Grain size effect on twin density in as-deposited nanocrystalline Cu film

Here, we report the formation of twins and grain size dependence of twin density in nanocrystalline (NC) copper films fabricated by pulsed laser deposition. It is found that the percentage of grains containing twins decreases with decreasing grain size in the grain size range of 2–10?nm. Surprisingly, although the twins were formed during the deposition process without mechanical deformation, our analysis suggests that they are most likely deformation twins formed under high internal stress existing in the NC Cu films. This phenomenon may also happen in other NC metallic thin films where internal stresses are high.     

纳米晶Ti薄膜的结构研究

用高密度、高电离度的电子迴旋共振等离子体溅射方法在室温基片上沉积出纳米晶Ti薄膜,基体为玻璃、NaCl单晶、纯Al等。对Ti薄膜的结构、形貌和成分进行X射线衍射(XRD),透射电子显微镜(TEM)和X射线光电子能谱(XPS)分析,表明所沉积的Ti薄膜是平均粒径d<10nm,晶粒大小均匀且具有比较稳定的fcc反常结构的纳米晶粒膜。我们还较系统地研究了各工作参数对Ti薄膜的晶体结构、晶粒尺寸、成膜速率以及对基体粘附力的影响,分析了成膜机理。 关键词：     

溅射功率对Mo薄膜微结构和性能的影响

 实验采用直流磁控溅射沉积技术在不同溅射功率下制备Mo膜,研究了不同溅射功率下Mo膜的沉积速率、表面形貌及晶型结构,并对其晶粒尺寸和应力进行了研究。利用原子力显微镜观察样品的表面形貌发现随着溅射功率的增加,薄膜表面粗糙度逐渐增大。X射线衍射分析表明薄膜呈立方多晶结构,晶粒尺寸为14.1～17.9 nm;应力先随溅射功率的增大而增大,在40 W时达到最大值(2.383 GPa),后随溅射功率的增大有所减小。     

The grain size distribution in nanocomposite films

The grain size distributions and related mechanisms in nanocomposite films with nanostructures comprising a nanocrystalline (nc) phase surrounded by an amorphous (a) matrix under different amorphous phase amounts (V _a) have been analyzed by using a Monte Carlo grain growth model. The results show that with the V _a value increasing to a critical value of ～28%, the grain size distribution approaches lognormality, and it becomes off-lognormal when the V _a value is larger or smaller than ～28%. The simulated results are in a good agreement with the experiment. It is shown that the homogenous or inhomogeneous grain growth mode, determined by the energy exerted on the grain boundary, originates in lognormal or off-lognormal grain size distributions in nanocomposite films. Also, in a system with lognormal grain size distribution, the amorphous phase just covers all grain boundaries (GBs) and the length obtained by summing the boundary circumference of all nanograins is the longest. It is expected that this microstructure can result in exceptional properties of nanocomposite films.     

由电阻率的准静态测量研究薄膜晶粒的生长动力学

提出一种用薄膜电阻率的准静态测量来进行薄膜晶粒生长动力学研究的方法。在超高真空系统中用直流溅射制备Pd膜,然后测量不同温度下Pd膜电阻率与退火时间的关系。利用二流体模型推算出对应晶粒尺寸大小的变化,并和TEM结果进行比较。在此基础上进一步分析了退火温度对薄膜中晶粒尺寸变化所起的作用,拟合出晶粒的生长曲线。实验结果表明晶粒长大是一种热激活生长过程,激活能约为0.53eV。 关键词：     

Influence of Grain Size on Electrical and Optical Properties of InP Films

InP film samples were prepared by spray pyrolysis technique using aqueous solutions of InCl₃ and Na₂HPO₄, which were atomized with compressed air as carrier gas onto glass substrates at 500°C with different thicknesses of the films. It is found that the resistivity of the polycrystalline films strongly depends on the grain size. It is observed that the grain size of the films increase with the decrease of the energy band gap and strain of the film. The changes observed in the energy band gap and strain related to the film grain size of the films are discussed in detail.     

