High-crystalline GaSb epitaxial films grown on GaAs(001) substrates by low-pressure metal–organic chemical vapor deposition

Orthogonal experiments of Ga Sb films growth on Ga As(001)substrates have been designed and performed by using a low-pressure metal–organic chemical vapor deposition(LP-MOCVD)system.The crystallinities and microstructures of the produced films were comparatively analyzed to achieve the optimum growth parameters.It was demonstrated that the optimized Ga Sb thin film has a narrow full width at half maximum(358 arc sec)of the(004)ω-rocking curve,and a smooth surface with a low root-mean-square roughness of about 6 nm,which is typical in the case of the heteroepitaxial single-crystal films.In addition,we studied the effects of layer thickness of Ga Sb thin film on the density of dislocations by Raman spectra.It is believed that our research can provide valuable information for the fabrication of high-crystalline Ga Sb films and can promote the integration probability of mid-infrared devices fabricated on mainstream performance electronic devices.     

Optical properties of 1.3-μm InAs/GaAs quantum dots grown by metal organic chemical vapor deposition

The optical properties of self-assembled InAs quantum dots （QDs） on GaAs substrate grown by metalorganic chemical vapor deposition （MOCVD） are reported. Photoluminescence （PL） measurements prove the good optical quality of InAs QDs, which axe achieved using lower growth temperature and higher InAs coverage. At room temperature, the ground state peak wavelength of PL spectrum and full-width at half-maximum （FWHM） are 1305 nm and 30 meV, respectively, which are obtained as the QDs are finally capped with 5-nm In0.06Ga0.94As strain-reducing layer （SRL）. The PL spectra exhibit two emission peaks at 1305 and 1198 nm, which correspond to the ground state （GS） and the excited state （ES） of the QDs, respectively.     

温度对GaSb/GaAs量子点尺寸分布的影响

采用低压金属有机物化学气相沉积 (LP-MOCVD) 法制备GaSb/GaAs量子点。通过对不同生长温度的样品进行分析发现温度的变化对GaSb/GaAs量子点的相位角无明显影响,量子点的形状是透镜型。由于量子点特殊的应力分布,可实现量子点的"自限制"生长。量子点的化学势不连续性以及Ostwald熟化机制的影响使得量子点尺寸分布在一定范围内不连续,会出现两种尺寸模式的量子点生长。Sb原子的表面迁移率对GaSb/GaAs量子点生长有较大的影响。升高温度可有效改善量子点的分立性,在升温过程中量子点体现出其熟化过程,高温时表面原子的解析附作用对量子点尺寸和密度的影响较大。     

Heteroepitaxial growth of InP/GaAs(100) by metalorganic chemical vapor deposition

Using two-step method InP epilayers were grown on GaAs(100)substrates by low-pressure metalorganic chemical vapor deposition(LP-MOCVD).X-ray diffraction(XRD)and room-temperature(RT)photolu- minescence(PL)were employed to characterize the quality of InP epilayer.The best scheme of growing InP/GaAs(100)heterostructures was obtained by optimizing the initial low-temperature(LT)InP growth conditions,investigating the effects of thermal cycle annealing(TCA)and strained layer superlattice(SLS) on InP epilayers.Compared with annealing,10-periods Ga_(0.1)In_(0.9)P/InP SLS inserted into InP epilayers can improve the quality of epilayers dramatically,by this means,for 2.6-μm-thick heteroepitaxial InP,the full-widths at half-maximum(FWHMs)of XRDωandω-2θscans are 219 and 203 arcsec,respectively,the RT PL spectrum shows the band edge transition of InP,the FWHM is 42 meV.In addition,the successful growth of InP/In_(0.53)Ga_(0.47)As MQWs on GaAs(100)substrates indicates the quality of device demand of InP/GaAs heterostructures.     

