Dark current simulation of InP/In0.53Ga0.47As/InP p-i-n photodiode

We report on 2D simulations of dark current for InP/In_0.53Ga_0.47aAs/InP p-i-n photodiode. Our simulation result is in good agreement with experiment confirming that generation-recombination effect is the dominant source of the dark current at low bias. Effects of the thickness and doping concentration of the absorption layer on the dark current are discussed in detail.     

p-i-nInP/In_(0.53)Ga_(0.47)As/InP探测器结构优化

利用半导体仿真工具Silvaco对p-i-n InP/In_(0.53)Ga_(0.47)As/InP近红外光探测器进行优化仿真.参考实际器件对红外探测器进行建模,并将其暗电流、光谱响应仿真结果与实验结果进行拟合,保证仿真结果的有效性.以减小探测器的暗电流为目的,优化其结构.针对探测器吸收层厚度和吸收层掺杂浓度对暗电流、光响应的影响进行研究,发现当吸收层厚度大于0.3μm后,暗电流不再上升,但光响应随着吸收层厚度的增加而增大;当吸收层掺杂浓度不断上升时,器件暗电流不断降低,当掺杂浓度上升到2×1017/cm3时,暗电流达到最低值.本文还研究了p-i-n型探测器的瞬态响应,探究了响应速度与反偏电压之间的关系,发现提高反偏电压能减小探测器响应时间.     

Cation diffusion in InP/In0.53Ga0.47As superlattices: strain build-up and relaxation

InP and In_0.53Ga_0.47As are lattice matched and can form superlattices that are free of crystalline defects. Zn indiffusion enhances the diffusion of cations while leaving the anions unaffected; the resultant In_1–x Ga _x P/In_1–x Ga _x As superlattices are strained. Since the as-grown specimens are pseudomorphic, any defects observed after Zn diffusion must be attributed to strain relaxation. Studies of the post-growth strain build-up and relaxation in this novel system suggest a new strain relief mechanism for buried strained layers of face-centred-cubic (fcc) structures. The signature defect of the proposed mechanism is a microtwin along a {111} plane spanning the buried strained layer and terminating at both interfaces with partial dislocations of 1/6112 type. Energy analysis indicates that this new partial-dislocation strain relief mechanism is more effective than the conventional 60 perfect-dislocation mechanism for relieving the in-plane strain in buried strained layers. Therefore, the proposed mechanism is an energetically favourable relaxation channel and limits the useful thicknesses of strained layers in electronic and optoelectronic devices.     

Electron mobilities in isomorphic In0.53Ga0.47As quantum wells on InP substrates

The influence of the doping level, illumination, and width of isomorphic In_0.52Al_0.48As/In_0.53Ga_0.47As/In_0.52Al_0.48As quantum wells grown on InP substrates on the electron mobility is studied. The persistent photoconductivity at low temperatures is found. Band diagrams are calculated and optimal parameters are found for obtaining the maximum electron mobility. The quantum and transport electron mobilities in dimensional quantization subbands are obtained from the Shubnikov-de Haas effect. The electron mobilities are calculated in dimensional quantization subbands upon scattering by ionized impurities taking intersubband transitions into account. Scattering by ionized impurities in samples studied is shown to be dominant at low temperatures.     

Efficient photoluminescence from triangular quantum wells at the interface of an InP/In0.53Ga0.47As heterostructure

Efficient photoluminescence (PL) with quantum yield close to 1 from InP/In_0.53Ga_0.47As heterostructures (HSs) at temperatures 77–300 K and low excitation levels is observed and investigated. The PL is due to a quasi-triangular quantum well (TQW) located at the HS interface and consists of two spectrally similar lines: InGaAs interband emission and emission from the bottom level of the TQW. It is found that as the temperature increases, the intersubband emission rises, while the TQW radiation is quenched. Pis’ma Zh. éksp. Teor. Fiz. 67, No. 10, 783–787 (25 May 1998)     