Grain Growth in Polycrystalline Thin Films of Semiconductors

Grain growth in thin films is usually abnormal, leading not only to an increase in the average grain size, but also to an evolution in the shape of the grain size distribution and to an evolution in the distribution of grain orientations. The latter can be driven by surface, interface or strain energy minimization, depending on film and substrate properties and on deposition conditions, and can lead to different final textures depending on which energy dominates.In semiconductor films, as in other materials, grain growth stagnation coupled with texture-selective driving forces leads to secondary grain growth, the rate of which is higher in thinner films. Self ion-bombardment enhances the rate of pre-stagnation grain growth, and doping of Si with electron donor leads to enhanced pre-stagnation grain growth as well as surface-energy-driven secondary grain growth. The effects of ion-bombardment and dopants on grain growth in Si can be understood in terms of associated increases in point defect concentrations and the effects of point defects on grain boundary mobilities.     

Microstructure and roughness improvement of polycrystalline Bi thin films upon pulsed-laser melting

Bismuth films with different thicknesses have been grown by do sputtering on substrates held at room temperature. The films are always formed by columnar crystals with a grain size comparable to the film thickness which lead to surface roughness. It increases with the thickness of the films and has a strong influence on the film optical properties. The films have been irradiated with nanosecond laser pulses, and real-time reflectivity measurements during the irradiation were used to follow the changes in the film optical properties. It will be shown that pulsed-laser irradiation of films thinner than 100 nm improves substantially their surface roughness and their crystalline quality by increasing the grain size at least one order of magnitude.     

A mathematical model to predict the grain size of nanocrystalline CdS thin films based on the deposition condition used in the sol–gel spin coating method

Design of experiment (DOE) based on central composite design (CCD) has been employed for the development of a mathematical model correlating the important process parameters like thiourea concentration (U), annealing temperature (A), rotational speed (S), and annealing time (T) of the spin coating process for the preparation of CdS thin films. The experiments were conducted as per the design matrix. Nanocrystalline CdS thin films have been prepared using cadmium nitrate and thiourea as precursors by sol gel spin coating method using the results of the mathematical model. The prepared CdS films have been characterized and the crystal structure and grain size of the samples were analyzed using X-ray diffraction technique. The adequacy of the developed models was checked by analysis of variance (ANOVA) technique. The accuracy of prediction has been carried out by conducting confirmation test. Using this model, the main effect of process parameters on grain size of CdS films have been studied. These parameters were optimized to obtain minimum grain size using the Microsoft excel solver. The results have been verified by depositing CdS films using the optimized conditions. These films have been characterized using X-ray diffraction technique and the grain size is found to be 8.8 nm. The high resolution transmission electron microscopy (HRTEM) analysis showed the grain size of the prepared CdS film to be ∼7 nm. UV–vis spectroscopy analysis revealed that CdS films exhibited quantum confinement effect.     

Observation of grain growth in swift heavy ion irradiated NiO thin films

NiO thin films grown on Si(100) substrates by electron beam evaporation, were sintered at 500 °C and 700 °C. The films were irradiated with 120 MeV Au⁹⁺ ions. Irradiation had different effects depending upon the initial microstructure of the films. Irradiation of the films at a fluence of 3 × 10¹¹ ions cm⁻² leads to grain growth for the films sintered at 500 °C and grain fragmentation for the films sintered at 700 °C. At still higher fluences of irradiation, grain size in 500 °C sintered film decreased, but the same improved in 700 °C sintered film. Associated with the grain size, texturing of the films was also shown to undergo significant modifications under irradiation.     

