Density and surface tension of molten calcium fluoride

The density and the surface tension of molten calcium fluoride have been measured in the temperature range from 1690 to 1790 K by an improved Archimedian method and a ring depressing technique (J. Crystal Growth 187 (1998) 391), respectively. The ring depressing technique was demonstrated as an effective technique to measure the surface tension in comparison with the conventional ring pulling technique. The density varied with the temperature change corresponding to a linear relationship: ρ=3.767−6.94×10⁻⁴T (K). The density of the CaF₂ melt at the melting point is 2.594 g/cm³, which is equal to the result obtained by Shiraishi and Watanabe (Bull. Res. Inst. Miner. Dressing Metal, Tohoku Univ. 34 (1978) 1), but the temperature coefficient of the density is different from the results obtained by other investigators. The thermal expansion coefficient of calcium fluoride melt linearly increases with temperature heating. The surface tension of molten calcium fluoride indicates a negative linear relationship as a function of the melt temperature: γ(T)=442.4−0.0816×T(K) (mN/m). The surface tension measured using the ring depressing technique is larger than those results obtained by other techniques.     

Facets formation of pyramidal Si nanocrystals selectively grown on Si(0 0 1) windows in ultrathin SiO2 films

We have used in situ scanning tunneling microscopy (STM) to study the facet formation in the selective growth of pyramidal Si nanocrystals on Si(0 0 1) windows in ultrathin 0.3-nm-thick SiO₂ films. Broad (0 0 1) surfaces developed as the top of the crystals, and {1, 1, (2n+1)} (n=1–6) facets formed the sidewalls. As growth continued, the slope angle of sidewall facets increased, and {1, 1, 9} and {1, 1, (2m+1)} (0 <m < 4) facets often came to coexist on the sidewalls. On well-oriented Si(0 0 1) surfaces, layer-by-layer growth in the [0 0 1] direction was dominant. On vicinal Si(0 0 1) surfaces, lateral step growth took place in the initial stage, and the layer-by-layer growth was suppressed until after a large (0 0 1) surface had formed as the top of the crystal.     

Synthesis and characterization of type-II textured tungsten disulfide thin films by vdWR process with Pb interfacial layer as texture promoter

The growth of type-II textured tungsten disulfide (WS₂) thin films by solid state reaction between the spray deposited WO₃ and gaseous sulfur vapors with Pb interfacial layer has been studied. X-ray diffraction (XRD) technique is used to measure the degree of preferred orientation ‘S’ and texture of WS₂ films. Scanning electron microscopy (SEM) and transmission electron microscopy techniques have been used to examine the microstructure and morphology. The electronic structure and chemical composition were studied using X-ray photoelectron spectroscopy (XPS). The use of Pb interfacial layer for the promotion of type-II texture in WS₂ thin films is successfully demonstrated. The presence of (0 0 3 l), (where l=1, 2, 3, …) family of planes in the XRD pattern indicates the strong type-II texture of WS₂ thin films. The crystallites exhibit rhombohedral (3R) structure. The large value of ‘S’ (1086) prompts the high degree of preferred orientation as well. The stratum of crystallites with their basal plane parallel to the substrate surface is seen in the SEM image. The EDS and XPS analyses confirm the tungsten to sulfur atomic ratio as 1:1.75. We purport that Pb interfacial layer enhances type-II texture of WS₂ thin films greatly.     

AFM investigation of step kinetics and hillock morphology of the {1 0 0} face of KDP

Step velocities and hillock slopes on the {1 0 0} face of KDP were measured over a supersaturation range of 0<σ<0.15, where σ is the supersaturation. The formation of macrosteps and their evolution with distance from the hillock top were also observed. Hillock slope depended linearly on supersaturation and hillock geometry. The two non-equivalent sectors exhibited different slopes and step velocities. AFM shows an elementary step height of 3.7 Å, or half the unit cell height, whereas previous interferometric experiments assumed the elementary step was a unit cell. Values of the step edge energy (), the kinetic coefficients for the slow and fast directions (β_S and β_F), and the activation energies for slow and fast step motion (E_a,S and E_a,F) were calculated to be 24.0 erg/cm², 0.071 cm/s, 0.206 cm/s, 0.26 eV/molecule, and 0.21 eV/molecule, respectively. Analysis of macrostep evolution including the dependence of step height on time and terrace width on distance were performed and compared to predictions of published models. The results do not allow us to distinguish between a shock wave model and a continuous step-doubling model. Analysis within the latter model leads to a characteristic adsorption time for impurities (λ⁻¹) of 0.0716 s.     