生长温度对In0.53Ga0.47As/InP的LPMOCVD生长影响

利用LPMOCVD技术在InP衬底生长了InxGa1-xAs材料,获得表面平整．光亮的In0.53Ga0.47As外延层。研究了生长温度对InxGa1-xAs外延层组分、表面形貌、结晶质量、电学性质的影响。随着生长温度的升高,为了保证铟在固相中组分不变,必须增加三甲基铟在气相中的比例。在生长温度较高时,外延层表面粗糙。生长温度在630℃与650℃之间,X射线双晶衍射曲线半高宽最窄,高于或低于这个温度区间,半高宽变宽。迁移率随着生长温度的升高而增加,在630℃为最大值,然后随着生长湿度的升高反而降低。生长温度降低使载流子浓度增大,在生长温度大于630℃时载流子浓度变化较小。     

Ultrafast carrier dynamics in In1−x Ga x As/InP heterostructures

We investigate carrier capture and carrier transport in the InGaAs/InP material system by luminescence spectroscopy with femtosecond time resolution. Comparative studies are performed on samples of different well width, barrier width and gallium mole fraction of the InGaAs layers. The investigations focus on excitation conditions that are comparable to those for semiconductor laser operation. Firm data on carrier dynamics are presented for these conditions. We find that the overall transfer rates of electrons and holes are similar and independent of well width. Furthermore, the transfer times show a linear dependence on barrier width. From experimental and model calculation results we derive some guidelines for the design of high-frequency laser devices.     

In0.53 Ga0.47As/In0.52Al0.48As量子阱中双子带占据的二维电子气的输运特性

研究了不同沟道厚度的In0.53 Ga0.47As/In0.52Al0.48As量子阱中双子带占据的二维电子气的输运特性.在考虑了两个子带电子之间的磁致子带间散射效应后,通过分析Shubnikov-de Haas振荡一阶微分的快速傅里叶变换结果,获得了每个子带电子的浓度、输运散射时间、量子散射时间以及子带之间的散射时间.结果表明,对于所研究的样品,第一子带电子受到的小角散射更强,这与第一子带电子受到了更强的电离杂质散射有关.     

Improvement of photoluminescence and electroluminescence characteristics of MBE-grown In0.53Ga0.47As/In0.53(Ga0.6Al0.4)0.47As quantum well laser structure with InGaAlAs digital alloys by thermal annealing

We investigated the effect of rapid thermal annealing (RTA) on the photoluminescence (PL) and electroluminescence of the In_0.53Ga_0.47As/In_0.53(Ga_0.6Al_0.4)_0.47As multiple quantum well (MQW) laser structure with InGaAlAs barrier layers provided by the digital-alloy technique. The SiO₂- (Si₃N₄-) capped samples followed by the RTA exhibited a significant improvement of PL intensity without any appreciable shifts in PL peak energy for settings of up to 750 °C (800 °C) for 45 s. This improvement is attributed to the annealing of nonradiative defects in InAlAs layers of digital-alloy InGaAlAs and partially those near the heterointerfaces of the digital-alloy layers. The InGaAs/InGaAlAs MQW laser diodes fabricated on the samples annealed at 850 °C show a hugely improved lasing performance. Received: 2 September 2002 / Accepted: 3 September 2002 / Published online: 17 December 2002 RID="*" ID="*"Corresponding author. Fax: +82-62/970-2204, E-mail: ytlee@kjist.ac.kr     

两个子带占据的In0.53Ga0.47As/In0.52Al0.48As量子阱中填充因子的变化规律

研究了低温(1.5K)和强磁场(0-13T)条件下,InP基In0.53Ga0.47As/In0.52Al0.48As量子阱中电子占据两个子带时填充因子随磁场的变化规律.结果表明,在电子自旋分裂能远小于朗道能级展宽的情况下,如果两个子带分裂能是朗道分裂能的整数倍时,即⊿E21=κ*ωc(其中κ为整数),填充因子为偶数;当两个子带分裂能为朗道分裂能的半奇数倍时,即⊿E21=(2κ 1*ω/2,填充因子出现奇数.