压强对GaSb/GaAs量子点形貌各向异性的影响

采用低压金属有机物化学气相沉积(LP-MOCVD)技术在Ga As(001)衬底上制备Ga Sb量子点,研究了反应室压强对改善Ga Sb/Ga As量子点形貌各向异性的影响。通过Sb表面处理方法,在Ga As衬底上形成低表面能的Sb-Sb浮层,实现以界面失配(IMF)生长模式对Ga Sb量子点诱导生长。用原子力显微镜(AFM)对各样品的量子点形貌进行了表征,结果表明Ga Sb量子点形貌各向异性明显且沿[110]方向拉长。在压强条件为10 k Pa时,IMF生长模式导致不对称岛的长宽比大于3,由于低能量(111)侧面的存在,Ga Sb量子点优先沿[110]方向生长而不是与之垂直的[110]方向。压强降低至4 k Pa时量子点密度增大为8. 3×109cm-2,量子点形貌转变为对称的半球形且长宽比约为1。低的压强降低了吸附原子的扩散激活能从而增大了扩散长度,可以有效改善Ga Sb量子点的各向异性。     

Mid-gap photoluminescence and magnetic properties of GaMnN films grown by metal–organic chemical vapor deposition

Metal-organic chemical vapor deposition （MOCVD） grown ferromagnetic GaMnN films are investigated by photo- luminescence （PL） measurement with a mid-gap excitation wavelength of 405 nm. A sharp PL peak at 1.8 eV is found and the PL intensity successively decreases with the addition of Mn, in which the Mn concentration of sample A is below 1% （[Mn]A =0.75%） but its PL intensity is stronger than other samples＇. The 1.8-eV PL peak is attributed to the recombination of electrons in the t2 state of the neutral Mn3＋ acceptor with holes in the valence band. With Mn concentration increasing, the intensity of the PL peak decreases and the magnetic increment reduces in our samples. The correlation between the PL peak intensity and ferromagnetism of the samples is discussed in combination with the experimental results.     

Effect of Annealing on Optical Properties of InAs Quantum Dots Grown by MOCVD on GaAs （100） Vicinal Substrates

Thermal annealing effect on lnAs quantum dots grown on vicinal （100） GaAs substrates is studied in comparison with dots on exact （100） GaAs substrates. We find that annealing acts stronger effect on dots with vicinal substrates by greatly accelerating the degradation of material quality, as well as slightly increasing the blueshift of the emission wavelength and the narrowing of PL linewidth. It is attributed to the higher strain in the dots formed on the vicinal substrates.     

Ripening of single-layer InGaAs islands on GaAs（001）

The present paper discusses our investigation of InGaAs surface morphology annealed for different lengths of time.After annealing for 15 min,the ripening of InGaAs islands is completed.The real space scanning tunneling microscopy(STM) images show the evolution of InGaAs surface morphology.A half-terrace diffusion theoretical model based on thermodynamic theory is proposed to estimate the annealing time for obtaining flat morphology.The annealing time calculated by the proposed theory is in agreement with the experimental results.     

First Principles Study of Half Metallic Properties of VSb Surface and VSb/GaSb （001） Interface

The structural, electronic, and magnetic properties of VSb in zincblende, and NiAs phases, VSb （001） film surfaces and its interfaces with GaSh （001） have been investigated within the framework of the density functional theory using the FPLAPW＋lo approach. The NiAs structure is more stable than the ZB phase, ZB VSb is found to a half-metallic ferromagnetic. The V-terminated surfaces retain the half-metallic character, while the half-metallicity is destroyed for Sb-terminated surfaces due to surface states, which originate from p electrons. The phase diagram obtained through the ab-initio atomistic thermodynamics shows that the formation energy of ZB VSb is about 0.1 Ryd. The half-metallicity character is also preserved at VSb/GaSb （001） interface. The conduction band minimum （CBM） of VSb in the minority spin case lies about 0.47 eV above that of GaSb, suggesting that the majority spin can be injected into GaSb without being flipped to the conduction bands of the minority spin.     

