Micromachining of a thin film by laser ablation using femtosecond laser with masks

A gold thin film was machined by laser ablation using a femtosecond laser with mask patterns in the shape of lines and numbers. The patterns were successfully transferred with proper focusing and laser fluence. The optimal femtosecond laser fluence to keep the line width was about 5.2 mJ/cm² on the mask, and 99 mJ/cm² on the film. The processing resolution was 13 μm, and the narrowest line width was about 4 μm.     

Non-vacuum, single-step conductive transparent ZnO patterning by ultra-short pulsed laser annealing of solution-deposited nanoparticles

A solution-processable, high-concentration transparent ZnO nanoparticle (NP) solution was successfully synthesized in a new process. A highly transparent ZnO thin film was fabricated by spin coating without vacuum deposition. Subsequent ultra-short-pulsed laser annealing at room temperature was performed to change the film properties without using a blanket high temperature heating process. Although the as-deposited NP thin film was not electrically conductive, laser annealing imparted a large conductivity increase and furthermore enabled selective annealing to write conductive patterns directly on the NP thin film without a photolithographic process. Conductivity enhancement could be obtained by altering the laser annealing parameters. Parametric studies including the sheet resistance and optical transmittance of the annealed ZnO NP thin film were conducted for various laser powers, scanning speeds and background gas conditions. The lowest resistivity from laser-annealed ZnO thin film was about 4.75×10⁻² Ω cm, exhibiting a factor of 10⁵ higher conductivity than the previously reported furnace-annealed ZnO NP film and is even comparable to that of vacuum-deposited, impurity-doped ZnO films within a factor of 10. The process developed in this work was applied to the fabrication of a thin film transistor (TFT) device that showed enhanced performance compared with furnace-annealed devices. A ZnO TFT performance test revealed that by just changing the laser parameters, the solution-deposited ZnO thin film can also perform as a semiconductor, demonstrating that laser annealing offers tunability of ZnO thin film properties for both transparent conductors and semiconductors.     

Al和Sb共掺对ZnO有序阵列薄膜的结构和光学性能的影响

采用水热合成法在预先生长的ZnO种子层的玻璃衬底上制备出Al和Sb共掺ZnO纳米棒有序阵列薄膜. 通过X射线衍射、扫描电镜、透射电镜和选区电子衍射分析表明:所制备的薄膜由垂直于ZnO种子层的纳米棒组成, 呈单晶六角纤锌矿ZnO结构, 且沿[001]方向择优生长, 纳米棒的平均直径和长度分别为27.8 nm和1.02 μm. Al和Sb共掺ZnO纳米棒有序阵列薄膜的拉曼散射分析表明:相对于未掺杂ZnO薄膜的拉曼振动峰(580 cm^-1), Al和Sb共掺ZnO阵列薄膜的E₁(LO)振动模式存在拉曼位移. 当Al和Sb的掺杂量为3.0at%,4.0at%,5.0at%,6.0at%时, Al和Sb共掺ZnO阵列薄膜的拉曼振动峰的位移量分别为3,10,14,12 cm^-1. E₁ (LO) 振动模式位移是由Al和Sb掺杂ZnO产生的缺陷引起的. 室温光致发光结果表明:掺杂Al和Sb后, ZnO薄膜在545 nm处的发光强度减小,在414 nm处的发光强度增加. 这是由于掺杂Al和Sb后, ZnO薄膜中Zn_i缺陷增加, O_i缺陷减少引起的. 关键词： Al和Sb共掺ZnO薄膜 纳米棒有序阵列 结构表征 拉曼散射     

Fabrication of χ{2) Grating in Poled Polymer Waveguide Based on Direct Laser Beam Writing

A simple method is described for fabricating high resolution χ⁽²⁾ grating in poled polymer waveguide. It is found that the second-order nonlinearity of corona-poled polymer thin film is erased after visible laser (450 nm) irradiation. The mechanism of the erasure of χ^{2) is discussed. High resolution χ⁽²⁾ grating structure in several poled polymer waveguides is demonstrated by direct writing with a cw He-Cd laser.On leave from the Department of Optical Instruments, Zhejiang University, Hangzhou, Zhejiang Province, 310027, P.R. of China.     

