Infrared electroluminescence from a Si MOS structure with Ge in the oxide

We report on room-temperature infrared electroluminescence (EL) from metal-oxide-semiconductor devices made from Si. We compare the luminescence from RF sputtered oxide films containing SiO₂ with and without Ge by using a composite target and luminescence from a SiO₂ layer made by rapid thermal oxidation. The sputtered films were annealed in the temperature range 600-900 °C. This densifies the films and is likely to reduce the concentration of defects. A luminescence peak located around 1150-1170 nm is observed at current densities as low as 0.1 A/cm². The corresponding photon energy is close to that of the Si band gap. In addition, we observe several broad luminescence bands in the range 1000-1750 nm. These bands get stronger with Ge in the SiO₂ film. Some of these bands have previously been suggested and are directly associated with Ge. Since we observe that the intensity is correlated with the presence of Ge while the mere presence of the bands is not, we discuss the EL bands being due to defects which concentration is influenced by Ge in the oxide.     

Cathodoluminescence from nanocrystalline silicon films and porous silicon

Received: 4 May 1998 / Accepted: 30 October 1998     

Study on size-dependent optical property of 4,4′-dibromobiphenyl nanocrystals

4,4^′-dibromobiphenyl nanocrystals with different sizes in the range from 20 nm to 300 nm were prepared by the reprecipitation method. It was found that their absorption peaks experienced a red shift while the size of the nanocrystals increased. Through analyzing these spectra of the nanocrystals with different sizes, it is suggested that this size-dependent optical property is contributed by two factors, the size effect and the J-aggregate formation. Received: 28 August 2000 / Accepted: 2 March 2001 / Published online: 23 May 2001     

Transient behavior of the strong violet electroluminescence of Ge-implanted SiO2 layers

Si-based light emitters will be a key element of future optoelectronics. One of the most promising approaches is Ge implantation into thin SiO₂ films on crystalline Si. This system exhibits a strong violet electroluminescence with a power efficiency up to 0.5% [18], but the mechanism of electrical excitation is not yet fully understood. In this paper the electrical excitation of the luminescence centers is investigated by means of electrical and electroluminescence transient measurements. It is found that the most probable way to excite luminescence centers is the impact excitation by hot electrons. Whereas the injection is explained by trap-assisted tunneling of electrons from the substrate into the oxide, the electrons will be transported via traps or in the SiO₂ conduction band. Furthermore, the electroluminescence rise and decay time is estimated to be of the order of 100 μs. Received: 26 September 2001 / Published online: 29 November 2001     

Organic electroluminescence channel avoiding triplet excitons

Polarons and bipolarons are main carriers in conducting polymers. It is shown that a bipolaron can open a channel of electroluminescence, which does not involve a triplet exciton, and can enhance the efficiency of electroluminescence. The dynamics of this channel is simulated.     

Size dependence of non-linear optical properties of SiO2 thin films containing InP nanocrystals

SiO₂ composite thin films containing InP nanocrystals were fabricated by radio-frequency magnetron co-sputtering technique. The microstructure of the composite thin films was characterized by X-ray diffraction and Raman spectrum. The optical absorption band edges exhibit marked blueshift with respect to bulk InP due to strong quantum confinement effect. Non-linear optical absorption and non-linear optical refraction were studied by a Z-scan technique using a single Gaussian beam of a He-Ne laser (632.8 nm). We observed the saturation absorption and two-photon absorption in the composite films. An enhanced third-order non-linear optical absorption coefficient and non-linear optical refractive index were achieved in the composite films. The nonlinear optical properties of the films display the dependence on InP nanocrystals size. Received: 27 June 2000 / Accepted: 27 June 2000 / Published online: 13 September 2000     

