考虑液面凹陷时金属熔化与蒸发的数值研究

将关于液面凹陷的Young-Laplace方程与关于金属溶池的流体力学方程组及关于金属蒸发的ＢＧＫ方程联立求解，在给定的电子枪加热条件下，获得了熔池流场和温度场图像及金属蒸气密度、速度和温度分布.数值计算结果表明，随电子枪功率增加，金属的蒸发速率增加，蒸气的密度增大、温度降低而速度升高.与假设液面为平面的情况相比，考虑液面凹陷后求得的液面温度较低，金属的蒸发速率较小，并且这种差别随电子枪功率的增加而扩大.因此对于高功率电子枪加热金属蒸发，必须考虑液面凹陷的影响才能得到符合实际的结果. 关键词： 液面凹陷 Young-Laplace方程 熔池 金属蒸发     

电子枪功率与束宽对金属原子蒸气特性的影响

在原子法激光同位素分离工程中,电子枪加热金属铀产生的原子蒸气的密度、速度以及温度等宏观量分布特性是非常重要的参数.为了分析电子枪功率和束宽对原子蒸气密度、速度、温度、质量通量和速度分布等物理特性的影响,采用直接MonteCarlo方法用柱坐标模拟了铀原子平面蒸发动力学过程.在电子枪加热方式下,蒸发源温度场不均匀,而且温度场随电子枪功率和束宽变化.着重研究这种变化对蒸气各种物理特性的影响.模拟结果表明,电子枪功率越高,蒸气径向宏观漂移速度越大,蒸发量越大;电子束束宽越窄,蒸发量越大. 关键词： 金属蒸发 原子法激光同位素分离 直接MonteCarlo 电子枪     

电子束激发原子对金属蒸发的影响

在原子蒸气激光同位素分离工程(AVLIS)中,金属受电子束的加热而熔化,并向真空蒸发,蒸气原子通过电子束的过程中,可能与电子发生非弹性碰撞,被激发到高能级.在膨胀的过程中,高能级的原子通过与原子的非弹性碰撞消激发,将原子内的电子能量转换为蒸气的平动能.为了分析电子束与原子作用对蒸气的密度、速度和温度等物理特性的影响,采样直接模拟蒙特卡罗法(DSMC)模拟钆原子蒸发过程.模拟结果表明,电子束与原子的作用使得原子蒸气的速度增加,密度减小,温度升高 关键词： 金属蒸发 AVLIS DSMC 电子枪     

冷热坩埚中电子枪加热金属熔池的数值分析

利用NavierStokes方程在一定的边界条件下求解了电子枪加热长槽形冷、热坩埚中的二维熔池流场,获得了熔池流场的速度和温度分布,并且详细地对比研究了冷、热坩埚中金属熔池的蒸发量与电子枪功率、束宽以及坩埚尺寸的关系.电子枪功率越高、束宽越小(除非小于05mm)、坩埚尺寸越大,则蒸发量越大,电子枪能量的有效利用率也越高.当电子枪束宽较大时,热坩埚的蒸发量较大,而当束宽较小时,冷坩埚的蒸发量较大.计算中对铁、铜、钆和铝等金属熔池进行了数值分析,获得了相似的结果. 关键词： NavierStokes方程 热毛细流 浮力流 金属熔池     

Numerical simulation of metal evaporation based on the kinetic model equation and the direct simulation Monte Carlo method

Metal evaporation on the basis of the kinetic model equations(BGK and S-model) and the direct simulation Monte Carlo(DSMC) method was investigated computationally under the circumstances of collimators existing or not. Numerical data of distributions of number density, bulk velocity and temperature were reported over a wide range of evaporation rate.It was shown that these results reached a good agreement for the case of small evaporation rate, while the deviations became increasingly obvious with the increase of evaporation rate, especially when the collimators existed. Moreover, the deposition thickness over substrate obtained from the kinetic model equations were inaccurate even though the evaporation rate was small. All of the comparisons showed the reliability of the kinetic model equations, which require less computational cost at small evaporation rate and simple structure.     