Cerium oxide nanoparticles protect primary mouse bone marrow stromal cells from apoptosis induced by oxidative stress

The sintering of a silver (Ag) nanoparticle film by laser beam irradiation was studied using a CW DPSS laser. The laser sintering of the Ag nanoparticle thin film gave a transparent conductive film with a thickness of ca. 10 nm, whereas a thin film sintered by conventional heat treatment using an electronic furnace was an insulator because of the formation of isolated silver grains during the slow heating process. The laser sintering of the Ag nanoparticle thin film gave a unique conductive network structure due to the rapid heating and quenching process caused by laser beam scanning. The influences of the laser sintering conditions such as laser scan speed on the conductivity and the transparency were studied. With the increase of scan speed from 0.50 to 5.00 mm/s, the surface resistivity remarkably decreased from 4.45 × 10⁸ to 6.30 Ω/sq. The addition of copper (Cu) nanoparticles to silver thin film was also studied to improve the homogeneity of the film and the conductivity due to the interaction between the oxidized surface of Cu nanoparticle and a glass substrate. By adding 5 wt% Cu nanoparticles to the Ag thin film, the surface resistivity improved to 2.40 Ω/sq.     

Fe/Al混合膜的PLD法制备及表面分析

 采用脉冲激光气相沉积（PLD）技术制备了Fe/Al混合膜,测量了该混合膜的光电子能谱（XPS）,并采用原子力显微镜（AFM）、扫描电子显微镜（SEM）对Fe/Al混合膜作了表面分析。结果表明：Fe/Al混合膜的表面粗糙度对衬底温度有明显的依赖性, 随着衬底温度的升高,薄膜的表面逐渐变得平滑,膜层变得致密,在200 ℃衬底温度下制得了均方根（rms）粗糙度为0.154 nm、具有原子尺度光滑性的Fe/Al混合膜, 膜中Fe和Al分布比较均匀,其成分比约为1∶3,同时XPS分析也表明Fe/Al混合膜暴露在空气中后表面形成了Al₂O₃和FeO氧化层。     

非化学计量比靶材溅射制备Cu-Al-O薄膜的光学电学性质研究

考虑到铜铝溅射速率的差别,使用铜铝比例为0.9 ∶1的多晶CuAlO₂靶材,用射频磁控溅射法制备Cu-Al-O薄膜.研究不同衬底温度对薄膜光学电学性能的影响.在衬底温度500 ℃附近,薄膜在可见光范围内具有很好的透光性,达到70%,计算拟合得到直接帯隙为3.52 eV,与CuAlO₂相的理论值符合较好.在室温附近,薄膜导电符合半导体热激活机理,在衬底温度为500 ℃附近薄膜电导率达到2.48×10^-3 S·cm^-1. 关键词： Cu-Al-O 衬底温度 透过率 电导率     

Ultrafast laser ablation of indium tin oxide thin films for organic light-emitting diode application

Ultrafast laser ablation of ITO thin film coated on the glass has been investigated as a function of laser fluence as well as the number of laser pulses. The ablation threshold of ITO thin film was found to be 0.07 J/cm² that is much lower than that of glass substrate (about 1.2–1.6 J/cm²), which leads to a selective ablation of ITO film without damage on glass substrate. The changes in the electrical resistance and morphology of ablated trench of ITO electrode were found to be strongly dependent on the processing conditions. We present the performance of organic light-emitting diodes (OLED) fabricated with ITO electrode patterned by ultrafast laser ablation.     

Effect of Al incorporation on the structural,morphological, optoelectronic and transport properties of PbS thin films

Doping of PbS thin films with different metal atoms produce considerable changes in structural and material properties that make them useful in the technology of thin film devices. The goal of this work is to study the effects of doping on the structural, morphological, optoelectronic and transport properties of PbS thin films as a function of Al³⁺ concentration. Thin films of pure and Al doped PbS nanoparticles are prepared on soda lime glass substrates by chemical bath deposition technique. The Al content in aqueous solution is varied from 0 to 20 mg. XRD analysis of the films revealed significant enhancement in crystallinity and crystallite size up to an optimum concentration of doping. Films are polycrystalline with crystallite size 19–32 nm, having face centered cubic structure. The optical band gap energy exhibits a decreasing trend and is shifted from 2.41 to 1.34 eV with increasing Al content. The room temperature conductivity of the as-deposited PbS films is in the range of 0.78×10⁻⁸ to 0.67×10⁻⁶(Ω cm)⁻¹ with a maximum for optimum Al content. The Al doped PbS thin film, which we synthesize with optimum Al concentration of 15 mg is found to be a most suitable material for solar control coating applications.     

