The fabrication and photoresponse of ZnO/diamond film heterojunction diode

Boron-doped p-type freestanding diamond (FSD) films were prepared by hot filament chemical vapor deposition (HFCVD) method. The effect of B/C ratio on the electrical properties of FSD films was investigated by Hall effect measurement system. A ZnO/diamond heterojunction diode was fabricated successfully by depositing n-type ZnO films on the p-type FSD substrate by radio-frequency (RF) magnetron sputtering method. The wavelength dependent photoresponse properties of the heterojunction diode were investigated by studying the effect of light illumination on current-voltage (I-V) characteristics and photocurrent spectra at room temperature. The diode showed a significant discrimination between ultraviolet (UV) and the visible light under reverse bias conditions and photoresponse of the device was approximately linear related to the increasing reverse bias voltages.     

Fabrication of high quality silicon–polyaniline heterojunctions

A high quality silicon–polyaniline heterojunction is produced by spin-coating of soluble polyaniline on silicon substrates. The devices have excellent reproducibility of their electrical characteristics and high rectification ratio. The rectification ratio is 60,000 at ±1.0 V at room temperature, and typical reverse current at −1.0 V is 3 nA. A G/I×G plot is used to analyze the current–voltage characteristics, yielding typical series resistance of 4 kΩ and ideality factor in a range from 1.0 to 2.0. The devices present great potential for use as radiation and/or gas sensors.     

Electronic and photovoltaic properties of p-Si/C70 heterojunction diode

Electronic and photovoltaic properties of p-Si/C₇₀ heterojunction diode have been investigated. The ideality factor n and barrier height φ_b values of the diode were found to be 1.86 and 0.69 eV, respectively. The diode indicates a non-ideal current–voltage behaviour due to the ideality factor being higher than unity. This behaviour results from the effect of series resistance and the presence of an interfacial layer. The series resistance R_S and ideality factor n values were determined using Cheng's method and the obtained values are 2.21×10⁵ Ω and 1.86, respectively. The device shows photovoltaic behaviour with a maximum open-circuit voltage of 0.22 V and a short-circuit current of 0.35 μA under 6 mW/cm² light intensity.     

Effect of ambient temperature on electrical properties of nanostructure n-ZnO/p-Si heterojunction diode

The nanostructure n-ZnO/p-Si heterojunction diode was fabricated by sol–gel method. The structural and morphological properties of the nanostructure ZnO film have been investigated. The X-ray diffraction spectra indicated that the films are of polycrystalline nature. The scanning electron microscopy images indicate that the surface morphology of ZnO film is almost homogeneous and the ZnO film is consisted of the circular formed with coming together of the nanoparticles. The electrical characterization of nanostructure n-ZnO/p-Si heterojunction diode has been investigated by current–voltage characteristics. The ideality factor (n) of the diode was found for different ambient temperatures and the obtained 6.40 value for 296 K is higher than unity due to the interface states between the two semiconductor materials and series resistance. The values of n increased with decreasing ambient temperature. The reverse current of the diode increased with illumination intensity of 100 mW cm⁻² and the diode gave a maximum open circuit voltage V_oc of 0.19 V and short-circuits current I_sc of 8.03 × 10⁻⁸ A.     

Fabrication and performance evaluation of ultraviolet photodetector based on organic /inorganic heterojunction

Organic/inorganic ultraviolet photodetector was fabricated using thermal evaporation technique. Organic/inorganic heterojunction based on thermally evaporated copper (II) acetylacetonate thin film of thickness 200 nm deposited on an n-type silicon substrate is introduced. I–V characteristics of the fabricated heterojunction were investigated under UV illumination of intensity 65 mW/cm². The diode parameters such as ideality factor, n, barrier height, Φ_B, and reverse saturation current, I_s, were determined using thermionic emission theory. The series resistance of the fabricated diode was determined using modified Nord's method. The estimated values of series resistance and barrier height of the diode were about 0.33 KΩ and 0.72 eV, respectively. The fabricated photodetector exhibited a responsivity and specific detectivity about 9 mA/W and 4.6 × 10⁹ Jones, respectively. The response behavior of the fabricated photodetector was analyzed through ON-OFF switching behavior. The estimated values of rise and fall time of the present architecture under UV illumination were about 199 ms and 154 ms, respectively. Finally, enhancing the photoresponsivity of the fabricated photodetector, post-deposition plasma treatment process was employed. A remarkable modification of the device performance was noticed as a result of plasma treatment. These modifications are representative in a decrease of series resistance and an increase of photoresponsivity and specific detectivity. The process of plasma treatment achieved an increment of external quantum efficiency from 5.53% to 8.34% at −3.5 V under UV illumination.     

