改善Si3N4俘获层过擦现象的第一性原理研究

采用第一性原理方法对如何改善电荷俘获存储器的过擦现象进行了研究. 过擦是由于氮空位中Si原子对电荷的局域能力弱导致, 因此, 在Si₃N₄超胞中分别建立了以C, N, O替换氮空位中的Si原子的缺陷结构作为本文的研究模型. 分别计算了擦写之后体系的巴德电荷分布、相互作用能、态密度, 借以分析替位原子对过擦的影响. 巴德电荷分布的计算结果表明, Si₃N₄在O替位128号Si后的过擦现象被明显改善; C替位128号Si也可以改善过擦, 但由于C替位对电荷的局域作用变弱, 不利于电荷的存储实现; N替位128号Si则不能改善过擦; 而在162和196号Si位置, 三种原子的替换均无法改善过擦现象. 相互作用能的研究表明, 在128号Si位置, 三种原子都能够和氮空位形成团簇, 在体系中稳定存在. 特别地, O替位Si后, 体系中两缺陷的相互吸引作用最弱, 从而写入的电荷能够短暂的打破O团簇的稳定性, 实现电荷重构, 将电荷局域在O团簇周围. 此外, 态密度的分析结果表明O在128号Si位置能够在Si₃N₄禁带中引入深能级缺陷, 深能级局域电荷的能力强. 以上分析证明, O替位可以很好的改善Si₃N₄中的过擦现象. 本文的研究结果为电荷俘获存储器改善过擦提供了一种方法, 对提高器件的电荷保持特性和优化存储窗口具有指导意义.     

Si3N4的晶体化和ZrN/Si3N4纳米多层膜的超硬效应

研究了Si₃N₄层在ZrN/Si₃N₄纳米多层膜中的晶化现象及其对多层膜微结构与力学性能的影响. 一系列不同Si₃N₄层厚度的ZrN/Si₃N₄纳米多层膜通过反应磁控溅射法制备. 利用X射线衍射仪、高分辨透射电子显微镜和微力学探针表征了多层膜的微结构和力学性能. 结果表明，由于受到ZrN调制层晶体结构的模板作用，溅射条件下以非晶态存在的Si₃N₄层在其厚度小于0.9 nm时被强制晶化为NaCl结构的赝晶体，ZrN/Si₃N₄纳米多层膜形成共格外延生长的柱状晶，并相应地产生硬度升高的超硬效应. Si₃N₄随层厚的进一步增加又转变为非晶态，多层膜的共格生长结构因而受到破坏，其硬度也随之降低.     

Crystallization of amorphous Si3N4 and superhardness effect in HfC/Si3N4 nanomultilayers

HfC/Si₃N₄ nanomultilayers with various thicknesses of Si₃N₄ layer have been prepared by reactive magnetron sputtering. Microstructure and mechanical properties of the multilayers have been investigated. The results show that amorphous Si₃N₄ is forced to crystallize and grow coherently with HfC when the Si₃N₄ layer thickness is less than 0.95 nm, correspondingly the multilayers exhibit strong columnar structure and achieve a significantly enhanced hardness with the maximum of 38.2 GPa. Further increasing Si₃N₄ layer thickness leads to the formation of amorphous Si₃N₄, which blocks the coherent growth of multilayer, and thus the hardness of multilayer decreases quickly.     

Si3N4在h-AlN上的晶体化与AlN/Si3N4纳米多层膜的超硬效应

采用反应磁控溅射法制备了一系列具有不同Si₃N₄层厚度的AlN/Si₃N₄纳米多层膜,利用X射线衍射仪、高分辨透射电子显微镜和微力学探针表征了多层膜的微结构和力学性能.研究了Si₃N₄层在AlN/Si₃N₄纳米多层膜中的晶化现象及其对多层膜生长结构与力学性能的影响.结果表明,在六方纤锌矿结构的晶体AlN调制层的模板作用下,通常溅射条件下以非晶态存在的Si₃N₄层在其厚度小于约1nm时被强制晶化为结构与AlN相同的赝形晶体,AlN/Si₃N₄纳米多层膜形成共格外延生长的结构,相应地,多层膜产生硬度升高的超硬效应.Si₃N₄随层厚的进一步增加又转变为非晶态,多层膜的共格生长结构因而受到破坏,其硬度也随之降低.分析认为,AlN/Si₃N₄纳米多层膜超硬效应的产生与多层膜共格外延生长所形成的拉压交变应力场导致的两调制层模量差的增大有关. 关键词： 3N₄纳米多层膜')" href="#">AlN/Si₃N₄纳米多层膜 外延生长 赝晶体 超硬效应     

