微束斑X射线源聚焦系统的数值研究

本文研究了由两个磁透镜组成的电子束打靶微束斑X射线源的聚焦系统.首先利用有限元法计算了磁透镜的磁感应强度的轴上分布,在此基础上用三次样条函数插值计算了磁场的空间分布,最后用四阶Runge-Kutta法追踪了电子的运动轨迹,并给出了入射电子束经过聚焦系统后的缩小倍率.     

微束斑X射线源及X射线光学元件

高质量的X射线源,尤其高亮度的微纳束斑X射线源是现代X射线光学高清晰成像最为关键的部件之一,在工业无损探伤、生命科学、材料科学等科学研究和实际应用中具有重要的意义。简单介绍了微束斑X射线源的产生方法及发展历史,并对微束X射线光学涉及到的聚焦X射线光学元件（如X射线掠入射反射镜、布拉格法反射镜、多层膜反射镜、多层膜光栅、X射线波带片、毛细管聚焦透镜和复合折射透镜等）的主要特点作了简要的系统介绍。最后展望了微细束X射线在微纳检测与分析等方面的应用前景。     

一种新型微束斑X射线源的研究

采用高效长寿命的LaB6单晶阴极电子枪作为电子束发射系统、轻便的等径双圆筒静电系统作为聚焦系统等技术研究了一种新型台式微束斑X射线源.通过在综合测试仪上的初步实验研究,表明该微束斑X射线源不仅可以连续辐射,而且可以脉冲辐射X射线,输出X射线束斑小、亮度高.此外,该台式X射线源具有体积小、重量轻,使用寿命长、造价低,可灵活移动等优点.     

电子束在微束斑X射线源中运动轨迹的计算

轰击金属靶面的高能电子束束斑大小,是决定微束斑X射线源最终X射线束斑尺寸的关键因素之一.当LaB₆晶体阴极发射电流为60μA时,采用5点不等距有限差分法(FDM)计算了整个仪器内旋转对称电子光学系统电场的分布,并利用Runge Kutta法从LaB₆阴极发射端面开始追踪了电子束在整个系统内部的运动,经计算,聚焦在靶面上的电子束斑直径约为600~1000nm.     

微束斑X射线源LaB_6阴极电子枪的设计

LaB6阴极电子枪是微束斑X射线源的关键组成部件之一。详细的讨论了电子枪的各组成电极 ,即LaB6阴极、Wehnelt栅极和阳极的设计。采用边界元法 (BEM )对电子枪内部电场电位和场强分布进行了有效的数值计算 ,并从阴极开始起利用四阶Runge Kutta法追踪电子的运动轨迹。给出了当阳极端口处电子束半径为设计值时各电极电压、电极结构等工作参量 ,利用该LaB6阴极电子枪可以满足微束斑X射线源需要高亮度、微细电子束发射的要求。     

微束斑X射线源发射系统的数值计算

本文采用边界元法(BEM)对高亮度微束斑X射线源的LaB₆阴极、Wehnet栅极和阳极等发射系统的电位和场强分布进行了数值计算,首先计算了系统对称轴上的电位,再利用三次样条插值法和谢赫尔公式等计算了系统在考虑三次相差情况下的傍轴电场强度分布.     

基于空间应用的透射式微型微束调制X射线源

针对空间应用对X射线源的需求, 提出了一种透射式微型微束调制X射线源的设计方案, 建立了调制X射线源的理论模型. 相较传统的X射线源, 增加了栅极电压控制和多个聚焦极微束聚焦功能, 通过改变栅极电压实现X射线的幅度调制和脉冲调制. 利用带电粒子光学仿真软件SIMION, 模拟计算了不同管电压下透射式阳极靶的最佳靶厚, 仿真分析了不同栅极电压对电子束运动轨迹的影响, 最终得到了150 μm的微束焦斑直径. 完成了原理样机的加工镀膜和真空密封, 搭建了调制X射线源的测试装置, 实验报道了阳极钨靶的谱线特性, 分析了栅极电压影响出射X射线强度的原因, 讨论了栅极幅度调制的可能性, 完成了调制X射线源栅极脉冲调制的验证.     

