Ordering poly(trimethylsilyl styrene‐block‐D,L‐lactide) block copolymers in thin films by solvent annealing using a mixture of domain‐selective solvents

Controlling the morphology, domain orientation, and domain size of block copolymer (BCP) thin films is desirable for many applications in nanotechnology. These properties can be tuned during solvent annealing by varying the solvent choice and degree of swelling which affect the effective miscibility and volume fraction of the BCP domains. In this work, we demonstrate with a bulk lamellae‐forming BCP, poly(4‐trimethylsilylstyrene‐block‐D ,L ‐lactide) (PTMSS‐b‐PLA), that varying the composition of a mixture of solvent vapors containing cyclohexane (PTMSS‐selective) and acetone (PLA‐selective), enables formation of perpendicularly oriented lamellae with sub‐20‐nm pitch lines. The BCP domain periodicity was also observed to increase by 30%, compared to bulk, following solvent annealing. Furthermore, solvent annealing alone is shown to induce a transition from a disordered to an ordered BCP. We rationalize our observations by hypothesizing that the use of a combination of domain selective solvent mixtures serves to increase the effective repulsion between the blocks of the copolymer. We furnish results from self‐consistent field theory calculations to support the proposed mechanism. © 2013 Wiley Periodicals, Inc. J. Polym. Sci. Part B: Polym. Phys. 2014 , 52, 36–45     

Synthesis and thin‐film orientation of poly(styrene‐block‐trimethylsilylisoprene)

The successful synthesis, characterization, and directed self‐assembly of a silicon‐containing block copolymer, poly(styrene‐block‐trimethylsilylisoprene) (P(S‐b‐TMSI)), which has much higher oxygen etch contrast than the de facto standard, poly(styrene‐block‐methyl methacrylate) is reported. A Sakurai, Grignard‐type coupling reaction provided the key monomer in good yield. Living anionic polymerization was employed to prepare the block copolymer, which has very low polydispersity. P(S‐b‐TMSI) was successfully ordered and oriented by directed self‐assembly. © 2012 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem, 2013     

Orientation control in nanoparticle filled block copolymer cold zone annealed films

Nanoparticles provide an attractive route to modifying polymer thin film properties, yet controlling the dispersion and morphology of functionalized nanoparticle filled films is often difficult. Block copolymers can provide an ideal template for directed assembly of nanoparticles under controlled nanoparticle‐polymer interactions. Previously we observed that neat films of cylinder forming poly(styrene‐b‐methyl methacrylate) PS‐b‐PMMA block copolymer (c‐BCP) orient vertically with dynamic sharp thermal cold zone annealing (CZA‐S) over wide range of CZA‐S speed (0.1–10) μm/s. Here, we introduce a low concentration (1–5 wt %) of nanoparticles of phenolic group functionalized CdS (fCdS‐NP), to PMMA cylinder forming polystyrene‐b‐poly (methyl methacrylate) block copolymer (c‐BCP) films. Addition of the fCdS‐NP induces a vertical to horizontal orientation transition at low CZA‐S speed, V = 5 μm/s. The orientation flip studies were analyzed using AFM and GISAXS. These results confirm generality of our previously observed orientation transition in c‐BCP under low speed CZA‐S with other nanoparticles (gold [Au‐NP], fulleropyrrolidine [NCPF‐NP]) in the same concentration range, but reveal new aspects not previously examined: (1) A novel observation of significant vertical order recovery from 5–10% vertical cylindrical fraction at V = 5 μm/s to 46–63% vertical cylindrical fraction occurring at high CZA‐S speed, V = 10 μm/s for the fCdS nanoparticle filled films. (2) We rule out the possibility that a nanoparticle wetting layer on the substrate is responsible for the vertical to horizontal flipping transition. (3) We demonstrate that the orientation flipping results can be achieved in a nanoparticle block copolymer system where the nanoparticles are apparently better‐dispersed within only one (matrix PS) domain unlike our previous nanoparticle system studied. We consider facile processing conditions to fabricate functionalized nanoparticles filled PS‐PMMA block copolymer films with controlled anisotropy, a useful strategy in the design of next generation electronic and photonic materials. © 2015 Wiley Periodicals, Inc. J. Polym. Sci., Part B: Polym. Phys. 2015 , 53, 604–614     