Dependence of bimodal size distribution on temperature and optical properties of InAs quantum dots grown on vicinal GaAs （100） substrates by using MOCVD

Self-assembled InAs quantum dots (QDs) are grown on vicinal GaAs (100) substrates by using metal-organic chemical vapour deposition (MOCVD). An abnormal temperature dependence of bimodal size distribution of InAs quantum dots is found. As the temperature increases, the density of the small dots grows larger while the density of the large dots turns smaller, which is contrary to the evolution of QDs on exact GaAs (100) substrates. This trend is explained by taking into account the presence of multiatomic steps on the substrates. The optical properties of InAs QDs on vicinal GaAs(100) substrates are also studied by photoluminescence (PL) . It is found that dots on a vicinal substrate have a longer emission wavelength, a narrower PL line width and a much larger PL intensity.     

Effect of InxGal-xN ＂continuously graded＂ buffer layer on InGaN epilayer grown by metalorganic chemical vapor deposition

In this paper we report on the effect of an lnxGal xN continuously graded buffer layer on an InGaN epilayer grown on a GaN template. In our experiment, three types of buffer layers including constant composition, continuously graded composition, and the combination of constant and continuously graded composition are used. Surface morphologies, crystalline quality, indium incorporations, and relaxation degrees of InGaN epilayers with different buffer layers are investigated. It is found that the InxGa1-xN continuously graded buffer layer is effective to improve the surface morphology, crystalline quality, and the indium incorporation of the InGaN epilayer. These superior characteristics of the continuously graded buffer layer can be attributed to the sufficient strain release and the reduction of dislocations.     

Investigation of optical emission spectroscopy in diamond chemical vapor deposition by Monte Carlo simulation

The optical emission spectra(atomic hydrogen(H_α,H_β,H_γ),atomic carbon C(2p3s→2p~2:λ=165.7 nm)and radical CH(A~2Δ→X~2Π:λ=420-440 nm))in the gas phase process of the diamond film growth from a gas mixture of CH4 and H_2 by the technology of electron-assisted chemical vapor deposition (EACVD)have been investigated by using Monte Carlo simulation.The results show that the growth rate may be enhanced by the substrate bias due to the increase of atomic hydrogen concentration and the mean temperature of electrons.And a method of determining the mean temperature of electrons in the plasma in-situ is given.The strong dependence on substrate temperature of the quality of diamond film mainly attributes to the change of gas phase process near the substrate surface.     

Substrate and pretreatment dependence of Cu nucleation by metal–organic chemical vapor deposition

The nucleation of copper (Cu) with (hfac)Cu(VTMS) organometallic precursor is investigated for Si, SiO₂, TiN, and W₂N substrates. As the deposition temperature is increased, the dominant growth mechanism is observed to change from the nucleation of Cu particles to the clustering of Cu nuclei around 180 °C independent of the employed substrates. It is also observed that the cleaning of substrate surfaces with the diluted HF solution improves the selectivity of Cu nucleation between TiN and SiO₂ substrates. Dimethyldichlorosilane treatment is found to passivate the surface of TiN substrate, contrary to the generally accepted belief, when the TiN substrate is cleaned by H₂O₂ solution before the treatment.     

Nanodots and microwires of ZrO_2 grown on LaAlO_3 by photo-assisted metal–organic chemical vapor deposition

ZrO_2 nanodots are successfully prepared on LaAlO_3(LAO)(100) substrates by photo-assisted metal-organic chemical vapor deposition(MOCVD). It is indicated that the sizes and densities of ZrO_2 nanodots are controllable by modulating the growth temperature, oxygen partial pressure, and growth time. Meanwhile, the microwires are observed on the surfaces of substrates. It is found that there is an obvious competitive relationship between the nanodots and the microwires. In a growth temperature range from 500℃ to 660℃, the microwires turn longest and widest at 600℃, but in contrast, the nanodots grow into the smallest diameter at 600℃. This phenomenon could be illustrated by the energy barrier, decomposition rate of Zr(tmhd)_4, and mobility of atoms. In addition, growth time or oxygen partial pressure also affects the competitive relationship between the nanodots and the microwires. With increasing oxygen partial pressure from 451 Pa to 75_2 Pa,the microwires gradually grow larger while the nanodots become smaller. To further achieve the controllable growth, the coarsening effect of ZrO_2 is modified by varying the growth time, and the experimental results show that the coarsening effect of microwires is higher than that of nanodots by increasing the growth time to quickly minimize ZrO_2 energy density.     

