CEA/Saclay的ECR轻离子离子源

In the beginning of the 90s,T.Taylor and his collaborators demonstrated ECR sources operating at low frequency(i.e.2.45GHz)are able to produce very intense single charge light ion beams. At CEA/Saclay,the SILHI source developments started in 1995.Since 1997 more than 100mA proton or deuteron beams are routinely produced in pulsed or continuous mode.To comply with ADS reliability constraint,important improvements have been performed to increase the installation reliability.Moreover,to optimize the beam transport in the low energy beam line,the extraction system was carefully designed and space charge compensation studies were undertaken.An important step has been reached in 2005 with the development of a permanent magnet source able to produce a total beam of 109mA at 85kV. A new test bench named BETSI,especially dedicated to permanent magnet source developments,is presently under construction.It will allow analysing positive or negative extracted beams up to 50keV and 100mA. In addition,for several years work has been done to optimize the production of negative hydrogen ion beam with such an ECR source.Recent analysis pushed towards the construction of a new set up based on a multicusp magnetic configuration. After a brief overview of the CEA/Saclay source developments,this article will point out on the recent results and present status.     

NIRS的ECR离子源现状

Four ECR ion sources have been operated in National Institute of Radiological Sciences(NIRS). Two ECR ion sources supply various ion species for the Heavy Ion Medical Accelerator in Chiba(HIMAC). The 10GHz NIRS-ECR ion source mainly produces C~(2 ) ions for the heavy-ion therapy.Ions of Si,Ar,Fe,Kr and Xe are usually produced by the 18GHz NIRS-HEC ion source for physical and biological experiments.The other two compact ECR ion sources with all permanent magnet configuration have been developed for the new generation carbon therapy facility.One of these,the Kei-source,is a prototype which has been installed to the NIRS-930 cyclotron for axial injection.The other source,Kei2-source,is a demonstration source and utilized for the new generation Linac.In addition,both Kei sources have been used to study fundamental properties. In this paper,present status of the ion sources and recent developments are reported.     

NSCL/MSU ECR离子源项目进展报告

Since the last ECR Workshop,NSCL/MSU has been involved in a vigorous ECR ion source R&D program,which resulted in the construction of an off-line test ECR ion source(ARTEMIS-B)for new beam development and ion optics studies.Also the design and partial completion of a 3rd generation,fully superconducting ECR ion source,SuSI has been accomplished.This paper is an overview of the construction projects and the different R&D activities performed with the existing ion sources.These activities include development of metallic ion beam production methods using evaporation with resistive and inductive ovens and sputtering of very refractory metals.Ion optics developments include testing different focusing elements(magnetic solenoid lens,electrostatic quadrupole triplet lens,Einzel lens,electrostatic double doublet quadrupole combined with an octupole lens),and different beam forming and diagnostics devices.The detailed results will be presented at the workshop in separate talks and posters.     

Argonne国家实验室ECR离子源在固体材料离子束流产生方面的研究进展

Development work with solid materials at the Argonne National Laboratory ECR ion sources has been focused on two areas-introduction of materials with low vapour pressures,and increasing the beam intensities of heavy beams(i.e.-lead and uranium).An induction oven,with a demonstrated operating temperature extending to 2000℃,has been utilized to produce a Ti-50 beam with an intensity of 5.5eμA (12 ).In addition,a refinement of the sputter technique has been employed which has resulted in a 42% improvement in lead beam intensities.Details of the induction oven as well as the refined sputter technique will be presented.     

近物所在产生金属离子束方面的研究

Since 1998,many experiments for metallic ion production have been done on LECR2(Lanzhou ECR ion source NO.2),LECR3(Lanzhou ECR ion source NO.3)and SECRAL(Superconductiong ECB ion source Advanced design in Lanzhou)at Institute of Modern Physics.The very heavy metallic ion beams such as those of uranium were also produced by the plasma sputtering method,and supplied for HIRFL(Heavy Ion Research Facility in Lanzhou)accelerators successfully.During the test,11.SeμAU~(28 ),9eμAU~(24 ) were obtained.Some ion beams of the metal having lower melting temperature such as Ni and Mg ion beams were produced by oven method on LECR3 too.The consumption rate was controlled to be lower for ~(26)Mg ion beams production,and the minimum consumption was about 0.3mg per hour.In this paper,the main experimental results are given.Some discussions are made for some experimental phenomena and results,and some conclusions are drawn.     