Nanopatterning and micropatterning of cobalt containing block copolymers via phase‐separation and lithographic techniques

Reversible addition fragmentation transfer (RAFT) agent functionalized polydimethylsiloxane (PDMS‐RAFT) was used as a macro‐RAFT agent to polymerize a mixed sandwich cobaltocene containing monomer featuring η⁵‐cyclopentadienyl‐cobalt‐η⁴‐cyclobutadiene. High molecular weight block copolymers (BCP) consisting of a metallic block and a PDMS block with excellent control over molecular weight and polydispersity were prepared. Solid‐state self‐assembly of this BCP resulted in hexagonal domains of metallopolymer phase‐separated from PDMS. In solution, spherical micelles with a metallic core, stabilized by a PDMS corona were prepared. Pyrolysis of the BCP resulted in magnetic nanoparticles with 30% char yield. The BCP was used as an ink material for microcontact printing (μCP) to transfer long‐ranged patterns. © 2015 Wiley Periodicals, Inc. J. Polym. Sci., Part A: Polym. Chem. 2015 , 53, 2747–2754     

Effect of block molecular weight distribution on the structure formation in block copolymer/homopolymer blends

The effect of homopolymer (hP) addition on the structure formation in lamellar amorphous block copolymers (BCP) with narrow‐ and broad‐molecular weight distribution (MWD) was studied using small‐angle X‐ray scattering and transmission electron microscopy. The systems in our study consist of blends of a poly(styrene‐b‐methyl acrylate) copolymer with block‐selective broad MWD of the poly(methyl acrylate) domain as well as polystyrene and poly(methyl acrylate) hPs with molecular weight less than the corresponding block of the copolymer. Homopolymer addition to the broad MWD domain of the BCP is found to induce structural changes similar to narrow MWD BCP/hP blend systems. Conversely, addition of hP to the narrow MWD domain is found to induce a more pronounced expansion of lamellar domains due to the segregation of the hP to the center region within the host copolymer domain. With increasing hP concentration, the formation of a stable two‐phase regime with coexisting lamellar/gyroid microphases is observed that is bounded by uniform lamellar phase regimes that differ in the distribution of hP within the corresponding narrow MWD block domain. The segregation of low‐molecular weight hP to the center region of the narrowdisperse domains of a broad MWD BCP is rationalized as a consequence of the more stretched chain conformations within the narrowdisperse block that are implied by the presence of a disperse adjacent copolymer domain. The increase of chain stretching reduces the capacity of the narrowdisperse block to solubilize hP additives and thus provides a driving force for the segregation of hP chains to the center of the host copolymer domain. © 2011 Wiley Periodicals, Inc. J Polym Sci Part B: Polym Phys 50: 106–116, 2012     

Water‐soluble top coats for orientation control of liquid crystal‐containing block copolymer films

An easily removable, water‐soluble top coat of polyvinylpyrrolidone (PVP) is used to control the orientation of microdomains in a liquid crystalline block copolymer (LC BCP, poly(ethylene oxide)‐block‐poly(6‐(4‐methoxy‐azobenzene‐4′‐butyl) hexyl methacrylate)). The corresponding LC homopolymer is also investigated for comparison. Atomic force microscopy is used to determine the orientation of the cylindrical microdomains of the LC BCP. UV–vis spectroscopy and grazing incidence wide‐angle X‐ray scattering are used to determine the orientation of the LC mesogens in the LC homopolymer and the LC BCP films annealed both with and without a top coat. Once the LC BCP morphology is self‐assembled, the PVP top coat layer can be easily removed with water or alcohol. The facile removal of the top coat improves the processability of BCPs in technological applications, and enables direct investigation of the BCP morphology in scientific studies. © 2017 Wiley Periodicals, Inc. J. Polym. Sci., Part B: Polym. Phys. 2017 , 55, 1569–1574     

Synchronous stimuli of biodegradable poly(butylene succinate‐co‐terephthalate) copolymer via uniaxial stretching at varying temperatures

