Polarizabilities of shallow donors in silicon — A comment

A recent experiment on n-type As, P and Sb-doped Si samples to study the donor polarizabilities by the capacitance measurement should be reinterpreted on the basis of the d.c. resistivity data below 4.2 K together with the concentration vs resistivity relations at room temperature.     

Polarizabilities of shallow donors in finite-barrier nanodots

Polarizabilities of shallow donors in finite-barrier GaAs/Ga_1−xAl_xAs of harmonic oscillator nanodots are calculated, within the effective-mass approximation, using the Hasse variational method. The magnetic field dependence of polarizabilities and the diamagnetic susceptibilities are computed.     

Polarizability of shallow donors in silicon - A reply

A reply to the comment of Yoshihiro and Yamanouchi is made explaining the role of Schottky barriers on the capacitance results determined previously by Bethin, Castner, and Lee. Earlier concentration-dependent dielectric constant measurements for Sb-doped Ge are also noted.     

Determination of the deformation potential of shallow donors in silicon

The stress dependence of the energy of the ground state of group V impurities (P, Sb) in silicon was investigated by measurement of the Hall effect in a wide range of pressures. A conclusion was reached that the deformation potential of the lowest impurity state of shallow donors (Ξ¹_u) in silicon differs from the deformation potential of the conduction band (Ξ_u), the value of this difference being dependent on the type of the impurity. According to our data, the most probable values for ($\text{Ξ}{}_{\mathrm{u}}\text{ Ξ}{}^1{}_{\mathrm{u}}$) are 0.12 eV for phosphorous-doped silicon and 0.06 eV for antimony-doped silicon.     

Central cell effects on the polarizabilities of shallow donors in silicon

With the Topp and Hopfield form for the ionic pseudopotentials, the screened impurity pseudopotentials of the shallow donors P, As and Sb in silicon are obtained in closed form in the linearized Thomas-Fermi model. The results are compared with the screening using a k-dependent dielectric function. Using these impurity pseudopotentials in the multivalley effective mass equation, the binding energies of these donors in Si are estimated variationally. Adopting the Hasse variational method, the polarizabilities of the P, As and Sb donors in Si are computed and are found to be in excellent agreement with the polarizability values of isolated P and Sb in Si, deduced from recent piezocapacitance measurements.     

Systematics of bound excitons and bound multiexciton complexes for shallow donors in silicon

We report luminescence measurements of transitions involving bound multiple exciton complexes in Si:Sb and Si:As. The systematics of the donor systems Si:P, Si:As and Si:Sb are examined. We find that the splittings between the two observed series of lines are independent of complex number and donor type.     

Generation of shallow nitrogen-oxygen donors as a method for studying nitrogen diffusion in silicon

Physics of the Solid State - The nitrogen concentration distribution C(z) obtained after diffusion of nitrogen from the bulk of a sample toward the surface is determined with a high accuracy...     

Copper donors in silicon

The temperature dependences of the resistivity and of the Hall constant were measured for dislocation-free p-type silicon saturated with copper under different conditions at temperatures round 1000°C. The analysis of the results and their discussion led to the conclusion that the copper donors form complexes the dimension and physical characteristics of which depend on the way the sample is prepared.     

Polarizability of shallow donors in EuSe

Permittivity measurements at a microwave frequency 24 GHz have been made on n-type EuSe at low temperatures 4.2–77 K after various annealing times. Consideration of different models for annealing dependent permittivity leads to the polarizability of Se vacancy defects as the most likely explanation. Donor polarizability $\text{α}{}_{\mathrm{d}}\text{= 3.2 × 10}{}^6\text{A}\text{?}{}^3$is found and further an estimation for electron effective mass $\text{m}{}^1\text{= 0.28m}{}_0$.     

Thermal double donors in silicon

A family of double donors with only slightly differing binding energies can be generated in silicon containing oxygen. In the 30 years since they were discovered the microscopic structure of these defects has not been unravelled in spite of being investigated with all the tools of solid state physics.     

New oxygen donors in silicon

Oxygen donor traps and oxygen-related precipitates are investigated by deep level transient spectroscopy (DLTS) and transmission electron microscopy (TEM). The so-called New Donors (ND's) occur after thermal treatments in the temperature range of 650 °–800 ° C. They have a continuous distribution of trap states with respect to energy in the band gap of Si. The concentration of the trap states increases towards the conduction band edge. The precipitates observed are mainly platelets and ribbon-like defects. The formation and annihilation kinetics of ND traps and oxygen-related precipitates are correlated. An SiO _x Interface Model is proposed to explain the origin and the donor-like behavior of the ND traps. The ND trap spectrum is composed of two different types of trap states: interface states at the surface of precipitates and bound states in the Coulombic wells of a fixed positive charge which is located in the SiO _x precipitates.     

Phosphorus donors in highly strained silicon

The hyperfine interaction of phosphorus donors in fully strained Si thin films grown on virtual Si(1-x)Ge(x) substrates with x< or =0.3 is determined via electrically detected magnetic resonance. For highly strained epilayers, hyperfine interactions as low as 0.8 mT are observed, significantly below the limit predicted by valley repopulation. Within a Green's function approach, density functional theory shows that the additional reduction is caused by the volume increase of the unit cell and a relaxation of the Si ligands of the donor.     

Magneto-optical study of shallow donors in transmutation-doped GaAs

Lineshapes and peak positions of 1s→2p^?1, donor transitions in epitaxial GaAs samples of relatively low compensation have been studied as functions of magnetic field by use of photoconductivity measurements. Some of these samples were produced by transmutation doping using thermal neutrons—a method which is useful for the controlled introduction of donor impurities in GaAs. Two new effects, tentatively attributed to van der Waals interactions between neutral donor atoms, are observed: (1) although both Se and Ge donors are introduced by thermal neutron transmutation, the Se line is much broader than the Ge line, and (2) deviations from isolated-donor behavior occur in the magnetic field dependence of the chemical shift of the shallowest donor present. The separation of lines from two deeper donors, Ge and Si, verified the simple phenomenological theory of the magnetic field dependence of central cell corrections of isolated donors up to at least 10T.     

Structures of thermal double donors in silicon

Accurate total-energy calculations are used to study the structures and formation energies of oxygen chains as models for thermal double donors (TDD's) in Si. We find that the first three TDD's (TDD0-TDD2) consist of one four-member ring, with one or two adjacent interstitial O atoms. These metastable TDD's form bistable negative-U systems with the corresponding stable, electrically inactive staggered structures. The TDD3-TDD7 structures are found to consist of four-member rings with adjacent interstitial O atoms at both ends. The TDD's with a central "di-Y-lid" core are found to become energetically competitive with the four-member ring TDD's only for clusters larger than ten O atoms.