Study of photoexcited plasma in p-doped GaAs beveled structures by micro-Raman spectroscopy

The generation and properties of photoexcited steady-state plasma of electrons and holes in bevel-shaped p-type GaAs structures were studied by micro-Raman spectroscopy. The best correspondence of theoretical calculations with experimental spectra was obtained by using of photoexcited carrier concentration of 1.1 × 10¹⁷ cm⁻³ and mobility 600 and 40 cm²/V s for the photoexcited steady-state electrons and holes, respectively. The analysis of the plasma behavior and its coupling with longitudinal optical phonons at different positions along the bevel shows that the mode resulting from this coupling causes the changes of Raman intensities recorded in frequency positions of transversal (TO) and longitudinal (LO) optical phonon peaks. These changes were further studied and physical interpretation was provided. The dependence of their ratio in the region affected by surface depletion layer can be fitted by linear function very well. The linearity was observed at all studied structures. This behavior on beveled structures prepared by special treatment with very low bevel angle can be used for analysis of the p-type GaAs nanostructures, particularly for measurement and extraction of a doping profile of p-type impurities in GaAs with very high resolution in nm scale.     

Morphological and micro-Raman investigations on Ar-ion irradiated nanostructured GaAs surface

Low energy Ar⁺-ion irradiation at normal incidence is used to fabricate nanostructured GaAs surface. Atomic force microscopy (AFM) images reveal the formation of GaAs surface nanodots with an average size of about 25-35 nm. The swelling of irradiated surface is observed at a higher energy due to the ion beam-induced porosity in the amorphized GaAs surface. Micro-Raman scattering shows a gradual increase in the downward shift and line shape broadening of optical phonon modes from the nanostructured GaAs prepared with increasing ion dose and beam energy. The rapid broadening of the transverse-optical phonon mode at a higher energy and dose represents the onset of plastic deformation of the irradiated surface. Furthermore, the influence of rapid thermal annealing (RTA) shows a reverse LO and TO phonon peakshift and the change in the lineshape due to reduction of the amorphous disorder.     

One-phonon-assisted resonant electron Raman scattering of GaAs quantum dots in an AlAs matrix

We have presented a theoretical calculation of the differential cross section (DCS) for the electron Raman scattering (ERS) process associated with the bulk-like longitudinal optical (LO) and interface optical (IO) phonon modes in semiconductor quantum dots (QDs). Electron states are considered to be confined within the QDs. We consider the Fröhlich electron-phonon interaction in the framework of the dielectric continuum approach. We study selection rules for the processes. Some singularities in the Raman spectra are found and interpreted. A discussion of the phonon behavior for QDs with large and small size is presented. The numerical results are also compared with that of experiments.     

Photoemission of spin-polarized electrons from negative electron affinity GaAsP

GaAs_0.62P_0.38 activated to negative electron affinity and irradiated with circularly polarized light of a wavelength shorter than approximately 680 nm emits electrons whose spins are mainly oriented antiparallel to the photon spins. At 650 nm a degree of electron spin polarization around 40% is observed. The spectrum of spin polarization of the photoelectrons is similar to that known from GaAs cathodes but is shifted to shorter wavelengths. 25 μA current of spin-polarized electrons were achieved with a 5 mW He-Ne laser.     

Growth and optical characterization of single quantum well structure of submonolayer ZnS/ZnTe

Single quantum wells of submonolayer ZnS/ZnTe were grown between ZnTe layers using hot wall epitaxy method with fast-movable substrate configuration. As ZnS well widths decrease from 1 to 0.15 monolayer, the photoluminescence peaks shift to higher energies from 2.049 to 2.306 eV, and the photoluminescence intensities increase. As ZnS well width decrease, the PL spectra show the lower-energy tails and consequently the increased PL FWHMs. This is a result of a convolution of two PL peaks from two-dimensional and zero-dimensional quantum islands, supported by a still lived lower-energy peaks of zero-dimensional quantum islands above 50 K. The energy shift in the power dependence of photoluminescence spectra is proportional to the third root of the excitation density. These behaviors can be described by the formation of submonolayer type-II ZnS/ZnTe quantum well structure, and the coexistence of two-dimensional and one-dimensional islands in ZnS layers.     

Effect of changing incident wavelength on Raman features of optical phonons in SiC nanorods and TaC nanowires

Novel Raman scattering in polar semiconductor SiC and TaC one-dimensional materials have been carried out. With increasing incident laser wavelength from 488 to 633 nm there is a huge difference in Raman intensity enhancement for the LO/IF peaks and the TO peak. This has been interpreted as due to Fröhlich interaction and abundant defects in polar nano-scale semiconductor materials.     

Comparison of the photoemission behaviour between negative electron affinity GaAs and GaN photocathodes

In view of the important application of GaAs and GaN photocathodes in electron sources, differences in photoemission behaviour, namely the activation process and quantum yield decay, between the two typical types of III-V compound photocathodes have been investigated using a multi-information measurement system. The activation experiment shows that a surface negative electron affinity state for the GaAs photocathode can be achieved by the necessary Cs-O two-step activation and by Cs activation alone for the GaN photocathode. In addition, a quantum yield decay experiment shows that the GaN photocathode exhibits better stability and a longer lifetime in a demountable vacuum system than the GaAs photocathode. The results mean that GaN photocathodes are more promising candidates for electron source emitter use in comparison with GaAs photocathodes.     

