非晶SiO2薄膜中氧双键缺陷电子及光学特性的第一性原理研究

利用第一性原理对离子溅射沉积的非晶SiO2薄膜微观结构进行了分析、研究,结果表明,氧双键缺陷（SGs）可以作为体缺陷稳定存在于非晶SiO2中,SGs缺陷导致非晶SiO2薄膜材料禁带中引入了新的电子态,减小了禁带宽度;同时采用时相关密度泛函理论（TDDFT）对其光学特性进行了研究,得到非晶SiO2薄膜介电常数与入射光子能量间的关系曲线,从介电常数的虚部发现SGs缺陷在3.6eV处存在一个光学吸收峰。     

非晶SiO_2薄膜中氧双键缺陷电子及光学特性的第一性原理研究

利用第一性原理对离子溅射沉积的非晶SiO2薄膜微观结构进行了分析、研究,结果表明,氧双键缺陷(SGs)可以作为体缺陷稳定存在于非晶SiO2中,SGs缺陷导致非晶SiO2薄膜材料禁带中引入了新的电子态,减小了禁带宽度;同时采用时相关密度泛函理论(TDDFT)对其光学特性进行了研究,得到非晶SiO2薄膜介电常数与入射光子能量间的关系曲线,从介电常数的虚部发现SGs缺陷在3.6eV处存在一个光学吸收峰.     

Structural-optical study of high-dielectric-constant oxide films

High-k polycrystalline Pr₂O₃ and amorphous LaAlO₃ oxide thin films deposited on Si(0 0 1) are studied. The microstructure is investigated using X-ray diffraction and scanning electron microscopy. Optical properties are determined in the 0.75-6.5 eV photon energy range using spectroscopic ellipsometry. The polycrystalline Pr₂O₃ films have an optical gap of 3.86 eV and a dielectric constant of 16-26, which increases with film thickness. Similarly, very thin amorphous LaAlO₃ films have the optical gap of 5.8 eV, and a dielectric constant below 14 which also increases with film thickness. The lower dielectric constant compared to crystalline material is an intrinsic characteristic of amorphous films.     

Fe,Ni掺杂CdS的电子结构和光学性质

基于密度泛函理论（DFT）的第一性原理研究了Fe,Ni单掺杂和（Fe,Ni）共掺杂CdS的能带结构、电子态密度分布、介电常数和光学吸收系数,分析了掺杂后电子结构和光学性质的变化.计算结果表明:掺杂体系的CdS晶格常量均减少,能带宽度减小,介电函数虚部ε₂（ω）都在0.53 eV左右出现了一个新峰,吸收光谱发生明显的红移,它们均在1.35 eV处出现较强吸收峰.     

Structural and optical properties of low temperature synthesized Nanostructured BiFeO3 thin films

Nanostructured bismuth ferrite (BiFeO₃) thin films were deposited on glass substrate by the sol-gel process. The as-fired film at 250 °C was found to be amorphous crystallizing to pure rhombohedral phase after annealing at 450 °C for 2 h in air. The XRD pattern shows that the sample is polycrystalline in nature. The average grain size of the film calculated from the XRD data was found to be 16 nm. The as-fired film show high transmittance that decreases after crystallization. The absorption edge of the films was found to be sharper and shifting towards the lower energy as the annealing temperature increases. The optical energy band gaps of the amorphous and crystalline films were found to be 2.63 and 2.31 eV, respectively. The refractive indices of the amorphous and crystalline films were 2.05 and 2.26, respectively.     

États de surface du sodium dans l'approximation des électrons quasi-libres

Electron states located near a (110) surface of a Na crystal are investigated by the method of matching the crystal wave function to the outside solution at the surface. The lower energetic states are in the fundamental state. An “anormal” optical band situated about 1.8 eV is discussed when the imaginary part of the dielectric function ?₂ has been determinated considering transitions with the k-vector component parallel to the surface.     

Effect of process parameters and post-deposition annealing on the microwave dielectric and optical properties of pulsed laser deposited Bi<Subscript>1.5</Subscript>Zn<Subscript>1.0</Subscript>Nb<Subscript>1.5</Subscript>O<Subscript>7</Subscript> thin films

Bismuth Zinc niobate (Bi_1.5Zn_1.0Nb_1.5O₇) thin films were deposited by pulsed laser deposition (PLD) method on fused silica substrates at different oxygen pressures. The structural, microwave dielectric and optical properties of these thin films were systematically studied for both the as-deposited and the annealed films at 600°C. The as-deposited films were all amorphous in nature but crystallized on annealing at 600°C in air. The surface morphology as studied by atomic force microscopy (AFM) reveals ultra-fine grains in the case of as-deposited thin films and cluster grain morphology on annealing. The as-deposited films exhibit refractive index in the range of 2.36–2.53 (at a wavelength of 750 nm) with an optical absorption edge value of 3.30–3.52 eV and a maximum dielectric constant of 11 at 12.15 GHz. On annealing the films at 600°C they crystallize to the cubic pyrochlore structure accompanied by an increase in band gap, refractive index and microwave dielectric constant.     

