Growth rate and morphology of silicon carbide whiskers from polycarbosilane

The growth rate of silicon carbide whiskers grown from polycarbosilane was measured and the growth morphology was investigated. The plot of whisker length vs. growth time was almost linear up to a certain growth time but tended to become time-saturated, independent of growth temperature. Cessation of whisker growth was caused by a change of the growth process from vapor–liquid–solid (VLS) to vapor–solid (VS). Decrease in whisker length with growth time was observed in the higher temperature range. Arrhenius plots of growth rate were almost linear in the lower temperature range, but deviated markedly from linearity in the higher temperature range. This deviation was caused by the coexistence of the VS process and the VLS process during whisker growth.     

激光烧蚀硅靶下荷电粒子和纳米晶粒的电流响应研究

采用波长为308 nm的XeCl脉冲准分子激光器,在5～50 Pa的Ar气压下烧蚀高阻抗单晶硅(Si)靶.在烧蚀点正前方、距靶1.5 cm处放置一个中心开孔直径为2 mm的挡板,挡板后面上下对称放置两个极板,然后串联一个标准电阻接地,电阻大小为10 Ω,利用高分辨数字存储示波器记录并测量回路中产生的瞬间电流来研究荷电粒子和纳米晶粒的电流响应.实验结果表明烧蚀产物中的正离子在气压为5 Pa时到达极板上数量最多.纳米Si晶粒带正电并且随着气压的增加纳米Si晶粒下落到极板的数量呈现先增大后减小趋势,在气压为8 Pa时达到最大值,这与扫描电子显微镜的测量结果基本一致.所得结果为进一步研究烧蚀粒子在环境气体中的输运动力学过程提供了依据.     

热屏优化对大直径单晶硅生长影响的数值模拟

通过对28英寸热场生长300 mm硅单晶过程中结晶速率、固液界面形状、晶体中热应力及晶体中氧含量的数值计算提出了在该热场条件下热屏的优化方案。数值计算结果表明:对热屏底端与晶体表面和熔体自由液面的距离以及热屏材料(优化前热屏使用单一石墨材料,优化后采用辐射率较高的内壁材料结合反射率较高的外壁材料组成复合式热屏)的优化可以减少主加热器对晶体的热辐射使得固液界面更加平坦,藉此增加结晶速率,减小晶体内热应力和熔体中氧含量。     

利用Al/AlAs中间层调控GaAs在Si(111)上外延生长的研究

为了实现Ⅲ-V器件在硅基平台上单片集成,近年来Ⅲ-V半导体在硅衬底上的异质外延得到了广泛研究。由于Ⅲ-V半导体与Si之间大的晶格失配以及晶格结构不同,在Si上生长的Ⅲ-V半导体中存在较多的失配位错及反相畴,对器件性能造成严重影响。而Si(111)表面的双原子台阶可以避免Ⅲ-V异质外延过程中形成反相畴。本文利用分子束外延技术通过Al/AlAs作为中间层首次在Si(111)衬底上外延生长了GaAs(111)薄膜。通过一系列对比实验验证了Al/AlAs中间层的插入对GaAs薄膜质量的调控作用,并在此基础上通过低温-高温两步法优化了GaAs的生长条件。结果表明Al/AlAs插层可以为GaAs外延生长提供模板,并在一定程度上释放GaAs与Si之间的失配应力,从而使GaAs薄膜的晶体质量得到提高。以上工作为Ⅲ-V半导体在硅上的生长提供了新思路。     

Er,Yb:KGd(WO4)2激光晶体的生长

采用顶部籽晶熔盐法,以K2WO4为助熔剂生长出铒、镱共掺钨酸钆钾[Er,Yb：KGd（WO4）2简称Er,Yb：KGW]激光晶体。XRD分析结果表明晶体为低温相Er,Yb：KGW晶体,即β-Er,Yb：KGW晶体。通过差热分析测量,确定其相变温度和熔点分别为1020℃和1080℃。测量了晶体190-2000nm的室温透过光谱,结果表明除980nm的吸收谱带是Er^3＋离子和Yb^3＋离子的共同谱带之外,其余均属于Er^3＋离子。     