宽带微波馈入对于具有常规磁场构型的ECR离子源性能的提高

As clearly demonstrated at several laboratories,the performances of electron-cyclotron resonance (ECR)ion sources can be enhanced by increasing the physical sizes(volumes)of embedded ECR zones.En- larged ECR zones have been achieved by engineering the central magnetic field region of these sources so they are uniformly-distributed"volumes"in resonance with single-frequency rf power.Alternatively,the number of ECR surfaces in conventional minimum-B geometry sources can be increased by heating their plasmas with multiple,discrete frequency microwave radiation.Broadband rf power offers a simple,low cost and arguably more effective means for increasing the physical sizes of the ECR zones within the latter source type.In this article,theoretical arguments are made in support of the volume effect and the charge-state enhancing ef- fects of broadband microwave radiation(bandwidth:200MHz)plasma heating are demonstrated by comparing the high-charge-states of Ar ion beams,produced by powering a conventional minimum-B geometry,6.4GHz ECR ion source,equipped with a biased disk,with those produced by conventional bandwidth(bandwidth:～1.5MHz)radiation.     

高电荷态ECR离子源引出束流4D 发射度测量仪设计

为了进一步探究高电荷态电子回旋共振(ECR) 离子源引出束流品质和横向相空间耦合情况,根据中国科学院近代物理研究所高电荷态离子源引出束流发射度测量需求,针对束流流强为1 eμA∼1 emA,能量范围为10∼35 keV/q 的直流或脉冲高电荷态重离子束,设计了一台实时四维Pepper-pot 发射度测量仪。该Pepper-pot 型发射度测量仪具有响应时间快和工作范围宽等特点。针对强流重离子束诊断的特点,在结构与材料选择上做了设计与优化,并对获得图像的处理方法提出了具体的解决办法。For the purpose of on-line beam quality diagnostics and transverse emittance coupling investigation of the ion beams delivered by an Electron Cyclotron Resonance (ECR) ion source, a real-time 4D Pepper Pot type emittance scanner is under development at IMP(Institute of Moden Physics, Chinese Academy of Sciences). The high charge state ECR ion source at IMP could produce CW or pulsed heavy ion beam intensities in the range of 1 eμA∼1 emA with the kinetic energy of 10∼35 keV/q, which needs the design of the Pepper Pot scanner to be optimized accordingly. The Pepper Pot scanner has many features, such as very short response time and wide dynamic working range that the device could be applied. Since intense heavy ion beam bombardment is expected for this device, the structure and the material selection for the device is specially considered during the design, and a feasible solution to analyze the pictures acquired after the data acquisition is also made.     

多电荷态气脉冲式ECR离子源(摘要)

A new type of pulse sources of multicharged ions,namely,a quasi-gasdynamic ECR source is propose.Its main difference from the classical ECR ion sources is a different,quasi-gasdynamic regime of plasma confinement in a magnetic trap.A zero-dimensional model was constructed that describes gas breakdown, formation of charge state distribution in a plasma,and plasma flux through the plugs of the trap.A wide spectrum of model experimental studies was covered.Plasma was produced and heated by a pulse(1ms) gyrotron at the frequency of 37.5GHz and power of 100kW in a cusp magnetic trap with magnetic field in plugs up to 2.5T.Such a trap has axisymmetric configuration and allows one to realize a quasi-gasdynamic regime of confinement with reliable stabilization of MHD perturbations.It was demonstrated that with such a confinement regime it is possible to generate multicharged ions and create intense(more than 1A/cm~2)ion fluxes through the trap plugs.Comparison of results of calculations and data of experiments shows that they are in a good agreement,which allows us to predict with a high degree of certainty creation of an ECR source of a new generation. The data obtained were used to design a pulse quasi-gasdynamic ECR ion source with pumping at the frequency of 100GHz,effective trap size lm,average ion charge in plasma comparable with that in the best classical MCI ECR sources but with an order of magnitude higher flux density and absolute magnitude of plasma flux through trap plugs.Creation of intense plasma fluxes allows one to extract high-current MCI beams of high brightness.Transverse homogeneity of a plasma flux makes it possible to use multi-aperture extraction system for formation on broad intense MCI beams.     