HFCVD金刚石膜电阻率研究

本文采用在金刚石表面蒸镀铝电极的方法测量金刚石膜的电阻率。样品的Raman,SEM,XRD分析结果表明,金刚石膜的电阻率与晶粒尺寸、晶粒取向和缺陷及杂质有直接关系,大尺度晶粒的金刚石膜具有较高的电阻率,高比例的I（110）／I（111）晶粒取向的金刚石膜具有较高的电阻率;结构缺陷和杂质含量较小的金刚石膜具有较高的电阻率。     

氦氢离子协同注入对锆膜形貌及物相结构的影响

 采用磁控溅射法制备了Zr-Mo膜,随后在低能静电加速器上分别采用剂量为2.80×10¹⁷~1.12 ×10¹⁸ions·cm^-2的He⁺、H⁺离子辐照Zr-Mo膜,利用光学透镜、扫描电镜、原子力显微镜和X射线衍射研究He⁺、H⁺离子协同注入效应对Zr-Mo膜微观结构的影响。实验结果表明：原始Zr-Mo膜表层晶粒清晰可见,尺寸约为200nm;辐照效应可导致Zr-Mo膜表层产生微观损伤区域,在注He⁺基础上注H⁺导致Zr-Mo膜出现更为严重的损伤现象;离子注入的表面溅射效应可使膜面晶粒边界逐渐刻蚀退让,导致膜面更加光滑、细致;He⁺、H⁺ 离子协同注入可使Zr-Mo膜晶格发生畸变,注入期间未使Zr-Mo膜发生吸H相变生成氢化物。     

HFCVD法制备纳米晶体碳化硅薄膜中氢流量对晶粒尺寸的影响

以甲烷、硅烷和氢气为反应气体,采用热丝化学气相沉积(HFCVD)法在单晶硅衬底上沉积纳米晶体碳化硅(SiC)薄膜.通过X射线衍射(XRD)和扫描电子显微镜(SEM)分别对SiC薄膜的晶体结构和表面形貌进行分析.实验发现氢气流量对碳化硅薄膜晶粒尺寸有很大影响,当氢气流量从10SCCM变化到300SCCM时,薄膜晶粒的平均尺寸将由较大的400 nm左右减小到40 nm左右.     

氧分压对磁控溅射制备ZnO薄膜的结构及光学特性的影响

采用射频反应磁控溅射法在玻璃衬底上成功制备出具有c轴高择优取向的ZnO薄膜,利用X射线衍射及紫外-可见吸收和透射光谱研究了氧分压变化对ZnO薄膜的微观结构及光吸收特性的影响。结果表明,当工作气压恒定时,用射频反应磁控溅射制备的ZnO薄膜的生长行为主要取决于成膜空间中氧的密度,合适的氧分压能够提高ZnO薄膜的结晶质量;薄膜在可见光区的平均透过率达到90%以上,且随着氧分压的增大,薄膜的光学带隙发生了一定程度的变化。采用量子限域模型对薄膜的光学带隙作了相应的理论计算,计算结果与对样品吸收谱所作的拟合结果符合较好,二者的变化趋势完全一致,表明ZnO纳米晶粒较小时,薄膜光学带隙的变化与量子限域效应有很大关系。     

Fe含量和粒径对Fe/Cu颗粒膜结构和磁性的影响

采用共蒸发法制备不同组分的Fe/Cu颗粒膜,将样品分两组进行退火和不退火处理. 根据测量及分析,确定了不同成分的Fe/Cu颗粒膜的相组成和晶体结构;找出了 Fe/Cu颗粒膜矫顽力与粒径的关系,利用此关系由自发形核理论可知,提高功率,快速蒸镀薄膜,可得到细密颗粒的Fe/Cu颗粒膜,从而降低矫顽力,减少磁滞损耗.     