Raman and point contact current-voltage characterization of laser-induced diffusion in GaAs

Raman scattering and point contact current-voltage (PCIV) measurements were used as characterization tools of tin-diffused GaAs layers. Diffusion was induced by irradiating GaAs substrates covered with thin tin layers single pulses of a ruby laser. Samples processed with the lowest energies show strong damage and incomplete electrical activation as deduced from Raman and PCIV measurements, respectively. Raman microprobe in depth analysis and PCIV profiles also suggest the presence of a damaged region with incomplete electrical activation at the boundary between the molten layer and the solid substrate.     

Micro-Raman spectroscopy in polycrystalline CuInSe2 formation

The crystalline formation of CuInSe₂ thin films has been investigated using micro-Raman spectroscopy and AES composition analysis. It is confirmed that the Raman peaks are stongly dependent on the surface morphology and the Cu:In:Se ratio. In the films annealed at 315°C, crystalline grains larger than 2 m show Raman peaks at 174 cm^–1 and 258 cm^–1. The In content is very low and the Cu:Se ratio is about 1:1 in these grains. The low In concentration is thought to be due to the formation of In₂O₃ on the surface. On the other hand, random structures of 1–2 m grains found in films annealed at temperatures below 305°C show peaks at 174 cm^–1 and 186 cm^–1 instead of 258 cm^–1 and have a Cu:In:Se ratio of 1:1:3–4. Thus the 186 cm^–1 peak is thought to be related to a Cu, In-deficient phase when compared to stoichiometric CuInSe₂. The optimum annealing condition was found by analyzing the Raman spectra and composition of different crystalline CuInSe₂ grains. Films annealed under this condition exhibited a clear Raman peak at 174 cm^–1 and consisted of clusters of crystals less than 1 m in size.     

Growth and characterization of Y2O3 thin films

Y₂O₃ thin films were grown on silicon (1 0 0) substrates by pulsed-laser deposition at different substrate temperatures and O₂ pressures. The structure and composition of films are studied by using X-ray diffraction (XRD) and X-ray photoelectron spectroscopy (XPS). The Y₂O₃ thin films deposited in vacuum strongly oriented their [1 1 1] axis of the cubic structure and the film quality depended on the substrate temperature. The magnitude of O₂ pressure obviously influences the film structure and quality. Due to the silicon diffusion and interface reaction during the deposition, yttrium silicate and SiO₂ were formed. The strong relationship between composition and growth condition was discussed.     

Evolution of Photocurrent during Coadsorption of Cs and O on GaAs （100）

The photocurrent and spectral response characteristics of gallium arsenide （GaAs） are obtained by a multiinformation measurement system, and the evolution of the photocurrent versus the Cs：O flux ratio is investigated. The experimental results show that the photocurrent increases approximately exponentially after the first exposure to Cs until a maximum sensitivity is reached, the detailed evolution process and the ultimate photocurrent are different for different samples. These differences are analysed, and according to the process of coadsorption of Cs and oxygen on GaAs, an equation is presented to explain the increase of photocurrent.     

负电子亲和势光电阴极量子效率公式的修正

量子效率是表征负电子亲和势（NEA）光电阴极发射性能的最重要的特性参数,准确建立量子效率公式为揭示各个阴极参量对整体性能的影响以及NEA光电阴极的优化设计提供了重要的理论指导.在对NEA光电阴极体内及表面光电发射过程的分析基础上,考虑入射光子能量、表面能带弯曲区以及表面势垒对电子发射的影响,对表面逸出概率和电子衰减长度进行了修正,并利用积分法推导了NEA光电阴极的量子效率公式,其理论预测曲线与实验曲线基本一致,从而验证了修正公式的实用性.为NEA光电阴极的研究提供了有效的理论参考依据. 关键词： 负电子亲和势光电阴极 量子效率 能带弯曲区 衰减长度     

Effect of substrate temperature and annealing temperature on the structural, electrical and microstructural properties of thin Pt films by rf magnetron sputtering

Influence of both substrate temperature, T_s, and annealing temperature, T_a, on the structural, electrical and microstructural properties of sputtered deposited Pt thin films have been investigated. X-ray diffraction results show that as deposited Pt films (T_s = 300, 400 °C) are preferentially oriented along (1 1 1) direction. A little growth both along (2 0 0) and (3 1 1) directions are also noticed in the as deposited Pt films. After annealing in air (T_a = 500-700 °C), films become strongly oriented along (1 1 1) plane. With annealing temperature, average crystallite size, D, of the Pt films increases and micro-strain, e, and lattice constant, a₀, decreases. Residual strain observed in the as deposited Pt films is found to be compressive in nature while that in the annealed films is tensile. This change in the strain from compressive to tensile upon annealing is explained in the light of mismatch between the thermal expansion coefficients of the film material and substrate. Room temperature resistivity of Pt films is dependant on both the T_s and T_a of the films. Observed decrease in the film resistivity with T_a is discussed in terms of annihilation of film defects and grain-boundary. Scanning electron microscopic study reveals that as the annealing temperature increases film densification improves. But at an annealing temperature of ∼600 °C, pinholes appear on the film surface and the size of pinhole increases with further increase in the annealing temperature. From X-ray photoelectron spectroscopic analysis, existence of a thin layer of chemisorbed atomic oxygen is detected on the surfaces of the as deposited Pt films. Upon annealing, coverage of this surface oxygen increases.     

