Anisotropy of the work function change in physical adsorption

Smoluchowski's concept of the surface double layer of bare metals is extended for physical adsorption of rare gas atoms on metal surfaces. With the use of the polarization approach it is possible to show that the work function decrease on physical adsorption of rare gases is anisotropic. A simple rule is suggested according to which the work function change produced by physical adsorption of the given rare gas on different crystal faces of the same metal [-Δφ(hkl)] decreases with increasing work function of the bare face [φ₀(hkl)] and/or with increasing packing density of the bare face. The former correlation is quantitative, whereas the latter correlation is only qualitative. The above predictions are compared with the first data available in the literature.     

Thermodynamics of xenon adsorption on Pd(s)[8(100) × (110)]: From steps to multilayers

The thermodynamic properties of the adsorption of xenon on the stepped Pd(s)[8(100)×(110)] surface have been studied over a wide range of pressure (5×10^?11 to 1×10^?4 Torr) and temperature (40–140 K). We have measured adsorption isobars using AES in order to evaluate the surface coverage. By choosing pressure and temperature we have studied under equilibrium conditions, the successive adsorption of xenon on the steps and on the terraces until the first layer is formed, the condensation of the second layer as well as the formation of xenon multilayers. For a small range of pressure and temperature, adsorption takes place only on the atomic steps. The LEED pattern shows that only every other site along the steps is occupied. The extrapolated initial heat of adsorption for steps is E_ad^S = 10.2 kcal/mol, decreasing monotonically by about 2 kcal/mol as the relative coverage of the step sites increases. The dipole moment of the Xe atoms adsorbed on steps is 1.12 D. During adsorption on the terraces the LEED observations suggest that the xenon adlayer is non-localized up to completion of the hexagonally close packed monolayer. The initial heat of adsorption on the terraces, E_ad^T is 8.2 kcal/mol and decreases continuously to a value of 6.9 kcal/mol for a complete monolayer due to lateral repulsive interactions between the adsorbed xenon atoms. The induced dipole moment of Xe on terraces is reduced to 0.49 D. The 5p_{$\text{1}\text{2}$} binding energy of Xe adsorbed on terrace sites is 0.3 eV smaller than that of Xe occuping step sites. The differential molar entropy of the adsorbed layer on the terraces as a function of coverage compares fairly well with the calculated value for an ideally mobile two-dimensional gas. No indication of the growth of two-dimensional xenon islands has been found under these conditions. The isosteric heat of adsorption for the second layer is E_ad^sec = 5.8 kcal/mol independently of the coverage. The condensation of the second layer is a first order two-dimensional gas ? two-dimensional solid phase transition in opposition to the continuous nature of the adsorption of the first layer (extending over a wide range of temperature for a given pressure). The induced dipole moment is further reduced for the Xe second layer to a value of 0.11 D. Finally, the condensation of multilayers proceeds with a latent heat of transformation of E_cond = 3.8 kcal/mol in excellent agreement with the known bulk value for the heat of sublimation of xenon. The line shape of the NVV low energy Auger transitions of xenon or the UPS binding energies of the Xe 5p_{$\text{3}\text{2}$,$\text{1}\text{2}$} spectra allow a clear distinction between first, second and higher layer Xe atoms. We have also established the temperature/pressure conditions for equilibrium between first, second and bulk xenon layers, i.e. a so-called “roughening point”.     

Study of mercury surface diffusion on tantalum with and without an electric field by means of a field emission microscope

The surface diffusion of mercury atoms on tantalum substrate with and without high electric field was studied by means of a field emission microscope (Müller's). The activation energy during surface migration Q_m of mercury atoms with and without an electric field F on tantalum substrate depending on the thickness of the adsorbate was measured. It is shown that the electron density distribution at coverage θ < 0.65 with adsorbate is due to a dipole momentum P. At θ > 0.65 the slope of the curves of Q^F_m = ?(θ) is explained with the appearance of the effect of polarization. The energy of desorption Q_d as a function of the thickness of the adsorbed layer in the temperature range 100–300 K was measured also.     