水杨醛缩苯胺锌及其薄膜的谱学性能

合成了一种新型的发光材料水杨醛缩苯胺锌(SAZ),利用真空热蒸镀制备了高质量、纳米级薄膜,利用红外光谱、差热-热重谱、X射线衍射谱、UV-Vis吸收谱、荧光光谱研究了水杨醛缩苯胺锌及其薄膜的结构、晶态、热稳定性以及光学特性,并利用循环伏安法、UV-Vis吸收谱确定了该材料的能级结构。结果表明,水杨醛缩苯胺锌无定性薄膜具有较高的热稳定性,在紫外光激发下产生绿色荧光,色纯度高, 亮度高。水杨醛缩苯胺锌薄膜在大气环境下存放,荧光衰减比8-羟基喹啉铝快,但受紫外光照射时,荧光衰减比8-羟基喹啉铝慢。水杨醛缩苯胺锌的HOMO能级为-5.659 eV,LUMO能级为-3.054 eV,禁带宽度为2.604 eV。     

Fe掺杂GaN光电特性的第一性原理研究

基于密度泛函理论体系,计算了本征GaN材料和12.5%的Fe掺杂GaN体系的光电特性,分析了晶体结构、能带结构和电子态分布、介电函数、吸收系数、折射率、反射率、能量损失谱和消光系数,从理论上讨论了掺杂对体系光电特性的影响.计算所得理想GaN的禁带宽度为3.41 eV,Fe的重掺杂体系明显变窄,为3.06 eV,但仍为直接带隙半导体.本征GaN材料与Fe掺杂GaN体系的静态介电常数为5.74和6.20,折射率为2.39和2.48,能量损失最大值在20.02 eV和18.96 eV,最大吸收系数能量均在13.80 eV左右.计算结果为Fe掺杂GaN高压光电导开关材料及器件的进一步研究提供了有力的理论依据和实验支持.     

Ge20Sb15Se65薄膜的热致光学特性变化研究

采用磁控溅射法制备了Ge₂₀Sb₁₅Se₆₅薄膜, 研究热处理温度(150—400 ℃)对薄膜光学特性的影响. 通过分光光度计、X射线衍射仪、显微拉曼光谱仪对热处理前后薄膜样品 的光学特性和微观结构进行了表征, 并根据Swanepoel方法以及Tauc公式分别计算了薄膜折射率色散曲线和光学带隙等参数. 结果表明当退火温度(T_a)小于薄膜的玻璃转化温度(T_g)时,薄膜的光学带隙(E_g^opt)随着退火温度的增加由1.845 eV上升至1.932 eV, 而折射率由2.61降至2.54; 当退火温度大于薄膜的玻璃转化温度时,薄膜的光学带隙随退火温度的增加由1.932 eV降至1.822 eV, 折射率则由2.54增至2.71. 最后利用Mott和Davis提出的非晶材料由非晶到晶态的结构转变模型对结果进行了解释, 并通过薄膜XRD和Raman光谱进一步验证了结构变化是薄膜热致变化的重要原因. 关键词： 20Sb₁₅Se₆₅薄膜')" href="#">Ge₂₀Sb₁₅Se₆₅薄膜 热处理 光学带隙 折射率     

First-principles investigation of electronic and optical properties in wurtzite Zn<Subscript>1-x</Subscript>Mg<Subscript>x</Subscript>O

A first-principles study has been performed to evaluate the electronic and optical properties of wurtzite Zn_1-xMg_xO. Substitutional doping is considered with Mg concentrations of x = 0, 0.0625, 0.125, 0.1875 and 0.25, respectively. Mg incorporation can induce band gap widening due to the decrease of Zn 4s states. The imaginary part of the dielectric function shows that the optical transition from band edge emission decreases slightly with increasing Mg contents. The optical band gap also increases from 3.2 to 3.7 eV with increasing Mg contents from 0.0625 to 0.25. The calculated results suggest that relatively high Mg concentration is necessary for effective band gap engineering of wurtzite Zn_1-xMg_xO.     

