Mobility of two-dimensional electron gas in JFETS limited by polar-optic and impurity scattering

The theory of mobility of a two-dimentional electron gas in JFET structures limited by polar-optic phonon and impurity scattering is developed in this work. The energy level and the wave function of the lowest subband are obtained by a variational procedure. The mobility limited by polar-optic phonon scattering is obtained by solving the Boltzmann equation iteratively. The expression for the impurity scattering limited mobility is obtained by using the variational wave function. For numerical calculation, however, the electron gas is assumed to be strictly two-dimensional. It is found that for experimental range of impurity concentration in GaAs JFETs, impurity scattering is the dominant process even at 300K.     

Low temperature electron mobility in Ga0.5In0.5P/GaAs quantum well structures

We analyse the low temperature subband electron mobility in a Ga_0.5In_0.5P/GaAs quantum well structure where the side barriers are delta-doped with layers of Si. The electrons are transferred from both the sides into the well forming two dimensional electron gas (2DEG). We consider the interface roughness scattering in addition to ionised impurity scattering. The effect of screening of the scattering potentials by 2DEG on the electron mobility is analysed by changing well width. Although the ionized impurity scattering is a dominant mechanism, for small well width the interface roughness scattering happens to be appreciable. Our analysis can be utilized for low temperature device applications.      

单轴[110]应力硅电子迁移率

基于k·p微扰法研究单轴[110]应力作用下硅的导带结构,获得单轴[110]应力硅的导带底能量及电子有效质量.在此基础上,考虑电子谷间、谷内及电离杂质散射,采用弛豫时间近似计算单轴[110]应力硅沿不同晶向的电子迁移率.结果表明：单轴[110]应力作用下硅的电子迁移率具有明显的各向异性.在[001]、[110]及[110]输运晶向中,张应力作用下电子沿[110]晶向输运时迁移率有较大的增强,由未受应力时的1 450 cm²·Vs^-1提高到2 GPa应力作用下的2 500 cm²·Vs^-1.迁移率增强的主要原因是电子有效质量的减小,而应力作用下硅导带能谷分裂导致的谷间散射几率的减小对电子迁移率的影响并不显著.     

Determination of the LO phonon energy by using electronic and optical methods in AlGaN/GaN

The longitudinal optical (LO) phonon energy in AlGaN/GaN heterostructures is determined from temperature-dependent Hall effect measurements and also from Infrared (IR) spectroscopy and Raman spectroscopy. The Hall effect measurements on AlGaN/GaN heterostructures grown by MOCVD have been carried out as a function of temperature in the range 1.8-275 K at a fixed magnetic field. The IR and Raman spectroscopy measurements have been carried out at room temperature. The experimental data for the temperature dependence of the Hall mobility were compared with the calculated electron mobility. In the calculations of electron mobility, polar optical phonon scattering, ionized impurity scattering, background impurity scattering, interface roughness, piezoelectric scattering, acoustic phonon scattering and dislocation scattering were taken into account at all temperatures. The result is that at low temperatures interface roughness scattering is the dominant scattering mechanism and at high temperatures polar optical phonon scattering is dominant.     

AlGaN插入层对InAlN/AlGaN/GaN异质结散射机制的影响

InAlN/AlN/GaN异质结中,名义上的AlN插入层实为Ga含量很高的AlGaN层, Al, Ga摩尔百分比决定了电子波函数与隧穿几率,因此影响与InAlN/AlGaN势垒层有关的散射机制.本文通过求解薛定谔-泊松方程与输运方程,研究了AlGaN层Al摩尔百分含量对InAlN组分不均匀导致的子带能级波动散射、导带波动散射以及合金无序散射三种散射机制的影响.结果显示:当Al含量由0增大到1,子带能级波动散射强度与合金无序散射强度先增大后减小,导带波动散射强度单调减小;在Al含量为0.1附近的小组分范围内,合金无序散射是限制迁移率的主要散射机制,该组分范围之外,子带能级波动散射是限制迁移率的主要散射机制;当Al摩尔百分含量超过0.52,三种散射机制共同限制的迁移率超过无插入层结构的迁移率, AlGaN层显示出对迁移率的提升作用.     