Effect of nanopatches on electrical behavior of Ni/n-type Si Schottky diode

Topological surface measurement of thin metal film using a conducting probe atomic force microscope (C-AFM) shows that thin metal film deposited on Ni/n-Si Schottky diode (SD) consists of patches. These patches are sets of parallel connected and electrically cooperating nano-contacts of size between 50 and 100nm. Every individual patch acts as an individual diode with different I-V curve, barrier height (BH) and ideality factor (n). Between these diodes or patches, there are spot field distributions; the patches with different local work functions are in direct electric contact with surrounding patches. As a result, a potential difference between surfaces of patches, the so-called electrostatic spot field E_f, is formed. It is shown that in real metal-semiconductor (MS) contacts, patches with quite different configurations, various geometrical sizes and local work functions are randomly distributed on the surface of metal; hence direction and intensity of spot field are non-uniformly distributed along the surface of metal. There is a linear dependence between barrier height and ideality factor, which is the consequence of reduction of distance of the maximum of BH from the interface. This dependency is the sign of reduction of contribution of a peripheral current.     

Comparison of D.C. and A.C. electro-analytical methods for measuring diode ideality factors and series resistances of silicon solar cells

The diode ideality factor (m) and the series resistance (R_s) of a Si solar cell represent two critical performance-indicator parameters of the device. Since both m and R_s are functions of voltage (V) and temperature (T), simultaneous electrical measurements of these parameters under variable conditions of V and T can often be difficult with traditional direct current (D.C.) techniques. Using the electro-analytical method of linear sweep voltammetry (LSV) and a commonly available Si solar cell, we explore these specific confines of such D.C. measurements. The results are compared with those obtained from a parallel set of alternating current (A.C.) measurements using impedance spectroscopy (IS). LSV provides the main D.C. parameters (open circuit voltage, short circuit current, fill factor, and efficiency) of the cell, but is limited in terms of independently measuring m and R_s beyond strong forward biased conditions. The IS approach is free of the latter experimental constraints, and at the same time can provide several other important electrical parameters of the solar cell. Specifically, IS detects the presence of a low-high (p–p⁺) junction at the back surface of the cell, and serves as an efficient probe of certain electrical characteristics of this junction.     

Fabrication and characterization of ZnTPP:PCBM bulk heterojunction (BHJ) solar cells

Bulk heterojunction (BHJ) solar cells were fabricated based on blended films of a porphyrin derivative 5,10,15,20-Tetraphenyl-21H,23H-porphine zinc (ZnTPP) and a fullerene derivative [6,6]-phenyl-C₆₁ butyric acid methyl ester (PCBM) as the active layer. The ZnTTP:PCBM BHJ solar cells were fabricated by spin-casting of the blended layer. The weight ratios of ZnTPP and PCBM were varied from 1:1 to 0:10. The electronic and optical properties of each cell were investigated. Optical density (OD) of the blended film for each cell was extracted from its reflection and transmission curves. OD and average absorption coefficients of the active materials were used to determine film thicknesses. Absorption spectra of each component material were compared with the spectra of the blended films. Current density–Voltage (J–V) characteristics were recorded under dark as well as under the illumination of AM 1.5G (1 sun) solar spectrum. The BHJ solar cell with ZnTPP:PCBM ratio of 1:9 showed the best performance . The values of RR, V_OC , J_SC , FF and η for these ratios were 106.3, 0.4 V, 1.316 mA/cm², 0.4 and 0.21%, respectively. The cross-section of this device using SEM was also examined.     

Effect of diode size and series resistance on barrier height and ideality factor in nearly ideal Au/n type-GaAs micro Schottky contact diodes

Small high-quality Au/n type-GaAs Schottky barrier diodes (SBDs) with low reverse leakage current are produced using lithography. Their effective barrier heights (BHs) and ideality factors from current-voltage (I-V) characteristics are measured by a Pico ampere meter and home-built I-V instrument. In spite of the identical preparation of the diodes there is a diode-to-diode variation in ideality factor and barrier height parameters. Measurement of topology of a surface of a thin metal film with atomic force microscope (AFM) shows that Au-n type-GaAS SD consists of a set of parallel-connected micro and nanocontacts diodes with sizes approximately in a range of 100-200 nm. Between barrier height and ideality factor there is an inversely proportional dependency. With the diameter of contact increasing from 5 μm up to 200 μm, the barrier height increases from 0.833 up to 0.933 eV and its ideality factor decreases from 1.11 down to 1.006. These dependencies show the reduction of the contribution of the peripheral current with the diameter of contact increasing. We find the effect of series resistance on barrier height and ideality factor.     