Electroluminescence of silicon nanocrystals in MOS structures

We have studied the structural, electrical and optical properties of MOS devices, where the dielectric layer consists of a substoichiometric SiO_x (x<2) thin film deposited by plasma-enhanced chemical vapor deposition. After deposition the samples were annealed at high temperature (>1000 °C) to induce the separation of the Si and the SiO₂ phases with the formation of Si nanocrystals embedded in the insulating matrix. We observed at room temperature a quite intense electroluminescence (EL) signal with a peak at ∼850 nm. The EL peak position is very similar to that observed in photoluminescence in the very same device, demonstrating that the observed EL is due to electron–hole recombination in the Si nanocrystals and not to defects. The effects of the Si concentration in the SiO_x layer and of the annealing temperature on the electrical and optical properties of these devices are also reported and discussed. In particular, it is shown that by increasing the Si content in the SiO_x layer the operating voltage of the device decreases and the total efficiency of emission increases. These data are reported and their implications discussed. Received: 31 August 2001 / Accepted: 3 September 2001 / Published online: 17 October 2001     

Group-IV nanocluster formation by ion-beam synthesis

A short review of our investigations devoted to the use of ion-beam-synthesized nanoclusters for silicon-based light emission and nonvolatile memory effects is presented. Blue-violet light emission is demonstrated based on Ge-implanted silicon dioxide layers thermally grown on silicon substrates. This version of silicon-based light emission relies on Ge-related defects in the amorphous ≡Si–O–Si≡ network. The photoluminescence and electroluminescence are excited by a singlet S₀–S₁ transition of a neutral oxygen vacancy and by electron injection from the silicon substrate into the silicon dioxide layer, respectively. Whereas the photoluminescence excitation is a well-known mechanism, for the case of electroluminescence an interpretation was performed for the first time in the course of our studies. It was found that the most probable way to excite luminescence centers is the impact excitation by hot electrons. Whereas the injection is explained by trap-assisted tunneling of electrons from the substrate into the oxide, the electrons will be transported via traps or in the SiO₂ conduction band. The application of the silicon-based light-emitting devices for an integrated optocoupler arrangement is described. Another application of nanoclusters is based on the investigation of thin Si-implanted silicon dioxide layers for nonvolatile memory devices. First promising results demonstrate that the observed programming window can reach several volts and the devices exhibit excellent retention behavior. A 256 K-nv-SRAM is demonstrated showing a programming window of >1 V for write pulses of 12 V/8 ms. Received: 21 August 2002 / Accepted: 21 August 2002 / Published online: 12 February 2003 RID="*" ID="*"Corresponding author. Fax: +49-351/260-3411, E-mail: w.skorupa@fz-rossendorf.de     

Temperature dependence of electroluminescence from Si-based light emitting diodes with β-FeSi2 particles active region

Electroluminescence (EL) properties of Si-based light emitting diodes with β-FeSi₂ particles active region grown by reactive deposition epitaxy are investigated. EL intensity of β-FeSi₂ particles versus excitation current densities has different behaviors at 8, 77 K and room temperature, respectively. The EL peak energy shifted from 0.81 to 0.83 eV at 77 K with the increase of current density from 1 to 70 A/cm². Temperature dependence of the peak energy can be well fitted by semi-empirical Varshni's law with the parameters of α=4.34 e-4 eV/K and β=110 K. These results indicate that the EL emission originates from the band-to-band transition with the band gap energy of 0.824 eV at 0 K.     

Optical characterization of thermally evaporated thin films of As40S40Se20 chalcogenide glass by reflectance measurements

40 S₄₀Se₂₀, deposited by thermal evaporation, were obtained in the 400 nm to 2200 nm spectral region. The optical constants of this amorphous material were computed using an optical characterization method based mainly on the ideas of Minkov and Swanepoel of utilising the upper and lower envelopes of the spectrum, which allows us to obtain both the real and imaginary parts of the complex refractive index, and the film thickness. Thickness measurements made by a surface-profiling stylus have been carried out to cross-check the results obtained by the optical method. The dispersion of the refractive index is discussed in terms of the single-oscillator Wemple–DiDomenico model. The optical band gap has been determined from absorption coefficient data by Tauc’s procedure. Finally, the photo-induced and thermally induced changes in the optical properties of a-As₄₀S₄₀Se₂₀ thin films were also studied, using both transmission and reflection spectra. Received: 11 February 1998/Accepted: 16 February 1998     