Analytical electron microscopy of a reaction-bonded Si3N4-based ceramic containing oxide additions

The microstructure of a silicon nitride (Si₃N₄)-based ceramic, prepared by a process combining direct nitridation and reactive liquid phase sintering of silicon/ceramic oxide powder compacts, has been characterised using analytical transmission electron microscopy. The presence of the reactive liquid phase, promoted by the addition of oxides from the CaO-Al₂O₃-SiO₂ ternary system, resulted in an as-fired microstructure containing a mixture of crystalline phases based on -Si₃N₄, β-Si₃N₄ and Si₂ N₂O, and distinct amorphous regions rich in Si, Al and Ca. X-ray microanalysis revealed the calcium to be wholly partitioned to the glassy phase, while significant concentrations of aluminium were detected in both β-Si₃N₄ and Si₂N₂O. The observed compositions of these phases, together with measured lattice parameters systematically in excess of those of the pure compounds, imply that they are in fact β- and O-sialons respectively. Semi-quantitative energy dispersive X-ray spectroscopy, using an ultra-thin window detector, is demonstrated to be capable of distinguishing clearly between these phases according to their oxygen content and of determining the aluminium content of both phases to within ± 1 equ.%, even at concentration levels of <5 equ.%.     

Optical and electrical properties of binary WO3–Pb3O4 glasses

A glass system of the composition xWO₃+(100−x)Pb₃O₄, with x=5, 10, 20 and 30 mol.% was prepared. The optical absorption, ac and dc conductivities are the subject of the present work. The optical absorption indicates that the electronic transition is indirect and is associated with phonon assisted transition. The exponential dependence of the absorption coefficient as a function of the incident photon energy suggests that the Urbach rule is obeyed, and indicates the formation of a band tail. On the other hand, ac conductivity measurements are performed in the frequency range 0.1–100 kHz, and in the temperature range 300–600 K. The results of the electrical conductivity are discussed on the basis of electronic glass conduction models. Correlated narrow-band limit for random sites and single polaron hopping model are found to describe the experimental results effectively. The dielectric constant was correlated to the optical band gap and a satisfactory relation was found. It was also possible to calculate the thermochromic properties from independent ac and dc measurements, and it was possible to evaluate the optical gap at 0 K by extrapolation.     

AlN/Si3N4纳米多层膜的外延生长与力学性能

采用射频磁控溅射方法制备单层AlN, Si₃N₄薄膜和不同调制周期的AlN/Si₃N₄纳米多层膜.采用X射线衍射仪、高分辨透射电子显微镜和纳米压痕仪对薄膜进行表征.结果发现,多层膜中Si₃N₄层的晶体结构和多层膜的硬度依赖于Si₃N₄层的厚度.当AlN层厚度为4.0nm、 Si₃N₄层厚度 关键词： 3N₄纳米多层膜')" href="#">AlN/Si₃N₄纳米多层膜 外延生长 应力场 超硬效应     

Improving the tribological performances of graphite-like carbon films on Si3N4 and SiC by using Si interlayers

Si interlayers were used to obtain the excellent tribological performances of graphite-like carbon (GLC) film on silicon nitride (Si₃N₄) and silicon carbide (SiC). The microstructure and mechanical characteristics of the as-prepared GLC films with Si interlayers were investigated by scanning electron microscopy, Raman spectroscopy, nanoindention and scratch test. The tribological behaviors of GLC-coated and uncoated Si₃N₄ and SiC were comparatively studied by a ball-on-disc tribo-meter in both dry and water environments. Results showed that the Si interlayers were dense and bonded well with both the substrates and GLC layers. The as-prepared GLC films exhibited excellent tribological performances in both dry and water environments. More importantly, the stably mild wear without any delamination was obtained in water by using Si interlayer. The mechanisms of friction reduction and anti-wear performances of GLC films on the two ceramics with Si interlayers under different environmental conditions were discussed, as well as the corresponding models were deduced.     

