飞秒激光直写光量子逻辑门

量子比特在同一时刻可处于所有可能状态上的叠加特性使得量子计算机具有天然的并行计算能力,在处理某些特定问题时具有超越经典计算机的明显优势.飞秒激光直写技术因其具有单步骤高效加工真三维光波导回路的能力,在制备通用型集成光量子计算机的基本单元—量子逻辑门中发挥着越来越重要的作用.本文综述了飞秒激光直写由定向耦合器构成的光量子比特逻辑门的进展.主要包括定向耦合器的功能、构成、直写和性能表征,集成波片、哈达玛门和泡利交换门等单量子比特逻辑门、受控非门和受控相位门等两量子比特逻辑门的直写加工,并对飞秒激光加工三量子比特逻辑门进行了展望.     

极坐标激光直写法制作圆对称连续衍射元件掩模的能量表征方法研究

采用激光直写法制作连续衍射光学元件,具有过程简单、周期短、成本低等优点。介绍了极坐标激光直写法制作圆对称连续衍射元件的原理。通过实验,研究了衍射微结构深度与激光功率、曝光位置半径与激光功率的关系。实验结果显示,在相同曝光位置半径条件下,微结构深度与激光功率呈正比;在相同微结构深度条件下,曝光位置半径与激光功率呈正比。分析总结出了极坐标激光直写法制作圆对称连续衍射元件的能量表征方法,并采用该方法成功制作了圆对称连续衍射聚光透镜掩模。     

低空频模板实现微光变图像的激光直写方法

提出一种采用低空频模板实现微光变图像(micro-optical variable device)的激光直写方法。低空频模版由6×6个不同取向线条状单元图形构成，单元图形由空间光调制器输入，经精缩投影光学系统缩微，在光刻胶面上逐单元曝光。控制单元图形的结构取向能够实现各种复杂设计和特性的微光变图像。在低频光栅模板的基础上，给出了定向散斑结构输入模板的设计方法，它可进一步改进图像的非彩色效果。采用自行研制的SVG-LDW04型激光直写系统制作了微光变图像，其结构特征线度为4μm～100μm。该方法无需机械旋转机构，为实现微光变图像提供了一种便捷有效的手段。     

Second harmonic generation by femtosecond Yb-doped fiber laser source based on PPKTP waveguide fabricated by femtosecond laser direct writing

The frequency doubling of femtosecond pulses from an Yb-doped fiber laser source was demonstrated in a PPKTP waveguide fabricated by femtosecond laser direct writing. The PPKTP waveguide contains a fixed period of 8.9 μm and the feomtosecond fundamental pulses have a central wavelength of 1044 nm. A maximum SHG power of 406 mW was produced, yielding a conversion efficiency of 5.6%. Numerical simulations were carried out to investigate the property of frequency doubling for femtosecond pulses. The results show that the SHG process proceeds even the quasi-phase-matching (QPM) condition is not well satisfied, which is significantly different from that of “long” pulses or CW light and is accorded with the experimental results.     

通过光致还原调制氧化石墨烯寿命并用于微纳图形制备

氧化石墨烯因其宽带可调谐的荧光发射特性已被广泛应用于荧光成像、金属离子高灵敏检测和光电器件的制备.相比于荧光强度,氧化石墨烯荧光寿命不受材料厚度和激发功率的影响,具有更为稳定和均一的特性.本文研究了在激光还原过程中氧化石墨烯荧光寿命逐渐减小的变化行为,发现了长寿命sp~3杂化结构向短寿命sp~2杂化结构的转变.通过精确控制还原时间,结合激光直写技术,在单层氧化石墨烯薄膜上实现了二维码、条形码、图形和数字等微纳图形的制备,还在多层氧化石墨烯薄膜结构上获得了多寿命多层微纳图形.这种微纳图形的制备具有灵活无掩膜、高对比和多模式的特点,可用于高密度光学存储、信息显示和光电器件制备等诸多领域.     

飞秒激光直写生物凝胶模板原位合成纳米粒子

为了制备具有可控复杂形状和特定化学性质的聚合物微结构,提出了一种飞秒激光直写生物凝胶模板原位合成纳米粒子的方法。首先,采用飞秒激光直写技术加工带有COOH基团的复杂三维结构的生物凝胶模板,用氢氧化钠处理使COOH基团离子化为COO^-基团;然后,用金属盐溶液处理,使金属离子与COO^-基团螯合,形成纳米粒子结晶核。通过多次循环盐溶液处理步骤,控制模板中纳米粒子的粒径与含量。实验结果表明：所制备的生物凝胶模板具有亚100 nm分辨率和10 μm量级尺寸,纳米粒子含量高达9%。该法简单高效,具有很好的应用前景。     

3D integration of microcomponents in a single glass chip by femtosecond laser direct writing for biochemical analysis

3D integration of microcomponents in a single glass chip by femtosecond laser direct writing followed by post annealing and successive wet etching is described for application to biochemical analysis. Integration of microfluidics and microoptics realized some functional microdevices like a μ-fluidic dye laser and a biosensor. As one of practical applications, we demonstrate inspection of living microorganisms using the microchip with 3D microfluidic structures fabricated by the present technique.     

