Analysis of the antitarnish film on a tin surface by x-ray photoelectron spectroscopy and Auger electron spectroscopy

A corrosion-resistant complex film formed in ethylenediaminetetra(methylidenephosphonic acid) (EDTMP) solution was determined by x-ray photoelectron spectroscopy and Auger electron spectroscopy to consist of 48.0% O, 11.7% Sn, 7.7% N, 22.1% C and 10.5% P. From the differences in the binding energies of Sn, N and O before and after film formation and the RPO^2?₃ and SnN vibrations in the Raman spectrum of the film, it was deduced that N and O in EDTMP were coordinated with Sn in the film.     

Quantitative surface analysis by X-ray photoelectron spectroscopy and X-ray excited auger electron spectroscopy

It is shown that X-ray excited KLL Auger electron spectra allow it to describe measured signal strengths similarly to X-ray photoelectron signals, thus offering valuable information on the quantitative surface composition of a solid sample. The principal equation and corresponding fundamental parameters are discussed. As a result Auger spectra of C, N, O, F, and Na can be easily used in a multiline approach for quantitative analysis. LMM and MNN spectra give rise to more problems, due to their more complicated structure, uncertainties with regard to the background and the influence of Coster-Kronig transitions. These problems are overcome by the use of empirical ratios of the strongest lines of 2p/LMM or 3d/MNN. Since these ratios are independent of sample composition, they allow it to transform the Auger signal into the corresponding photoelectron signal, provided that a standard sample has been measured. Thus a true additional information is obtained and moreover difficulties in cases of photoelectron spectra with overlapping lines from other chemical elements can be overcome.Dedicated to Professor Günther Tölg on the occasion of his 60th birthday     

Copper passivity and its breakdown in sodium bicarbonate solutions: A scanning electron microscopy and x-ray photoelectron and auger spectroscopy study

Effect of bicarbonate ions on the copper passivity and its local breakdown is studied by cyclic voltammetry, Auger spectroscopy, x-ray photoelectron spectroscopy, and scanning electron microscopy. Comparing data for solutions with various sodium bicarbonate concentrations shows copper to undergo pitting in 0.02 M NaHCO₃, whereas it remains stably passive in 0.10 M NaHCO₃. Independent studies suggest that carbonates play a protective role in stabilization of the oxide-hydroxide passive film on copper.     

State of the Cu electrode surface studied by X-ray photoelectron and Auger spectroscopies

Annealing of the copper plate in flame was found (by XPS and X-ray Auger spectroscopy) to enrich the surface copper layers in oxygen in the forms of Cu₂O and adsorbed oxygen. The changes in the surface layers of the copper cathode due to annealing can be the origin of the earlier found enhancement of its activity in the electrocatalytic hydrogenation of citral and trans-2-allyl-6-R-1,2,3,6-tetrahydropyridines (R = Me, All, Ph). This method of the copper electrode pre-treatment provides its long durability, an insignificant decrease in the electrocatalytic activity in time, and the reproducibility of the electrocatalytic hydrogenation of unsaturated organic compounds.     

Summary of ISO/TC 201 Standard: XX ISO 18118: 2004 – Surface chemical analysis – Auger electron spectroscopy and X‐ray photoelectron spectroscopy – Guide to the use of experimentally determined relative sensitivity factors for the quantitative analysis of homogeneous materials

ISO 18118 provides guidance on the measurement and use of experimentally determined relative sensitivity factors for the quantitative analysis of homogeneous materials by Auger electron spectroscopy (AES) and X‐ray photoelectron spectroscopy (XPS). This article provides a brief summary of this International Standard. Copyright © 2005 John Wiley & Sons, Ltd.     

Quantitative analysis of trace levels of surface contamination by X‐ray photoelectron spectroscopy. Part II: Systematic uncertainties and absolute quantification

We discuss analyses of trace levels of surface contamination using X‐ray photoelectron spectroscopy (XPS). The problem of quantifying common sources of statistical and systematic uncertainties for these measurements is formulated in terms of the needs of extreme ultraviolet lithography, but the results and conclusions are applicable to a broad range of XPS applications. We quantify the systematic uncertainties introduced by particular cases of overlapping peaks on different substrate structures by simulating measured spectra with the National Institute of Standards and Technology Database for the Simulation of Electron Spectra for Surface Analysis (SESSA). One example demonstrates that the relative atomic concentrations of trace elements such as S, P, and halogens on a Ru surface could be dramatically overestimated if the fitting of the overlapping Ru 3d and C 1s peaks excludes the contribution from carbon. We also show how spectra generated by SESSA can be compared with measured spectra to determine absolute amounts of surface impurities on layered samples of the type used for extreme ultraviolet lithography. We provide estimates of the total uncertainty for such measurements by considering the systematic limitations of SESSA and the statistical uncertainties of the measurements. The same procedure can be employed for other multilayered materials. Finally, we describe two approaches for converting XPS detection limits for an elemental impurity in an elemental matrix to the corresponding detection limits for the impurity as a thin film on the surface of the matrix material.     

Summary of ISO/TC 201 Technical Report: ISO/TR 19319: 2003—Surface chemical analysis—Auger electron spectroscopy and x‐ray photoelectron spectroscopy—Determination of lateral resolution,analysis area and sample area viewed by the analyser

ISO Technical Report 19319:2003 contains information on the determination of lateral resolution, analysis area and sample area viewed by the analyser in surface analyses by Auger electron spectroscopy and x‐ray photoelectron spectroscopy. This article provides a brief summary of this information. Copyright © 2004 John Wiley & Sons, Ltd.