Spectroscopic ellipsometric characterization of TiAlN/TiAlON/Si3N4 tandem absorber for solar selective applications

Sputter deposited TiAlN/TiAlON/Si₃N₄ tandem absorber has been characterized by spectroscopic ellipsometry in the wavelength range of 450-1200 nm. Each layer of the tandem absorber viz., TiAlN, TiAlON and Si₃N₄ has been deposited separately on copper substrate (Cu) and ellipsometric measurements have been carried out on each of these layers. The measured ellipsometric spectra were fitted with theoretically simulated spectra and the sample structure and wavelength dispersion of optical constants of each layers have been determined. The ellipsometric measurements have also been carried out on the three-layer tandem absorber deposited on Cu substrate. By analyzing the ellipsometric data, depth profiling of the tandem absorber has been carried out using the derived optical constants of the individual layers.     

Preparation, characterization and luminescence properties of porous Si3N4 ceramics with Eu2O3 as sintering additive

Porous Si₃N₄ ceramics with photoluminescence properties were prepared by pressureless sintering using α-Si₃N₄ powder as raw material and Eu₂O₃ as sintering additive. Chemical composition, phase formation, microstructure and photoluminescence properties of porous Si₃N₄ ceramics were studied by X-ray photoelectron spectroscopy (XPS), X-ray diffraction (XRD), scanning electron microscopy (SEM) and photoluminescence measurements (PL/PLE). The results show that single Eu₂O₃ additive promotes α→β transformation but not significant densification. A broad band emission center at 570 nm assigned to Eu²⁺ is observed, Eu³⁺ in Eu₂O₃ is (partially) converted to Eu²⁺ by reaction with Si₃N₄, which results in a lower β aspect ratio and β-content compared to the other Ln (Ln=lanthanide) oxide additives.     

Effects of substitution of Ti for Fe in BiFeO3 films prepared by sol–gel process

Ti substituted BiFe_1−xTi_xO_3+δ films have been prepared on indium–tin oxide (ITO)/glass substrates by the sol–gel process. The films with x=0.00–0.20 were prepared at an annealing temperature of 600 °C. X-ray diffraction patterns indicate that all films adopt R3m structure and the films with x=0 and 0.10 show pure perovskite phase. Cross-section scanning shows the thickness of the films is about 300 nm. Through 0.05 Ti substitution, the 2P_r increases to 8.30 μC/cm² from 2.12 μC/cm² of the un-substituted BiFeO₃ film and show enhanced ferroelectricity at room temperature. The 2P_r values are 2.63 and 0.44 μC/cm² for the films with x=0.01 and 0.2, respectively. Moreover, the films with x=0.05 and 0.10 show enhanced dielectric property since the permittivity increases near 150 at the same measuring frequency. Through the substitution of Ti, the leakage conduction is reduced for the films with x=0.05–0.20.     

Preparation of uniform TiO2 nanostructure film on 316L stainless steel by sol-gel dip coating

Sol was prepared by the mixing of tetra-η-butyle titanat, ethyl aceto acetate, and ethanol in an optimized condition. Polished 316L specimens were coated with the sol by dip-coating method. The influences of drying condition, withdrawal speed, calcination temperature, addition of dispersant, and pH of sol on TiO₂ nanostructure coating were investigated. Choosing of alcohol as drying atmosphere hindered the crack formation. The relation between coating thickness and withdrawal speed was evaluated. The optimum temperature to create a uniform distribution of nanoparticles of anatase was derived as 400 °C. Average roughness of coating was found about 10.61 nm by AFM analysis. Dispersant addition promoted formation of a uniform film as well as prevention of agglomeration. Acidic sol provided smaller particles than neutral sol.     

Photon recycling in Fabry–Perot micro-cavities based on Si3N4 waveguides

We present a numerical analysis and preliminary experimental results on one-dimensional Fabry–Perot micro-cavities in Si₃N₄waveguides. The Fabry–Perot micro-cavities are formed by two distributed Bragg reflectors separated by a straight portion of a waveguide. The Bragg reflectors are composed of a few air slits produced within the Si₃N₄ waveguides. In order to increase the quality factor of the micro-cavities, we have minimized, with a multiparametric optimization tool, the insertion loss of the reflectors by varying the length of their first pairs (those facing the cavity). To explain the simulation results, the coupling of the fundamental waveguide mode with radiative modes in the Fabry–Perot micro-cavities is needed. This effect is described as a recycling of radiative modes in the waveguide. To support the modelling, preliminary experimental results of micro-cavities in Si₃N₄ waveguides realized with the focused ion beam technique are reported.     