“冷沉积”的Ag-BaO薄膜在超短脉冲激光作用下的光电发射

研究了冷沉积制备条件下获得的Ag-BaO薄膜在超短激光脉冲串作用下的光电发射．得到Ag-BaO薄膜的阈值光强为10W/cm²，光量子效率达10^-4数量级．光电流密度与入射光强的关系主要表现为一段曲率随光强增大而逐步减小的曲线．其光量子效率是一个可变值，它的变化规律同入射光强及薄膜本身的性能有关 关键词：     

Structure distortion, optical and electrical properties of ZnO thin films co-doped with Al and Sb by so--gel spin coating

ZnO thin films co-doped with Al and Sb with different concentrations and a fixed molar ratio of AlCl₃ to SbCl₃ at 1:2, are prepared by a sol--gel spin-coating method on glass annealed at 550 ℃ for 2 h in air. The x-ray diffraction results confirm that the ZnO thin films co-doped with Al and Sb are of wurtzite hexagonal ZnO with a very small distortion, and the biaxial stresses are 1.03×10⁸, 3.26×10⁸, 5.23×10⁸, and 6.97×10⁸ Pa, corresponding to those of the ZnO thin films co-doped with Al and Sb in concentrations of 1.5, 3.0, 4.5, 6.0 at% respectively. The optical properties reveal that the ZnO thin films co-doped with Al and Sb have obviously enhanced transmittance in the visible region. The electrical properties show that ZnO thin film co-doped with Al and Sb in a concentration of 1.5 at% has a lowest resistivity of 2.5Ω·cm.     

激光诱导铝基碳纳米管薄膜及场发射性能

结合电泳沉积和激光纳米焊接技术在常温下成功制备了铝基单壁碳纳米管(SWCNTs-Al)薄膜。首先,将单壁碳纳米管电泳沉积到铝片基底上,再使用皮秒脉冲激光构建二者的可靠连接。对SWCNTsAl薄膜进行场发射性能测试,开启电压从焊接前的5.1V/μm降低到2.1V/μm,发射电流密度显著提高且更加稳定。这主要是激光纳米焊接后界面接触阻抗减小,场致电子发射更容易实现的结果。基于SWCNTs-Al薄膜的表面形貌图和场发射性能测试结果,确定了最优的激光纳米焊接参数。     

金属光学薄膜的激光化学沉积法

评述薄膜光学技术的发展动向及铜、金、铝光学薄膜的激光化学汽相沉积法。     

Al/CdSe/GaSe/C resonant tunneling thin film transistors

An Al/CdSe/GaSe/C thin film transistor device was prepared by the physical vapor deposition technique at a vacuum pressure of 10⁻⁵ mbar. The x-ray diffraction measurements demonstrated the polycrystalline nature of the surface of the device. The dc current-voltage characteristics recorded for the Al/CdSe/C and Al/CdSe/GaSe/C channels displayed a resonant tunneling diode features during the forward and reverse voltage biasing, respectively. In addition, the switching current ratio of the Al/CdSe/C increased from 18.6 to 9.62×10³ as a result of the GaSe deposition on the CdSe surface. Moreover, the alternating electrical signal analyses in the frequency range of 1.0 MHz to 1.8 GHz, showed some remarkable properties of negative resistance and negative capacitance spectra of the Al/CdSe/GaSe/C thin film transistors. Two distinct resonance-antiresonance phenomena in the resistance spectra and one in the capacitance spectra were observed at 0.53, 1.04 and 1.40 GHz for the Al/CdSe/C channel, respectively. The respective resonating peak positions of the resistance spectra shift to 0.38 and 0.95 GHz when GaSe is interfaced with CdSe. These features of the thin film transistors are promising for use in high quality microwave filtering circuits and also for use as ultrafast switches.     