Hydrothermal synthesis of MoS2 nanowires

The MoS₂ nanowires with diameters of 4 nm and lengths of 50 nm were synthesized by a hydrothermal method using 0.36 g MoO₃ and 1.8 g Na₂S as precursors in 0.4 mol/l HCl solution at 260°C. The products are characterized by XRD, XPS, TEM, HTEM and BET. Results show that the as-prepared MoS₂ nanowires consist of 1–10 sulfide layers with BET surface areas of 107 m²/g. The possible reaction route and the formation mechanism of the MoS₂ nanowires are discussed. The effects of exterior conditions such as pH value, temperature, concentration of precursors and additives on the particle size and morphology of MoS₂ crystallites were investigated.     

Ambient-condition growth of superconducting YBa2Cu4O8 single crystals using KOH flux

YBa₂Cu₄O₈ is a stoichiometric oxide superconductor of T_c80 K. Unlike YBa₂Cu₃O_7−δ, this compound is free from oxygen vacancy or twin formation and does not have any microscopic disorder in the crystal. Doping with Ca raises its T_c to 90 K. The compound is a promising superconductor for technological application. Up to now, single crystals have not been grown without using specialized apparatus with extremely high oxygen pressure up to 3000 bar and at over 1100 °C due to the limited range of reaction kinetics of the compound. This fact has delayed the progress in the study of its physical properties and potential applications. We present here a simple growth method using KOH as flux that acts effectively for obtaining high-quality single crystals in air/oxygen at the temperature as low as 550 °C. As-grown crystals can readily be separated from the flux and exhibit a perfect orthorhombic morphology with sizes up to 0.7×0.4×0.2 mm³. Our results are reproducible and suggest that the crystals can be grown using a conventional flux method under ambient condition.     

Properties of ZnO films grown on (0 0 0 1) sapphire substrate using H2O and N2O as O precursors by atmospheric pressure MOCVD

In this paper, we compare the properties of ZnO thin films (0 0 0 1) sapphire substrate using diethylzinc (DEZn) as the Zn precursor and deionized water (H₂O) and nitrous oxide (N₂O) as the O precursors, respectively in the main ZnO layer growth by atmospheric pressure metal–organic chemical vapor deposition (AP-MOCVD) technique. Surface morphology studied by atomic force microscopy (AFM) showed that the N₂O-grown ZnO film had a hexagonal columnar structure with about 8 μm grain diameter and the relatively rougher surface compared to that of H₂O-grown ZnO film. The full-widths at half-maximum (FWHMs) of the (0 0 0 2) and () ω-rocking curves of the N₂O-grown ZnO film by double-crystal X-ray diffractometry (DCXRD) measurement were 260 and 350 arcsec, respectively, indicating the smaller mosaicity and lower dislocation density of the film compared to H₂O-grown ZnO film. Compared to H₂O-grown ZnO film, the free exciton A (FX_A) and its three phonon replicas could be clearly observed, the donor-bound exciton A⁰X (I₁₀):3.353 eV dominated the 10 K photoluminescence (PL) spectrum of N₂O-grown ZnO film and the hydrogen-related donor-bound exciton D⁰X (I₄):3.363 eV was disappeared. The electron mobility (80 cm²/V s) of N₂O-grown ZnO film has been significantly improved by room temperature Hall measurement compared to that of H₂O-grown ZnO film.     