Computational study on the half-metallicity in transition metal–oxide-incorporated 2D g-C3N4 nanosheets

In this study, based on the first-principles calculations, we systematically investigated the electronic and magnetic properties of the transition metal–oxide-incorporated 2D g-C₃N₄ nanosheet (labeled C₃N₄– TM–O, TM= Sc–Mn). The results suggest that the TM–O binds to g-C₃N₄ nanosheets strongly for all systems. We found that the 2D C₃N₄–TM–O framework is ferromagnetic for TM= Sc, Ti, V, Cr, while it is antiferromagnetic for TM= Mn. All the ferromagnetic systems exhibit the half-metallic property. Furthermore, Monte Carlo simulations based on the Heisenberg model suggest that the Curie temperatures (T_c) of the C₃N₄–TM–O (TM= Sc, Ti, V, Cr) framework are 169 K, 68 K, 203 K, and 190 K, respectively. Based on Bader charge analysis, we found that the origin of the half-metallicity at Fermi energy can be partially attributed to the transfer of electrons from TM atoms to the g-C₃N₄ nanosheet. In addition, we found that not only electrons but also holes can induce half-metallicity for 2D g-C₃N₄ nanosheets, which may help to understand the origin of half-metallicity for graphitic carbon nitride.     

共聚改性g-C3N4-N可见光催化降解RhB的研究

染料废水的排放对人类健康和生态系统构成严重威胁,光催化技术因其操作简单、绿色环保等优点在解决环境污染问题上已显示出巨大的潜力。类石墨相氮化碳（g-C₃N₄）由于成本低且具有良好的化学稳定性,被认为是光催化领域最有前景的新型光催化剂之一,但由于单一g-C₃N₄的比表面积小、可见光吸收能力低、光生电子-空穴复合率高影响了其光催化性能。以邻氨基苯甲腈和尿素为原料,通过高温共聚改性制备高催化活性的g-C₃N₄-N光催化剂,研究g-C₃N₄-N在不同pH值、g-C₃N₄-N投加量和RhB溶液浓度条件下对RhB光催化降解的影响,并结合红外光谱、XRD、BET、UV-Vis对g-C₃N₄-N光催化降解RhB的机理和染料降解路径进行解析。结果表明,经共聚改性制备的碳化氮为类石墨型纯相g-C₃N₄-N,具有稳定的光催化活性、大的比表面积和多孔结构,在初始pH值为3时,加入50 mg的g-C₃N₄-N在可见光条件下光催化降解10 mg·L-1 的RhB可达到最好的光催化降解效果,RhB在暗反应30 min内的吸附去除率可达30%左右,120 min的去除率达到97.7%。在光催化作用下,g-C₃N₄-N将吸附在光催化剂表面的罗丹明B分子通过快速N-脱乙基过程形成DER、EER和AR等大分子中间体,它们在空穴与·OH和·O-₂作用下,共轭结构裂解、开环,生成丁二酸、间苯二酚、丙酸等小分子,脱除的乙基被逐步氧化为乙二醇,这些小分子可以被转化为CO₂和H₂O。     

Vapour phase formation of amino functionalised Si3N4 surfaces

Self-assembled monolayer (SAM) formation of silanes on SiO₂ surfaces has been extensively studied. However, SAMs formed on silicon nitride (Si₃N₄) substrates have not been explored to the same level as SiO₂, even though they are of technological interest with a view to the chemical modification of microelectromechanical systems (MEMS). Therefore, this article presents the formation and characterisation of 3-aminopropyltrimethoxysilane (APTMS) SAMs on Si₃N₄ substrates from solution phase and vapour phase, compared to the well characterised APTMS SAMs formed on SiO₂ surfaces. Contact angle, atomic force microscopy (AFM), X-ray photoelectron spectroscopy (XPS) and ellipsometric data indicate the formation of APTMS SAMs (0.55 nm ellipsometric thickness) after 60 min immersion of either SiO₂ or Si₃N₄ substrates in APTMS solution (0.5 mM in EtOH). By comparison Si₃N₄ substrates exposed to APTMS vapour, at 168 mbar for 60 min, result in the formation of the equivalent of a bi or trilayer of APTMS.     

