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1.
We used the scanning tunneling microscope (STM) to examine single-stranded deoxyribonucleic acid (DNA) oligomers deposited on a metal surface. Because STM can be used to study the electrical properties of materials via the tunneling spectra, we used it to visualize DNA oligomers at the single molecule resolution. The 5′-hexachloro-fluorescein phosphoramidite (HEX)-labeled oligomers (sequence, AGCTTC) were observed on an atomically flat Cu(1 1 1) surface. At large tip-sample distances at large set-point biases, the lowest unoccupied molecular orbit (LUMO) peak of the empty state can be observed for the dye molecules on the tunneling spectra. When this distance becomes small, similar spectra as for the Cu substrate were observed for the dye molecule on the LUMO-related peak. Cu gave peaks at small bias voltages in the filled state. From comparison of these peaks on each subunit of the molecules, the measured values of dI/dV on HEX were smaller to those on Cu because of the large size of the HEX molecule, but the normalized values of dI/dV/(I/V) were apparently equal. We believe that the tunneling current is able to pass through the HEX molecules to the Cu substrate, thus reflecting the density of the Cu(1 1 1) surface. Molecular size therefore affects the intensity of dI/dV. LUMO-related peaks sometimes cannot be observed for HEX because of conformational differences, but Cu peaks can almost always be observed for HEX molecules. These peaks for the counter ions are almost the same as those for the Cu substrate. Thus, tunneling spectra can assist in the molecular mapping of DNA.  相似文献   

2.
The atomic structure and charge transfer on the Ge (1 0 5) surface formed on Si substrates are studied using scanning tunneling microscopy and spectroscopy (STM and STS). The bias-dependent STM images of the whole Ge (1 0 5) facets formed on a Ge “hut” structure on Si (0 0 1) are observed, which are well explained by the recently confirmed structure model. The local surface density of states on the Ge (1 0 5) surface is measured by STS. The localization of the electronic states expected from charge transfer mechanism is observed in the dI/dV spectra. The surface band gap is estimated as 0.8-0.9 eV, which is even wider than the bulk bandgap of Ge, indicating the strong charge transfer effect to make the dangling bonds stable. The shape of normalized tunnel conductance agrees with the theoretical band structure published recently by Hashimoto et al.  相似文献   

3.
A study on interface states density distribution and characteristic parameters of the In/SiO2/p-Si (MIS) capacitor has been made. The thickness of the SiO2 film obtained from the measurement of the corrected capacitance in the strong accumulation region for MIS Schottky diodes was 220 Å. The diode parameters from the forward bias I-V characteristics such as ideality factor, series resistance and barrier heights were found to be 1.75, 106-112 Ω and 0.592 eV, respectively. The energy distribution of the interface state density Dit was determined from the forward bias I-V characteristics by taking into account the bias dependence of the effective barrier height. The interface state density obtained using the I-V characteristics had an exponential growth, with bias towards the top of the valance band, from 9.44×1013 eV−1 cm−2 in 0.329-Ev eV to 1.11×1013 eV−1 cm−2 in 0.527-Ev eV at room temperature. Furthermore, the values of interface state density Dit obtained by the Hill-Coleman method from the C-V characteristics range from 52.9×1013 to 1.11×1013 eV−1 cm−2 at a frequency range of 30kHz-1 MHz. These values of Dit and Rs were responsible for the non-ideal behaviour of I-V and C-V characteristics.  相似文献   

4.
The current-voltage (I-V) characteristics of Al/SiO2/p-Si metal-insulator-semiconductor (MIS) Schottky diodes were measured at room temperature. In addition the capacitance-voltage (C-V) and conductance-voltage (G-V) measurements are studied at frequency range of 10 kHz-1 MHz. The higher value of ideality factor of 3.25 was attributed to the presence of an interfacial insulator layer between metal and semiconductor and the high density of interface states localized at Si/SiO2 interface. The density of interface states (Nss) distribution profile as a function of (Ess − Ev) was extracted from the forward bias I-V measurements by taking into account the bias dependence of the effective barrier height (Φe) at room temperature for the Schottky diode on the order of ≅4 × 1013 eV−1 cm−2. These high values of Nss were responsible for the non-ideal behaviour of I-V and C-V characteristics. Frequency dispersion in C-V and G-V can be interpreted only in terms of interface states. The Nss can follow the ac signal especially at low frequencies and yield an excess capacitance. Experimental results show that the I-V, C-V and G-V characteristics of SD are affected not only in Nss but also in series resistance (Rs), and the location of Nss and Rs has a significant on electrical characteristics of Schottky diodes.  相似文献   