An approach towards the growth of polyaniline nanograins by electrochemical route

The growth of electropolymerized polyaniline nanograins has been carried out from aqueous solution of 0.45 M aniline (C₆H₅NH₂) + 0.5 M H₂SO₄. These polyaniline nanograins were characterized using Raman spectroscopy, field emission scanning electron microscopy (FESEM), transmission electron microscopy (TEM), contact angle measurement and optical studies. The presence of characteristic bonds of polyaniline was observed from Raman shift experiment. Based on field emission scanning electron microscopy and transmission electron microscopy analysis, the formation of the polyaniline nanograins with average diameter of about 50 nm was inferred. Surface of the polyaniline film was hydrophilic with contact angle 17 ± 1°. A blue shift of 0.30 eV with characteristic absorption peak at 427 nm has been attributed due to quantized size of polyaniline nanograins.     

Fabrication of p-CuGaS2/n-ZnO:Al heterojunction light-emitting diode grown by metalorganic vapor phase epitaxy and helicon-wave-excited-plasma sputtering methods

Greenish-white electroluminescence (EL) was observed from the heterojunction light-emitting diodes (LEDs) composed of p-type (001) CuGaS₂ chalcopyrite semiconductor epilayers and preferentially (0001)-oriented polycrystalline n-type ZnO thin films. The CuGaS₂ layers were grown on a (001) GaP substrate by metalorganic vapor phase epitaxy and the ZnO films were deposited by the surface-damage-free helicon-wave-excited-plasma sputtering method. The n-ZnO/p-CuGaS₂ LED structure was designed to enable an electron injection from the n-type wider band gap material forming a TYPE-I heterojunction. The EL spectra exhibited emission peaks and bands between 1.6 and 2.5 eV, although their higher energy portions were absorbed by the GaP substrate. Since the spectral lineshape resembled that of the photoluminescence from identical CuGaS₂ epilayers, the EL was assigned to originate from p-CuGaS₂.     

Fabrication of microrods and microtips of InP by electrochemical etching

Here we presented a simple approach to fabricate the microstructures of InP by electrochemical etching. Microrods were formed while InP etched in 7 M HCl solutions for 30 s, and microtips were obtained while InP etched for 120 s. In addition, with increasing applied potential the surface of the microrods became smoother. The formation mechanism was also discussed in this article.     

Understanding of a-Si:H(p)/c-Si(n) heterojunction solar cell through analysis of cells with point-contacted p/n junction

We fabricated point-contacted a-Si:H(p)/c-Si(n) heterojunction solar cells using patterned SiO₂ and investigated their electrical properties using the light current–voltage (I–V) curve and Suns-V_oc measurements. The light I–V curves showed bias-dependent changes according to the applied voltage in the point-contacted cells, especially in the samples with a long distance between the point-contacted junctions. The Suns-V_oc measurements showed that the bias-dependence of the light I–V curves did not originate from the recombination in the SiO₂/Si or a-Si:H(p)/c-Si(n) interface, but from the series resistances. It is possible to explain the bias-dependent light I–V curve in terms of the conductivity of a-Si:H(p) and difference in the electrical contact properties between a-Si:H(p), ZnO and c-Si(n). These results mean that the electrical properties of the a-Si:H(p) layer and the contact properties with this layer are also critical to obtain a high J_sc and fill factor in n-type based Si heterojunction solar cells.     

Fabrication and electrical characterization of Schottky diode based on 2-amino-4, 5-imidazoledicarbonitrile (AIDCN)

The junction characteristics of the organic compound 2-amino-4, 5-imidazoledicarbonitrile (AIDCN) on p-type silicon substrate are studied in detail. AIDCN is deposited on silicon substrate using thermal evaporator. Current–voltage (I–V) characteristic of the device is measured at room temperature. The Au/AIDCN/p-Si device shows non-linear I–V characteristic with rectification ratio of 7.2×10³ at 5 V. The electronic device parameters such as barrier height, ideality factor, and series resistance are calculated using I–V data and observed to be 0.74 eV, 3.00, and 3.73×10⁴ Ω respectively.     

Fabrication of nanoporous manganese by laser cladding and selective electrochemical de-alloying

Fabrication of nanoporous Cu-Mn alloy coatings was investigated by a two-step process involving high power laser cladding of a homogeneous Cu40Mn60 alloy coatings followed by selectively electrochemical de-alloying. Auger mapping results indicate that nanoporous manganese was obtained by selective electrochemical etching of the less active Cu component owing to the passivation of the more active manganese in potassium nitrate solution. The surface morphology of the porous Mn was a ribbon-like structure, different from interconnected bicontinuous nanopores that are usually obtained by de-alloying. The influence of de-alloying time, electric potential and temperature on the formation of nanoprosity is systematically investigated. Nanopore sizes can be tailored to be less than 100 nm. Under optimal etching conditions the nanopore size was below 25 nm. The surface area of the nanoporous manganese layer was enhanced by up to 990 times compared with that of a polished sample.     