初步的IMP重离子治疗计划系统

中国科学院近代物理研究所基于兰州重离子研究装置(HIRFL/HIRFL-CSR),在被动型束流配送系统下采用二维分层适形照射治疗技术开展重离子治癌临床试验研究。为了更好地利用重离子束在肿瘤放射治疗中的生物物理优势并保障重离子临床治疗试验的顺利实施,一个初级版本的重离子治疗计划系统已经设计完成。此计划系统是针对被动型束流配送系统下的二维分层适形照射治疗方式来进行设计的。介绍了此系统的设计框架、可提供的功能以及利用宽束算法进行剂量计算在此系统中的实现。通过人体仿真体模实验证实由该治疗计划系统给出的靶区计划剂量与实测剂量的偏差在5%之内。最后讨论了设计较为完备的重离子治疗计划系统仍需解决的问题。     

ORNL-HRIBF 6GHzECR离子源的最新结果

Experimental studies were conducted to characterize and improve the performance of the flat-B ECR ion source.The emittance of the source was investigated for the first time.The output beam currents of high-charge-states of Ar(q>8)were nearly doubled by increasing the plasma electrode aperture from 4mm to 6mm in diameter.To investigate possible enhancements with broadband microwave radiation,a"white"Gaussian noise generator was employed with a TWT amplifier to generate microwave radiation with a bandwidth of～200MHz.The performance of the flat-B ECR ion source was found to be much better with narrow bandwidth radiation when the source was operated in the flat-B region.However,the ion beam intensities and charge state distributions were improved with the broadband radiation when the source was tuned off the flat-B region.     

ECR离子源束流发射度的实验研究

利用最新自行研制的电扫描发射度探测系统, 在ECR离子源上进行了一系列关于ECR离子源引出束流发射度的研究. 这套电扫描发射度探测系统安装在中国科学院近代物理研究所(兰州)的LECR3试验平台的束运线上. 试验中, 通过测量相关参数, 研究了磁场、微波、掺气效应及负偏压效应等对引出束流发射度的影响. 利用实验所得的结果与关于ECR等离子体和离子源束流发射度的半经验理论, 分析推导了离子源各可调参数与ECR等离子体的直接关系, 这为分析探索ECR离子源的工作机制提供了一定的参考依据.     

单粒子态ECR离子源

介绍了一台2.45GHz电子回旋共振(ECR)单电荷离子源的磁场场形,以及它和总束流的关系.并且比较了国际上现有的几台同类型离子源的磁场场形.由此得出了关于2.45GHzECR离子源磁场场形的一些结论.     

A Single Charge State ECR Ion Source

介绍了一台2.45GHz电子回旋共振（ECR）单电荷离子源的磁场场形,以及它和总束流的关系． 并且比较了国际上现有的几台同类型离子源的磁场场形． 由此得出了关于2.45GHz ECR 离子源磁场场形的一些结论．     

高电荷态ECR离子源——LECR3

研制成功了一台新的高电荷态ECR离子源,该离子源主要为原子物理实验提供各种高电荷态离子束流,是基于中国科学院近代物理研究所14.5GHz高电荷态ECR离子源设计建成的,同时在该离子源中应用多种有利于提高束流强度的技术,设计时考虑到采用双频加热,试图通过试验双频加热模式来提高高电荷态离子的产额,并设计建造了一套束流聚焦分析系统,以提高电荷态分辨率和束流传输效率.     

高电荷态ECR离子源

介绍了目前ECR离子源的发展状况和国际上几台典型的ECR离子源.Electron cyclotron resonance (ECR) ion source is the most efficient facility for producing highly charged ions. So far more than 1 emA of O 6+ and 0.02 eμA of U 55+ have been delivered by ECR ion source. In this paper the latest development of ECR ion source is presented and several typical ECR ion sources in the world is introduced.     

Afterglow工作模式下ECR离子源脉冲束的产生

为满足国家大科学工程兰州重离子冷却储存环的要求,在14.5GHz ECR 离子源上进行afterglow工作模式的实验,首次产生了高电荷态脉冲束流Ar¹¹⁺和Ar¹²⁺,给出了初步实验结果,并对结果进行了分析和解释.     

ECR离子源中的微波功率在线测量

在中子发生器中采用ECR离子源是一种新技术。由于受结构的限制,ECR离子源不能像高频源离子源那样通过观察气体放电的颜色判断其工作状态,所以在运行中调节状态非常困难。解决这个问题的方法是：用定向耦合器加微波小功率计的方法在线测量ECR离子源的微波入射功率,通过微波入射功率可以直接得到ECR离子源引出离子束流的大小,从而推断微波信号源的放电过程是否正常,然后调整ECR离子源,最终使中子发生器工作在最佳状态。从ECR离子源后面的引出电极测得的最大束流为20 mA,且工作长时间稳定,当微波功率在160 W~500 W之间时,放电效果较好,离子束流随微波功率的增加而增加。