Interaction of inert gases with a nickel (100) surface: I. Adsorption of xenon

The adsorption of Xe on a Ni(100) surface has been studied in UHV between 30 and 100 K using LEED, thermal desorption spectroscopy (TDS), work function (Δφ) measurements, and UV photoemission (UPS). At and below 80 K, Xe adsorbs readily with high initial sticking probability and via precursor state adsorption kinetics to form a partially ordered phase. This phase has a binding energy of ~5.2 kcal/mole as determined by isosteric heat measurements. The heat of adsorption is fairly constant up to medium coverages and then drops continuously as the coverage increases, indicating repulsive mutual interactions. The thermal desorption is first order with a preexponential factor of about 10¹² s^?1, indicative of completely mobile adsorption. Adsorbed Xe lowers the work function of the Ni surface by 376 mV at monolayer coverage. (This coverage is determined from LEED to be 5.65 × 10¹⁴ Xe molecules/cm^-2.) For not too high coverages, θ, Δφ(θ) can be described by the Topping model, with the initial dipole moment μ₀ = 0.29 D and the polarizability α being 3.5 × 10^?24 cm³. In photoemission, the $\text{Xe 5p}{}_{\mathrm{<mtext>3</mtext><mtext>2</mtext>}}$ and $\text{5p}{}_{\mathrm{<mtext>1</mtext><mtext>2</mtext>}}$ orbitals show up as intense peaks at 5.56 and 6.83 eV below E_f which do not shift their position as the coverage varies. Multilayer adsorption (i.e. the filling of the second and third layers) can be seen by TDS. The binding energies of these α states can be estimated to range between 4.5 and 3.5 kcal/mole. The results are compared and contrasted with previous findings of Xe adsorption on other transition metal surfaces and are discussed with respect to the nature of the inert-gas-metal adsorptive bond.     

Stay time measurements for Xe,Kr, and CO2 physisorbing on Ni and Cu surfaces

A pulsed molecular beam apparatus is used to measure mean stay times for gases physisorbing on cooled surfaces. Most of the data are for Xe on nickel surfaces. Data are also presented for Kr and CO₂ on nickel, Xe on copper, and Xe on ion-sputter-cleaned nickel. All targets are polycrystalline. Surface temperatures range from 92 to 125 K and measured stay times range from 10^?5 to 10^?3 s. Heats of adsorption and pre-exponential factors deduced from the data indicate that the adsorption is localized (immobile) and suggest that the sputter-cleaned targets may be approximately clean. A model relating the shape of the detector signal to the mean stay time is presented and its validity is assessed. Measured speed distributions for the desorbing molecules exhibit an excess of slow molecules compared to that expected for simple effusion. At lower surface temperatures where longer stay times are observed, a peculiar detector signal dip is observed which appears to indicate that the adsorbing beam pulses temporarily reduce the steady state desorption rate of background atoms.     

Work function of adsorption systems potassium on tantalum and on molybdenum

Work functions φ_hkl of thermally annealed and potassium covered tantalum and molybdenum as a function of potassium surface density on (011), (112), (100) and (111) planes of these metals have been measured using a field emission microscope. The measurements have been performed at liquid nitrogen temperature (immobile layers). The work function decreases linearly at first, then more slowly, passes through a minimum, and then attains a constant value. Quantitative data on the dependence of φ_hklon surface density of potassium, N_hkl, for tantalum, molybdenum and tungsten have been compared. The principal results of the observations are: (i) for K on Ta, Mo, and W the work function minimum exhibits no distinct dependence on the type of substrate, however, it proves to depend on crystallographic direction of the latter; (ii) the values of the high coverage limit work function are approximately equal for one type of metal planes; (iii) the values of the high coverage limit surface densities of potassium adsorbed on Ta(011), Mo(011) and W(011) surfaces are approximately equal to the surface density of the (011) plane of bulk potassium crystal.     

The adsorption of Xe and CO on a Cu (311) single crystal surface

LEED, electron energy loss spectroscopy and surface potential measurements have been used to study the adsorption of Xe and CO on Cu (311). Xe is adsorbed with a heat of 19 ± 2 kJ mol^/t-1. The complete monolayer has a surface potential of 0.58 V and a hexagonal close-packed structure with an interatomic distance of 4.45 ± 0.05 Å. CO gives a positive surface potential increasing with coverage to a maximum of 0.34 V and then falling to 0.22 V at saturation. The heat of adsorption is initially 61 ± 2 kJ mol^?1, falling as the surface potential maximum is approached to about 45 kJ mol^?1. At this coverage streaks appear in the LEED pattern corresponding to an overlayer which is one-dimensionally ordered in the [011&#x0304;] direction. Additional CO adsorption causes the heat of adsorption to decrease further and the overlayer structure to be compressed in the [011&#x0304;] direction. At saturation the LEED pattern shows extra spots which are tentatively attributed to domains of a new overlayer structure coexisting with the first. Electron energy loss spectra (EELS) of adsorbed CO show two characteristic peaks at 4.5 and 13.5 eV probably arising from transitions between the electronic levels of chemisorbed CO.     