Effect of neutral scatterers on electron mobility in silicon (100) inversion layers

The electron mobility inn-type inversion layers at (100) silicon surface is studied at low temperature. Using the lowest subband calculated numerically, and taking into account the neutral impurity distribution in the vicinity of the Si–SiO₂ interface, the process of carrier scattering is investigated by the Green's function formalism. Experimental data for electron mobility are in good agreement with the results from Dyson's equation in Born approximation in the case of shallow and steep profiles of impurities.     

Estimation of various scattering parameters and 2-DEG mobilities from electron mobility calculations in the three conduction bands Γ, L and X of gallium arsenide

The electron drift mobility in Γ conduction band of GaAs has been calculated before, but for the first time, we have made attempts to estimate the electron mobilities in higher energy L and X minima. We have also calculated the value of mobility of two-dimensional electron gas needed to predict hetero-structure device characteristics using GaAs. Best scattering parameters have been derived by close comparison between experimental and theoretical mobilities. Room temperature electron mobilities in Γ, L and X valleys are found to be nearly 9094, 945 and 247 cm²/V-s respectively. For the above valleys, the electron masses, deformation potentials and polar phonon temperatures have been determined to be (0.067, 0.22, 0.39m ₀), (8.5, 9.5, 6.5 eV), and (416, 382, 542 K) as best values, respectively. The 2-DEG electron mobility in Γ minimum increases to 1.54 × 10⁶ from 1.59 × 10⁵ cm²/V-s (for impurity concentration of 10¹⁴ cm⁻³) at 10 K. Similarly, the 2-DEG electron mobility values in L and X minima are estimated to be 2.28 × 10⁵ and 1.44 × 10⁵ cm²/V-s at 10 K, which are about ∼4.5 and ∼3.9 times higher than normal value with impurity scattering present.      

Perfectly conducting channel and universality crossover in disordered graphene nanoribbons

The band structure of graphene ribbons with zigzag edges have two valleys well separated in momentum space, related to the two Dirac points of the graphene spectrum. The propagating modes in each valley contain a single chiral mode originating from a partially flat band at the band center. This feature gives rise to a perfectly conducting channel in the disordered system, if the impurity scattering does not connect the two valleys, i.e., for long-range impurity potentials. Ribbons with short-range impurity potentials, however, through intervalley scattering display ordinary localization behavior. The two regimes belong to different universality classes: unitary for long-range impurities and orthogonal for short-range impurities.     

Effect of strain on multisubband electron transport in GaAs/InxGa1-xAs coupled quantum well structures

We analyze the strain induced changes in the low temperature multisubband electron mobility mediated through the intersubband interactions in a pseudomorphic GaAs/In_xGa_1−xAs coupled double quantum well structure. We consider the non-phonon scattering mechanisms and study the effect of strain on them. We show that strain reduces the mobility due to ionized impurity (imp-) scattering μ^imp but enhances the mobility due to interface roughness (IR-) scattering μ^IR. For alloy disorder (AL-) scattering as long as the lowest subband is occupied, the effect of strain enhances the mobility μ^AL. However, once the second subband is occupied, there is almost no change, rather decrease in μ^AL for larger well widths. It is gratifying to note that for single subband occupancy, the effect of strain enhances the total mobility μ. On the other hand, for double subband occupancy, initially there is almost no change, but with increase in well width the total mobility reduces. We vary the In composition x from 0.15 to 0.2 and 0.25 and the barrier width between the two wells to analyze their effects on the mobility which shows interesting results. Our study of multisubband mobility can be utilized for the low temperature device applications.     

Electronic structure of silicon superlattices

Utilizing a new complex-band-structure technique, the electronic structure of model Si-Si_1?xGe_x and MOS superlattices have been obtained over a wide range of layer thickness d (11 ≤ d ≤ 110 A). For d ≥ 44 A, it is found that these systems exhibit a direct fundamental band gap. Further calculations of band-edge effective masses and impurity scattering rates suggest the possibility of a band-structure-driven enhancement in electron mobility over bulk silicon.     