Clearly knowing the structural responses of polymers to the treatment conditions is essential to regulate their final properties during industrial processing such as spinning, extrusion, injection, and blow molding. In this work, we reported the changes of hierarchical structure in poly(butylene succinate‐co‐terephthalate) (PBST) copolymer upon application of synchronous stimuli via uniaxial stretching at varying temperatures. The lamellae melting and the transition of crystal structure from α to β form in PBST copolymer always presented at the early stage of the deformation at different temperatures. The lamellae oriented to about ± (40–50)° direction as the yielding response to the stimuli. Upon further stretching, the oriented lamellae were freshly and progressively formed at high temperature, whose morphology was controllable by regulating the synchronous stimuli. Furthermore, a schematic for the structural responses to the synchronous stimuli was proposed. The structural responses of PBST copolymer under such synchronous stimuli are beneficial to tailor the final properties of the products in the form of fibers, films, plastics, and so forth, which also can provide new insights into the design and development of other copolymers. © 2015 Wiley Periodicals, Inc. J. Polym. Sci., Part B: Polym. Phys. 2015 , 53, 640–649     

Synthesis of highly dispersed,block copolymer‐grafted TiO2 nanoparticles within neat block copolymer films

The objective of the study is to formulate exclusive block copolymer (BCP) nanocomposites by dispersing bcp end‐grafted nanoparticles (bcp‐g‐nps) of PMMA‐b‐PS‐g‐TiO₂ within PS‐b‐PMMA matrix. PMMA‐b‐PS‐g‐TiO₂ is synthesized using a “grafting‐to” approach and characterized by XPS and TGA to establish that the copolymer chains were bonded to NPs. Good dispersion of bcp‐g‐nps in PMMA and PS‐PMMA bcp films is observed, in contrast to poor dispersion in PS films. In PS‐PMMA films, the compatible and identical bcp nature of the end‐grafted polymer, and large NP size caused it to span across entire PS‐PMMA domains. Poor and good dispersion in PS and PMMA matrices, respectively, can be rationalized by the fact that NPs interactions are driven by the PMMA at the outer corona of the bcp‐g‐nps. Developing bcp‐g‐nps as a strategic route to preparation of highly dispersed high permittivity NPs like titanium dioxide (TiO₂) in bcp matrix can have important ramifications for energy storage devices. © 2014 Wiley Periodicals, Inc. J. Polym. Sci., Part A: Polym. Chem. 2015 , 53, 468–478     

Topological “interfacial” polymer chemistry: Dependency of polymer “shape” on surface morphology and stability of layer structures when heating organized molecular films of cyclic and linear block copolymers of n‐butyl acrylate‐ethylene oxide

The “topological polymer chemistry” of amphiphilic linear and cyclic block copolymers at an air/water interface was investigated. A cyclic copolymer and two linear copolymers (AB‐type diblock and ABA‐type triblock copolymers) synthesized from the same monomers were used in this study. Relatively stable monolayers of these three copolymers were observed to form at an air/water interface. Similar condensed‐phase temperature‐dependent behaviors were observed in surface pressure–area isotherms for these three monolayers. Molecular orientations at the air/water interface for the two linear block copolymers were similar to that of the cyclic block copolymer. Atomic force microscopic observations of transferred films for the three polymer types revealed the formation of monolayers with very similar morphologies at the mesoscopic scale at room temperature and constant compression speed. ABA‐type triblock linear copolymers adopted a fiber‐like surface morphology via two‐dimensional crystallization at low compression speeds. In contrast, the cyclic block copolymer formed a shapeless domain. Temperature‐controlled out‐of‐plane X‐ray diffraction (XRD) analysis of Langmuir–Blodgett (LB) films fabricated from both amphiphilic linear and cyclic block copolymers was performed to estimate the layer regularity at higher temperatures. Excellent heat‐resistant properties of organized molecular films created from the cyclic copolymer were confirmed. Both copolymer types showed clear diffraction peaks at room temperature, indicating the formation of highly ordered layer structures. However, the layer structures of the linear copolymers gradually disordered when heated. Conversely, the regularity of cyclic copolymer LB multilayers did not change with heating up to 50 °C. Higher‐order reflections (d₀₀₂, d₀₀₃) in the XRD patterns were also unchanged, indicative of a highly ordered structure. © 2015 Wiley Periodicals, Inc. J. Polym. Sci., Part B: Polym. Phys. 2016 , 54, 486–498     