聚焦电子束对透射式微焦点X射线源的影响

微焦点X射线源是微计算机断层扫描技术设备的核心部件。研究了电子束在靶材中的横向扩散引起的透射式微焦点射线源的焦点尺寸和强度的变化规律。结果表明:当打靶电子束的束流密度遵循高斯分布时,其产生的X射线强度也遵循高斯分布,该分布的标准差可以用来精确表示X射线的焦点尺寸;当靶材厚度可以使沉积电子束的能量达到60%时,对应的靶材产生的X射线强度最高;随着靶材厚度增加,X射线的焦点尺寸逐渐变大;增大电子束的加速电压可以适当减小X射线的焦点。本研究为透射式微焦斑X射线源的靶材选择和设计提供了理论依据。     

利用聚束透镜获得高功率密度软X射线源

研制了针对Z-pinch强X射线辐射源的软X射线聚束透镜,利用西北核技术研究所"强光一号"加速器产生的钨丝阵高温等离子体辐射,对在高功率密度软X射线入射条件下的聚束透镜开展了实验.研究表明:由2401根X光导管组成的透镜,在输入软X射线功率密度达1.0×108W/cm2时,透镜的平均传输效率为9.6%,在软X射线传输过程中等离子体溅射被导管内壁吸收,透镜后焦点处能获得洁净的软X射线源,平均功率桁度达到1.15×109W/cm2.     

9MeV,小于0.1mm微焦点X射线源验证实验

密度高、成像分辨率高、成像速度快的X射线数字成像检测需要高能微焦点大剂量X射线源,高品质电子源是实现这一X射线源的关键手段。基于中国工程物理研究院太赫兹自由电子激光的主加速器,验证了低发射度、低能散度的高亮度电子束实现高能微焦点的可行性,得到电子束半高全宽尺寸小于70μm的9 MeV微焦点,并初步开展成像实验,双丝像质计焦斑清晰分辨9D号丝,丝直径0.13 mm。     

高电荷态ECR离子源的金属离子产生

简单介绍了采用炉子加热、 挥发性金属化合物和溅射产生ECR离子源的金属离子的3种方法和实验结果, 主要研究了铜、 锌、 镍和铁等多种电荷态离子的产生．　对3种方法分别进行了探讨．To satisfy the requirements of HIRFL (Heavy Ion Research Facility in Lanzhou), series of experiments have been done to produce metallic ion beams. By now, numerous methods have been tested, in which MIVOC (Metallic Ion from Volatile Compounds), heating oven methods and plasma sputter methods are all included. According to the experiments, the results of using MIVOC methods and heating oven methods are very good. In most of our researches, emphasis was put upon the ion production of iron, Nickel, Tantanum, copper of different charge states. Among the ion beams we have obtained, 210 μA Fe11+, 175 μA Fe12+, 142 μA Fe13+, 25 μA Fe16+, 64 μA Ni10+, 57 μA Ni13+, 31 μA Ni15+ and 15 μA Ni16+ are representative results.     

RF离子源引出特性的研究

为了使RF离子源具有良好的引出特性, 测试了吸极几何参数、振荡器板压、引出电压对离子源引出特性的影响, 对实验结果进行了分析. 在其他参数不变的情况下, 存在最佳的D/d; 增加D/d,有利于过聚焦的离子束恢复聚焦状态. b/D增大时, 聚焦度上升, 引出束流下降. B/d减小时,聚焦度增大; 当B/d小于4时, 聚焦度增加趋势变缓. 综合考虑聚焦度、引出束流和气压,D/d,b/D,B/d适宜的选择范围分别为1.6—2.1, 0.7—1.1, 4—7. 改变引出电压和振荡器功率对离子源性能的影响具有相反的方向, 两者都存在最佳工作点.     

HITRAP: A Facility for Experiments with Trapped Highly Charged Ions

HITRAP is a planned ion trap facility for capturing and cooling of highly charged ions produced at GSI in the heavy-ion complex of the UNILAC-SIS accelerators and the ESR storage ring. In this facility heavy highly charged ions up to uranium will be available as bare nuclei, hydrogen-like ions or few-electron systems at low temperatures. The trap for receiving and studying these ions is designed for operation at extremely high vacuum by cooling to cryogenic temperatures. The stored highly charged ions can be investigated in the trap itself or can be extracted from the trap at energies up to about 10 keV/q. The proposed physics experiments are collision studies with highly charged ions at well-defined low energies (eV/u), high-accuracy measurements to determine the g-factor of the electron bound in a hydrogen-like heavy ion and the atomic binding energies of few-electron systems, laser spectroscopy of HFS transitions and X-ray spectroscopy. This revised version was published online in July 2006 with corrections to the Cover Date.     