5.
The effects of surface preparation and illumination on electric parameters of Au/InSb/InP(100) Schottky diode were investigated, in the later diode InSb forms a fine restructuration layer allowing to block In atoms migration to surface. In order to study the electric characteristics under illumination, we make use of an He-Ne laser of 1 mW power and 632.8 nm wavelength. The current-voltage I(VG), the capacitance-voltage C(VG) measurements were plotted and analysed. The saturation current Is, the serial resistance Rs and the mean ideality factor n are, respectively, equal to 2.03 × 10−5 A, 85 Ω, 1.7 under dark and to 3.97 × 10−5 A, 67 Ω, 1.59 under illumination. The analysis of I(VG) and C(VG) characteristics allows us to determine the mean interfacial state density Nss and the transmission coefficient θn equal, respectively, to 4.33 × 1012 eV−1 cm−2, 4.08 × 10−3 under dark and 3.79 × 1012 eV−1 cm−2 and 5.65 × 10−3 under illumination. The deep discrete donor levels presence in the semiconductor bulk under dark and under illumination are responsible for the non-linearity of the C−2(VG) characteristic.  相似文献   

6.
Laser induced fluorescence spectra of HoS have been obtained using a Broida oven and a ring dye laser. Dispersed fluorescence spectra showed transitions from a common upper state, A[14.79]8.5 to the v = 0 and 1 vibrational levels of three low lying states, labelled X8.5, W[0.25]7.5 and V[0.98]7.5 (the states are labelled [10−3T0]Ω according to their energy and Ω assignment). High resolution excitation spectra were obtained for all six transitions and a rotational analysis yielded the following principal constants, in cm−1, for the X, W and V states, respectively: T0 = 0, 251.8713(31), 980.6969(37); Be = 0.121903(42), 0.121729(37), 0.122561(34); ΔG1/2 = 463.8811(46), 462.9411(45), 461.2084(127). For the A state, T0 = 14794.6987(28) cm−1 and B0 = 0.112596(29) cm−1. The three low lying states are shown to arise from the Ho2+[4f10(5I8)6s]S2− configuration in accord with Ligand Field Theory predictions. The atomic origin of each of the three low lying electronic states was determined from the observed resolved hyperfine structure.  相似文献   

7.
A series of I(V) characteristics and bias-dependent differential resistance dV/dI(V) curves of point contacts made between a single crystal of two-band superconductor MgB2 and Cu were measured in magnetic fields up to 9 T. The magnetic field dependences of the excess current in the I(V) curves were obtained and analyzed using Koshelev and Golubov's [Phys. Rev. Lett. 90, 177002 (2003)] theoretical results for the mixed state of a dirty two-band superconductor. Introducing a simple model for the excess current in the point contact in the mixed state, our data can be qualitatively described using the theoretical magnetic field dependence of the superconducting order parameter of the σ and π-bands and the averaged electronic density of states in MgB2.  相似文献   

8.
We have studied hydrogen adsorption on the Ge(1 1 1) c(2 × 8) surface using scanning tunneling microscopy (STM) and angle-resolved photoelectron spectroscopy (ARPES). We find that atomic hydrogen preferentially adsorbs on rest atom sites. The neighbouring adatoms appear higher in STM images, which clearly indicates a charge transfer from the rest atom states to the adatom states. The surface states near the Fermi-level have been followed by ARPES as function of H exposure. Initially, there is strong emission from the rest atom states but no emission at the Fermi-level which confirms the semiconducting character of the c(2 × 8) surface. With increasing H exposure a structure develops in the close vicinity of the Fermi-level. The energy position clearly indicates a metallic character of the H-adsorbed surface. Since the only change in the STM images is the increased brightness of the adatoms neighbouring a H-terminated rest atom, we identify the emission at the Fermi-level with these adatom states.  相似文献   

9.
Negative differential resistance (NDR) has been observed for individual 2,2,6,6-tetramethyl-1-piperidinyloxy (TEMPO) molecules on Si(1 1 1) in ultra high vacuum (UHV) scanning tunneling microscopy (STM) and spectroscopy (STS) measurements at room temperature. NDR effects were observed exclusively at negative bias voltage using an n-type Si(1 1 1) sample. At 77 K no NDR effects were observed, but the I(V) curves were similar in shape to those recorded on bare Si(1 1 1) sites. TEMPO was observed to adsorb preferentially at corner adatom sites of the Si(1 1 1)-7 × 7 structure. Although the Si(1 1 1)-7 × 7 reconstruction was conserved, local defects were frequently observed in the vicinity of the TEMPO adsorbates.  相似文献   

10.
Wu and Tong proposed the calculation method of Patterson function obtained directly from the LEED I-V curves which shows the relative position of surface atoms as an image. We have made the calculation program of Patterson function and applied to the structural analysis of the Si(1 1 1)1 × 1-Fe surface. Surface structure was able to be expressed almost correctly by the Patterson function obtained from the theoretical I-V curves for the model structure. In the Patterson function obtained from the experimental I-V curves, the locational relation between the atoms of subsurface layer was in agreement with the CsCl type structure. More over, because the faint peak, by which we can distinguish the model, can be seen, it seems that the model B8 is preferable to the model A8. This result is consistent with the model shown by Walter et al.  相似文献   