Electron mobility limited by surface and interface roughness scattering in AlxGa1-xN/GaN quantum wells

The electron mobility limited by the interface and surface roughness scatterings of the two-dimensional electron gas in AlxGa1-xN/GaN quantum wells is studied. The newly proposed surface roughness scattering in the AlGaN/GaN quantum wells becomes effective when an electric field exists in the AlxGa1-xN barrier. For the AlGaN/GaN potential well, the ground subband energy is governed by the spontaneous and the piezoelectric polarization fields which are determined by the barrier and the well thicknesses. The thickness fluctuation of the AlGaN barrier and the GaN well due to the roughnesses cause the local fluctuation of the ground subband energy, which will reduce the 2DEG mobility.     

Fang–Howard wave function modelling of electron mobility in AlInGaN/AlN/InGaN/GaN double heterostructures

To study the electron transport properties in InGaN channel-based heterostructures,a revised Fang-Howard wave function is proposed by combining the effect of GaN back barrier.Various scattering mechanisms,such as dislocation impurity(DIS) scattering,polar optical phonon(POP) scattering,piezoelectric field(PE) scattering,interface roughness(IFR) scattering,deformation potential(DP) scattering,alloy disorder(ADO) scattering from InGaN channel layer,and temperature-dependent energy bandgaps are considered in the calculation model.A contrast of AlInGaN/AlN/InGaN/GaN double heterostructure(DH) to the theoretical AlInGaN/AlN/InGaN single heterostructure(SH) is made and analyzed with a full range of barrier alloy composition.The effect of channel alloy composition on InGaN channel-based DH with technologically important Al(In,Ga)N barrier is estimated and optimal indium mole fraction is 0.04 for higher mobility in DH with Al_(0.4)In_(0.07)Ga_(0.53)N barrier.Finally,the temperature-dependent two-dimensional electron gas(2 DEG) density and mobility in InGaN channel-based DH with Al_(0.83)In_(0.13)Ga_(0.0)4 N and Al_(0.4)In_(0.07)Ga_(0.53)N barrier are investigated.Our results are expected to conduce to the practical application of InGaN channel-based heterostructures.     

On the Optical Conductivity of Kondo Insulators

The temperature-dependent optical conductivity of a Kondo insulator for different temperatures with impurity doping on the conduction band is studied within the U = ∞ Anderson lattice model in the framework of a slave-boson mean-field theory under the coherent potential approximation. The results show that the depletion of the optical conductivity in low-frequency region decreases with increasing of the temperature, and the system exhibits a transition between a low-temperature insulating phase and a high-temperature metallic phase. With increasing of the impurity concentration, the effect of the impurity scattering could result in a nearly temperature-independent gap behavior. The numerical results on the localization of the electron and its variation with temperature are also discussed with the help of optical sum rule.     

Mobility of charge carriers with position-dependent effective mass in a quantum film

The scattering of electrons on charged impurity centers in a quantum film with the parabolic confining potential is investigated, taking into account the coordinate dependence of the electron effective mass in the film. The mobility is calculated for various distributions of impurity centers (homogeneous distribution in the film, barrier region, and the whole space). It is shown that the consideration of the coordinate dependence leads to the mobility decrease.     

Negative differential mobility in PbTe and PbSnTe at high electric fields

Monte Carlo calculations of hot-electron drift velocity in PbTe and Pb_0.8Sn_0.2Te at 77 K are reported. The relevant scattering mechanisms together with band-structure nonparabolicity and anisotropy are included in the calculations. A negative differential mobility (NDM) does not appear when the electrons are assumed to remain confined within the L valleys of the conduction band. On the contrary, allowing for electron transfer into the W valleys and taking suitable values of the parameters related to these valleys, an NDM appears and the threshold field for the same agrees well with the experimental data. Alloy scattering in PbSnTe is found to reduce the NDM.     