过渡层结构和生长工艺条件对Si基GaN的影响

为了提高MOCVD外延硅基GaN材料的质量，在硅（111）衬底上以HT-AlN为缓冲层，在缓冲层上再生长变组份过渡层后外延生长GaN。过渡层为多层复合结构，分为高温变组分AlGaN、GaN、低温AlN、高温变组分AlGaN。在高温生长AlGaN和GaN层中插入一层低温生长AlN以缓解降温过程中应力对厚GaN层的影响，为了缓慢释放热应力、采用合适的慢降温工艺。当外延层的厚度小于1．7微米时GaN外延层无龟裂，而厚度不断增加时，GaN外延层产生龟裂。本文研究了AlN缓冲层生长温度、高温变组分AlGaN生长过程中生长时间的变化对所生长GaN材料的影响。采用三维视频显微镜、高分辨率双晶X射线衍射（DCXRD）、扫描电子显微镜（SEM）、原子力显微镜（AFM）和室温光致荧光光谱（RT-PL）对样品进行了测试分析。测试结果表明所研制的硅基GaN表面光亮、平整，过渡层的引入有利于降低外延层中应力，提高GaN结晶质量。     

On the Morphological Changes and Twinning of ZnS (Sphalerite) Crystallites under Hydrothermal Conditions

Morphological characteristics and twinning mechanism of ZnS crystals under hydrothermal conditions have been investigated in this paper. It was shown that under hydrothermal conditions the morphology of ZnS crystallites changes along the four‐fold axis directions, and the crystals are observed in a positive or negative tetrahedron, or in a combination of positive and negative tetrahedra depending on the growth conditions. The positive tetrahedral areas on the crystallites get larger with increase of the concentrations of OH^‐ and S^2‐ in solutions, whereas the twinned crystallites of ZnS taking an elliptic shape with (111) as composition plane are easily formed in weak basic solutions. It can be found that the morphologies of ZnS crystals are in accordance with the crystallization orientations of positive or negative coordination tetrahedra ([S‐Zn₄]⁶⁺, [Zn‐S₄]^6‐) in the crystal although, in some cases, the practical morphology could be greatly affected by growth conditions, and the twinning mechansim can be suggested based on the linkage of growth units of positive and negative coordination tetrahedra, which were formed in the solution. The present investigations further indicated that the crystal chemistry approach based on the linkage/incorporation of growth units previously proposed by us can be sucessfully applied to interpret the growth mechanisms of the crystals and to control a desirable morphology.     

Growth of Cr : LiCaAlF6 and Cr : LiSrAlF6 by the Czochralski method

Single crystals of chromium-doped LiCAF and LiSAF can be grown from nearly stoichiometric melts of the components LiF, AlF₃, CrF₃ and CaF₂ or SrF₂, respectively, by the Czochralski method. The optical quality of LiSAF crystals is usually better, as LiCAF contains more scattering particles. This different behavior can be attributed to different thermodynamic properties of both substances: The higher melting point of LiCAF leads to higher evaporation losses of volatile LiF and AlF₃. Moreover, LiCAF melts incongruently. The main problem during the growth and application of LiSAF crystals is the highly anisotropic thermal expansion that may lead to thermal cracking. The extreme hygroscopicity of the doping agent CrF₃ has to be considered for the growth of both substances.     

Growth Habit and Habit Variation of γ‐CuI Crystallites under Hydrothermal Conditions

The octahedra were observed in the γ CuI crystallites synthesized by hydrothermal method using 1.6g (C₂H₅OO)₂Cu and 2.66g KI as precursors at 200 °C for 12 hours in the de‐ionized water. The effect of additives on the morphology of γ‐CuI crystallites was investigated. Results show that the morphology of γ‐CuI crystallites prepared in the mixed solution of de‐ionized water and alcohol at 200 °C for 12 hours is the tetrahedron. In order to disclose the effect of the additive on the growth habit of γ‐CuI crystallites, the microcosmic growth mechanism of γ‐CuI crystal is investigated from the complex of I^‐ and Cu⁺ ions to each other. It is concluded that the effect of alcohol on the morphology of γ‐CuI crystallites is carried out through changing the relative rate of complex of anion and cation to each other at the interface. Based on the above analysis, the growth habit of γ‐CuI crystallites and the habit variation under hydrothermal conditions are explained reasonably.     