In situ grazing incidence small‐angle X‐ray scattering study of solvent vapor annealing in lamellae‐forming block copolymer thin films: Trade‐off of defects in deswelling

Solvent vapor annealing (SVA) is one route to prepare block copolymer (BCP) thin films with long‐range lateral ordering. The lattice defects in the spin‐coated BCP thin film can be effectively and rapidly reduced using SVA. The solvent evaporation after annealing was shown to have a significant impact on the in‐plane ordering of BCP microdomains. However, the effect of solvent evaporation on the out‐of‐plane defects in BCPs has not been considered. Using grazing‐incidence x‐ray scattering, the morphology evolution of lamellae‐forming poly(2‐vinlypyridine)‐b‐polystyrene‐b‐poly(2vinylpyridine) triblock copolymers, having lamellar microdomains oriented normal to substrate surface during SVA, was studied in this work. A micelle to lamellae transformation was observed during solvent uptake. The influence of solvent swelling ratio and solvent removal rate on both the in‐plane and out‐of‐plane defect density was studied. It shows that there is a trade‐off between the in‐plane and out‐of‐plane defect densities during solvent evaporation. © 2017 Wiley Periodicals, Inc. J. Polym. Sci., Part B: Polym. Phys. 2017 , 55, 980–989     

A facile route to regular and nonregular dot arrays by integrating nanoimprint lithography with sphere‐forming block copolymer directed self‐assembly

Nanoimprint lithography is used to create large‐area two‐dimensional prepatterns with tunable topographic heights in a resist layer. The resist prepatterns are applied to direct the self‐assembly of sphere‐forming polystyrene‐block‐polydimethylsiloxane block copolymers so as to form sparse nonregular nanodot arrays with flexible pattern layouts from high‐topography prepattern or dense regular nanodot arrays with a multiplicative pattern density from low‐topography prepattern. By precisely controlling the topographic height in substrate prepatterns, the origin of directed self‐assembly of block copolymer spheres using low‐topography prepattern is found to be topographic contrast. High‐fidelity pattern transfer from spherical block copolymer nanotemplates to functional materials indicates a promising route to ultrahigh density nanodevices. Bit‐patterned media over 1 teradot/in on a 2.5‐inch disk are fabricated, thus presenting future magnetic data storage media with great areal density growth potential. © 2013 Wiley Periodicals, Inc. J. Polym. Sci., Part B: Polym. Phys. 2014 , 52, 361–367     

Formation of long‐range stripe patterns with sub‐10‐nm half‐pitch from directed self‐assembly of block copolymer

We have demonstrated directed self‐assembly of poly(styrene‐b‐dimethylsiloxiane) (PS‐b‐PDMS) down to sub‐10‐nm half‐pitch by using grating Si substrate coated with PDMS. The strong segregation between PS and PDMS enables us to direct the self‐assembly in wide grooves of the grating substrate up to 500 nm in width. This process can be applied to form various type of sub‐10‐nm stripe pattern along variety of grating shape. © 2010 Wiley Periodicals, Inc. J Polym Sci Part B: Polym Phys, 2010     

Microphase segregation and selective chain scission of poly(2‐methyl‐2‐oxazoline)‐block‐polystyrene

