On the fabrication and characterization of graded slanted chiral nano-sculptured silver thin films

Graded slanted chiral sculptured silver thin films are produced using oblique angle deposition together with rotation of substrate holder about its surface normal, plus a shadowing block, fixed at the center of the substrate holder. Scanning electron microscope (SEM) and atomic force microscope (AFM) were used for characterization of these films. The results showed a structural gradient with distance from the edge of the shadowing block, which in turn is responsible for the decrease in the volume of void fraction and increase of grain size. Plasmon absorption peaks observed in the optical analysis of these nano-structures showed that their wavelength region and intensity depend on the polarization and the incident angle of light, as well as the distance from the edge of the shadowing block. Photoluminescence (PL) study of the samples showed that there is an inverse size dependence of the PL spectra intensity.     

Fabrication, characterization and some applications of graded chiral zigzag shaped nano-sculptured silver thin films

Graded chiral zig-zag shaped nano-sculptured silver thin films (GCZSSTF) were produced in two stages using oblique deposition technique together with rotation of substrate about its surface normal while a shadowing block was also fixed at the center of the substrate holder. Chrystallographic and morphological structure of these films were obtained using X-ray diffraction (XRD) and atomic force microscopy (AFM). Spectrophotometry was used to obtain their optical behavior while their application in both hydrophobicity and gas sensing was also investigated. XRD results showed a dominant (1 1 1) orientation growth on the zig arm of the structure while by addition of the second arm (zag) the crystallographical growth orientation changed to (2 2 0).The anisotropic nano-structure of these films was also distinguished through (1 − R) spectra. A common peak at about 350 nm related to the TM mode of plasmon resonances and a broad shoulder at about 420 nm for the s-polarized light and at 620 nm for the p-polarized light corresponding to the LM mode of plasmon resonances are observed. These peaks are directly related to the nano-columns topography. The film system used here proved to act as a physical method for producing layer-by-layer structure for obtaining enhanced hydrophobic surfaces rather than the usual chemical methods reported in the literature. In addition, the GCZSSTF also acted as good as reported results for nano-tubes when applied as cathode in the field ionization gas sensing setup.     

钽掺杂二氧化钛薄膜的光电性能研究

采用脉冲激光沉积法 (PLD), 以石英玻璃为衬底制备了钽掺杂TiO₂薄膜并研究了薄膜样品的光电性质. 沉积氧气分气压从0.3 Pa变化到0.7 Pa时薄膜样品的帯隙变化范围是3.26 eV到3.49 eV. 通过测量电阻率随温度的变化关系确定了薄膜内部的主要导电机理. 在150 K到210 K温度范围内, 热激发导电机理是主要的导电机理; 而在10 K到150 K范围内; 电导率随温度的变化复合Mott的多级变程跳跃模型 (VRH); 在210 K到300 K范围内, 电阻率和exp(b/T)^1/2呈正比关系. 关键词： 2')" href="#">Ta掺杂TiO₂ 脉冲激光沉积法 薄膜 导电机理     

Nano-structural characteristics and optical properties of silver chiral nano-flower sculptured thin films

Silver chiral nano-flowers with 3-, 4- and 5-fold symmetry were produced using oblique angle deposition method in conjunction with the rotation of sample holder with different speeds at different sectors of each revolution corresponding to symmetry order of the acquired nano-flower. Atomic force microscopy (AFM) and field emission scanning electron microscopy (FESEM), were employed to obtain morphology and nano-structure of the films. Optical characteristics of silver chiral nano-flower thin films were obtained using single beam spectrophotometer with both s- and p-polarization incident light at 30° and 70° incidence angles and at different azimuthal angles (φ). Optical spectra showed both TM (TDM (transverse dipole mode) and TQM (transverse quadruple mode)) and LM (longitudinal mode) Plasmon resonance peaks. For 3- and 4-fold symmetry chiral nano-flowers the s-polarization extinction spectra obtained at different azimuthal angles did not show significant change in the Plasmon peak position while 5-fold symmetry chiral nano-flower showed a completely different behavior, which may be the result of increased surface anisotropy, so when the φ angle is changed the s-polarization response from the surface can change more significantly than that for lower symmetries. In general, for 3-, 4- and 5-fold symmetry chiral nano-flowers a sharp peak at lower wavelengths (<450 nm) is observed in the s-polarization spectra, while in addition to this peak a broad peak at longer wavelengths (i.e., LM) observed in the p-polarization spectra, which is more dominant for 70° incidence angle.     

