旋涂法制备WO3薄膜电致变色性能

"智能窗"大规模推广顺应可持续发展潮流,三氧化钨(WO_3)是生产"智能窗"的一种重要电致变色材料,但调控WO_3薄膜电致变色性能机制仍待进一步研究。采用旋涂法制备WO_3薄膜,重点研究了溶液浓度和旋涂次数对调控WO_3薄膜电致变色性能的影响。通过表面轮廓仪测量薄膜厚度,X射线衍射(XRD)测量薄膜结晶情况,原子力显微镜(AFM)和扫描电子显微镜(SEM)分析薄膜表面形貌,光谱仪测量薄膜初始态、着色态和褪色态的透射率。实验结果表明,随着溶液浓度增加(0. 2～1. 0 mol/L),薄膜厚度从9. 7 nm增加到33. 3 nm,透射率调制能力从0%提升到37. 0%;多次旋涂薄膜厚度线性增长,线性拟合优度(R~2)达0. 98,5次旋涂后透射率调制能力达51. 3%。改变溶液浓度和旋涂次数都是调控薄膜透射率调制能力的有效手段,精准调控薄膜透射率调制能力对设计不同应用场景的电致变色器件具有重大意义。     

Electrochromic properties of spray deposited TiO2-doped WO3 thin films

TiO₂-doped WO₃ thin films were deposited onto fluorine-doped tin oxide coated conducting glass substrates using spray pyrolysis technique at 525 °C. The volume percentage of TiO₂ dopant was varied from 13% to 38%. The thin film samples were transparent, uniform and strongly adherent to the substrates. Electrochromical properties of TiO₂-doped WO₃ thin films were studied with the help of cyclic voltammetry (CV), chronoamperometry (CA) and chronocoulometry (CC) techniques. It has been found that TiO₂ doping in WO₃ enhances its electrochromic performance. Colouration efficiency becomes almost double and samples exhibit increasingly high reversibility with TiO₂ doping concentrations, in the studied range.     

石英衬底上Au缓冲层对ZnO薄膜微结构的影响

采用单源化学气相沉积(SSCVD)法,在石英衬底上以Au为缓冲层,Zn4(OH)2(O2CCH3)6.2H2O为固相源制备ZnO薄膜。SEM和XRD测试ZnO薄膜的微结构,结果表明:相对于SiO2衬底上生长的ZnO薄膜,Au/SiO2衬底上生长的ZnO薄膜具有较好的结晶质量和表面平整度;对制备ZnO薄膜的衬底温度进行了工艺优化,结果表明:500℃时制备的ZnO薄膜颗粒大小均匀,结晶质量较好;通过荧光光谱仪对Au/SiO2衬底上的ZnO薄膜进行光致发光(PL)谱测试,ZnO薄膜在400nm出现紫光发射峰,而没有出现与缺陷相关的深能级发射峰,表明ZnO薄膜具有较好的结晶质量。     

Structural, optical and electrical studies on pulse electrodeposited CdIn2S4 thin films

CdIn₂S₄ thin films were prepared by pulse electrodeposition technique over F:SnO₂ glass and stainless steel substrates in galvanostatic mode from an aqueous acidic bath containing CdSO₄, InCl₃ and Na₂S₂O₃. The growth kinetics of the film has been studied and the deposition parameters such as electrolyte bath concentration, bath temperature, time of deposition, deposition current and pH of the bath are optimized. X-ray diffraction (XRD) analysis of the as deposited and annealed films shows polycrystalline nature. Energy dispersive analysis by X-ray (EDAX) confirms nearly stoichiometric CdIn₂S₄ nature of the film. Scanning electron microscope (SEM) studies show that, the deposited films are well adherent and grains are uniformly distributed over the surface of the substrate. The optical transmission spectra show a direct band gap of 2.16 eV. Conductivity measurements have been carried out at different temperatures and electrical parameters such as activation energy, trapped energy state and barrier heights etc. have been determined.     