Herein, we report the design and synthesis of a block copolymer (BCP) with a high Flory–Huggins interaction parameter to access 10 nm feature sizes for potential lithographic applications. The investigated BCP is poly[(2‐methyl‐2‐oxazoline)‐block‐styrene] (PMeOx‐b‐PS), where the PMeOx segment functions as a hydrophilic segment. Two BCPs with different molecular weights were prepared using PMeOx as macroinitiator for copper(0) mediated controlled radical polymerization. The thin film self‐assembly of the obtained PMeOx‐b‐PS was performed by solvent annealing and investigated by atomic force microscopy. Both polymers formed PMeOx cylinders in a PS matrix with an average cylinder diameter of 10.5 nm. Additionally, the ability of the PMeOx domains to selectively degrade under ultraviolet irradiation was explored. It was shown that scission of the PMeOx block does occur selectively, and furthermore that the degraded domains can be removed while leaving the PS matrix intact. By combining synthetic accessibility, small feature sizes, and a selectively cleavable domain, this new BCP system holds significant promise as a lithographic mask for patterning surfaces with high precision. © 2019 Wiley Periodicals, Inc. J. Polym. Sci., Part A: Polym. Chem. 2019, 57, 1349–1357     

Brushless and controlled microphase separation of lamellar polystyrene‐b‐polyethylene oxide thin films for block copolymer nanolithography

Creating perpendicular alignment in lamellar block copolymer (BCP) systems has considerable industrial and commercial significance, most importantly for generating nanowire structures in electronic devices. In general, these lamellar systems require careful interface engineering to obtain vertical orientation of the blocks. To avoid the strong preferential adsorption of one block to either the substrate or the polymer/air interface, the surface must be “neutralized” by chemical brushes or external forces, for example, solvent fields. Reported here is a stepwise thermo/solvent annealing process allowing the formation of perpendicular domains of polystyrene‐b‐polyethylene oxide lamellar structures while avoiding brush or other surface modifications. This BCP has a relatively small minimum feature size and can be used to generate substrate patterns for use in fabrication of nanowire electronic device structures. © 2012 Wiley Periodicals, Inc. J Polym Sci Part B: Polym Phys, 2012     

Controlled epoxidation of poly(styrene‐b‐isoprene‐b‐styrene) block copolymer for the development of nanostructured epoxy thermosets

To be used as templates for nanostructured thermosets, a commercial poly(styrene‐b‐isoprene‐b‐styrene) (SIS) block copolymer (BCP) was epoxidized by three different epoxidation procedures. An exhaustive analysis of methodologies using metal catalyzed/hydrogen peroxide, dimethyldioxirane (DMDO), and meta‐chloroperbenzoic acid (m‐CPBA) was performed to obtain reactive BCPs. The DMDO approach was the best strategy to obtain highly epoxidized SIS BCP (85 mol %) without formation of side products. Careful control in BCP epoxidation by metal catalyzed/hydrogen peroxide and m‐CPBA approaches led to a maximum epoxidation degree (ED) of approximately 60 mol % without the formation of side products. The ED by metal catalyzed/hydrogen peroxide strategy could be further increased to 69 mol %, but a significant amount of crosslinking, ring opening, and polymer chain scission reactions were detected by spectroscopic and chromatographic techniques. The miscibility of epoxidized BCPs with diglycidyl ether of bisphenol‐A epoxy system before and after curing was analyzed to develop nanostructured epoxy thermosets. For ED higher than 69 mol %, BCPs were miscible, while those with lower ED presented macrophase separation. Highly epoxidized BCPs obtained by the DMDO methodology were successfully used to obtain ordered nanodomains inside the epoxy matrix, as determined by atomic force microscopy. © 2011 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem, 2011     

Block copolymer films on patterned surfaces

We present results from a numerical study of a coarse-grained model of diblock copolymer (BCP) thin films cast on a chemically patterned surface. The patterned surface contains chemical inhomogeneities with a repeat spacing length scale comparable to the linear size of the BCP molecules. We find that the orientation of the lamellae in the thin film and the overlap of the film morphology with the preassigned surface pattern is strongly influenced by the commensurability between the bulk unconstrained lamellar size λ^*, and the linear size of the surface inhomogeneities w. PACS Numbers: 64.60.Cn, 61.41.+e, 64.60.My, 64.75.+g. © 1998 John Wiley & Sons, Inc. J Polym Sci B: Polym Phys 36: 3127–3136, 1998     

Removal of poly(methyl methacrylate) in diblock copolymers films studied by grazing incidence small‐angle X‐ray scattering