Light pressure on chiral sculptured thin films and the circular Bragg phenomenon

For a circularly polarized plane wave incident normally on a chiral sculptured thin film (STF), we determined that light pressure per unit thickness on the film is high when the incident plane wave and the chiral STF are co-handed, the loss factor in the chiral STF is as low as possible, the wavelength is either the center-wavelength of the Bragg regime or close to it, and the ratio of the film thickness normalized by the period is moderately high.     

Magnetoelectric properties of Mn-substituted BiFeO3 thin films with a TiO2 barrier

Multiferroic thin films with the general formula TiO₂/BiFe_1−xMn_xO₃ (x=0.00, 0.05, 0.10 and 0.15) (TiO₂/BFMO) were synthesized on Au/Ti/SiO₂/Si substrates using a chemical solution deposition (CSD) method assisted with magnetron sputtering. X-ray diffraction analysis shows the thin films contained perovskite structures with random orientations. Compared with BFMO films, the leakage current density of the TiO₂/BFMO thin films was found to be lower by nearly two orders of magnitude, and the remnant polarizations were increased by nearly ten times. The enhanced ferroelectric properties may be attributed to the lower leakage current caused by the introduction of the TiO₂ layer. The J-E characteristics indicated that the main conduction mechanism for the TiO₂/BFMO thin film was trap-free Ohmic conduction over a wide range of electric fields (0-500 kV/cm). In addition, ferromagnetism was observed in the Mn doped BFO thin films at room temperature. The origin of ferromagnetism is related to the competition between distortion of structure and decrease of grain size and decreasing net magnetic moment in films due to Mn doping.     

纳米TiO2薄膜的低温等离子体制备技术

以四氯化钛为源物质,氩气为载气,氧气为反应气体,利用低温等离子体增强化学气相沉积在硅基表面制备出了TiO2薄膜。使用场发射扫描电子显微镜、X射线衍射仪等检测分析表征TiO2薄膜的性能与性质,并探讨了工艺条件如基片材料、沉积时间和基片温度对薄膜性能的影响。结果表明：制备的薄膜表面光滑均匀,结构致密,最小晶粒尺寸约15 nm;薄膜的晶型主要依赖于沉积温度,低于300 ℃沉积的薄膜是无定形的,300 ℃之上沉积的薄膜是锐钛矿结构。     

Deposition of graded TiO2 films featured both hydrophobic and photo-induced hydrophilic properties

Graded TiO₂ films were deposited on unheated glass substrates by using a twin dc magnetron sputtering system. The graded TiO₂ films showed a highly polycrystalline structure of anatase with a little rutile phases revealed by X-ray diffraction spectra. The surface energy of the fresh and UV irradiated films were evaluated by water contact angle measurement. The results indicated that the water contact angle of the fresh graded TiO₂ films was found within 100-112°. The films then became a highly hydrophilic surface with the water contact angle of almost zero under 60 min UV irradiation. The XPS spectrum of Ti 2p revealed that the graded TiO₂ films became a stoichiometric titanium oxide layer near the surface, proving that titanium was fully oxidized. It was found that the surface OH group density depended on the substrates employed for given sputtering conditions. In addition, AFM images revealed a considerably rough surface of the graded films with RMS roughness of 12.6-14.5 nm. One can conclude that the unique properties of highly hydrophobicity and photo-induced hydrophilicity can be attributed to fully oxidized chemical composition and higher roughness on the film surface.     