Wear resistance of reactive plasma sprayed and laser remelted TiB2-TiC0.3N0.7 based composite coatings against medium carbon steel

Wear resistance of reactive plasma sprayed TiB₂-TiC_0.3N_0.7 based composite coatings and the as-sprayed coating with laser surface treatment was investigated using plate-on-plate tests. Wear tests were performed at different normal loads and sliding speeds under dry sliding conditions in air. The surface morphologies of counterparts against as-sprayed and laser remelted coatings were investigated. The microstructure and chemical composition of wear debris and coatings were studied using scanning electron microscopy (SEM) and energy dispersive X-ray spectroscopy (EDS), respectively. The results show that the wear resistance of the laser remelted coating is improved significantly due to their increased microhardness and reduced flaws. The primary wear mechanism of the remelted coating is oxidation wear and its minor wear mechanisms are grain abrasion and fatigue failure during the course of wear test. In contrast, the primary wear mechanism of the as-sprayed coating is grain abrasion at the low sliding speed (370 rpm) and fatigue failure at the high sliding speed (549 rpm). The oxidation wear mechanism is a minor contributor for the as-sprayed coating.     

The effects of radiation damage on power VDMOS devices with composite SiO2-Si3N4 films

Total dose effects and single event effects on radiation-hardened power vertical double-diffusion metal oxide semiconductor(VDMOS) devices with composite SiO2-Si3N4 film gates are investigated.The relationships among the important electrical parameters of the samples with different thickness SiO2-Si3N4 films,such as threshold voltage,breakdown voltage,and on-state resistance in accumulated dose,are discussed.The total dose experiment results show that the breakdown voltage and the on-state resistance barely change with the accumulated dose.However,the relationships between the threshold voltages of the samples and the accumulated dose are more complex,and not only positively drift,but also negatively drift.At the end of the total dose experiment,we select the group of samples which have the smaller threshold voltage shift to carry out the single event effect studies.We find that the samples with appropriate thickness ratio SiO2-Si3N4 films have a good radiation-hardening ability.This method may be useful in solving both the SEGR and the total dose problems with the composite SiO2-Si3N4 films.     

Radiation damage effects on power VDMOS devices with composite SiO2–Si3N4 films

Total dose effects and single event effects on radiation-hardened power vertical double-diffusion metal oxide semiconductor (VDMOS) devices with composite SiO₂-–Si₃N₄ film gate are investigated. The relationships among the important electrical parameters of the samples with different thickness SiO₂-–Si₃N₄ films, such as threshold voltage, breakdown voltage, and on-state resistance in accumulated dose, are discussed. The total dose experiment results show that the breakdown voltage and the on-state resistance barely change with the accumulated dose. However, the relationships between the threshold voltages of the samples and the accumulated dose are more complex, not only positive drift, but also negative drift. At the end of the total dose experiment, we select the group of samples which have the smaller threshold voltage shift to carry out the single event effect studies. We find that the samples with appropriate thickness ratio SiO₂-–Si₃N₄ films have a good radiation-hardening ability. This method may be useful in solving both the SEGR and the total dose problems with the composite SiO₂-–Si₃N₄ films.     

Rigorous reflectance performance analysis of Si3N4 self-suspended subwavelength gratings

In this paper, we make an investigation into the reflectance performance of the Si₃N₄ self-suspended subwavelength grating (SSG) via changing several parameters including the incident wavelength, the grating period, the grating thickness and the grating filling ratio. For TM polarization of incidence, numerical results by the rigorous coupled-wave method reveal that the reflectance spectrum of the Si₃N₄ SSG has a narrow linewidth (less than 1 nm), high peak reflectance (100%), and low side bands (less than 0.5%) simultaneously in the optical telecommunication wavelength region. By using a micro-electromechanical-systems actuator, it is believed that the Si₃N₄ SSG should serve as tunable optical filters in optical telecommunication systems.