基于FTO/VO2/FTO结构的VO2薄膜电压诱导相变光调制特性

采用直流磁控溅射和后退火工艺在掺氟的SnO₂(FTO)导电玻璃衬底上制备VO₂薄膜, 研究了不同退火时间和不同比例的氮氧气氛对VO₂薄膜性能的影响, 对VO₂薄膜的结晶取向、表面形貌、表面元素的相对含量和透过率随波长变化进行了测试分析, 结果表明在最佳工艺条件下制备得到了组分相对单一的VO₂薄膜. 基于FTO/VO₂/FTO结构在VO₂薄膜两侧的透明导电膜上施加电压并达到阈值电压时, 观察到了明显的电流突变. 当接触面积为3 mm×3 mm时, 阈值电压为1.7 V, 阈值电压随接触面积的增大而增大. 与不加电压的情况相比, FTO/VO₂/FTO结构在电压作用下高低温的红外透过率差值可达28%, 经反复施加电压, 该结构仍保持性能稳定, 具有较强的电致调控能力.     

水热制备Sr（MoO4）x（WO4）1-x固溶体微晶及其发光性能

采用水热法制备了Sr（MoO₄）_x（WO₄）_1-x固溶体微晶。通过X射线粉末衍射（XRD）、傅里叶变换红外光谱（FT-IR）、扫描电镜（SEM）和荧光分析（FA）表征了微晶的结构、表面形貌和发光性能。XRD和FT-IR结果表明制备的Sr（MoO₄）_x（WO₄）_1-x微晶皆呈现典型的四方晶相白钨矿结构。SEM结果表明制备的微晶为表面光滑且粒径均匀的球形颗粒。荧光发射光谱显示,在275 nm紫外光激发下,随着x值的增加,Sr（MoO₄）_x-（WO₄）_1-x固溶体微晶在350 nm处的发射逐渐减弱,470 nm处的发射逐渐增强。     

High pyroelectric Ba0.65Sr0.35TiO3 thin films with Ba0.65Sr0.35RuO3 seeding-layer for monolithic ferroelectric bolometer

Ba_0.65Sr_0.35TiO₃ (BST) thin films were deposited by RF sputtering with a very thin Ba_0.65Sr_0.35RuO₃ (BSR) seeding-layer on Pt/Ti/SiO₂/Si substrate. The crystallization of BST thin films and the surface morphology of BSR seeding-layer were characterized by X-ray diffraction (XRD) and atomic force microscopy (AFM), respectively. XRD patterns show that the BSR seeding-layer affected the orientation of BST thin film, which is highly a-axis textured. It was also found that the BSR seeding-layer had a marked influence on the dielectric properties of BST thin films. Comparing with BST thin films directly deposited on Pt electrode, the dielectric relaxation can be suppressed and dielectric constant increased due to a possible reduction of interface oxygen vacancies at BST/BSR interface. Moreover, J–V measurement indicates that the leakage current density of BST thin films on BSR seeding-layer were greatly reduced compared with that of BST thin films directly on Pt electrodes. The pyroelectric coefficient of BST thin films with BSR seeding-layer is 7.57 × 10⁻⁷ C cm⁻² K⁻¹ at 6 V/μm at room temperature (RT). Our results reveal that high pyroelectric property of BST thin film could be achievable using BSR seeding-layer as a special buffer.     

Bismuth oxide thin films prepared by chemical bath deposition (CBD) method: annealing effect

Bismuth oxide thin films have been deposited by room temperature chemical bath deposition (CBD) method and annealed at 623 K in air. They were characterized for structural, surface morphological, optical and electrical properties. From the X-ray diffraction patterns, it was found that after annealing a non-stoichiometric phase, Bi₂O_2.33, was removed and phase pure monoclinic Bi₂O₃ was obtained. Surface morphology of Bi₂O₃ film at lower magnification SEM showed rod-like structure, however, higher magnification showed a rectangular slice-like structure perpendicular to substrate, giving rise to microrods on the surface. The optical studies showed the decrease in band gap by 0.3 eV after annealing. The electrical resistivity variation showed semiconductor behavior and from thermoemf measurements, the electrical conductivity was found to be of n-type.     