利用飞秒激光直写实现透明介电材料中三维维微微纳结构的制备与集成

本文综述了利用飞秒激光三维直写技术,在玻璃和晶体等透明介电材料中实现微流体、微光学、微电子学等一系列功能性微纳结构,并进一步构筑新型微纳光子器件的原理、技术与应用。     

Surface characteristics of SiO2-TiO2 strip fabricated by laser direct writing

SiO2-TiO2 sol-gel films axe deposited on SiO2/Si by dip-coating technique.The SiO2-TiO2 strips are fabricated by laser direct writing using an ytterbium fiber laser and followed by chemical etching.Surface structures,morphologies and roughness of the films and strips are characterized.The experimental results demonstrate that the SiO2-TiO2 sol-gel film is loose in structure and a shrinkage concave groove forms if the film is irradiated by laser beam.The surface roughness of both non-irradiated and laser irradiated areas increases with the chemical etching time.But the roughness of laser irradiated area increases more than thalt of non-irradiated area under the same etching time.After being etched for 28 s,the surface roughness value of the laser irradiated area increases from 0.3 nm to 3.1 nm.     

连续型平面衍射聚光透镜掩模的制作

针对目前二元光学元件掩模制作工艺过程的诸多不足，对连续型平面衍射聚光透镜掩模的激光直写制作工艺进行了研究。基于基尔霍夫标量衍射理论，采用光线追迹法设计了连续型平面衍射聚光透镜掩模。采用激光直写技术，利用CLWS 300M／C极坐标激光直写设备、S1830光刻胶和MICROPOSIT 351显影液，进行了刻写实验。实验表明，激光能量、预烘烤温度、显影液浓度以及预曝光对掩模微结构的制作均有影响。最后制作了掩模。与二元光学元件掩模的制作工艺相比，该技术具有工艺简单、制作周期短且易于操作的优点。     

微透镜变化对半导体激光器光束匀化效果的影响

为了实现高均匀性的半导体激光器泵浦光源,研究了成像型光束积分器中微透镜的变化对泵浦光均匀性的影响。详细讨论了微透镜数值孔径与入射光束的角度匹配的问题。推导了高斯光束经成像型光束积分器的光场分布模型,分析了微透镜的边缘衍射对光斑均匀性的影响,明确了微透镜孔径大小的取值范围,并利用ZEMAX进行了系统仿真及实验验证。结果表明,经优化后的成像型光束积分器实现了不均匀性为8.11%的矩形光斑。     

Influence of scanning velocity on femtosecond laser direct writing lines on FOTURAN glass

Lines are induced on the surface of a photosensitive (FOTURAN) glass by focused femtosecond laser transverse writing with scanning velocity in a wide range of 40- 1800μm/s. The formed lines are analyzed using scanning electron microscope (SEM) and optical microscope (OM). It is observed that three distinct morphologies of lines are produced depending on the scanning velocity. Lines written in low velocity level (40 - 100 μm/s) and high velocity level (1000 - 1800 μm/s) are uniform and regular, while those written in moderate velocity level (150 - 600 μm/s) are rough. The influence of scanning velocity is explained based on different pulses overlapping or cumulative dose of laser exposure in irradiated area. Fabrication of shallow groove on the surface is also demonstrated.     

Effects of thermal treatment on femtosecond laser fabricated diffraction gratings in polystyrene

We report the fabrication of efficient, buried diffraction gratings and micro-craters in bulk polystyrene using femtosecond laser direct writing technique. We recorded a maximum diffraction efficiency of 10% for a buried grating fabricated at 1 μJ energy, 1 mm/s speed, and a period of 30 μm. Buried micro-craters, with typical dimensions of ∼2 μm, were achieved at low energies and high scanning speeds. From the field emission scanning electron microscope studies, the observed emission is attributed as due to the inner surface modifications and the debris settled around the voids. The fabricated gratings subjected to heat treatment were tested for the diffraction efficiency and emission at different excitation wavelengths and the observed results are presented. Raman spectra collected from the femtosecond laser modified regions revealed the disappearance of few Raman modes at high peak intensities associated with incident Gaussian laser pulse. Potential applications of these luminescent micro-craters are highlighted.     