Hexagonal AlN films grown on nominal and off-axis Si(0 0 1) substrates

Nucleation and growth of wurtzite AlN layers on nominal and off-axis Si(0 0 1) substrates by plasma-assisted molecular beam epitaxy is reported. The nucleation and the growth dynamics have been studied in situ by reflection high-energy electron diffraction. For the films grown on the nominal Si(0 0 1) surface, cross-sectional transmission electron microscopy and X-ray diffraction investigations revealed a two-domain film structure (AlN¹ and AlN²) with an epitaxial orientation relationship of [0 0 0 1]_AlN || [0 0 1]_Si and AlN¹ || AlN² || [1 1 0]_Si. The epitaxial growth of single crystalline wurtzite AlN thin films has been achieved on off-axis Si(0 0 1) substrates with an epitaxial orientation relationship of [0 0 0 1]_AlN parallel to the surface normal and 0 1 1 0_AlN || [1 1 0]_Si.     

Photocurrent measurements on GaAs1−xNx epilayers grown by metalorganic chemical vapor deposition

GaAs_1−xN_x epilayers were grown on a GaAs(0 0 1) substrate by metalorganic chemical vapor deposition. Composition was determined by high resolution X-ray diffraction. Band gap was measured from 77 to 400 K by using photocurrent measurements. The photocurrent spectra show clear near-band-edge peak and their peak energies drastically decrease with increasing nitrogen composition due to band gap bowing in the GaAs_1−xN_x epilayers. Those red shifts were particularly notable for low nitrogen compositions. However, the shifts tended to saturate when the nitrogen composition become higher than 0.98%. When the nitrogen composition is in the range 1.68–3.11%, the measured temperature dependence of the energy band gap was nicely fitted. However, the properties for the nitrogen composition range 0.31–0.98% could not be fitted with a single fitting model. This result indicates that the bowing parameter reaches 25.39 eV for low nitrogen incorporation (x=0.31%), and decreases with increasing nitrogen composition.     

Synthesis, thermal and magnetic properties of new metal iodate: (LiFe1/3)(IO3)2

This paper reports the detail synthesis of a new kind of metal iodate, anhydrous (LiFe_1/3)(IO₃)₂, from aqueous solutions. The synthesized compound shows spinal morphology and is chemical stable up to 400°C. The iodate shows paramagnetic behavior from room temperature down to 4.2 K. At room temperature, the new compound has a hexagonal structure with the lattice parameters a=5.4632(2) Å, c=5.0895(6) Å, Z=1, space group of P6₃.     

Surface and interfacial structure of epitaxial SrTiO3 thin films on (0 0 1) Si grown by molecular beam epitaxy

Effects of relaxation of interfacial misfit strain and non-stoichiometry on surface morphology and surface and interfacial structures of epitaxial SrTiO₃ (STO) thin films on (0 0 1) Si during initial growth by molecular beam epitaxy (MBE) were investigated. In situ reflection high-energy electron diffraction (RHEED) in combination with X-ray diffraction (XRD), atomic force microscopy (AFM), X-ray photoelectron spectrometry (XPS) and transmission electron microscopy (TEM) techniques were employed. Relaxation of the interfacial misfit strain between STO and Si as measured by in situ RHEED indicates initial growth is not pseudomorphic, and the interfacial misfit strain is relaxed during and immediately after the first monolayer (ML) deposition. The interfacial strain up to 15 ML results from thermal mismatch strain rather than lattice mismatch strain. Stoichiometry of STO affects not only surface morphology but interfacial structure. We have identified a nanoscale Sr₄Ti₃O₁₀ second phase at the STO/Si interface in a Sr-rich film.     

Growth of NaBi(WO4)2 crystal by modified-Bridgman method

NaBi(WO₄)₂ (NBW) crystals have been grown for the first time by modified-Bridgman method. Influences of some factors on the crystal growth process are discussed. X-ray powder diffraction experiments show that the unit cell parameters of NBW crystal are a=b=0.5284 nm, c=1.1517 nm, and V=0.3215 nm³. The differential thermal analysis shows that the NBW crystal melts at 923°C.     