Thermal quenching of electroluminescence assisted by an electric field in thin films of tris-(8-hydroxyquinolinato) aluminum (III)

Temperature dependence of the electroluminescence (EL)-current efficiency of tris-(8-hydroxyquinolinato) aluminum (III) (Alq₃)-based organic light-emitting diodes (OLEDs) operated at a constant current density was investigated. The effects of temperature and electric field on photoluminescence (PL) efficiency of Alq₃ thin layers were also investigated. On the basis of these results, it was found that the EL efficiency decreases more markedly with increasing temperature than does PL efficiency. The temperature dependence of the EL efficiency can be interpreted in terms of the thermal dissociation of excitons that is assisted by the electric field.     

Growth and characterization of oriented cadmium sulphide nanocrystals under Langmuir-Blodgett monolayer of arachidic acid

Cadmium sulphide nanocrystals were grown at room temperature (20 °C) under arachidic acid monolayers floating over an aqueous solution of CdCl₂ inside an enclosed Langmuir-Blodgett set-up, through slow infusion of H₂S gas. X-ray diffraction spectra suggest an oriented growth of the crystallites. The particle sizes were found to increase with duration of exposure to the H₂S gas. Atomic force microscopy indicated that the particles were nearly circular pellets with uniform morphology throughout. In Raman spectra, the FWHM of the LO phonon was found to be large (≈20 cm^-1) for all the films grown with different exposure times in H₂S gas, and was found to reduce to 8 cm^-1 after annealing a typical sample at 500 °C for 45 min. Received: 30 September 1998 / Accepted: 29 March 1999 / Published online: 11 August 1999     

Electroluminescence and its excitation mechanism of SiOx films deposited by electron-beam evaporation

Blue electroluminescence from SiO_x films deposited by electron beam evaporation was observed. This blue emission blueshifted from 450 to 410 nm with increasing applied voltage. The dependences of blue emission on applied voltage, frequency and conduction current were studied. Our experimental data support that blue emission from SiO_x films is the result of both recombination of charge carriers injected from opposite electrodes and impact excitation of hot electrons, the recombination of carriers injected is dominant in low and medium electric fields but hot electron impact excitation is dominant under high electric fields.     

High refractive index and transparent heavy metal oxide glassy thin films

Heavy metal oxide thin films of the ternary system Nb₂O₅–GeO₂–PbO have been prepared by pulsed laser deposition in an O₂ environment from either glassy or crystalline bulk samples. The range of ([Pb]+[Nb]) content in which the films are optically homogeneous and transparent is much broader (0.5–1.0) than that of the bulk samples considered in the present work (0.55–0.62). The imaginary part of the refractive index is very low in all cases (k<10^-3), whereas the real part increases linearly with the ([Pb]+[Nb]) content up to values as high as 2.35. The optical energy gap has been found to be strongly dependent on [Pb], whereas it is almost independent of [Nb]. This dependence is discussed in terms of the role of Pb and Nb as network modifiers or formers. Received: 5 August 2002 / Accepted: 8 August 2002 / Published online: 17 December 2002 RID="*" ID="*"Corresponding author. Fax: +34-91/564-5557, E-mail: j.gonzalo@io.cfmac.csic.es     

On thickness dependence of electrical and optical properties of Te thin films

Received: 1 July 1997/Accepted: 6 August 1997     

Two modes of electroluminescence from single‐walled carbon nanotubes

The electroluminescence from single‐walled carbon nanotube field effect transistors is spectrally resolved, and shows two distinct modes of light emission. The vast majority of nanotubes have spectrally broad emission consistent with the spectrum of blackbody radiation. Much more rarely, superposed on the broad emission is a single narrow (<50 meV) peak which is consistent with expectation for electron–hole recombination. The narrow emission is strong even at lower biases and in general has greater peak intensity than the broadband emission. (© 2009 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Synthesis and electroluminescence properties of benzothiazole derivatives