11.
In this study, current-voltage (I-V) and capacitance-voltage (C-V) characteristics of metal-semiconductor (MS) Zn/p-Si and Sn/p-Si Schottky diodes, with high resistivity silicon structures, are investigated. The parameters of series resistance (RS), the ideality factor (n) and the barrier height (Φb) are determined by performing different plots from the forward bias current-voltage (I-V) and reverse bias capacitance-voltage (C-V) characteristics. Thus, the barrier heights (Φb) for the Si Schottky diodes obtained between 0.725 and 1.051 eV, the ideality factor (n) between 1.043 and 1.309, and the series resistance (RS) between 12.594 and 12.950 kΩ. The energy distribution of interface states density was determined from the forward bias I-V characteristics by taking into account the bias dependence of the effective barrier height. It was concluded that the density of interface states in the considered energy range are in close agreement with each other values obtained for Zn/p-Si and Sn/p-Si Schottky diodes.  相似文献   

12.
The growth processes and structures of Ga layers formed on a Si(0 0 1) surface have been studied by scanning tunneling microscopy (STM) and abinitio calculation. The precursor states of the Ga clusters that compose the Si(0 0 1) 8 × n-Ga (n = 4, 5, 6) structures are observed in addition to the 2 × 2- and 4 × 2-Ga structures at a Ga coverage of 0.55 ML at 300 °C. There are two types of precursor clusters whose protrusions are observed as different shapes in filled-state STM images. We compare the observed STM images with the simulated ones to identify the possible structural models. From the results, we determine the structure of each precursor cluster. On the basis of the results, the formation processes of the cluster are discussed.  相似文献   

13.
In this work we have compared the SiO2/SiC interface electrical characteristics for three different oxidations processes (dry oxygen, water-containing oxygen and water-containing nitrogen atmospheres). MOS structures were fabricated on 8° off-axis 4H-SiC(0 0 0 1) n- and p-type epi-wafers. Electrical characteristics were obtained by I-V measurements, high-frequency capacitance-voltage (C-V) and ac conductance (G-ω) methods. Comparing the results, one observes remarkable differences between samples which underwent different oxidation routes. Among the MOS structures analyzed, the sample which underwent wet oxidation with oxygen as carrier gas presented the higher dielectric strength and lower values of interface states density.  相似文献   

14.
By scanning tunneling microscopy and spectroscopy (STM/S) and high-resolution core-level photoemission using synchrotron radiation, we have investigated the atomic structure and electronic properties of Sb-induced 2 × 1 reconstruction on Ge(1 1 1). Our results support well the zigzag-chain model proposed for this phase in the literature; in particular, the STM images visualize the Sb zigzag (Seiwatz) chain in a real space, and the STS I-V spectrum suggests this surface to be semiconducting, in good agreement with the atomic configuration proposed. However, a closer inspection of the STM results does not support the buckling of Sb chains reported in earlier studies. Moreover, the analysis of the Sb 4d core-level line shape of the (2 × 1) reconstruction shows that the bonding state of the Sb atoms is very similar, suggesting an unbuckled Seiwatz chain. In addition, the Ge 3d core-level emission reveals only one component, giving evidence for the ideal bulk-terminated structure of the Ge substrate.  相似文献   

15.
The microwave spectra of cyclohexanone oxime and d1 (=NOD) and d4(2,2,6,6-d4) derivatives were observed in the frequency range from 8 to 40 GHz in the ground and excited vibrational states. The rotational constants were determined to be A = 3799.844(48), B = 1513.7912(23), and C = 1189.6118(29) MHz for normal species, A = 3791.835(88), B = 1461.0324(47), and C = 1157.5653(53) MHz for d1 species, and A = 3364.141(49), B = 1487.9551(34), and C = 1154.0965(44) MHz for d4 species in the ground vibrational state. The planar moments, Pbb (Pbb = (Ic + Ia − Ib)/2) of normal, d1, and d4 species were determined to be 111.9885(26), 111.9817(46), and 124.2394(49) uÅ2, respectively. The almost same values of Pbb of normal and d1 species suggest that the hydroxyl hydrogen atom is very close to the a-c plane. From the rs coordinates of the hydroxyl hydrogen atom, the OH bond was found to be at the trans position with respect to the CN double bond. The conformation of cyclohexanone oxime was determined to be chair form by comparing the observed and calculated rotational constants, ΔI, and planar moments, and taking account of the calculated the relative energy difference, ΔE. The structural parameters, the three bond lengths, three bond angles, and three dihedral angles, were adjusted to the nine rotational constants observed. The bond angle of ∠C2C1N is much wider than that of ∠C6C1N by about 10°. The dihedral angles of ∠C1C2C3C4, ∠C2C3C4C5, and ∠C3C4C5C6 were determined to be 53.3(5), −57.2(5), and 57.2(5)°. Two vibrational modes were assigned to the ring-bending and ring-twisting ones, which are almost harmonic up to v = 3.  相似文献   

