用于并行激光直写的连续深浮雕衍射透镜阵列研究

研究了一种用于并行激光直写的连续深浮雕衍射透镜阵列方法.该方法采用连续浮雕衍射透镜阵列替换传统并行激光直写中的物镜阵列,在兼顾系统分辨力基础上,克服了波带片等衍射透镜阵列衍射效率低的缺点|同时因采用深浮雕结构优化环带宽度,可降低阵列的制作难度.针对并行激光直写系统阵列F/#小的特点,在建立连续深浮雕衍射透镜阵列非旁轴近似聚焦模型基础上,设计、制作和测试了波长为441.6 nm,F/#为7.5的连续深浮雕衍射透镜阵阵列.测试结果表明：该阵列的衍射效率优于70%,远高于波带片阵列的40%.     

激光直写制作的小F数连续浮雕衍射透镜轴向聚焦特性分析

为确定卷积效应以及深度制作误差对小F数连续浮雕衍射透镜(DOE)轴向聚焦特性影响,基于瑞利-索末菲衍射理论建立了激光直写制作的连续浮雕衍射透镜非旁轴近似轴向光强分布模型.该模型考虑了连续浮雕衍射透镜的轴向衍射聚焦特性与透镜结构参数、写入光斑尺寸和扫描间距以及深度制作误差的关系,克服了傍轴近似条件下传统模型的不精确性.为验证模型的正确性,用激光直写制作了设计波长为441.6 nm,F数为4以及相位匹配因子为3的连续浮雕衍射透镜,并测试了波长441.6 nm激光入射时透镜的轴向聚焦特性.实验与分析表明,该模型分析结果与实验测试结果符合,从而证实模型的有效性,为激光直写制作的小F数连续浮雕衍射透镜的应用提供了理论依据.     

高衍射效率衍射望远镜系统的设计/加工及成像性能测试

为提高衍射效率,设计并制作了口径为300mm的衍射成像系统.该系统的物镜是由一块四台阶位相型菲涅尔波带片通过激光直写套刻和Ar离子束物理刻蚀技术在石英玻璃基板上加工而成.测试了衍射物镜的衍射效率,实验结果表明:衍射物镜在波长632.8nm处的衍射效率为66.4%,达到理论值的82%.搭建了衍射成像系统光路,分别采用10μm星点孔与分辨率板,测试了系统的成像性能.实验测得星点像直径为44μm,分辨率板的极限分辨率达到84lp/mm,接近该系统的理论计算值,表明该衍射成像系统具有较好的成像性能.     

小F数衍射微透镜阵列光学性能研究

本文基于小光点扫描,在国内首次提出了一种测试小F数衍射微透镜阵列光学性能的方法.利用光通信用半导体激光器和探测器建立了一套测试系统,并对所研制的大阵列,小单元尺寸的多相位菲涅耳衍射微透镜阵列的衍射效率和点扩散函数进行了测试.结果表明,衍射微透镜实际衍射光斑比理论衍射受限光斑扩展不大,8相位和16相位石英微透镜的衍射效率分别高达80.2%和87.5%,说明本实验室对多相位的设计理论和制作工艺已基本掌握,满足应用的要求.     

飞秒激光和酸刻蚀方法制作凹面微透镜阵列

基于飞秒激光光刻技术和氢氟酸对光学玻璃的刻蚀,在K9光学玻璃表面制作了凹面微透镜阵列,并且可以以此为模板实现凸微透镜阵列的大量复制.用相位对比显微镜和扫描电子显微镜分析了微透镜阵列的表面轮廓,测试了微透镜阵列的光学衍射特征.该方法简单、透镜参量可控,制作的微透镜阵列能够用于分光、光束匀化、并行光刻等强激光领域.     

飞秒激光和酸刻蚀方法制作凹面微透镜阵列

基于飞秒激光光刻技术和氢氟酸对光学玻璃的刻蚀,在K9光学玻璃表面制作了凹面微透镜阵列,并且可以以此为模板实现凸微透镜阵列的大量复制.用相位对比显微镜和扫描电子显微镜分析了微透镜阵列的表面轮廓,测试了微透镜阵列的光学衍射特征.该方法简单、透镜参量可控,制作的微透镜阵列能够用于分光、光束匀化、并行光刻等强激光领域.     