Morphology and gas sensitivity of erbium di-phthalocyanine thin films

Studies have been made of the application of certain phthalocyanine films in the detection of toxic gases such as chlorine. Consideration has been given to preparation parameters such as deposition conditions (evaporation rate, ambient pressure, post deposition annealing) together with varying central metal atoms within the phthalocyanine molecule. Particular studies have been made concerning the relationship between elevated substrate temperature deposition, the molecular structure and the corresponding sensitivity of the films to gases. The present results are considered within the context of the development of an economically viable selective thin film gas sensor.     

Few-layer graphene growth from polystyrene as solid carbon source utilizing simple APCVD method

This research article presents development of an economical, simple, immune and environment friendly process to grow few-layer graphene by controlling evaporation rate of polystyrene on copper foil as catalyst and substrate utilizing atmospheric pressure chemical vapor deposition (APCVD) method. Evaporation rate of polystyrene depends on molecular structure, amount of used material and temperature. We have found controlling rate of evaporation of polystyrene by controlling the source temperature is easier than controlling the material weight. Atomic force microscopy (AFM) as well as Raman Spectroscopy has been used for characterization of the layers. The frequency of G′ to G band ratio intensity in some samples varied between 0.8 and 1.6 corresponding to few-layer graphene. Topography characterization by atomic force microscopy confirmed Raman results.     

Effects of substrate rotation on the microstructure of metal sheet fabricated by electron beam physical vapor deposition

The effects of substrate rotation speed and rotation mode on the microstructure of large-sized metal sheet fabricated by electron beam physical vapor deposition technique were investigated. Helical and columnar microstructures were found in the deposited sheet. Both types of microstructures exhibit no preferential crystallographic orientation. The column inclination under asymmetric vapor incidence pattern was discussed. Integrated vapor incidence angle was found to be effective in evaluating the column inclination.     

Temperature effects in the photolytic LCVD of platinum

The photolytic laser chemical vapor deposition (LCVD) rate of platinum from its bishexafluoroacetylacetonate precurser has been measured in situ and in real time. Optical transmission of the 350 nm photolysis light through the deposited platinum film and a transparent glass substrate is monitored and analysed in detail. From these measurements, as well as measurements of the reflected light, the fraction of the laser beam power absorbed in the metal film is found. The latter allows a simple estimate of the laser-induced temperature rise at the metal surface. It is shown that even rather small temperature increases of the order of several tens of degrees centigrade can completely change the photolysis mechanism and hence drastically influence the photolytic LCVD rate. A simple modification of Lax's model, in which a temperature dependent thermal conductivity of the substrate is introduced, is used to describe the laser-induced heating of a strongly absorbing thin metal film on a glass substrate.     

Numerical modelling of methanol liquid pool fires

The focus of this paper is on numerical modelling of methanol liquid pool fires. A mathematical model is first developed to describe the evaporation and burning of a two-dimensional or axisymmetric pool containing pure liquid methanol. Then, the complete set of unsteady, compressible Navier-Stokes equations for reactive flows are solved in the gas phase to describe the convection of the fuel gases away from the pool surface, diffusion of the gases into the surrounding air and the oxidation of the fuel into product species. Heat transfer into the liquid pool and the metal container through conduction, convection and radiation are modelled by solving a modified form of the energy equation. Clausius–Clapeyron relationships are invoked to model the evaporation rate of a two-dimensional pool of pure liquid methanol. The governing equations along with appropriate boundary and interface conditions are solved using the flux-corrected transport algorithm. Numerical results exhibit a flame structure that compares well with experimental observations. Temperature profiles and burning rates were found to compare favourably with experimental data from single- and three-compartment laboratory burners. The model predicts a puffing frequency of approximately 12 Hz for a 1 cm diameter methanol pool in the absence of any air co-flow. It is also observed that increasing the air co-flow velocity helps in stabilizing the diffusion flame, by pushing the vortical structures away from the flame region.     