化学溶液法制备的Pb(Mg1/3Nb2/3)O3-PbTiO3薄膜的光学性能

用化学溶液方法在宝石衬底及有LaNiO₃缓冲层的Pt/TiO₂/SiO₂/Si衬底上制备了92%Pb(Mg_1/3Nb_2/3)O₃-8%PbTiO₃(PMNT)薄膜，X射线衍射测试结果表明：在有LaNiO₃缓冲层的Pt/TiO₂/SiO₂/Si衬底上制备的PMNT薄膜几乎是纯钙钛矿相，且薄膜 关键词： PMNT薄膜 光学性能 化学溶液法     

不同Sb含量p-SnO2薄膜的制备和特性

采用化学气相沉积方法, 利用Sb₂O₃/SnO作为源材料, 在蓝宝石衬底上制备出不同Sb掺杂量的SnO₂薄膜, 并在此基础上制作出p-SnO₂:Sb/n-SnO₂同质p-n 结器件. 研究表明, 随着Sb含量的增加, 样品表面变得平滑, 晶粒尺寸逐渐增大, 且晶体质量有所改善, 发现少量Sb的掺入可以起到表面活化剂的作用. Hall测量结果证实适量Sb的掺杂可以使SnO₂呈现p型导电特性, 当Sb₂O₃/SnO的质量比为1:5时, 其电学参数为最佳值. 此外, p-SnO₂:Sb/n-SnO₂同质p-n结器件展现出良好的整流特性, 其正向开启电压为3.4 V.     

H_2气氛退火处理对Nb掺杂TiO_2薄膜光电性能的影响

采用电子束沉积方法,以钛酸锶(SrTiO3)为衬底制备铌(Nb)掺杂TiO2薄膜并研究后续H2气氛退火处理对其薄膜样品光电性能的影响.结果发现H2气氛热退火处理能有效改善Nb掺杂TiO2薄膜的导电率,最佳电阻率达到5.46×10-3Ω·cm,在可见光范围内的透光率为60%—80%.导电性能的改善与H2气氛退火处理后多晶薄膜的晶粒尺寸变大和大量的氧空位形成及H原子掺杂有关.     

Hydrophilicity of amorphous TiO2 ultra-thin films

The UV-light-induced hydrophilicity of amorphous titanium dioxide thin films obtained by radio frequency magnetron sputtering deposition was studied in relation with film thickness. The effect of UV light irradiation on the film hydrophilicity was fast, strong and did not depend on substrate or thickness for films thicker than a threshold value of about 12 nm, while for thinner films it was weak and dependent on substrate or thickness. The weak effect of UV light irradiation observed for the ultra-thin films (with thickness less than 12 nm) is explained based on results of measurements of surface topography, UV-light absorption and photocurrent decay in vacuum. Comparing to thicker films, the ultra-thin films have a smoother surface, which diminish their real surface area and density of defects, absorb partially the incident UV light radiation, and exhibit a longer decay time of the photocurrent in vacuum, which proves a spatial charge separation. All these effects may contribute to a low UV light irradiation effect on the ultra-thin film hydrophilicity.     

A new method to characterizing surface roughness of TiO2 thin films

Titanium dioxide (TiO₂) thin films have been widely coated in the self-cleaning glass for facade application. The benefit of these glasses is its ability to actively decompose organic compounds with the help of ultraviolet light. Understanding the surface roughness of TiO₂ thin films is important before manufacturing of self-cleaning glasses using TiO₂ thin films because surface roughness of TiO₂ thin films has highly significant influence on the photocatalytic performance. Traditional approach for measuring surface roughness of TiO₂ thin films is atomic force microscopy. The disadvantage of this approach include long lead-time and slow measurement speed. To solve this problem, an optical inspection system for rapidly measuring the surface roughness of TiO₂ thin films is developed in this study. It is found that the incident angle of 60° is a good candidate for measuring surface roughness of TiO₂ thin films and y=90.391x+0.5123 is a trend equation for predicting the surface roughness of TiO₂ thin films. Roughness average (Ra) of TiO₂ thin films (y) can be directly determined from the peak power density (x) using the optical inspection system developed. The results were verified by white-light interferometer. The measurement error rate of the optical inspection system developed can be controlled by about 8.8%. The saving in inspection time of the surface roughness of TiO₂ thin films is up to 83%.     