连续型平面衍射聚光透镜掩模的制作

针对目前二元光学元件掩模制作工艺过程的诸多不足，对连续型平面衍射聚光透镜掩模的激光直写制作工艺进行了研究。基于基尔霍夫标量衍射理论，采用光线追迹法设计了连续型平面衍射聚光透镜掩模。采用激光直写技术，利用CLWS 300M／C极坐标激光直写设备、S1830光刻胶和MICROPOSIT 351显影液，进行了刻写实验。实验表明，激光能量、预烘烤温度、显影液浓度以及预曝光对掩模微结构的制作均有影响。最后制作了掩模。与二元光学元件掩模的制作工艺相比，该技术具有工艺简单、制作周期短且易于操作的优点。     

极坐标激光直写法制作圆对称连续衍射元件掩模的能量表征方法研究

采用激光直写法制作连续衍射光学元件,具有过程简单、周期短、成本低等优点。介绍了极坐标激光直写法制作圆对称连续衍射元件的原理。通过实验,研究了衍射微结构深度与激光功率、曝光位置半径与激光功率的关系。实验结果显示,在相同曝光位置半径条件下,微结构深度与激光功率呈正比;在相同微结构深度条件下,曝光位置半径与激光功率呈正比。分析总结出了极坐标激光直写法制作圆对称连续衍射元件的能量表征方法,并采用该方法成功制作了圆对称连续衍射聚光透镜掩模。     

衍射光学二维激光扫描器设计制作研究

提出、设计并采用激光直写和反应离子刻蚀技术制作出一种新型的衍射光学纯相位型二维激光扫描器,并进行了系统参数的实验测试,其扫描角度为２５°×２５°,衍射效率为４１％。     

紫外衍射微透镜阵列的设计与制备

为了提高紫外焦平面阵列的填充因子,可以通过微透镜阵列与紫外焦平面阵列的集成,以改善紫外焦平面阵列的探测性能。根据标量衍射理论设计了用于日盲型紫外焦平面阵列的128×128衍射微透镜阵列,其工作中心波长为350nm,单元透镜F数为F/3.56。采用组合多层镀膜与剥离的工艺方法制备了128×128衍射微透镜阵列,对具体的工艺流程和制备误差进行了分析,测量了衍射微透镜阵列的光学性能。实验结果表明:衍射微透镜阵列的衍射效率为88%,与理论值95%有偏差,制备误差主要来自对准误差和线宽误差。紫外衍射微透镜阵列具有均匀的焦斑分布,与紫外焦平面阵列单片集成能较好地改善器件的整体性能。     

Fabrication of PDMS microlens array by digital maskless grayscale lithography and replica molding technique

This paper presents a facile and effective method to fabricate microlens array in polydimethylsiloxane (PDMS). The microlens array model is fabricated in photoresist via digital maskless grayscale lithography technique and the replica molding technique is used to fabricate PDMS microlens array. A convex PDMS microlens array with rectangular aperture and concave PDMS microlens array with hexagonal aperture are fabricated. The morphological characteristics of the microlens arrays are measured by microscope and 3D profiler. The results indicate that the profiles of the PDMS microlens arrays are clear and distinct. This method provides a simple and low-cost approach to prepare large area, concave or convex with arbitrary shape microlens array, which has potential application in many optoelectronic devices.     

Mixed multi-region design of diffractive optical element for projection exposure system

The diffractive optical element (DOE) is widely used to generate various illumination modes in the projection lithography system. The working principle and design methods of the DOE are discussed in detail in this paper. A mixed multi-region design method is proposed to calculate the phase of DOE based on the poor spatial coherence of excimer laser, using the Gerchberg–Saxton (GS) algorithm. The DOEs generating circular, dipole and quadrupole illumination modes are designed and simulated by three different methods: single region design, repeated multi-region design and mixed multi-region design. The performance of these DOEs are compared and analyzed with these three design methods. The mixed multi-region design method is used to design the DOEs generating three illumination modes, the diffraction efficiencies are greater than 85%, and the non-uniformities of illumination are less than 3%. The analysis results indicate that the DOE designed by the mixed multi-region design can achieve higher diffraction efficiency and illumination uniformity of the far-field intensity distribution without modifying the GS algorithm.     