Une détermination du coefficient d'autodiffusion de surface en présence d'une couche d'adsorption à l'aide de pointes àémission de champ (nickel sur tungsténe)

The tip blunting technique to measure the surface self-diffusion of clean metals (A. Piquet, Vu Thien Binh, H. Roux, R. Uzan and M. Drechsler) is extended to study the influence of an adsorption layer on diffusion. The system studied is nickel on tungsten. The increase of the apex radius is measured by means of FEM characteristics. In the temperature range used (1200–1500 K), the nickel monolayer (1.16 × 10¹⁵ atoms/cm²) is maintained by compensation of desorbed Ni atoms with a continual flux from an evaporation source. The adsorption life time between 1350 and 1500 K decreases from 850 to 16 s. The conservation of the degree of coverage leads to a method to determine the desorption activation energy of nickel (E_d = 4.56 eV/atom). The surface self-diffusion data of tungsten with a nickel monolayer are found to be D₀ = 3 × 10^?3cm/²s and Q_s = 1.9 eV/atom, compared to the clean tungsten data D₀ = 1 cm²/s and Q_s = 3.1 eV/atom. The Ni monolayer increases the surface self-diffusion coefficient by a factor 160 at 1200 K and 20 at 1500 K. The results are discussed with respect to nickel activated sintering of tungsten powders.     

Adsorption isotherms of oxygen on tungsten (100), (110) and (111) surfaces in the pressure range 10−9 to 10−4 torr and temperature range 1500 to 2600 k,as measured by AES

This paper is a continuation of a previous investigation of oxygen adsorption on tungsten at high temperature using Auger electron spectroscopy. In this paper the adsorption isotherms of oxygen on (100), (110) and (111) faces of tungsten are reported. It is shown that these isotherms can be described by an equation of the form pO₂ = AF(θ) exp [?q(θ)/ kT]. The coverage depended functions F(θ) and q(θ) evaluated from the isotherms are different for all three investigated faces. The isosteric adsorption energy q has following initial values at very low oxygen coverage: q₁₀₀ = 6.1 eV, q₁₁₀ = 6.8 eV and q₁₁₁ = 6.5 eV. Increasing the oxygen coverage has only small influence on q₁₁₁; it changes from the initial value to q₁₁₁ ≈ 6.0 eV at θ ≈ 0.3 and remains constant at this value up to θ ≈ 1. q₁₁₀ shows the strongest dependence on oxygen coverage. It decreases rapidly at low coverages, slowly at moderate coverages and reaches the value q₁₁₀ = 5.0 atθ ≈ 1. The variation of q₁₁₀ with increasing oxygen coverage is monotonie from the initial value to q₁₁₁ = 4.9 eV at θ ≈ 1. Assuming that the atomic oxygen is the dominant species leaving the tungsten surface at high temperatures the functions F(θ) are used to calculate the oxygen equilibration probability ζO₂ (high temperature sticking probability) as a function of oxygen coverage θ. The main characteristic of ζO₂(θ) for all three faces is that it shows a maximum for (100) and (111) faces at θ = 0.3 and for (110) face at θ = 0.55.     

Cl原子在γ-TiAl(111)表面吸附的第一性原理研究

基于密度泛函理论,在广义梯度近似下研究了Cl在γ-TiAl(111)表面的吸附.计算结果表明:γ-TiAl(111)表面的面心立方位置(fcc)和六角密排位置(hcp)为Cl吸附的稳定位置,当覆盖度Θ小于一个单层(ML)时,Cl原子倾向于吸附在γ-TiAl(111)表面近邻为多Ti的位置.电子结构分析发现,Cl原子同表面金属原子形成较强的离子键,并且成键具有一定的方向性.当Cl原子和O原子共同在γ-TiAl(111)表面吸附时,二者都趋     