16.
M. Krawiec  M. Kisiel 《Surface science》2006,600(8):1641-1645
The electronic structure of Si(1 1 1)-(6 × 6)Au surface covered with submonolayer amount of Pb is investigated using scanning tunneling spectroscopy. Already in small islands of Pb with thickness of 1 ML Pb(1 1 1) and with the diameter of only about 2 nm we detected the quantized electronic state with energy 0.55 eV below the Fermi level. Similarly, the I(V) characteristics made for the Si(1 1 1)-(6 × 6)Au surface reveal a localized energy state 0.3 eV below the Fermi level. These energies result from fitting of the theoretical curves to the experimental data. The calculations are based on tight binding Hubbard model. The theoretical calculations clearly show prominent modification of the I(V) curve due to variation of electronic and topographic properties of the STM tip apex.  相似文献   

17.
We have studied the influence of oxygen pressure during the cyclic annealing used for the cleaning of W(1 1 0) surfaces. For this purpose the surface morphology and electronic properties are measured by means of scanning tunneling microscopy (STM) and spectroscopy (STS), respectively. It is found that the surfaces with impurity atom densities as low as 2 × 10−3 can be obtained by gradually reducing the oxygen pressure between subsequent annealing cycles down to about 2 × 10−8 mbar in the final cycle. Only on the clean surface a bias-dependent spatial modulation of the local density of states (LDOS) is observed at step edges and around impurity sites by STS. In addition, we find a pronounced peak in the occupied states. In combination with density functional theory calculations these features can be traced back to a dispersive pz-dxz-type surface resonance band and the lower band edge of a surface state, respectively.  相似文献   

18.
We studied the growth mode and electronic properties of ultra-thin silver films deposited on Ni(1 1 1) surface by means of scanning tunnelling microscopy (STM) and angle resolved photoemission spectroscopy (ARPES). The formation of the 4d-quantum well states (QWS) was analysed within the phase accumulation model (PAM). The electronic structure of the 1 ML film is consistent with the silver layer which very weakly interacts with the supporting surface. The line-shape analysis of Ag-4dxz,yz QWS spectrum support the notion of strong localization of these states within the silver layer. The asymmetry of the photoemission peaks implies that the decay of the photo-hole appears to be influenced by the dynamics of the electrons in the supporting surface.  相似文献   

19.
The atomic and electronic structures of the Si(0 0 1)-c(4 × 4) surface have been studied by scanning tunneling microscopy (STM) and density functional theory (DFT). To explain the experimental bias dependent STM observations, a modified mixed ad-dimer reconstruction model is introduced. The model involves three tilted Si dimers and a carbon atom incorporated into the third subsurface layer per c(4 × 4) unit cell. The calculated STM images show a close resemblance to the experimental ones.  相似文献   

20.
The forward bias current-voltage (I-V) characteristics of Al/p-Si (MS) Schottky diodes with native insulator layer were measured in the temperature range of 80-300 K. The obtained zero bias barrier height ΦB0(I-V), ideality factor (n) and series resistance (Rs) determined by using thermionic emission (TE) mechanism show strong temperature dependence. There is a linear correlation between the ΦB0(I-V) and n because of the inhomogeneties in the barrier heights (BHs). Calculated values from temperature dependent I-V data reveal an unusual behaviour such that the ΦB0 decreases, as the n and Rs values are increasing with decreasing absolute temperature, and these changes are more pronounced especially at low temperatures. Such temperature dependence of BH is contradictory with the reported negative temperature coefficient of the barrier height. In order to explain this behaviour we have reported a modification in the expression reverse saturation current Io including the n and the tunnelling factor (αΧ1/2δ) estimated to be 15.5. Therefore, corrected effective barrier height Φbef.(I-V) versus temperature has a negative temperature coefficients (α = −2.66 × 10−4 eV/K) and it is in good agreement with negative temperature coefficients (α = −4.73 × 10−4 eV/K) of Si band gap. In addition, the temperature dependent energy distribution of interface states density Nss profiles was obtained from the forward bias I-V measurements by taking into account the bias dependence of the Φe and n. The forward bias I-V characteristics confirm that the distribution of Nss, Rs and interfacial insulator layer are important parameters that the current conduction mechanism of MS Schottky diodes.  相似文献   

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