蒸汽爆炸粗混合过程中的蒸发阻力模型

在蒸汽爆炸的粗混合过程中,由于液体的快速蒸发,高温金属液滴的周围会产生一层很薄的蒸汽膜,此时液滴周围的边界层流动与没有液体蒸发时有很大的不同,因此,常温情况下的小球在连续液体中运动时的通用阻力模型在这种情况下是不适用的．本文通过受力分析,考虑了高温小球受力的分布和表面蒸发对小球周围力的影响,从阻力的基本机理上分析了蒸发状态下小球的运动阻力,分别提出了高温颗粒穿过自由表面时与其在液体中运动时的蒸发阻力模型．分析表明,当小球温度高于2500 K,特别是在靠近自由表面的区域,由于小球表面液体蒸发而产生的蒸发阻力作用非常明显．分析指出,小球的入水初速、小球表面的液体蒸发速率以及汽膜厚度都是影响小球运动阻力大小的重要因素．     

CAFe DUMP前刮束器的设计研制

位于中国科学院近代物理研究所的超导直线加速器样机CAFe是一台质子超导直线加速器实验样机,围绕该装置的束流实验研究将为下一步设计研究加速器驱动次临界洁净核能系统(ADS)专用的超导直线加速器打下基础并提供经验。为了实现CAFe的10 mA束流指标,需要设计研制专门的束流收集器(DUMP)和对应的刮束器。本工作就CAFe DUMP前刮束器的研制进行了系统的设计和计算工作。刮束器面向束流侧的材料采用Al6063,确保束流轰击后的剩余放射性活度处于安全范围。基于蒙特卡罗粒子输运模拟,开展放射性核素及剩余剂量分析。结果表明,退役时刮束器外围剂量为可接受的百微希沃特每小时量级。通过ANSYS的热分析,计算了不同束流情况下刮束器的温度分布及温度变化,研究了刮束器在正常运行时移除热量的能力和在异常状况下应急保护的能力。计算结果表明,刮束器可以满足安全移除强流高功率束流束晕的设计需求。在CAFe高功率束流实验中,刮束器及DUMP运行正常,束流监测指标与设计一致,证明研制的刮束器实现了安全移除束晕、监测束流参数和保护DUMP的功能。     

电子枪加热合金熔池的数值分析

利用数值方法求解了电子枪加热二维合金熔池的流体力学方程组，获得了熔池流场的速度、温度和浓度分布.并且详细地研究了各种特征参量（如雷诺数、普朗特数、格拉晓夫数和李斯特数）对合金熔池流动特性的影响，一般地，雷诺数和普朗特数越小、而格拉晓夫数和李斯特数越大，则熔池中溶剂金属的蒸发速率就越大.在此基础上提出参杂适当浓度的溶质金属可以提高某些难熔难挥发金属的蒸发速率，计算中对参杂了钨、钕、锡和铬等金属的钍、铂、铱和钌等合金熔池进行了数值分析，都相应提高了溶剂金属的蒸发速率. 关键词： 液态合金 毛细流 浮力流 熔池     

Study of the parameters of a thallium atomic beam by the laser resonant atomic photoionization technique

The arrangement and operating principle of a setup for studying the main parameters of a beam of thallium atoms using the laser resonance atomic photoionization technique and the experimental results obtained are presented. The measured characteristics are the evaporation time, the atomic beam intensity, the evaporation rate, the saturated vapor pressure, and the heat of thallium evaporation.     

平凸型氮化硅球面微透镜的研究

介绍了用激光化学汽相沉积球面微透镜的技术，首先对激光化学汽相沉积法获得球面微透镜进行了理论分析，并用计算机分析了在一定沉积技术下的微透镜厚度剖面形状及光学聚集特性。其后介绍了激光化学汽相沉积的实验装置，用该装置在平面石英玻璃衬底上，制出了平凸型氮化硅球面微透镜，并对其参量进行了测量。     