Ablation depth control with 40 nm resolution on ITO thin films using a square,flat top beam shaped femtosecond NIR laser

We reported on the ablation depth control with a resolution of 40 nm on indium tin oxide (ITO) thin film using a square beam shaped femtosecond (190 fs) laser (λ_p=1030 nm). A slit is used to make the square, flat top beam shaped from the Gaussian spatial profile of the femtosecond laser. An ablation depth of 40 nm was obtained using the single pulse irradiation at a peak intensity of 2.8 TW/cm². The morphologies of the ablated area were characterized using an optical microscope, atomic force microscope (AFM), and energy dispersive X-ray spectroscopy (EDS). Ablations with square and rectangular types with various sizes were demonstrated on ITO thin film using slits with varying x–y axes. The stereo structure of the ablation with the depth resolution of approximately 40 nm was also fabricated successfully using the irradiation of single pulses with different shaped sizes of femtosecond laser.     

Optical and electrical properties of aluminum-doped ZnO thin films grown by pulsed laser deposition

Transparent aluminum-doped zinc oxide (AZO) thin films were deposited on quartz glass substrates by pulsed laser deposition (PLD) from ablating Zn-Al metallic targets. The structural, electrical and optical properties of these films were characterized as a function of Al concentration (0-8 wt.%) in the target. Films were deposited at a low substrate temperature of 150 °C under 11 Pa of oxygen pressure. It was observed that 2 wt.% of Al in the target (or 1.37 wt.% of Al doped in the AZO film) is the optimum concentration to achieve the minimum film resistivity and strong ultraviolet emission. The presence of Al in the ZnO film changes the carrier concentration and the intrinsic defects.     

Effects of 1064 nm laser on the structural and optical properties of nanostructured TiO2 thin film

TiO₂ thin film has been widely used as photoelectrode in dye-sensitized solar cells. It can also be used in quantum dot synthesized solar cells. Study of its effects in different spectrum of light is important for its use in solar cells. We have reported effects of 1064 nm laser on the surface morphology, structural and optical properties of nanostructured TiO₂ thin film deposited on glass substrates using sol-gel spin coating technique. Q-Switched Nd:YAG pulsed laser at various power densities is used in this study. Surface morphology of the film is investigated using X-ray diffraction (XRD) and atomic force microscopy technique. The XRD pattern of as deposited TiO₂ thin film is amorphous and after laser exposure it became TiO₂ anatase structure. Atomic force microscopy of the crystalline TiO₂ thin film shows that the grain size increases by increasing laser power density. The calculations of the band gap are carried out from UV/Visible spectroscopy measurements with JASCO spectrometer. For laser power density of 25 MW/cm² there is an increase in the transmission and it decreases at the value of 38 MW/cm² and band gap decreases with increasing laser power density. Photoluminescence spectra of the crystalline TiO₂ thin film indicate two broad peaks in the range of 415 and 463 nm, one for band gap peak (415 nm) and other for oxygen defect during film deposition process.     

Observation of multiferroic properties in a CdTe:Mn thin film grown by pulsed laser deposition techniques

We report multiferroic properties in a 3% Mn-doped CdTe (CdTe:Mn or CTM) thin film grown in a co-deposition system constituting pulsed laser deposition and radio frequency (RF) sputtering, in which the Mn concentration was tuned by the sputtering rate of Mn. We observed a clear ferroelectric hysteresis loop in the CTM thin film with remanent polarization of 3.5 μC/cm² and ferromagnetism in the film at a temperature lower than the Curie temperature of 15 K. Both features show direct evidence of multiferroics in the CTM thin film.     

Fabrication of transparent double-walled carbon nanotubes flexible matrix touch panel by laser ablation technique

This study reports on the fabrication of transparent double-walled carbon nanotubes (DWNTs) flexible matrix touch panel using the method of laser ablation. We employed an Nd:YAG laser (1064 nm) to pattern transparent DWNT thin film pre-coated on a PET substrate and successfully fabricated a flexible matrix touch panel. By increasing the laser energy, the ablation depth of transparent DWNT flexible thin film is increased but the sheet resistance (Ω/sq) is decreased. When the laser energy intensity reaches 117 mJ/cm², the DWNTs can be completely ablated from transparent DWNT flexible thin film. This method is rapid, simple, applicable to large-area processing and thus is potential for mass production.     

掺半导体玻璃波导的导波功率限制

首次利用阳极氧化法在掺半导体玻璃上制备了两端带有抛物耦合喇叭的4微米条宽沟道波导,用光栅耦合器将波长0.532微米的YAG倍频激光耦合进波导中,实现了输出光的功率限制.