Site-selective adsorption of xenon on a stepped Ru(0001) surface

The adsorption of xenon has been studied with UV photoemission (UPS), flash desorption (TDS) and work function measurements on differently conditioned Ru(0001) surfaces at 100 K and at pressures up to 3 × 10^?5 Torr. Low energy electron diffraction (LEED) and Auger electron spectroscopy (AES) served to ascertain the surface perfectness. On a perfect Ru(0001) surface only one Xe adsorption state is observed, which is characterized by$\text{Xe}\text{5}\text{p}{}_{\mathrm{<mtext>3</mtext><mtext>2</mtext>}}$,$\text{1}\text{2}$ electron binding energies of 5.40 and 6.65 eV, an adsorption energy of E_ad≈ 5 kcal/mole and dipole moment of μ'_T ≈ 0.25 D. On a stepped-kinked Ru(0001) surface, the terrace-width, the step-height and step-orientation of which are well characterized with LEED, however, two coexisting xenon adsorption states are distinguishable by an unprecedented separation in$\text{Xe}\text{5}\text{p}{}_{\mathrm{<mtext>3</mtext><mtext>2</mtext>}}$,$\text{1}\text{2}$ electron binding energies of 800 meV, by their different UPS intensities and line shapes, by their difference in adsorption energy ofΔE_ad ≈ 3 kcal/mole and finally by their strongly deviating dipole moments of μ_S = 1.0 D and μ_T = 0.34 D. The two xenon states (which are also observed on a slightly sputtered surface) are identified as corresponding to xenon atoms being adsorbed at step and terrace sites, respectively. Their relative concentrations as deduced from the UPS intensities quantitatively correlate with the abundance of step and terrace sites of the ideal TLK surface structure model as derived from LEED. Furthermore, ledge-sites and kink-sites are distinguishable via E_ad. The E_ad heterogeneity on the stepped-kinked Ru(0001) surface is interpreted in terms of different coordination and/or different charge-transfer-bonding at the various surface sites. The enormous increase in Xe 5p electron binding energy of 0.8 eV for Xe atoms at step sites is interpreted as a pure surface dipole potential shift. —The observed effects suggest selective xenon adsorption as a tool for local surface structure determination.     

Adsorption of gold on oxidized tungsten

The kinetics of adsorption and desorption of gold atoms from the surface of a thin (<2 nm) oxide film grown on a textured W ribbon with the preferred emergence of the (100) face is studied using termal desorption spectrometry in a wide range of coatings. A single desorption phase is observed in the spectra of termal desorption of Au atoms from oxidized W. The activation energy of desorption of Au atoms from tungsten oxides is lower than the gold sublimation heat (it amounts to E = 3.1 eV for the concentration of adsorbate atoms on the surface corresponding to coverage θ _s = 2.38). The gold film on oxidized tungsten at room temperature grows in the form of 3D islands. The sticking coefficient for gold atoms at T = 300 K is close to unity in the coverage range 0.5 < θ _s < 2.5.     

The role of adsorbed sulfur in the H2D2 equilibration reaction on Pt single crystals

The H₂D₂ equilibration on Pt single crystals was investigated under intermediate pressure (100–400 Torr) and temperature (50–250°C), as a function of sulfur coverage. On Pt(110) and Pt(111), adsorbed sulfur modifies the kinetic parameters, activation energy and pre-exponential factor; the latter depends on the temperature on Pt(110) only. The clean Pt(110) face was found to be 5 times more active than the clean Pt(111). On both faces, adsorption of sulfur induces electronic effects on the neighbouring reactional sites. The difference in the behaviour of the two faces and a clear influence of the arrangement of the adsorbed sulfur atoms, deduced from LEED diagrams, tend to prove the structure dependency of the H₂D₂ reaction. A consistent reaction mechanism could be proposed, involving the dissociative adsorption and surface recombination of hydrogen and deuterium, and the reaction between adsorbed molecules for high sulfur coverages. The value of the sulfur coverage which makes the platinum inactive towards H₂D₂ is lower for the (111) than for the (110) orientation; this is in correlation with the roughness of the surface; the denser at atomic scale a surface is, the further is the extent of the lateral interactions due to adsorbed sulfur.     