Benzothiazole-based blue fluorescent materials N-(4-(benzo[d]thiazol-2-yl)phenyl)-N-phenylbenzenamine (BPPA) and N-(4-(benzo[d]thiazol-2-yl)phenyl)-N-phenylnaphthalen-1-amine (BPNA) were synthesized for use in organic light-emitting diodes (OLEDs). Electroluminescent device with a configuration of ITO/NPB/BPPA/BCP/Alq₃/LiF/Al showed a maximum brightness of 3760 cd/m² at 14.4 V with the CIE coordinates of (0.16, 0.16). A current efficiency of 3.01 cd/A and an external quantum efficiency of 2.37% at 20 mA/cm² were obtained from this device. Molecules derived from BPPA and BPNA with incorporated dicyanomethylidene, which is a functional group for most red fluorescent molecules, were designed, synthesized and characterized to study the red fluorescence properties of the benzothiazole derivatives.     

Optical diffuse reflectance spectra of GaSb nanocrystals embedded in SiO2 matrix by radio-frequency magnetron co-sputtering

Nanocrystalline GaSb embedded in SiO₂ films was grown by radio-frequency magnetron co-sputtering. X-ray diffraction pattern and transmission electron microscopy (TEM) confirm the existence of GaSb nanocrystals in the SiO₂ matrix. The average size of GaSb nanoparticles is in the range of 3 to 11 nm. Diffuse reflectance spectra were used to characterize the small change of the band gap of the semiconductor. The diffuse reflectance spectra shows that the absorption peaks have a large blueshift of about 4.0 eV of the absorption relative to that of bulk GaSb. It has been explained by quantum confinement effects. Room temperature optical transmission spectra show that the absorption edge exhibits a very large blueshift of about 2.1 eV with respect to that of bulk GaSb in agreement with quantum confinement. Received: 28 July 1999 / Accepted: 27 October 1999 / Published online: 1 March 2000     

Visible photoluminescence from Ge+-implanted SiO2 films thermally grown on crystalline Si

+ -implanted SiO₂ films is studied as a function of different fabricating conditions (implantation dose, annealing temperature and time). The SiO₂ films containing Ge nanocrystals exhibit two photoluminescence (PL) bands peaked at 600 nm and 780 nm. There are two excitation bands in the PL excitation (PLE) spectra. With variation in Ge nanocrystal size, the PL and PLE peak energies show no appreciable shift. The PL and PLE spectral analyses suggest that during the PL process, electron–hole pairs are generated by the E(l) and E(2) direct transitions inside Ge nanocrystals, which then radiatively recombine via luminescent centers in the matrix or at the interface between the nanocrystal/matrix. Received: 27 January 1998/Accepted: 18 March 1998     

The relationship between the macroscopic properties of PECVD silicon nitride and oxynitride layers and the characteristics of their networks

Silicon nitride and oxynitride films have been deposited on silicon wafers using plasma-enhanced chemical vapour deposition. Various amounts of ammonia, silane and nitrous oxide gases were applied at fixed total gas flow and at the same deposition temperature. The dependence of the macroscopic properties of the layers such as refractive index, internal stress and etch rate on the reaction atmosphere during deposition has been demonstrated. The chemical structure of amorphous layers was studied using infrared spectroscopy. The network was found to be characterised by SiN_xO_yH_z tetrahedra, joined to each other by common corners. The characteristic vibrational bands due to species that join tetrahedral units (N(-Si≡)₃, ≡Si-N-Si≡, ≡Si-O-Si≡) and species that stop this interconnection (Si-H, N-H) were determined and discussed with reference to the corresponding species available during deposition. The analysis resulted in the determination of the relationship between the chemical structure of the network and the layer’s refractive index, internal stress and etch rate. Received: 24 July 2000 / Accepted: 30 May 2001 / Published online: 30 August 2001