二氧化钛薄膜表面粗糙度研究

为了探究二氧化钛(TiO₂)薄膜表面粗糙度的影响因素, 利用离子束辅助沉积电子束热蒸发技术对不同基底粗糙度以及相同基底粗糙度的K9玻璃完成二氧化钛(TiO₂)光学薄膜的沉积。采用TalySurf CCI非接触式表面轮廓仪分别对镀制前基底表面粗糙度和镀制后薄膜表面粗糙度进行测量。实验表明, TiO₂薄膜表面粗糙度随着基底表面的增大而增大, 但始终小于基底表面粗糙度, 说明TiO₂薄膜具有平滑基地表面粗糙的作用; 随着沉积速率的增大, 薄膜表面粗糙度先降低后趋于平缓; 对于粗糙度为2 nm的基底, 离子束能量大小的改变影响不大, 薄膜表面粗糙度均在1.5 nm左右; 随着膜层厚度的增大, 薄膜表面粗糙度先下降后升高。     

氧离子辅助反应蒸发法制备ITO薄膜的研究

采用氧离子辅助电子束反应蒸发工艺在K9玻璃基底上制备了性能优异的ITO薄膜.通过对薄膜方块电阻和透过率的测量分析,研究了基底温度、离子束流、沉积速率等工艺参数对ITO薄膜光电性能的影响.发现升高基底温度有利于减小薄膜的短波吸收,但过高的基底温度会增加薄膜的电阻率,合适的沉积速率可以同时改善薄膜的光学和电学性能.在比较理想的工艺参数下制备的ITO薄膜的电阻率约为5.4×10-4Ω·cm,可见光(波长范围425～685 nm)平均透过率达84.8%,其光电性能均达到实用化要求.     

Plasma deposition of thin films utilizing the anodic vacuum arc

Anodic vacuum arcs operating with cold cathodes in the spot mode and hot evaporating anodes are investigated to explore their technical potential as a plasma deposition technique. This discharge provides a unique source of a highly ionized, metal vapor plasma by autogeneration of the working gas to evaporation of the anode. This gas-free and droplet-free metal vapor plasma expands into the ambient vacuum (10^-4 mbar) and produces thin metallic films at the surface of substrates. An analysis of Al and Cu plasmas at the position of a possible substrate for arc currents between 20 and 200 A leads to the following results: electron densities, 10¹⁵-10¹⁸/ m³; degree of ionization, 0.5-25%; directed ion energy, 5 eV; and electron temperatures, 0.2-1 eV. Metallic coatings generated with deposition rates between 0.1 and 100 nm/s show the following properties: purity, 99.9%; polycrystalline structure with grain sizes between a few and a few hundred nm, same mass density as the respective bulk material, electrical conductivity rather close to that of the bulk material, and excellent optical properties. The coatings show good adhesion, which can be enhanced by a plasma-supported pretreatment of the substrate surface and by an acceleration of the ions towards the substrate     

Applications of the matrix-assisted pulsed laser evaporation method for the deposition of organic,biological and nanoparticle thin films: a review

The matrix-assisted pulsed laser evaporation (MAPLE) technique offers an efficient mechanism to transfer soft materials from the condensed to the vapor phase, preserving the versatility, ease of use and high deposition rates of the pulsed laser deposition (PLD) technique. The materials of interest (polymers, biological cells, proteins, …) are diluted in a volatile solvent. Then the solution is frozen and irradiated with a pulsed laser beam. Here, important results of MAPLE deposition of polymer, biomaterials and nanoparticle films are summarized. Finally, the MAPLE mechanism is discussed. A review of experimental and theoretical works points out that the simple model of individual molecule evaporation must be abandoned. Solute concentration, solubility, evaporation temperature of solvents, laser pulse power density and laser penetration depth emerge as important parameters to explain the morphology of the MAPLE-deposited films.     

Influence of deposition conditions on the microstructure of oxides thin films

Thin films of ZrO₂, HfO₂ and TiO₂ were deposited on kinds of substrates by electron beam evaporation (EB), ion assisted deposition (IAD) and dual ion beam sputtering (DIBS). Then some of them were annealed at different temperatures. X-ray diffraction (XRD) was applied to determine the crystalline phase and the grain size of these films, and the results revealed that their microstructures strongly depended on the deposition conditions such as substrate, deposition temperature, deposition method and annealing temperature. Theory of crystal growth and migratory diffusion were applied to explain the difference of crystalline structures between these thin films deposited and treated under various conditions.