Fe和Ni共掺杂ZnO的电子结构和光学性质

基于密度泛函理论的第一性原理研究Fe,Ni单掺杂和(Fe,Ni)共掺杂纤锌矿型ZnO的能带结构、电子态密度分布、介电函数、光学吸收系数,分析了掺杂后电子结构与光学性质的变化.计算结果表明：掺杂体系的费米能级附近电子态密度主要来源于Fe 3d,Ni 3d态电子的贡献;与纯净ZnO相比,Fe,Ni单掺杂和(Fe,Ni)共掺杂ZnO的介电函数虚部均在0.46eV左右出现了一个新峰;Fe,Ni单掺杂和共掺杂ZnO的吸收光谱均发生明显的红移,并都在1.3eV处出现较强吸收峰.结合他人的计算和实验结果,给出了定性的讨 关键词： 氧化锌 掺杂 第一性原理 光学性质     

Disordering of the electronic structure of YBaCuO amorphous films upon incorporation of crystalline clusters formed in laser-induced plasma into their composition

The effect of crystalline clusters formed in a laser-induced plasma on the optical properties of YBa₂Cu₃O_{6 + x} amorphous films prepared by pulsed laser deposition has been investigated. It has been demonstrated that an increase in the number of clusters leads to a gradual disappearance of interference fringes inherent in optically homogeneous media. Simultaneously, the incorporation of metallic and insulating clusters into the amorphous medium results in a decrease in the optical band gap E ₀ of the YBaCuO amorphous matrix from 1.28 to 1.06 eV and a considerable decrease in the probability of interband optical transitions with charge transfer O 2p → Cu 3d due to the loosening of the structure and generation of local stresses. It has been revealed that there is an additional band gap E ₁, which decreases from 0.25–0.30 eV to zero values with a decrease in the optical band gap E ₀. The additional gap has been interpreted as an energy gap between localized states that belong to the valence and conduction bands. A decrease in the density of electronic states in the narrow 3d band leads to the overlap of tails of the density of states, so that the band gap E ₁ becomes negative.     

Optical and electrical properties of plasma-oxidation derived HfO2 gate dielectric films

High-k gate dielectric HfO₂ thin films have been deposited on Si(1 0 0) by using plasma oxidation of sputtered metallic Hf thin films. The optical and electrical properties in relation to postdeposition annealing temperatures are investigated by spectroscopic ellipsometry (SE) and capacitance-voltage (C-V) characteristics in detail. X-ray diffraction (XRD) measurement shows that the as-deposited HfO₂ films are basically amorphous. Based on a parameterized Tauc-Lorentz dispersion mode, excellent agreement has been found between the experimental and the simulated spectra, and the optical constants of the as-deposited and annealed films related to the annealing temperature are systematically extracted. Increases in the refractive index n and extinction coefficient k, with increasing annealing temperature are observed due to the formation of more closely packed thin films and the enhancement of scattering effect in the targeted HfO₂ film. Change of the complex dielectric function and reduction of optical band gap with an increase in annealing temperature are discussed. The extracted direct band gap related to the structure varies from 5.77, 5.65, and 5.56 eV for the as-deposited and annealed thin films at 700 and 800 °C, respectively. It has been found from the C-V measurement the decrease of accumulation capacitance values upon annealing, which can be contributed to the growth of the interfacial layer with lower dielectric constant upon postannealing. The flat-band voltage shifts negatively due to positive charge generated during postannealing.     

Microstructural and optical investigations of sol-gel derived ferroelectric BaTiO3 nanocrystalline films determined by spectroscopic ellipsometry

Ferroelectric BaTiO₃ nanocrystalline films (BTNFs) with the crystalline sizes of about 30 nm were grown on Pt/Ti/SiO₂/Si substrates by a modified sol-gel method. Spectroscopic ellipsometry (SE) was used to characterize the films in the photon energy range of 1.5-5.0 eV with a five-phase layered model (air/surface rough layer/BaTiO₃/interface layer/Pt). The optical properties in the transparent and absorption regions have been investigated with the Forouhi-Bloomer dispersion relation. With the aid of the structural and dielectric function models, the microstructure and electronic structure of the BTNFs can be readily obtained. It was found that the refractive index reaches the value of 2.20 in the transparent region. Based on the Sellmeier dispersion analysis, the single-oscillator energy is about 4.7 eV for the BTNFs. The long wavelength refractive index n(0) can be estimated to about 2.00 at zero point. The direct optical band gap energy approaches approximately 4.2 eV and Urbach band tail energy is 262±2 and 268±1 meV respectively with increasing crystalline size. A higher band gap observed can be owing to the known quantum confinement effect in the nanocrystalline formation and different fraction of amorphous and crystalline components. The theoretical analysis based on the effective mass approximation theory is well used to explain these experimental data.     