WO3/Pt复合薄膜的制备及其光电催化性能

导电玻璃作为基底水热法生长了WO₃纳米棒,通过电沉积法改变沉积Pt的时间(40 s,80 s,120 s),以WO₃纳米棒为基底沉积得到不同的WO₃/Pt复合薄膜样品。通过X射线衍射分析和扫描电子显微镜等测试手段将WO₃纳米棒薄膜和WO₃/Pt复合薄膜样品进行表征。结果表明成功制备了WO₃/Pt复合薄膜样品。漫反射结果显示WO₃/Pt复合薄膜与WO₃薄膜相比具有更强的光吸收。交流阻抗谱显示WO₃/Pt复合薄膜与WO₃纳米棒薄膜相比增强了电荷转移效率。利用光电流、光电催化对WO₃/Pt复合薄膜进行光电性能测试,结果表明WO₃/Pt复合薄膜相较于单一WO₃薄膜光电流活性更高和光电催化活性更强,并且沉积时间为80 s的WO₃/Pt复合薄膜显示最为优异的光电流和光电催化性能。同时,沉积时间为80 s的WO₃/Pt复合薄膜的光电催化性能优于其光催化和电催化性能。     

Eu3+．Dy3+,Sm3+掺杂Ca(Sr,Ba)W04的光谱性质

采用共沉淀方法制备了稀土离子Eu3+,Dy3+,Sm3掺杂的Ca(Sr,Ba) WO4发光材料,目的是研究金属阳离子改变对稀土离子发光性质的影响.X射线衍射光谱数据表明,CaWO4、SrWO4、BaWO4都是四方晶系I41/a(88)结构,随着阳离子半径增大,衍射峰向小角移动.不同温度制备的BaWO4样品X射线衍射光谱...     

利用Er3+光学温度传感特性研究Tm3+/Yb3+掺杂NaY(WO4)2微米球的激光辐照热效应

采用微波水热方法合成了Er³⁺/Yb³⁺及Tm³⁺/Yb³⁺两个共掺杂的绣球花状NaY（WO₄）₂微米球样品。XRD结果表明所获得的产物为纯相体心结构的NaY（WO₄）₂,利用SEM观察发现产物粒子结构为纳米片组装成的绣球花状。考虑到红外激光辐照对样品产生加热效应,采用380 nm激发下不同温度的发射光谱获得了Er³⁺/Yb³⁺共掺杂NaY（WO₄）₂微米球的温度传感特性曲线和灵敏度曲线。把Er³⁺/Yb³⁺共掺杂NaY（WO₄）₂与Tm³⁺/Yb³⁺共掺杂的NaY（WO₄）₂按质量比1：10进行混合,采用980 nm激发测量了混合物的上转换发光光谱,研究了激光持续辐照对Tm³⁺/Yb³⁺掺杂NaY（WO₄）₂样品的加热效应和Tm³⁺的¹G₄→³H₆ 跃迁发光强度随激光辐照时间的变化。实验发现980 nm激光辐照使Tm³⁺/Yb³⁺掺杂NaY（WO₄）₂样品的温度持续升高并达到某一平衡温度,Tm³⁺的蓝色上转换发光也随着激光辐照时间的延长而增强,最后达到饱和。此外,在相同条件下,Tm³⁺/Yb³⁺共掺杂样品的激光辐照热效应比Er³⁺/Yb³⁺共掺杂样品的热效应更为显著。     