LCAO studies of hydrogen chemisorption on nickel: II. Cluster models for adsorption sites

The adsorption of single hydrogen atoms, investigated by means of cluster calculations, has been compared with the adsorption of hydrogen monolayers on periodic crystals (paper I). From the similarity of the adsorption energy curves we conclude that the (direct and indirect) interactions between adsorbed hydrogen atoms are relatively small up to monolayer coverage. For adsorption on different sites of ideal low index surfaces the stability decreases in the order Atop > Bridge > Centred. For Atop adsorption it increases with a decreasing number of nearest neighbours to the nickel atom in the NiH “surface molecule”, thus leading to especially strong adsorption sites at the edges of a stepped surface and to low stability in the notches. In general, we find that the Ni_nH “surface molecule” with n = 1, 2, 3 or 4 determines the equilibrium positions for H adsorption; the inclusion of one shell of neighbours to the nickel atoms is sufficient to explain the differences in adsorption energy. The Extended Hückel method is not well suited to study dissociative chemisorption of H₂, although some qualitative trends are correct.     

Adsorption-desorption properties,coadsorption, and surface structural chemistry of chlorine and oxygen on Ag(331)

At 300 K oxygen chemisorbs on Ag(331) with a low sticking probability, and the surface eventually facets to form a (110)?(2 × 1) O structure with ΔΦ = +0.7 eV. This facetting is completely reversible upon O₂ desorption at ~570 K. The electron impact properties of the adlayer, together with the LEED and desorption data, suggest that the transition from the (110) facetted surface to the (331) surface occurs at an oxygen coverage of about two-thirds the saturation value. Chemisorbed oxygen reacts rapidly with gaseous CO at 300 K, the reaction probability per impinging CO molecule being ~0.1. At 300 K chlorine adsorbs via a mobile precursor state and with a sticking probability of unity. The surface saturates to form a (6 × 1) structure with ΔΦ = +1.6 eV. This is interpreted in terms of a buckled close-packed layer of Cl atoms whose interatomic spacing is similar to those for Cl overlayers on Ag(111) and Ag(100). Desorption occurs exclusively as Cl atoms with E_d ~ 213 kJ mol^?1; a comparison of the Auger, ΔΦ, and desorption data suggests that the Cl adlayer undergoes significant depolarisation at high coverages. The interaction of chlorine with the oxygen predosed surface, and the converse oxygen-chlorine reaction are examined.     

X-ray photoemission study of physically absorbed SF6

The physical adsorption of octahedral SF₆ on Ru(001) has been studied with X-ray photoelectron spectroscopy (XPS) in an attempt to see effects on the energy levels resulting from the conformation of the molecule on the surface. Near 80 K surface coverages up to a monolayer have been studied at various steady state pressures of SF₆. Kinetic studies, core level binding energies, and peak areas indicate that the surface species studied was a physically adsorbed monolayer of sf₆. The sticking coefficient of SF₆, at ? 80 K is approximately unity. Also, a multilayer structure was observed at the highest pressures of SF₆. The binding energy of the F(ls) peak for monolayer coverage is centered at 688.2 ± 0.2 eV relative to the Ru Fermi level. while the multilayer F(ls) peak is shifted more than 3.5 eV to higher binding energy. The F(ls) linewidth for one monolayer has a full width at half maximum of 1.75 ± 0.1 eV. The F(ls) linewidth of the multilayer peak narrows with increasing coverage. Its narrowest observed linewidth was 1.35 eV ± 0.1 eV or approximately the same as that found in the gas phase. One of the mechanisms which may account for the F(ls) linewidth with monolayer coverage is a difference in F(ls) binding energy between those F atoms in contact with the substrate and those further away. This may be due to the variation in chemical environment and relaxation effects as a function of distance from tlie substrate. A classical image force calculation including finite screening effects of the substrate indicates that there is a differential binding energy, ΔW. between the F ligands; ΔW = 0.85 ± 0.25 eV, for realistic ranges of adsorption distances from the substrate and screening lengths in the substrate. The observed broadening of the monolayer F(ls) level is consistent with a ΔW of 0.7 ± 0.1 eV, indicating the possible existence of such a mechanism. Adsorption of a monolayer of SF₆ onto the Ru covered with a monolayer of oxygen shifts the F(ls) peak to lower binding energy by 0.8 eV. Similar effects due to oxygen have been observed previously in the physical adsorption of Xe on W(111).     