Self‐assembly of diblock copolymers (BCP) into periodic arrays is a promising route to generate templates for the fabrication of nanoscopic elements, when one block is selectively removed. In cylindrical morphology polystyrene‐block‐poly(methyl methacrylate) (PS‐b‐PMMA) copolymer (BCP) films, the efficiency of different processes for removing the PMMA from cylinders is studied using grazing incidence small angle X‐ray scattering (GISAXS), x‐ray reflectivity and critical dimension scanning electron microscopy. The detailed analysis of the GISAXS patterns leads to the determination of the depth of cylindrical holes left by removal of the PMMA. It is found that the combination of a preliminary UV exposure followed by a wet treatment allows to remove totally the PMMA blocks. Furthermore, the optimization of both UV exposition time and solvent allows to preserve the PS matrix and interestingly for nanolithographic applications to decrease the process costs. © 2016 Wiley Periodicals, Inc. J. Polym. Sci., Part B: Polym. Phys. 2016 , 54, 1137–1144     

Synthesis and morphology investigations of a novel alkyne‐functionalized diblock copolymer

We reported the synthesis and morphology of a novel alkyne‐functionalized diblock copolymer (di‐BCP) poly(methyl methacrylate‐random‐propargyl methacrylate)‐block‐poly(4‐bromostyrene). The di‐BCPs were synthesized by atom transfer radical polymerization and postpolymerization deprotection, with good control over molecular weight and polydispersity index. Microphase separation in bulk di‐BCPs was confirmed by thermal analysis, small‐angle X‐ray scattering, and transmission electron microscopy. Microphase‐separated morphologies were also observed in thin films, and the orientation of the microdomains can be conveniently controlled by annealing under different solvents. © 2012 Wiley Periodicals, Inc. J Polym Sci Part B: Polym Phys, 2012     

Donor–acceptor rod–coil block copolymers comprising poly[2,7‐(9,9‐dihexylfluorene)‐alt‐bithiophene] and fullerene as compatibilizers for organic photovoltaic devices

The successful synthesis is described for a donor–acceptor rod–coil block copolymer comprising blocks of poly[2,7‐(9,9‐dihexylfluorene)‐alt‐bithiophene] (F6T2) and polystyrene functionalized with fullerene (PS(C₆₀)) (F6T2‐b‐PS(C₆₀)). This new material was obtained by combining Suzuki polycondensation with radical addition fragmentation chain transfer. The block copolymer was characterized by nuclear magnetic resonance, gel permeation chromatography, and optical spectroscopy methods. Photophysical data for (F6T2‐b‐PS(C₆₀)) and a related block copolymer (F6T2‐b‐PS(PCBM)) (PCBM, phenyl‐C61‐butyric acid methyl ester) are reported and their performance as compatibilizers in bulk heterojunction organic solar cells is assessed. It is demonstrated that the addition of the rod–coil block copolymers to the active layer extends the operational stability of organic photovoltaic devices. © 2015 Wiley Periodicals, Inc. J. Polym. Sci., Part A: Polym. Chem. 2015 , 53, 888–903     

RAFT radical copolymerization of beta‐pinene with maleic anhydride and aggregation behaviors of their copolymer in aqueous solution

RAFT copolymerization of beta‐pinene and maleic anhydride was successfully achieved for the first time, using 1‐phenylethyl dithiobenzoate as chain transfer agent in a mixed solvent of tetrehydrofuran and 1.4‐dioxane (1:9, v/v) at a feed molar ratio of beta‐pinene to maleic anhydride as 3:7, and the alternating copolymer was prepared with predetermined molecular weight and narrow molecular weight distribution. Furthermore, using former alternating copolymer as a macro‐RAFT agent, block copolymer poly(beta‐pinene‐alt‐maleic anhydride)‐b‐polystyrene was synthesized in a chain extending with styrene. Hydrolysis of this block copolymer under acidic conditions formed a new amphiphilic block copolymers poly(beta‐pinene‐alt‐maleic acid)‐b‐polystyrene whose self‐assembly behaviors in aqueous solution at different pH were investigated through SEM and DLS. © 2015 Wiley Periodicals, Inc. J. Polym. Sci., Part A: Polym. Chem. 2015 , 53, 1422–1429