Density of states in the impurity d band and inelastic electron scattering by a system of mixed-valence iron ions in HgSe: Fe crystals

The resistivity and the Hall coefficient of HgSe: Fe crystals with various iron content are experimentally studied in the temperature range 1.3≤T≤300 K and in magnetic fields up to 60 kOe. The temperature dependences of the density and mobility of conduction electrons in these crystals are determined. The influence of spatial charge ordering in the system of mixed-valence iron ions on impurity states in HgSe: Fe crystals is considered. The density of states in the impurity d band is theoretically analyzed, and inelastic electron scattering in which bi-and trivalent iron ions are recharged is discussed. It is shown that the experimentally detected features in the dependence of the density and mobility of electrons on temperature and iron impurity content can be explained by the influence of Coulomb correlations in the mixed-valence iron ion system on the structure of the impurity d band.

     

Influence of temperature on strain-induced polarization Coulomb field scattering in AlN/GaN heterostructure field-effect transistors

Electron mobility scattering mechanism in AlN/GaN heterostuctures is investigated by temperature-dependent Hall measurement, and it is found that longitudinal optical phonon scattering dominates electron mobility near room temperature while the interface roughness scattering becomes the dominant carrier scattering mechanism at low temperatures(～100 K).Based on measured current–voltage characteristics of prepared rectangular AlN/GaN heterostructure field-effect transistor under different temperatures, the temperature-dependent variation of electron mobility under different gate biases is investigated. The polarization Coulomb field(PCF) scattering is found to become an important carrier scattering mechanism after device processing under different temperatures. Moreover, it is found that the PCF scattering is not generated from the thermal stresses, but from the piezoelectric contribution induced by the electrical field in the thin AlN barrier layer. This is attributed to the large lattice mismatch between the extreme thinner AlN barrier layer and GaN, giving rise to a stronger converse piezoelectric effect.     

AlxGa1-x N/GaN调制掺杂异质结构的子带性质研究

通过低温和强磁场下的磁输运测量研究了Al_0.22Ga_0.78N/GaN调制掺杂异质结构中2DEG的子带占据性质和子带输运性质.在该异质结构的磁阻振荡中观察到了双子带占据现象，并发现2DEG的总浓度随第二子带浓度的变化呈线性关系.得到了该异质结构中第二子带被2DEG占据的阈值电子浓度为7.3×10¹²cm^-2.采用迁移率谱技术得到了不同样品的分别对应于第一和第二子带的输运迁移率.发现当样品产生应变弛豫时第一子带的电子迁移 关键词： AlGaN/GaN异质结 二维电子气 子带占据 输运迁移率     

赝形InxGa1-xAs/In0.52Al0.48As异质结构中二维电子气的回旋共振光谱研究

采用回旋共振光谱方法，同时获得了具有较高电子气浓度的赝形In_0.80Ga_0.20As/In_0.53Ga_0.47As/In_0.52Al_0.48AsHEMT结构中最低两个子能带的费密面附近电子有效质量、 散射时间和迁移率.观察到该系统中能带非抛物性和波函数穿透所导致的电子回旋有效质量的显著增大效应，以及合金无序势和电离杂质散射所引起的电子散射时间和迁移率明显的子带依赖性. 关键词：     

Scattering theory of electrons on impurities in compensated semiconductors

In this paper we study the temperature behavior of the electron mobility in n-type compensated semiconductors, caused by scattering on neutral, ionized, and dipole impurity centers. With increased temperature, neutral impurity atoms and paired oppositely charged donor-acceptor dipole scattering impurity centers transform into separate ionic scattering centers. These transformations of scattering centers take place at various temperatures. We find that the mobility caused by electron scattering on separate impurity ions does not change with temperature monotonically — there appear two minima under certain conditions.Translated from Izvestiya Vysshikh Uchebnykh Zavedenii, Fizika, No. 10, pp. 106–109, October, 1987.