Porous crystal structures obtained from directionally solidified eutectic precursors

Interconnecting cage-like porous structures of several halide compounds were prepared by the selective leaching of one eutectic phase method. The binary eutectic precursors were prepared by directional solidification using the Bridgman crystal growth technique. Porous NaMgF₃ (40% pore volume), CaF₂ (57% pore volume) and BaF₂ (43% pore volume) crystals were obtained after water leaching the NaF component of the directionally solidified NaF/NaMgF₃, NaF/CaF₂ and NaF/BaF₂ eutectics with the appropriate entangled microstructure. The growth conditions for eutectic-coupled growth and the morphology of the eutectics have been determined. In the coupled growth regime, the size of the eutectic phases “λ” is fairly uniform and varies with the eutectic growth rate “v” as λ²v=constant, which allows us to control the pore size within the 0.5–10 μm range. The simplicity and versatility of the eutectic growth also allows us to fabricate highly aligned porous structures at relatively high production rates.     

Absorption spectra of GaN: film characterization by Urbach spectral tail and the effect of electric field

The absorption tail of undoped and Si-doped GaN films was investigated at different temperatures and under applied electric field. It was found that the spectral dependence of logarithm of absorption coefficient is combined of two linear functions: ln[(hν)]=C₁+(hν−E_g)/U₁ for hν<3.42 eV and ln[(hν)]=C₂+(hν−E_g)/U₂ for 3.44<hν<3.5 eV with Urbach energies U₁=400–470 meV and U₂=10–20 meV. The influence of an electric field effect on the absorption spectra follows the Dow and Redfield theory. It was shown that the intrinsic electric field about 10⁵ V/cm exists in our samples. The implemented analysis of the absorption spectra gives the qualitative method of film characterization.     

Microstructure and growth rate of chemical vapour deposited TiN films in a vertical cold wall reactor

TiN films were grown on SUS304 substrates heated by an induction furnace in a vertical cold wall reactor. Scanning electron microscopy, transmission electron microscopy and X-ray diffraction were used to characterize the microstructures of films obtained at different deposition conditions (temperature, gas flow rate and gas composition). Film structures obtained in the present vertical reactor had the following features compared with those in the tubular reactor: (1) Abnormally grown “star-shaped” crystals were observed on the surfaces of films deposited in the following ranges of total gas flow rate (Q_T), temperature (T) and partial pressures (P): 9.0×10⁻⁶ ≤ Q_T ≤ 1.6×10⁻⁵ m³ s⁻¹, 1223 ≤ T ≤ 1273 K, 0.92 ≤ P_TiCl4 ≤ 6.18 kPa, P_H2 = P_N2. The matrix grains were responsible for (211) preferred orientation. (2) Surface morphologies did not vary so much with P_TiCl4. On the other hand, a drastic change was brought about by adding HCl to the source gas, i.e., plate-shaped crystals dominated and the large “star-shaped” crystals were no longer present. (3) The apparent activation energy for deposition reaction was 230 kJ/mol (1173 ≤ T ≤ 1273 K) and 76.5 kJ/mol (1273 ≤ T ≤ 1373 K) at P_TiCl4 = 2.43 kPa and P_H2 = P_N2 = 49.45 kPa.     

Structural, thermal and dielectric studies on a new solution grown 4-dimethylaminopyridinium dihydrogen phosphate crystal

Single crystals of 4-dimethylaminopyridinium dihydrogen phosphate (DMAPDP) (C₇H₁₃N₂PO₄) were grown by the solvent evaporation method. The three-dimensional structure was solved by the single-crystal X-ray diffraction method which belongs to triclinic crystal system and the molecular arrangements in the crystal were studied. The thermal behaviour was investigated using differential scanning calorimetry (DSC) and no phase transition was identified in the temperature region −150 to 230 °C. The thermal parameters—thermal diffusivity (), thermal effusivity (e), thermal conductivity (K) and heat capacity (C_p) of DMAPDP were measured by an improved photopyroelectric technique at room temperature. Dielectric constant and dielectric loss of the grown crystal were evaluated for the frequency range 1–200 KHz in the temperature region 28–135 °C. The Vicker's hardness was measured as 42.2 for a load of 98.07 mN. The laser induced surface damage threshold of DMAPDP crystal was found to be 4.8 GW/cm² with nanosecond Nd:YAG laser.     