Optical and structural characterization of ultrananocrystalline diamond/hydrogenated amorphous carbon composite films deposited via coaxial arc plasma

Ultrananocrystalline diamond/hydrogenated amorphous carbon composite films were deposited in the ambient of hydrogen by coaxial arc plasma deposition. The film compositions and chemical bonding structures were investigated by X-ray diffraction, X-ray photoemission and hydrogen forward scattering spectroscopies. The sp³/(sp²+sp³) ratio and hydrogen content in the film were estimated to be 64% and 35?at.%, respectively. The optical parameters and the optical dispersion profile were determined by using a variable angle spectroscopic ellipsometer at 55°, 65° and 75° angle of incidence in the photon energy range of 0.9–5?eV. Combinations of multiple Gaussian, and Tauc-Lorentz or Cody-Lorentz dispersion functions are used to reproduce the experimental data. Results of ellipsometry showed a refractive index of approximately 2.05 (at 2eV) and optical band gap of 1.63?eV. The imaginary part of dielectric function exhibited a peak at 3.8?eV, which has assigned to π-π* electron transitions. Furthermore, Electron spin resonance measurements implied the existence of dangling bonds, which might have a partial contribution to the optical absorption properties of the deposited films. A correlation between optical parameters and structural profile of the deposited films is discussed.     

Electronic structure,optical dielectric constant and born effective charge of EuAlO3

EuAlO₃ (EAO) is synthesized by the sol–gel process. The Rietveld refinement of the X-ray diffraction data shows that the material has orthorhombic structure with Pbnm space group. The density functional theory calculations are initiated with the experimental lattice parameters. The full potential linearized augmented plane wave method and projector augmented wave method are used to investigate the ground state properties of EAO. An indirect band gap of 1.8 eV is observed with the valence band maximum at the Γ point and the conduction band minimum at the R point. The X-ray photoemission spectroscopy (XPS) spectra of EAO are obtained in the energy window of 0–1000 eV. Using the electronic density of states, the valence band (VB) spectrum of EAO is generated and compared with the observed VB-XPS spectrum. The optical dielectric constant and the refractive index of the material are calculated for the photon energy radiation. The optical properties show a considerable anisotropy in the material. The Born effective charge of various elements and the dielectric tensor of EAO have been calculated.     

Annealing-induced optical and sub-band-gap absorption parameters of Sn-doped CdSe thin films

Thin films of Sn-doped CdSe were prepared by thermal evaporation onto glass substrates in an argon gas atmosphere and annealed at different temperatures. Structural evaluation of the films was carried out using X-ray diffraction and their stoichiometry studied by energy-dispersive X-ray analysis. The films exhibit a preferred orientation along the hexagonal direction of CdSe. The optical transmittance of the films shows a red shift of the absorption edge with annealing. The fundamental absorption edge corresponds to a direct energy gap with a temperature coefficient of 3.34 × 10^?3 eV K^?1. The refractive index, optical conductivity and real and imaginary parts of the dielectric constants were found to increase after annealing. The sub-band gap absorption coefficient was evaluated using the constant photocurrent method. It varies exponentially with photon energy. The Urbach energy, the density of defect states, and the steepness of the density of localized states were evaluated from the sub-band-gap absorption.     

非线性光学晶体硼酸镧钠(Na_3La_9B_8O_(27))的光谱研究

测量了Na3La9B8O27晶体在紫外-可见光-红外波段的透射光谱和反射光谱,分析得到其在上述波段的吸收光谱。在波长400nm~2000nm范围内,透射比超过80%,禁带宽度为3.93eV,没有明显的缺陷和杂质吸收。测量了该晶体在太赫兹波段的时域光谱,分析得到其在上述波段的吸收光谱、折射光谱,且通过光学常数之间的关系,得到其介电常数ε曲线。在0.3~1.5THz内吸收小于10cm-1。在0.3~2.4THz内,介电常熟实部ε1成近似线性递增趋势,介电常熟虚部ε2小于0.03。     

Electronic,optical and bonding properties of MgCO3

The electronic, optical and bonding properties of MgCO₃ (magnesite, rhombohedral calcite-type structure) are calculated using a first-principles density-functional theory (DFT) method considering the exchange-correlation function within the local density approximation (LDA) and the generalized gradient approximation (GGA). The indirect band gap of magnesite is estimated to be 5.0 eV, which is underestimated by ～1.0 eV. The fundamental absorption edge, which indicates the exact optical transitions from occupied valence bands to the unoccupied conduction band, is estimated by calculating the photon energy dependent imaginary part of the dielectric function using scissors approximations (rigid shift of unoccupied bands). The optical properties show consistent results with the experimental calcite-type structure and also show a considerable optical anisotropy of the magnesite structure. The density of states and Mulliken population analyses reveal the bonding nature between the atoms.