Characterisation and mesomorphic behaviour of liquid crystals with dispersed PdCl2 nanoparticles

The synthesis and characterisation are carried on liquid crystalline (LC) p-dodecyloxy benzoic acid (12OBA) with 1 and 2 wt% for PdCl₂ nanoparticles dispersion. Further, characterizations are carried out by different spectroscopic techniques like X-ray diffraction spectrometric studies, scanning electron microscopy, Fourier transform infrared and differential scanning calorimetry (DSC). Textural determinations of the synthesised compounds are recorded by using polarising optical microscope (POM) attached with a hot stage and camera. The results show that the dispersion of PdCl₂ nanoparticles in 12OBA exhibits Nematic phases as same as the pure 12OBA with reduced clearing temperature as expected. Further, the nematic thermal ranges are quenched and the smectic C thermal range has been increased while performing both DSC and POM with the dispersion of 1 wt% PdCl₂ nanoparticles. Size dependence on bonding nature with LC compounds is established.     

外加氩气流下脉冲激光烧蚀制备纳米硅晶粒成核生长动力学研究

为研究纳米硅晶粒成核生长动力学过程,采用脉冲激光烧蚀(PLA)技术,在室温,50～200 Pa的氩气氛围中,通过引入垂直于烧蚀羽辉轴线的外加气流,在水平放置的衬底上沉积了一系列纳米Si晶薄膜.扫描电子显微镜( SEM)、拉曼(Raman)散射和X射线衍射(XRD)检测结果表明,未引入气流时,衬底上相同位置处晶粒尺寸随气体压强的增大逐渐减小;在距靶1 ～2cm范围内引入气流后,尺寸变化规律与未引入气流时相反.通过分析晶粒尺寸及其在衬底上的位置分布特点,结合流体力学模型和热动力学方程,分析得出在激光能量密度一定的条件下,环境气体压强、烧蚀粒子温度和密度共同影响着纳米晶粒的成核生长.     

六钛酸钾晶须的制备及生长机理的研究

通过KDC方法成功制备了六钛酸钾(K2Ti6O13)晶须,并进行了热重分析和差热分析,研究烧结时间和烧结温度对K2Ti6O13晶须结晶过程的影响,通过X射线衍射分析了K2Ti6O13晶须的相组成和晶体指数.此外,通过扫描电子显微镜和透射电子显微镜研究晶须的微观结构,揭示了K2Ti6O13晶须的生长机理.     

硅单晶提拉生长中拉速稳定性研究

为解决硅单晶提拉生长过程中拉速不稳定、波动较大的问题,在分析晶体生长界面热量及质量传输的基础上,通过控制温度补偿速率来抑制拉速大幅波动.采取基于遗传算法优化隶属度函数的模糊控制策略,对温度补偿速率进行控制,调节加热功率,使炉内热环境处于适宜晶体生长的范围.实验结果表明,在提高系统控径精度的同时,拉速稳定性也有显著提高,大幅波动明显减少.     

大尺寸优质激光晶体Nd3+/Yb3+∶NaY(WO4)2的生长和性能研究

采用提拉法生长了尺寸为φ25 mm×100 mm的大尺寸Nd3+与Yb3+掺杂的NaY(WO4)2晶体.对晶体的生长习性进行了讨论,利用XRD对晶体进行了相分析.测试了晶体的热膨胀特性,得到了主轴方向的热膨胀系数,测得沿c轴的膨胀系数大约为a轴的两倍.在室温下测试了Yb3掺杂的NaY( WO4)2晶体的吸收谱、荧光光谱和相关能级的荧光衰减,用标准与改进的J-O理论分析了吸收光谱与荧光光谱.结果表明,Yb3+掺杂的NaY( WO4)2晶体有着较好的光谱性能参数.采用氙灯泵浦Nd3+掺杂的NaY( WO4)2,实现了1.06 μm波段786 mJ的激光输出,同时在LD泵浦下,采用LBO晶体倍频,实现了87 mW的激光输出,基频光光转换效率为25;,斜率效率为7.98;.     

Growth kinetics on the (100) and (001) faces of TGS crystals

The growth kinetics and mechanisms on the (001) and (100) faces of TGS crystals were investigated. A phase contrast microscope with a CCD camera was used to observe the growth of the crystal. We found the growth on the (001) and (100) faces at high supersaturation was mainly controlled by a BCF surface diffusion mechanism. The kinetic data for the (100) face were also fitted by the nucleation and layer growth model of two-dimension nucleation at high supersaturation. Some important growth parameters for TGS crystals, such as edge energy, activation energy, and so on, were estimated.     