Transition of 3D to 2D growth modes of InAs grown on GaAs

We report a method to grow thin strain-released InAs layer on GaAs (1 0 0) substrates by molecular beam epitaxy. We have shown that by controlling the growth parameters, a thin 2D InAs layer can be grown during initial stages, which eventually serves as a buffer layer to trap dislocations and epitaxial regrowth of InAs on this buffer results in high crystal quality. The size dependence of the InAs islands formed during initial stages with growth time has been studied by atomic force microscopy. With continuous short-time epitaxial growth during various stages, the InAs growth mode transfers from 3D to 2D. The introduction of dislocations into InAs epitaxial islands and their behavior during initial growth stage has been theoretically studied. The theoretical results are in remarkable agreement with the experimental results and shows that once the film is formed, the film strain is totally relaxed. The 200 nm thick InAs epilayer grown on this buffer shows a narrow X-ray diffraction peak. Such InAs strain-released buffer layer would be useful for regrowth of high In content based materials on top of it for electronics and optoelectronics device applications.     

Purely quadratic dispersion of surface plasmon in Ag/Ni(111): the influence of electron confinement

Surface plasmon dispersion in nanoscale thin Ag films deposited onto the Ni(111) surface was investigated by angle‐resolved electron energy loss spectroscopy. We found that the dispersion curve contains only the quadratic term. The vanishing of the linear term was ascribed to the presence in the film of Ag 5sp‐related quantum well states. Screening effects enhanced by electron confinement in Ag quantum well states push the position of the centroid of the induced charge of the surface plasmon less inside the interface compared to other Ag systems, rendering null the linear coefficient of the dispersion curve. (© 2008 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Si DX centers in GaAs at large hydrostatic pressures

A number of experimental and theoretical studies indicate that DX centers in GaAs, its alloys and other III–V semiconductors have negative U properties. Using far infrared localized vibrational mode (LVM) spectroscopy of Si donors in GaAs under large hydrostatic pressure in a diamond anvil cell we have discovered an LVM of the Si DX center. From the ratio of the LVM absorption lines of Si_Ga and Si_DX and the compensation in our GaAs samples, we show unambiguously that two electrons are trapped when the ionized shallow Si donors transform into negatively charged DX centers, in full agreement with the negative U model.Dedicated to H.-J. Queisser on the occasion of his 60th birthday     

Influence of initial oxygen on the formation of thiol layers

In this study, X-ray photoelectron spectroscopy (XPS) has been used to study thin organic films. For comparison, monolayers were formed on clean and air-exposed metal substrates. Obtained results show that thiols remove contamination oxygen from gold, silver, platinum and copper surfaces. The tightly packed thiolate layers can be formed. In addition, oxygen does not take part in the final bonding of molecules to the surfaces.     

The structure of an Fe monolayer on the Ni (111) surface. A density-functional study using the generalized gradient approximation

Using a density-functional method that employs linear combinations of atomic orbitals as basis sets, nonlocal norm-conserving pseudopotentials and the generalized gradient approximation for exchange and correlation, we found that at 0 K the atoms of an Fe monolayer on the Ni (111) surface occupy hcp rather than fcc sites, in keeping with previous predictions made using the ab initio all-electron full-potential linearized augmented plane wave method with the local spin density approximation.     

Spot focus size effect in spectroscopic ellipsometry of thin films

A focused as opposed to collimated light beam is typically used as probe in order to achieve a smaller as well as more intense light interrogation area in spectroscopic ellipsometry of thin films. In this work, we performed geometric ray analysis at the illumination and recording ends of such a system. The numerical results revealed substantial changes in (i) average optical path length and (ii) optical path length differences, which varied according to wavelength despite the film thickness remaining uniform. These results were able to consistently explain the anomalies found when different focus probe beam sizes were used in experimental spectroscopic ellipsometry measurements.     

Electronic and geometric structure of methyl oxirane adsorbed on Si(1 0 0)2 × 1

Electronic and geometric properties of the adsorbate-substrate complex formed upon adsorption of methyl oxirane on Si(1 0 0)2 × 1 at room temperature is reported, obtained with synchrotron radiation-induced valence and core-level photoemission. A ring-opening reaction is demonstrated to occur, followed by a five-membered ring formation involving two of the Si surface atoms bound to a surface dimer. Core-level photoemission spectra support the ring-opening reaction and the SiO and SiC bond formation, while from the valence spectra a more extended molecular fragmentation can be ruled out. We discuss the most likely geometry of the five-membered ring.