Comparative study of electrical properties of Au/n-Si (MS) and Au/Si3N4/n-Si (MIS) Schottky diodes

In this paper, the electrical parameters of Au/n-Si (MS) and Au/Si₃N₄/n-Si (MIS) Schottky diodes are obtained from the forward bias current-voltage (I-V) and capacitance-voltage (C-V) measurements at room temperature. Experimental results show that the rectifying ratios of MS and MIS diode at ± 5 V are found to be 1.25×10³ and 1.27×10⁴, respectively. The main electrical parameters of MS and MIS diode, such as the zero-bias barrier height (Φ _Bo) and ideality factor (n) are calculated to be 0.51 eV (I-V), 0.53 eV (C-V), and 4.43, and 0.65 eV (I-V), 0.70 eV (C-V), and 3.44, respectively. Also, the energy density distribution profile of the interface states (N_ss) is obtained from the forward bias I-V. In addition, the values of series resistance (R_s) for the two diodes are calculated from Cheung's method and Ohm's law.     

Performance enhancement of a heterojunction bipolar transistor (HBT) by two-step passivation

An interesting two-step passivation (with ledge structure and sulphide based chemical treatment) on base surface, for the first time, is demonstrated to study the temperature-dependent DC characteristics and noise performance of an InGaP/GaAs heterojunction bipolar transistor (HBT). Improved transistor behaviors on maximum current gain β_max, offset voltage ΔV_CE, and emitter size effect are obtained by using the two-step passivation. Moreover, the device with the two-step passivation exhibits relatively temperature-independent and improved thermal stable performances as the temperature is increased. Therefore, the two-step passivationed device can be used for high-temperature and low-power electronics applications.     

Fabrication of ZnO nanoparticles-embedded hydrogenated diamond-like carbon films by electrochemical deposition technique

ZnO nanoparticles-embedded hydrogenated diamond-like carbon (ZnO-DLC) films have been prepared by electrochemical deposition in ambient conditions. The morphology, composition, and microstructure of the films have been investigated. The results show that the resultant films are hydrogenated diamond-like carbon films embedded with ZnO nanoparticles in wurtzite structure, and the content and size of the ZnO nanoparticles increase with increasing deposition voltage, which are confirmed by X-ray photoelectron spectroscopy (XPS), Raman, and transmission electron microscope (TEM). Furthermore, a possible mechanism used to describe the growth process of ZnO-DLC films by electrochemical deposition is also discussed.     

Fabrication of belt-like VO2(M)@C core-shell structured composite to improve the electrochemical properties of VO2(M)

VO₂(M) nanobelts encapsulated into carbon core–shell structured composite (VO₂(M)@C) was successfully synthesized by the thermal treatment with the precursor V₃O₇·H₂O@C composite under the inert atmosphere. The as-obtained sample was characterized by XRD, EDS, EA, FT-IR, Raman, SEM and TEM measurements. The core exhibited monoclinic phase VO₂(M) and the carbon coated on the surface of VO₂(M) was amorphous. The average thickness of carbon was about 18.5 nm. The possible formation mechanism of VO₂(M)@C was proposed as that the reaction underwent the solid state reaction by the interface reaction between V₃O₇ core and carbon shell. Furthermore, VO₂(M) and VO₂(M)@C composite were explored as the cathode materials to apply in lithium-ion batteries, indicating that the VO₂(M)@C composite electrode exhibited the better electrochemical properties than that of pure VO₂(M), achieving the aim of improving the electrochemical properties of VO₂(M).     

Fabrication of ceramic electrolytic films by the method of solution aerosol thermolysis (SAT) for solid oxide fuel cells (SOFC)

The technique of solution aerosol thermolysis (SAT) for the production of ceramic electrolytic films suitable for solid oxide fuels cells was investigated. The research has focused on the optimization of process parameters and characterization of the obtained films by means of X-ray diffractometry and scanning electron microscopy/energy-dispersive spectroscopy. Dense films of gadolinia-stabilized ceria of uniform thickness have been successfully produced on substrates consisting of dense disks of yttria-stabilized zirconia by SAT using nitrate salts of the precursors dissolved in an ethanol–water solvent. Substrate temperature is an important parameter and in this system the best initial values identified were of the order of 400–420 °C. The interplay between initial substrate temperature, solution flow rate, and postdeposition temperature is important for a good-quality film.