Room temperature NO_2-sensing properties of hexagonal tungsten oxide nanorods

Hexagonal WO_3 nanorods were synthesized through a facile hydrothermal method. The nanorods properties were investigated by scanning electron microscope(SEM), transmission electron microscope(TEM), energy dispersive spectroscopy(EDS), and x-ray diffraction(XRD). The NO_2-sensing performances in terms of sensor response, response/recovery times and repeatability at room temperature were optimized by varying the heat treatment temperature of WO_3 nanorods. The optimized NO_2sensor(400-℃-annealed WO_3 nanorods) showed an ultra-high sensor response of 3.2 and short response time of 1 s to 5-ppm NO_2. In addition, the 400-℃-annealed sample exhibited more stable repeatability.Furthermore, dynamic responses measurements of annealed samples showed that all the annealed WO_3 nanorods sensors presented p-type behaviors. We suppose the p-type behavior of the WO_3 nanorods sensor to be that an inversion layer is formed in the space charge layer when the sensor is exposed to NO_2 at room temperature.Therefore, the 400-℃-annealed WO_3 nanorods sensor is one of the most energy conservation candidates to detect NO_2 at room temperature.     

Substrate dependent growth studies of MgB2 films by electrocrystallization

The comparative study of MgB₂ film growth on Al₂O₃ and glass substrate by electrocrystallization technique is discussed. The precursor magnesium films were deposited by vacuum evaporation method. These magnesium films were then used as electrode for the growth of MgB₂ films by electrocrystallization. The structural, morphological and superconducting properties of the electrocrystallized MgB₂ films on Al₂O₃ substrate were examined by using XRD, SEM and electrical resistivity measurement techniques and compared with that of MgB₂ films grown on glass substrate. The films deposited on Al₂O₃ substrates showed enhanced crystallinity and relatively higher T_c value compared to films deposited on glass substrates.     

反应前驱物中n(S)∶n(Cd)对CdS薄膜结构及发光特性的影响

采用化学水浴以CdCl2·H2O、CS( NH2)2、NH4Cl、NH3·H2O和去离子水作为反应前驱物制备CdS纳米晶薄膜.采用扫描电镜( SEM)、X射线衍射(XRD)、透射光谱和稳态荧光光谱,研究了反应前驱物中不同的n(S)∶n(Cd)对所制备的CdS薄膜的形貌、结构和光学性能的影响.结果表明:反应前驱物中n(S...     

Growth, structural, and magnetic properties of iron nitride thin films deposited by dc magnetron sputtering

FeN thin films were deposited on glass substrates by dc magnetron sputtering at different Ar/N₂ discharges. The composition, structure and the surface morphology of the films were characterized using X-ray photoelectron spectroscopy (XPS), X-ray diffraction (XRD), and atomic force microscopy (AFM). Films deposited at different nitrogen pressures exhibited different structures with different nitrogen contents, and the surface roughness depended on the mechanism of the film growth. Saturation magnetization and coercivity of all films were determined using superconducting quantum interference device, which showed that if N₂/(Ar+N₂) flow ratio was equal to or larger than 30% the nonmagnetic single-phase γ″-FeN appeared. If N₂/(Ar+N₂) flow ratio was less than 10%, the films consisted of the mixed phases of FeN_0.056 and γ′-Fe₁₆N₂, whose saturation magnetizations were larger than that of -Fe. If N₂/(Ar+N₂) flow ratio was 10%, the phases of γ′-Fe₄N and -Fe₃N appeared, whose saturation magnetizations were lower than that of -Fe.     

Annealing effects on the properties of Ga2O3 thin films grown on sapphire by the metal organic chemical vapor deposition

We have prepared the gallium oxide (Ga₂O₃) thin films on sapphire substrates by the metal organic chemical vapor deposition (MOCVD) technique. We have compared the two films with and without the thermal annealing by using the X-ray diffraction (XRD), scanning electron microscopy (SEM), atomic force microscopy (AFM), and the photoluminescence (PL) spectra. Postdeposition annealing of amorphous Ga₂O₃ films was found to increase the degree of crystallization and the surface roughness. The PL emission intensities of bands in the blue–green and the ultraviolet regions increased by the thermal annealing.     