Techniques for formation of the surface profile of diffractive optical elements

We give a review of the findings of an investigation into a photolithographical method of fabricating diffractive optical elements (DOEs), based on the use of only one photomask with two transmittance gradations. The binarization of the continuous transmission function of the diffractive element is conducted using a technology of half-toning of continuous-tone images and the exposure of the light-sensitive medium is performed using an incoherent spatial filtration in combination with a conventional photolithographical process. We analyze how the DOE diffractive efficiency depends on photomask parameters, binarization methods and fabrication errors. Comparison of the characteristics of the method proposed with the well-known multilevel method is made. Peculiarities of fabricating DOEs with continuous phase profile resulting from the projection, contact, and X-ray lithography are discussed. The results of experimental research are given. A possibility of fabricating DOEs with an 80% diffractive efficiency using only one photomask is demonstrated.     

Investigation of physical properties of quartz after focused ion beam bombardment

Optical properties (transmission and refractive index) and phase change (from amorphous to crystal) of a commonly used glass, quartz, were investigated before and after focused ion beam (FIB) bombardment with ion energy from 30 to 50 keV. We found different influences of FIB bombardment on the optical properties and chemical structure of the quartz in the wavelength region of visible and near infrared, respectively. The quartz still can be used in the infrared wavelength for conventional optical applications. As an application example, an array of diffractive optical elements (DOEs) was directly fabricated on the quartz by the FIB milling. The measured diffraction efficiency of the DOEs is 83.5%, which is acceptable for practical use.This revised version was published online in March 2005. In the previous version, the published online date was missing     

毛细微模塑法制作聚合物微球的有序结构

用毛细微模塑法在玻璃基片上组装了聚苯乙烯微球紧密的有序阵列 .扫描电镜观察了组装后的微球排列 .结果表明 ,在毛细通道的出口端 ,聚苯乙烯的微球堆积得紧密有序 .毛细通道的尺寸 ,环境温度和聚合物微球乳液的浓度是毛细微模塑法的主要影响因素 .     

13.4nm软X射线干涉光刻透射光栅的优化设计

基于严格的矢量耦合波方法,结合纳米级光栅实际制作工艺,定量分析了在13.4 nm软X射线(TE偏振)正入射条件下,光栅材料、厚度、占空比、梯形浮雕底角大小等因素对光栅一级衍射效率的影响.结果表明,在此波段处,Si3N4、Cr、Au浮雕的相位作用对光栅衍射起重要影响,其中非金属材料Si3N4比金属材料Cr、Au的相位作用更明显.最后优化得到了用Si(或Si3N4)做衬底的si3N4、Cr、Au光栅,分析结果显示,其一级衍射效率优于目前用于13.4 nm软X射线干涉光刻的Cr、Si3N4复合光栅.     

数字微镜器件制造精度误差对紫外光调制特性的影响

数字微镜器件（DMD）的能量利用率对于提高无掩膜激光直写系统的效率十分重要。对DMD在相干光照明下的相位调制特性进行数值和实验分析,发现同种型号DMD在出射0级光垂直于微镜表面角度入射情况下的衍射图样,其光能量分布各不相同,有0级光强占总光强27.2%的情况,也有零0级光强占总光强13.1%的情况,理论计算表明,DMD的微镜偏转角存在1的误差可以使DMD衍射0级的衍射效率在极大和极小之间变化。这一结论对于选择高能量利用效率的DMD有重要参考价值。     

Simple and universal method in designs of high-efficiency diffractive optical elements for spectrum separation and beam concentration

Diffractive optical elements(DOEs) with spectrum separation and beam concentration(SSBC) functions have important applications in solar cell systems. With the SSBC DOEs, the sunlight radiation is divided into several wave bands so as to be effectively absorbed by photovoltaic materials with different band gaps. A new method is proposed for designing high-efficiency SSBC DOEs, which is physically simple, numerically fast, and universally applicable. The SSBC DOEs are designed by the new design method, and their performances are analyzed by the Fresnel diffraction integral method.The new design method takes two advantages over the previous design method. Firstly, the optical focusing efficiency is heightened by up to 10%. Secondly, focal positions of all the designed wavelengths can be designated arbitrarily and independently. It is believed that the designed SSBC DOEs should have practical applications to solar cell systems.