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M. Asghar F. Iqbal S. Faraz V. Jokubavicius Q. Wahab M. Syväjärvi 《Physica B: Condensed Matter》2012,407(15):3041-3043
In this study deep level transient spectroscopy has been performed on boron–nitrogen co-doped 6H-SiC epilayers exhibiting p-type conductivity with free carrier concentration (NA–ND)∼3×1017 cm−3. We observed a hole H1 majority carrier and an electron E1 minority carrier traps in the device having activation energies Ev+0.24 eV, Ec −0.41 eV, respectively. The capture cross-section and trap concentration of H1 and E1 levels were found to be (5×10−19 cm2, 2×1015 cm−3) and (1.6×10−16 cm2, 3×1015 cm−3), respectively. Owing to the background involvement of aluminum in growth reactor and comparison of the obtained data with the literature, the H1 defect was identified as aluminum acceptor. A reasonable justification has been given to correlate the E1 defect to a nitrogen donor. 相似文献
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Andreas Gällström Björn Magnusson Franziska C. Beyer Adam Gali N.T. Son Stefano Leone Ivan G. Ivanov Carl G. Hemmingsson Anne Henry Erik Janzén 《Physica B: Condensed Matter》2012,407(10):1462-1466
Several optically observed deep level defects in SiC are still unidentified and little is published on their behavior. One of the commonly observed deep level defects in semi-insulating SiC is UD-1. 相似文献
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We have used deep level transient spectroscopy (DLTS), and Laplace-DLTS to investigate the defects created in antimony doped germanium (Ge) by sputtering with 3 keV Ar ions. Hole traps at EV+0.09 eV and EV+0.31 eV and an electron trap at EC−0.38 eV (E-center) were observed soon after the sputtering process. Room temperature annealing of the irradiated samples over a period of a month revealed a hole trap at EV+0.26 eV. Above room temperature annealing studies revealed new hole traps at EV+0.27 eV, EV+0.30 eV and EV+0.40 eV. 相似文献