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1.
In this study deep level transient spectroscopy has been performed on boron–nitrogen co-doped 6H-SiC epilayers exhibiting p-type conductivity with free carrier concentration (NA–ND)∼3×1017 cm−3. We observed a hole H1 majority carrier and an electron E1 minority carrier traps in the device having activation energies Ev+0.24 eV, Ec −0.41 eV, respectively. The capture cross-section and trap concentration of H1 and E1 levels were found to be (5×10−19 cm2, 2×1015 cm−3) and (1.6×10−16 cm2, 3×1015 cm−3), respectively. Owing to the background involvement of aluminum in growth reactor and comparison of the obtained data with the literature, the H1 defect was identified as aluminum acceptor. A reasonable justification has been given to correlate the E1 defect to a nitrogen donor.  相似文献   

2.
文章作者利用深能级瞬态谱(DLTS),正电子湮灭谱(PAS)和光致荧光谱(PL)等谱分析技术研究了六方碳化硅中具有电活性的深能级缺陷、这些深能级缺陷分别通过不同能量的电子辐照、中子辐照,或氦离子注入等产生.经过研究和分析各种实验测试的相关图谱,作者给出了六方碳化硅中一些重要的深能级缺陷在可控辐照条件下产生和退火行为的研究结果以及这些深能级缺陷相关结构的实验依据.  相似文献   

3.
Several optically observed deep level defects in SiC are still unidentified and little is published on their behavior. One of the commonly observed deep level defects in semi-insulating SiC is UD-1.  相似文献   

4.
We have used deep level transient spectroscopy (DLTS), and Laplace-DLTS to investigate the defects created in antimony doped germanium (Ge) by sputtering with 3 keV Ar ions. Hole traps at EV+0.09 eV and EV+0.31 eV and an electron trap at EC−0.38 eV (E-center) were observed soon after the sputtering process. Room temperature annealing of the irradiated samples over a period of a month revealed a hole trap at EV+0.26 eV. Above room temperature annealing studies revealed new hole traps at EV+0.27 eV, EV+0.30 eV and EV+0.40 eV.  相似文献   

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