低温铝诱导晶化制备纳米晶硅薄膜的物相和光学性能研究

采用射频磁控溅射镀膜系统,在玻璃衬底上制备了非晶硅(α-Si)/铝(Al)复合薄膜,结合氮气(N₂)气氛中低温快速光热退火制备了纳米晶硅(nc-Si)薄膜;利用光学显微镜、共焦光学显微仪、X射线衍射(XRD)仪、拉曼散射光谱(Raman)仪和紫外-可见光-近红外分光光度计(UV-VIS-NIR)对纳米晶硅薄膜的表面形貌、物相及光学性能进行了表征,研究了退火工艺对薄膜性能的影响。结果表明： 300 ℃,25 min光热退火可使α-Si/Al膜晶化为纳米晶硅薄膜,晶化率为15.56%,晶粒尺寸为1.75 nm;退火温度从300 ℃逐渐升高到400 ℃,纳米晶硅薄膜晶粒尺寸、晶化率、带隙逐渐增加,表面均匀性、晶格畸变量逐渐减小;退火温度从400 ℃逐渐升高到500 ℃,纳米晶硅薄膜的晶粒尺寸、晶化率继续增加,带隙则逐渐降低;采用纳米晶硅薄膜的吸光模型验证了所制备的纳米晶硅薄膜的光学特性,其光学带隙的变化趋势与吸光模型得出的结果一致。     

Surface enhanced Raman scattering from mildly roughened surfaces: variation of signal with metal grain size

The intensity of surface enhanced Raman scattering from benzoic acid derivatives on mildly roughened, thermally evaporated Ag films shows a remarkably strong dependence on metal grain size. Large grained (slowly deposited) films give a superior response, by up to a factor of 10, to small grained (quickly deposited) films, with films of intermediate grain size yielding intermediate results. The optical field amplification underlying the enhancement mechanism is due to the excitation of surface plasmon polaritons (SPPs). Since surface roughness characteristics, as determined by STM, remain relatively constant as a function of deposition rate, it is argued that the contrast in Raman scattering is due to differences in elastic grain boundary scattering of SPPs (leading to different degrees of internal SPP damping), rather than differences in the interaction of SPPs with surface inhomogeneities.     

Effect of thickness on structural, optical and electrical properties of nanostructured ZnO thin films by spray pyrolysis

Transparent conducting zinc oxide thin films were prepared by spray pyrolytic decomposition of zinc acetate onto glass substrates with different thickness. The crystallographic structure of the films was studied by X-ray diffraction (XRD). XRD measurement showed that the films were crystallized in the wurtzite phase type. The grain size, lattice constants and strain in films were calculated. The grain size increases with thickness. The studies on the optical properties show that the direct band gap value increases from 3.15 to 3.24 eV when the thickness varies from 600 to 2350 nm. The temperature dependence of the electrical conductivity during the heat treatment was studied. It was observed that heat treatment improve the electrical conductivity of the ZnO thin films. The conductivity was found to increase with film thickness.     

晶粒尺寸对薄膜电阻率温度系数的影响

报道了Ｐｄ薄膜电阻率温度系数（ＴＣＲ）随不同薄膜厚度和不同退火温度的变化．实验结果表明：薄膜ＴＣＲ值远小于体材料的值，且对晶粒尺寸有一定的依赖关系；薄膜晶粒尺寸越大，其ＴＣＲ值也越大。采用晶粒间界散射的二流体模型对此结果进行了讨论。 关键词：     

Molecular dynamics simulation of mechanical properties of nanocrystalline platinum: Grain-size and temperature effects

A series of molecular dynamics simulations has been carried out to study the mechanical properties of nanocrystalline platinum. The effects of average grain size and temperature on mechanical behaviors are discussed. The simulated uniaxial tensile results indicate the presence of a critical average grain size about 14.1 nm, for which there is an inversion of the conventional Hall-Petch relation at temperature of 300 K. The transition can be explained by a change of dominant deformation mechanism from dislocation motion for average grain size above 14.1 nm to grain boundary sliding for smaller grain size. The Young's modulus shows a linear relationship with the reciprocal of grain size, and the modulus of the grain boundary is about 42% of that of the grain core at 300 K. The parameters of mechanical properties, including Young's modulus, ultimate strength, yield stress and flow stress, decrease with the increase of temperature. It is noteworthy that the critical average grain size for the inversion of the Hall-Petch relation is sensitive to temperature and the Young's modulus has an approximate linear relation with the temperature. The results will accelerate its functional applications of nanocrystalline materials.