Femtosecond pulsed laser deposition of nanostructured TiO2 films

Nanostructured deposits of TiO₂ were grown on Si (1 0 0) substrates by laser ablating a TiO₂ sintered target in vacuum or in oxygen using a Ti:sapphire laser delivering 80 fs pulses. The effect of the laser irradiation wavelength on the obtained nanostructures, was investigated using 800, 400 and 266 nm at different substrate temperatures and pressures of oxygen. The composition of the deposits was characterized using X-ray photoelectron spectroscopy (XPS) and the surface morphology was studied by environmental scanning electron microscopy (ESEM) and atomic force microscopy (AFM). Deposits are absent of microscopic droplets in all conditions explored. The best deposits, constituted by nanoparticles of an average diameter of 30 nm with a narrow size distribution, were obtained at the shorter laser wavelength of 266 nm under vacuum at substrate room temperature.     

Micro-structuring of TiO2 thin films by laser-assisted diffraction processing

Thin films of TiO₂ are deposited by magnetron sputtering on glass substrate and are irradiated by UV radiation using a KrF excimer laser (248 nm). These thin films are patterned with a razor blade placed on the way of the radiation just in front of the TiO₂ thin film. Just near the edge of the razor blade on the thin film, diffraction lines are observed, resulting in the ablation of the film. These patterns are characterized by optical microscopy, mechanical profilometry. Diffraction up to the 35th order is observed. The results are shown to be compatible with a model in which electronic excitation plays the major role.     

Vanadium-Al2O3 nanostructured thin films prepared by pulsed laser deposition: Optical switching

The formation and optical response of VO_x nanoparticles embedded in amorphous aluminium oxide (Al₂O₃) thin films by pulsed laser deposition is studied. The thin films have been grown by alternate laser ablation of V and Al₂O₃ targets, which has resulted in a multilayer structure with embedded nanoparticles. The V content has been varied by changing the number of pulses on the V target. It is found that VO_x nanoparticles with dimensions around 5 nm have been formed. The structural analysis shows that the vanadium nanoparticles are oxidized, although probably there is not a unique oxide phase for each sample. The films show a different optical response depending on their vanadium content. Optical switching as a function of temperature has been observed for the two films with the highest vanadium content, at transition temperatures of about −20 °C and 315 °C thus suggesting the presence of nanoparticles with compositions V₄O₇ and V₂O₅, respectively.     

Oblique angle deposition of TiO2 thin films prepared by electron-beam evaporation

Optical, structural and photocatalytic properties of TiO₂ thin films obliquely deposited on quartz glass substrate using an electron-beam evaporation method were investigated. The photocatalytic activity of the films was evaluated by photodecomposition of methylene blue. An increase in incident deposition angle increased the porosity and surface roughness of the TiO₂ films. As a result, the photocatalytic activity was enhanced with incident deposition angle up to 60°. However, a further increase in incident deposition angle to 75° reduced the photocatalytic activity due to a lack of the crystalline phase.     

Bragg-regime engineering by columnar thinning of chiral sculptured thin films

Using a microscopic-to-continuum model of sculptured thin films (STFs) as two-phase composite materials, we have examined the optical consequences of post-deposition, uniform, columnar thinning of chiral STFs. Our results indicate that thinning processes such as etching and bioreduction can be useful in engineering the Bragg regimes of STFs after deposition. Uniform columnar thinning blue-shifts the Bragg regime and can improve the Bragg features of a chiral STF.     

Spectral responses of gyrotropic chiral sculptured thin films to obliquely incident plane waves

Gyrotropic chiral sculptured thin films (STFs) exhibit optical activity due to their structural chirality, local anisotropy, and magneto-optic gyrotropy. We adapted two algorithms for nongyrotopic chiral STFs to investigate the circular-polarization-sensitivity of gyrotropic chiral STFs to incident plane waves. The impacts of gyrotropy and oblique angles of incidence on the reflectances and the transmittances were examined, and several conclusions drawn. In particular, we found that the incorporation of gyrotropy results in a blueshift of the Bragg regime.