Picosecond time-resolved luminescence of hydrogenated amorphous silicon-carbon

Photoluminescence decay curves and time-resolved luminescence spectra of amorphous Si_0.15C_0.85 : H films are measure. The decay curves are nearly exponential with a time-constant of about 200 psec at room temperature. The peak of the emission spectrum is shifted from 440 nm immediately after the excitation to 490 nm at 400 psec after the excitation.     

Luminescence and ESR studies of defects in hydrogenated amorphous silicon

New experimental information on luminescence and light induced ESR (LESR) in hydrogenated amorphous silicon is described. We demonstrate that the two experiments involve identical recombination transitions, and identify two separate processes. One process involves defect states, and from the doping dependence of LESR we deduce that the electronically active defects are dangling bonds with positive electronic correlation energy.     

Interaction of ultrasonic phonons with defects in hydrogenated amorphous germanium

The attenuation of acoustic surface waves of 300 MHz has been measured in sputtered films of amorphous Ge and a-GeH_x (0x0.25) at temperatures between 0.5 K and 475 K. A strong absorption maximum due to structural relaxation is found at 135 K in pure a-Ge. This absorption maximum is shifted by annealing and is suppressed by hydrogen incorporation. Below 20 K the attentuation varies linearly with temperatures in all films investigated so far.On leave from: Department of Physics, Maharshi Dayanand University, Rohtak, 124001, India     

Urbach edge and the density of states in hydrogenated amorphous silicon

Photoconductivity measurements of the optical absorption edge and time-of-flight measurements of the hole drift mobility, on the same amorphous silicon film, enable us to identify the origin of the Urbach edge in amorphous silicon with the density of states in the valence band tail.     

Specificities of light-induced relaxation of metastable defects in amorphous hydrogenated silicon

The thermal relaxation kinetics of light-induced metastable defects in a-Si:H was studied prior to and after partial relaxation in the dark and in a dim light. The film lighting was found to change the relaxation rate of the defects and their distribution in relaxation time. This was demonstrated to be due to the concurrent light-induced relaxation and formation of the defects.     

On the generation and annealing of dangling bond defects in hydrogenated amorphous silicon

We show that, through the diffusive re-arrangement of Si-H bonds, the a-SiH lattice is able to establish thermal equilibrium between the densities of band tail trapped charge carriers and dangling bond defects. When this equilibrium is disturbed by changes in temperature, carrier injection or illumination, dangling bond defects have to be generated or annealed out via H-diffusion processes. Based on the concept of charge-induced bond breaking, we develop a mathematical formalism for the diffusive re-arrangement of Si-H bonds and show that our formalism can account for a variety of observations that have been made in the context of defect-generation and annealing experiments.     

Experimental elucidation of hydrogen local density of states in hydrogenated amorphous silicon

Ultraviolet and X-ray photoemission spectroscopies (UPS and XPS) are used to study the valence band in device quality hydrogenated amorphous silicon films (s-Si:H). Their results are combined to obtain estimated information about the hydrogen local density of states (HLDOS). The monohydride bonding configuration and the occurence of interhydride bonding between H atoms are confirmed by the experimental data.     

Role of the hydrogen in the light-induced defects in undoped hydrogenated amorphous silicon

We have investigated the effect of the deposition temperature (i.e. the hydrogen content) on the light-induced effects in undoped hydrogenated amorphous silicon (a-Si:H). Combined junction capacitance-temperature (C-T), ESR and IR absorption measurements are carried out in both the dark annealed state (A) and the saturated light-soaked state (B), as well as after partial annealing of the samples, starting from state B. The experimental results indicate that the films deposited at the highest substrate temperature (i.e. the lowest H content) exhibit a completely different behaviour from those deposited at lower substrate temperature (i.e. with higher H concentration), when the samples are left for long times at room temperature in the dark after partial annealing. These results are discussed in detail in relation to the different models proposed to explain the light-induced effects in a-Si:H.     

Nanoindentation of hydrogenated amorphous silicon

Nanoindentation was carried out on thin films of hydrogenated amorphous silicon (a-Si:H) prepared by plasma-enhanced chemical vapor deposition. The composite values of elastic (Young's) modulus, E _c, and hardness, H _c, of the film/substrate system were evaluated from the load–displacement curves using the Oliver–Pharr approach. The film-only parameters were obtained employing the extrapolation of the depth profiles of E _c and H _c. Scanning probe microscopy was employed to image the nanoindenter impressions and to estimate the effect of film roughness and material pile-up on the testing results. It was established that the elastic modulus of thin a-Si:H films is in the range 117–131 GPa, which is lower than for crystalline silicon. In contrast, the values of hardness are in the range 12.2–12.7 GPa, which is comparable to crystalline silicon and higher than for hydrogen-free amorphous silicon. It is suggested that the plastic deformation of a-Si:H proceeds through plastic flow and it is the presence of hydrogen in the amorphous matrix that leads to a higher hardness.     

Nitrogen doping in hydrogenated amorphous silicon

A direct evidence of substitutional doping in ion beam deposited amorphous hydrogenated silicon by nitrogen is presented. From the analysis of infrared (IR) absorption spectra and Si-2p core level shape, measured with X-ray photoelectron spectroscopy (XPS), the preferential tendency of nitrogen to go in for three-fold coordination at higher concentration and tetrahedral bonding at lower concentration (⩽4 at %) is established. XPS technique has been used for the first time to deduce the upper limit for substitutional solid solubility of the impurity.     

Persistent photoconductivity in hydrogenated amorphous silicon

The persistent photoconductivity (PPC) has been observed in undoped, phosphorus-doped, and boron-doped hydrogenated amorphous silicon (a-Si: H) films. As the annealing temperature is raised for these films the decay of residual conductivity is accelerated and the PPC disappears almost completely after annealing at 500°C. These experimental results rule out the mechanism requiring the phosphorus-boron complexes or the deep defects. The PPC is found to be related with the sample inhomogeneity from the experimental observation that the decay of residual conductivity is closely correlated with the microstructure. A model is proposed to explain the PPC in a-Si: H films.     

Modelling amorphous silicon with hydrogenated defects: GW treatment of the ST12 phase

The ST12 phase of silicon is investigated as a possible model for amorphous silicon (a-Si). The structure is studied both with and without hydrogenated hole defects to model the properties of hydrogenated amorphous silicon (a-Si:H) as well as a-Si. A density functional theory model of ST12 Si is structurally relaxed, and the radial correlation function and phonon density of states are used to compare the structural properties of the model to those of a-Si. One-shot GW self-energy corrections are used to generate the band structure, and the corrected electronic structure is found to reproduce the experimental energy gap of a-Si. Introducing hydrogenated defects to the ST12 structure leads to a slight decrease in the band gap and a shift in the density of states, as the breaking of symmetry results in band splitting. The dielectric functions are calculated for both a-Si and a-Si:H, using the GW corrected band structures, with a density functional perturbation theory approach. The model ST12 Si is found to absorb strongly at slightly lower energies than experimental a-Si, whereas the spectrum of the hydrogenated ST12 closely matches that of a-Si:H.