SECRAL在18GHz频率下产生强流高电荷态离子束的初步结果

A Superconducting ECR ion source with Advanced design in Lanzhou (SECRAL) was successfully built to produce intense beams of highly charged ions for Heavy Ion Research Facility in Lanzhou (HIRFL).The ion source has been optimized to be operated at 28GHz for its maximum performance.The superconducting magnet confinement configuration of the ion source consists of three axial solenoid coils and six sextupole coils with a cold iron structure as field booster and clamping.For 28GHz operation,the magnet assembly can produce peak mirror fields on axis 3.6T at injection,2.2T at extraction and a radial sextupole field of 2.0T at plasma chamber wall.A unique feature of SECRAL is that the three axial solenoid coils are located inside of the sextupole bore in order to reduce the interaction forces between the sextupole coils and the solenoid coils. During the ongoing commissioning phase at 18GHz with a stainless steel chamber,tests with various gases and some metals have been conducted with microwave power less than 3.2kW and it turned out the performance is very promising.Some record ion beam intensities have been produced,for instance,810eμA of O~(7 ),505eμA of Xe~(20 ),306eμA of Xe~(27 ),21eμA of Xe~(34 ),2.4eμA of Xe~(38 ) and so on.To reach better results for highly charged ion beams,further modifications such as an aluminium chamber with better cooling,higher microwave power and a movable extraction system will be done,and also emittance measurements are being prepared.     

电偏转扫描法测量高电荷态ECR源发射度

成功地研制了一套适合于低能离子束流发射度测量的电偏转扫描探测器.对该探测器的原理和结构作了较详细的描述,并给出该探测器对兰州近代物理研究所高电荷态ECR源LECR3引出离子束流发射度的测量结果.典型结果为:在引出高压为15.97kV,引出束流为190μA时,O⁴⁺水平发射度(x方向)为137πmm·mrad,垂直发射度(y方向)为120πmm·mrad(包括90%束流).最后,对测量结果作了一些分析和讨论.     

激光等离子体光源软X射线反射率计

介绍了所研制的激光等离子体光源软X射线反射率计,该反射率计由激光等离子体光源、掠入射光栅单色仪、样品室、真空系统、样品台、光电探测系统和计算机控制系统组成,工作波段8～30 nm,测量样品的最大尺寸为130 mm×120 mm×120 mm(长×宽×高),可以利用这台反射率计对软X射线波段光栅、滤光片和多层膜反射镜等光学元件进行测量和评估。为检验反射率计的性能指标,利用该反射率计对本室研制的软X射线多层膜反射镜的反射率进行了测量,测量结果与理论计算结果符合较好,反射率测量重复性为±0.6%。     

Electron Magnetic Moment in Highly Charged Ions: The ARTEMIS Experiment

The magnetic moment (g‐factor) of the electron is a fundamental quantity in physics that can be measured with high accuracy by spectroscopy in Penning traps. Its value has been predicted by theory, both for the case of the free (unbound) electron and for the electron bound in a highly charged ion. Precision measurements of the electron magnetic moment yield a stringent test of these predictions and can in turn be used for a determination of fundamental constants such as the fine structure constant or the atomic mass of the electron. For the bound‐electron magnetic‐moment measurement, two complementary approaches exist, one via the so‐called “continuous Stern–Gerlach effect”, applied to ions with zero‐spin nuclei, and one a spectroscopic approach, applied to ions with nonzero nuclear spin. Here, the latter approach is detailed, and an overview of the experiment and its status is given.     

ECR离子源金属离子的产生

讨论了ECR离子源金属供料方法,在145GHzECR离子源上应用炉子加热和MIVOC法获得了⁴⁰Ca¹¹⁺140eμA和⁵⁶Fe¹⁰⁺65eμA,并对实验过程和结果作了分析.     

高电荷态离子Ar17+与Mo表面作用过程中的X射线发射

观测了低速(小于Bohr速度)高电荷Ar¹⁷⁺离子与金属Mo表面相互作用的X射线发射,以及ArKα,KβX射线强度随入射离子动能的变化.