不同磁场对大直径单晶硅生长中的动量与热量输运影响的数值分析

本文采用紊流模型对大直径单晶硅在垂直磁场及勾形磁场作用时熔体内动量及热量输运作了数值模拟.采用有限体积法离散控制方程,采用SIMPLE((Semi-implicit Method for Pressure Linked Equations)算法耦合压力和速度场.对无磁场、垂直磁场及勾形磁场作用下熔体内的传输特性进行了比较.数值计算结果表明,垂直磁场对动量及热量的分布具有双重效应.垂直磁场强度过大,不利于晶体生长.随着勾形磁场强度的增加,熔体内子午面上的流动减弱,并且紊流强度也相应降低.     

硅基片上异质外延SiC的机理研究

本文利用低压高温MOCVD系统,成功地在Si(111)基片上外延出了具有高质量的SiC薄膜,并对其反应机理做了一些初步的研究.大部分观点认为,SiC/Si的异质外延,其最初的状态应该为Si衬底中Si的扩散.但是,本文通过在不同流量比的条件下,SiC薄膜在Si基片以及Al2O3基片上外延的比较,发现在SiC/Si的异质外延过程中起重大作用的并非Si衬底中Si的扩散,而是很大程度上作用于C向Si衬底的扩散.同时,还发现反应速率的快慢受SiH4流量所限制.当SiH4流量增加时,反应速率会明显加快,但是结晶质量会相对变差.     

基于POLO钝化接触结构的晶硅电池技术及其研究进展

多晶硅氧化物(POLO)结构是在晶硅表面依次生长一层极薄的界面氧化层与多晶硅层所形成的钝化接触结构。基于POLO结构的钝化接触技术不仅能够获得优异的表面钝化特性,而且避免了金属与晶硅表面的直接接触,极大地降低了金属与晶硅表面的接触复合。目前应用POLO钝化接触结构制作的小面积晶硅太阳能电池转换效率高达26.1%,制作的大面积晶硅太阳能电池产业化效率已经超过24.5%。同时POLO钝化接触技术应用于晶硅电池的制作可以承受高温工艺,兼容现有的晶硅电池产业化设备,是未来极具产业化潜力的钝化接触技术方案。本文主要综述了POLO钝化接触结构中载流子的传输机理及相应的量化参数表征方法;对比了POLO结构制备中界面氧化层生长、多晶硅层的沉积、掺杂及氢化处理的方法;总结了多晶硅层的寄生吸收效应、晶硅表面形貌结构、掺杂浓度分布对POLO结构钝化接触特性的影响;简述了POLO钝化接触技术的研究进展及当前POLO电池制作面临的技术难点。     

Si4+共掺杂Yb∶YAG单晶生长和光谱特性研究

利用提拉法生长了Si⁴⁺共掺杂Yb∶YAG单晶,该晶体属于立方晶系,O_h¹⁰-Ia3d空间群。掺杂的Si⁴⁺没有改变YAG的晶体结构,但是影响了发光离子的价态。吸收光谱表明Si⁴⁺的引入使得Yb²⁺含量增多,这是由于Si⁴⁺引入了过量的电荷,为满足电价平衡,Yb³⁺转换为Yb²⁺。Yb²⁺的出现降低了Yb∶YAG的发光强度。稳态X射线激发发射光谱结果表明Si⁴⁺共掺杂Yb∶YAG晶体的发光强度是Yb∶YAG的63%,γ射线激发下的光产额降至原来的40%。此外,由于原料中含有多种Yb的同位素,Yb∶YAG除了可以被X射线、γ射线激发出荧光外,还可以与中子发生核反应产生带电粒子,进而引起次级反应产生荧光。荧光的产生仍然由Yb³⁺决定,因此,Si⁴⁺掺入也降低了中子探测灵敏度。     

AgGa1-xInxSe2单晶的生长研究

采用高纯(99.9999;)Ag、Ga、In和Se单质为原料,按化学计量比富Se0.3～0.5;配料,通过机械振荡和温度振荡相结合的方法合成出单相高致密AgGa1-xInxSe2多晶材料.以此为原料采用布里奇曼法生长出外观完整的尺寸为φ15mm×25mm的AgGa1-xInxSe2单晶锭(x=0.2).沿自然显露面对晶体进行了解理和X射线衍射分析,发现该面是(101)面.同时进行了红外透过率测试,其红外透过率为41;.