Study on the Ce substitution effects of BiFeO3 films on ITO/glass substrates

Ce substituted Bi_1−xCe_xFeO₃ (BCFO) films with x=0–0.15 were deposited on indium tin oxide (ITO)/glass substrates by sol–gel process annealed at 500 °C. Rhombohedral phase was confirmed by XRD study and no impure phases were observed till x=0.15. Substantially enhanced ferroelectricity was observed at room temperature due to the substitution of Ce. In the films with x=0.05 and 0.10, the double remnant polarization are 75.5 and 57.7 μC/cm² at an applied field 860 kV/cm. Moreover, the breakdown field was enhanced in the films with Ce substitution.     

Facile synthesis of submicron BaTiO3 crystallites by a liquid–solid reaction method

Uniform, submicron BaTiO₃ crystallites in tetragonal structure were synthesized by a novel low-temperature liquid–solid reaction method mainly via two simple steps: firstly, BaO₂·H₂O₂ submicron particles of about 130–450 nm were precipitated from the reaction of BaCl₂ and H₂O₂ in a slightly alkaline (pH 8) aqueous solution under the ambient condition; secondly, tetragonal phase BaTiO₃ submicrocrystals with the size in the range of 180 to 400 nm could be produced by subjecting the as-prepared BaO₂·H₂O₂ and commercial TiO₂ submicron particles to thermal treatment in air at 700 °C for 10 h. The as-obtained products were characterized by X-ray powder diffraction, Raman spectroscopy, Fourier transform infrared spectroscopy, X-ray photoelectron spectroscopy and inductively coupled plasma-atomic emission spectroscopy, and scanning electron microscopy.     

Investigations on the effect of InSb and InAsSb step-graded buffer layers in InAs0.5Sb0.5 epilayers grown on GaAs (0 0 1)

We report the structural and electrical properties of InAsSb epilayers grown on GaAs (0 0 1) substrates with mid-alloy composition of 0.5. InSb buffer layer and InAs_xSb_1−x step-graded (SG) buffer layer have been used to relax lattice mismatch between the epilayer and substrate. A decrease in the full-width at half-maximum (FWHM) of the epilayer is observed with increasing the thickness of the InSb buffer layer. The surface morphology of the epilayer is found to change from 3D island growth to 2D growth and the electron mobility of the sample is increased from 5.2×10³ to 1.1×10⁴ cm²/V s by increasing the thickness of the SG layers. These results suggest that high crystalline quality and electron mobility of the InAs_0.5Sb_0.5 alloy can be achieved by the growth of thick SG InAsSb buffer layer accompanied with a thick InSb buffer layer. We have confirmed the improvement in the structural and electrical properties of the InAs_0.5Sb_0.5 epilayer by quantitative analysis of the epilayer having a 2.09 μm thick InSb buffer layer and 0.6 μm thickness of each SG layers.     

A simple method to synthesize single-crystalline β-wollastonite nanowires

The single-crystalline β-wollastonite (β-CaSiO₃) nanowires were prepared via a simple hydrothermal method, in the absence of any template or surfactant using cheap and simple inorganic salts as raw materials. Xonotlite [Ca₆(Si₆O₁₇)(OH)₂] nanowires were first obtained after hydrothermal treatment at a lower temperature of 200 °C for 24 h, and after being calcinated at 800 °C for 2 h, xonotlite nanowires completely transformed into β-wollastonite nanowires and the wire-like structure was preserved. The synthesized β-wollastonite nanowires had a diameter of 10–30 nm, and a length up to tens of micrometers, and the single-crystalline monoclinic parawollastonite structured β-wollastonite was identified by XRD with the space group of P2₁/a and cell constants of a=15.42 Å, b=7.325 Å, c=7.069 Å and β=95.38°. A possible growth mechanism of β-wollastonite nanowires was also proposed. The advantages of this method for the nanowire synthesis lie in the high yield, low temperature and mild reaction conditions, which will allow large-scale production at low cost.