Laser-induced voltage effects in CaaCoaO9 thin films on tilted LaAlO3（001） substrates grown by chemical solution deposition

Laser-induced voltage effects in c-axis oriented Ca3Co4O9 thin films have been studied with samples fabricated on 10°tilted LaAIO3 （001） substrates by a simple chemical solution deposition method. An open-circuit voltage with a rise time of about 10 ns and full width at half maximum of about 28 ns is detected when the film surface is irradiated by a 308-nm laser pulse with a duration of 25 ns. Besides, opemcircuit voltage signals are also observed when the film surface is irradiated separately by the laser pulses of 532 nm and 1064 nm. The results indicate that Ca3Co4O9 thin films have a great potential application in the wide range photodetctor from the ultraviolet to near infrared regions.     

Nucleation of diamond on silicon wafers using C60 in the hot filament chemical vapour deposition system

Scanning electron microscopy and Raman shifts were used to study the process of diamond nucleation and growth using C60 in the hot filament chemical vapour deposition (HFCVD) system.The process of nucleation and growth of diamond films on silicon wafer using C60 as intermediate layer in HFCVD system is described.In order to increase the density of diamond nuclei on the wafers,it is not necessary to use negative bias.The UV-light pre-treatment is not beneficial for improving the diamond nucleation.The multi-layers of C60 molecules,but not a monolayer,can increase the density of diamond nuclei in the presence of H atoms.     

MgB2 coated conductors directly grown on flexible metallic Hastelloy tapes by hybrid physical–chemical vapor deposition

MgB₂ coated conductors (CCs), which can avoid the low packing density problem of powder-in-tube (PIT) processed wires, can be a realistic solution for practical engineering applications. Here we report on the superior superconducting properties of MgB₂ CCs grown directly on the flexible metallic Hastelloy tapes without any buffer layer at various deposition temperatures from 520 to 600 °C by using hybrid physical–chemical vapor deposition (HPCVD) technique. The superconducting transition temperatures (T_c) are in the range of 38.5–39.4 K, comparable to bulk samples and high quality thin films. Clear (101) and (002) reflection peaks of MgB₂ are observed in the X-ray diffraction patterns without any indication of chemical reaction between MgB₂ and Hastelloy tapes. From scanning electron microscopy, it was found that connection between MgB₂ grains and voids strongly depend on the growth temperature. A systematic increase in the flux pinning force density and thereby the critical current density with decreasing growth temperature was observed for the MgB₂ CCs. The critical current density (J_c) of J_c(5 K, 0 T) ～10⁷ A/cm² and J_c(5 K, 2.5 T) ～10⁵ A/cm² has been obtained for the sample fabricated at a low growth temperature of 520 °C. The enhanced J_c (H) behavior can be understood on the basis of the variation in the microstructure of MgB₂ CCs with growth temperature.     

Observation of positive and small electron affinity of Si-doped AlN films grown by metalorganic chemical vapor deposition on n-type 6H–SiC

We have investigated the electron affinity of Si-doped AlN films(N_(Si)= 1.0 × 10~(18)–1.0 × 10_(19)cm~(-3)) with thicknesses of 50, 200, and 400 nm, synthesized by metalorganic chemical vapor deposition(MOCVD) under low pressure on the ntype(001)6H–SiC substrates. The positive and small electron affinity of AlN films was observed through the ultraviolet photoelectron spectroscopy(UPS) analysis, where an increase in electron affinity appears with the thickness of AlN films increasing, i.e., 0.36 eV for the 50-nm-thick one, 0.58 eV for the 200-nm-thick one, and 0.97 e V for the 400-nm-thick one.Accompanying the x-ray photoelectron spectroscopy(XPS) analysis on the surface contaminations, it suggests that the difference of electron affinity between our three samples may result from the discrepancy of surface impurity contaminations.