X-ray photoelectron spectroscopic study of the physical adsorption of xenon and the chemisorption of oxygen on tungsten (111)

X-ray photoelectron spectroscopy (ESCA) has been used to study the physical adsorption of Xe and the chemisorption of oxygen by W (111). An ultrahigh vacuum ESCA spectrometer has been modified such that thermal desorption behavior from the W (111) crystal can be directly compared with ESCA spectra of the adsorbed species. In addition, since the work function of a W (111) crystal covered with one monolayer of Xe is accurately known from previous work, the binding energy of the $\text{Xe}\text{(3}\text{d}{}_{\mathrm{<mtext>5</mtext><mtext>2</mtext>}}\text{)}$ adsorbate level can be accurately compared to the gaseous $\text{Xe}\text{(3}\text{d}{}_{\mathrm{<mtext>5</mtext><mtext>2</mtext>}}\text{)}$ level.When Xe is physisorbed to 1 monolayer the $\text{Xe}\text{(3}\text{d}{}_{\mathrm{<mtext>5</mtext><mtext>2</mtext>}}\text{)}$ level exhibits a binding energy (relative to the vacuum level) which is 2.1 eV below that found for Xe (g). At lower Xe coverages the shift becomes monotonically greater, approaching 2.6 eV at a Xe coverage of 0.05. This 0.5 eV shift downward is accompanied by an increase of only 0.05 eV in adsorption energy as coverage decreases, and may be partially caused by the presence of ~ 10–20 % of extraneous adsorption sites other than W (111) which adsorb Xe with higher adsorption energy. The adsorption energy of Xe may also be increased by coadsorption of oxygen and the $\text{Xe}\text{(3}\text{d}{}_{\mathrm{<mtext>5</mtext><mtext>2</mtext>}}\text{)}$ binding energy exhibits a corresponding shift downward as adsorbed oxygen coverage is increased to θ_o = 0.5. Electronic relaxation processes affecting the final state are dominant factors in determining the magnitude of the chemical shift upon adsorption, in agreement with the predictions of Shirley. The magnitude of the relaxation effect seems to be very sensitive to small changes in Xe adsorption energy. Similar effects have been seen for chemisorption of CO.The adsorption of O₂ at 120 K by W (111) yields a single broad O(1s) peak whose line-width decreases with increasing coverage. The final spectra at θ_o = 1 monolayer are very similar to those obtained at temperatures of 300 K or above on polycrystalline tungsten.     

The surface structures growth’s features caused by Ge adsorption on the Au(111) surface

The initial stage of the adsorption of Ge on an Au(111) surface was investigated. The growth and stability of the structures formed at the surface were studied by ultrahigh-vacuum low-temperature scanning tunneling microscopy and analyzed using density functional theory. It was established that the adsorption of single Ge atoms at the Au(111) surface at room temperature leads to the substitution of Au atoms by Ge atoms in the first surface layer. An increasing of surface coverage up to 0.2–0.4 monolayers results in the growth of an amorphous binary layer composed of intermixed Au and Ge atoms. It was shown that the annealing of the binary layer at a temperature of T _s ? 500 K, as well as the adsorption of Ge on the Au(111) surface heated to T _s ? 500 K for coverages up to 1 monolayer lead to a structural transition and the formation of an Au–Ge alloy at least in the first two surface layers. Based on experimental and theoretical data, it was shown that the formation of single-layer germanene on the Au(111) surface for coverages ≤1 monolayer in the temperature range of T _s = 297–500 K is impossible.     

Adsorption and coadsorption of carbon monoxide and hydrogen on Pd(111)

The adsorption and coadsorption of CO and H₂ have been studied by means of thermal desorption (TD) and electron stimulated desorption (ESD) at temperatures ranging from 250 to 400 K. Three CO TD states, labelled as β₂, β₁, and β₀ were detected after adsorption at 250 K. The population of β₂ and β₁ states which are the only ones observed upon adsorption at temperatures higher than 300 K was found to depend on adsorption temperature. The correlation between the binding states in the TD spectra and the ESD O⁺ and CO⁺ ions observed was discussed. Hydrogen is dissociatively adsorbed on Pd(111) and no ESD H⁺ signal was recorded following H₂ adsorption on a clean Pd surface. The presence of CO was found to cause an appearance of a H⁺ ESD signal, a decrease of hydrogen surface population and an arisement of a broad H₂ TD peak at about 450 K. An apparent influence of hydrogen on CO adsorption was detected at high hydrogen precoverages alone, leading to a decrease in the CO sticking coefficient and the relative population of CO β₂ state. The coadsorption results were interpreted assuming mutual interaction between CO and H at low and medium CO coverages, the “cooperative” species being responsible for the H⁺ ESD signal. Besides, the presence of CO was proved to favour hydrogen penetration into the bulk even at high CO coverage when H atoms were completely displaced from the surface.