直流磁控溅射厚度对Cu(Inx,Ga1-x)Se2背接触Mo薄膜性能的影响

采用直流磁控溅射工艺, 在一定条件下通过控制溅射时间, 在钠钙玻璃上制备了不同厚度的用于Cu(In_x, Ga_1-x)Se₂薄膜太阳电池背接触材料的Mo薄膜, 并利用X射线衍射 (XRD)、场发射扫描电子显微镜 (SEM)、四探针测试仪、台阶仪研究了厚度对溅射时间、薄膜微结构、电学性能及力学性能的交互影响. Mo薄膜的厚度与溅射时间呈线性递增关系; 随厚度的增大, Mo薄膜 (110) 和 (211) 面峰强均逐渐增大, 择优生长从(110)方向逐渐向 (211)方向转变, 方块电阻值只随 (110) 方向上的生长而急剧减小直到一特定值约2 Ω/⇑, 电导率随薄膜的 (110) 择优取向程度的降低而线性减小直到一特定值约0.96×10^-4 Ω·cm; Mo薄膜内部是一种多孔的长形簇状颗粒和颗粒间隙交织的结构, 并处于拉应力态, 其内部应变随薄膜厚度的增大而减小. 关键词： Mo薄膜 CIGS背接触 厚度 微结构     

反应物浓度对NaYF4∶yb3+,Tm3+晶相的影响

利用水热法,制备了具有不同形貌的NaYF4:20％ Yb3+,1％Tm3+上转换发光粒子.利用扫描电子显微镜、X射线衍射分析、发光光谱测量等手段对样品进行了形貌、晶相和发光性质的表征.结果表明,通过调控反应物的浓度,可以实现NaYF4基质从立方相到六角相的晶相转变.在980 nm红外光的激发下,六角相的NaYF4∶ 2...     

Deposition of MgO films by pulsed mid-frequency magnetron sputtering

MgO films were deposited by pulsed mid-frequency magnetron sputtering from metallic targets in the mixture of Ar and O₂ gas. The surface morphology, crystalline structure, and optical properties were characterized by using atomic force microscopy (AFM), X-ray diffraction (XRD), and spectroscopic ellipsometry, respectively. The secondary electron emission coefficients of MgO films were measured by using a self-made apparatus in He gas. A pronounced hysteresis phenomenon of target voltage, current, and deposition rate with increasing and decreasing O₂ flow rate was observed. The structure of films deposited at a metallic mode changes from Mg phase to the mixed Mg and MgO phase, and the films have a very rough surface. All the films deposited at oxide mode have high transparency and smooth surface, and show (2 2 0) preferred orientation growth. The refractive index and extinction coefficient at a wavelength of 670 nm for MgO films deposited at oxide mode with a O₂ flow rate of 3 sccm are 1.698 and 1.16×10⁻⁴, respectively. The secondary emission coefficient at a E/p of 57.8 V/(cm Torr) for MgO films deposited at a O₂ flow rate of 3 sccm is 0.16, which is higher than that of MgO films deposited by e-beam evaporation.     

Ge20Sb15Se65薄膜的热致光学特性变化研究

采用磁控溅射法制备了Ge₂₀Sb₁₅Se₆₅薄膜, 研究热处理温度(150—400 ℃)对薄膜光学特性的影响. 通过分光光度计、X射线衍射仪、显微拉曼光谱仪对热处理前后薄膜样品 的光学特性和微观结构进行了表征, 并根据Swanepoel方法以及Tauc公式分别计算了薄膜折射率色散曲线和光学带隙等参数. 结果表明当退火温度(T_a)小于薄膜的玻璃转化温度(T_g)时,薄膜的光学带隙(E_g^opt)随着退火温度的增加由1.845 eV上升至1.932 eV, 而折射率由2.61降至2.54; 当退火温度大于薄膜的玻璃转化温度时,薄膜的光学带隙随退火温度的增加由1.932 eV降至1.822 eV, 折射率则由2.54增至2.71. 最后利用Mott和Davis提出的非晶材料由非晶到晶态的结构转变模型对结果进行了解释, 并通过薄膜XRD和Raman光谱进一步验证了结构变化是薄膜热致变化的重要原因. 关键词： 20Sb₁₅Se₆₅薄膜')" href="#">Ge₂₀Sb₁₅Se₆₅薄膜 热处理 光学带隙 折射率