Tuning the refractive index in 3D direct laser writing lithography: towards GRIN microoptics

We report a study of the determination of polymer cross‐linking, namely the degree of conversion and refractive index of the microstructures created by two‐photon polymerization (TPP). The influence of TPP processing parameters such as laser intensity and scanning velocity is investigated. The degree of conversion is analyzed via Raman microspectroscopy and the refractive index is measured with the interferometric technique employing a Michelson interferometer. Moreover, the relationship between these two properties is revealed and details are discussed. The largest refractive index change that we have obtained is of the order of 10⁻². Finally, we propose and demonstrate experimentally the realization of the gradient‐index (GRIN) structure, resulting from a laser‐induced local refractive index modification due to monomer cross‐linking, i.e. degree of conversion. This work implies that the TPP technique is a valuable tool for the fabrication of GRIN microoptics for (in)homogeneous molding of light flow at the micrometer scale.

     

激光超衍射加工机理与研究进展

随着纳米科技和微纳电子器件的发展,制造业对微纳加工技术的要求越来越高.激光加工技术是一种绿色先进制造技术,具有巨大的发展潜力,己广泛应用于不同的制造领域.为实现低成本、高效率、大面积尤其是高精度的激光微纳加工制造,研究和发展激光超衍射加工技术具有十分重要的科学意义和应用价值.本文首先阐述了基于非线性效应的远场激光直写超衍射加工技术的原理与国内外发展状况,包括激光烧蚀加工技术、激光诱导改性加工技术和多光子光聚合加工技术等;然后介绍了几种基于倏逝波的近场激光超衍射加工技术,包括扫描近场光刻技术、表面等离子激元光刻技术等新型超衍射激光近场光刻技术的机理与研究进展;最后对激光超衍射加工中存在的问题及未来发展方向进行了讨论.     

微透镜阵列误差对半导体激光匀化性能的影响

为了减小微透镜阵列误差对匀化光斑的影响,深入研究微透镜阵列光束匀化系统中微透镜阵列相对位置误差对光束匀化性能的影响,设计了一种微透镜阵列光束匀化系统。依据相对位置误差类型的不同,将双列微透镜阵列间六个自由度变化导致的误差分为距离误差、偏移误差以及转动误差进行分析,并对每种误差对光束匀化性能的影响进行了研究。采用6板条条半导体激光器堆栈对上述匀化系统进行实验验证,实现了均匀性为90.75%的光斑,并对系统影响光斑性能的原因进行了分析。     

Study on the instantaneous characteristics of diffracted and transmitted light of static photorefractive grating illuminated by ultra-short pulse laser

Based on Kogelnik's coupled wave theory, the time-domain diffraction and transmission of static PR gratings are theoretically studied when they are illuminated by ultra-short pulse laser. Study shows that the waveforms of the diffracted and transmitted pulses depend on the readout pulse duration, grating spacing, crystal thickness and refractive index modulation. By changing the values of these parameters, the diffracted and transmitted waveforms can be controlled. Also we find there is a displacement of diffracted and transmitted pulse along the time-axis when compared to readout pulse. Conclusions of our study could be used in many areas, such as pulse shaping and signal processing.     

激光直写制作高阶螺旋相位板及其性能

将拓扑荷为4的螺旋相位光束与平面光干涉的计算全息图输入到空间光调制器中,得到含有多个衍射级次的高阶涡旋光束。为提高衍射效率,利用激光直写技术制作拓扑荷为4的高阶螺旋相位板,经测定,相位板深度理论数值为1.073 m,测量数值为1.082 m,相位板制作误差在0.83%以内。平行光束通过此相位板时,在夫琅和费衍射场获得一个高质量的高阶光学涡旋,光强分布与理论数值基本吻合,衍射效率达到86%。     

Low cost fabrication of SiO2 optical waveguides by laser direct writing on Ti-doped Sol-Gel films

A commercial direct laser writing (DLW) system operating at 1070 nm was used to fabricate SiO₂ optical waveguides on silicon wafers. A Ti-doped SiO₂ Sol-Gel film was deposited on the SiO₂/Si substrate by the dip-coating technique, based on which SiO₂ optical waveguides were patterned by DLW using a Ytterbium fiber laser and followed by chemical etching. The effects of laser parameters and the preheated temperature of Sol-Gel films on the dimensions of optical waveguides were studied systematically. The differences of etching rate between laser irradiated and non-irradiated areas in Sol-Gel films preheated at various temperatures are characterized by measuring the thickness of the films. Results demonstrate that the available laser power density range for laser densification and the width of the patterned optical waveguides are influenced strongly by the preheated temperature of the Sol-Gel films. The width of the optimized optical waveguide in this work is 25 μm. The minimum propagation loss of the fabricated optical waveguides is 1.7 dB cm⁻¹ at the wavelength of 1550 nm.     

A smile insensitive method for spectral linewidth narrowing on high power laser diode arrays

To eliminate the smile effect in spectral linewidth narrowing on high power laser diode arrays, we have introduced a plane reflective mirror into a common Littrow configuration external cavity to enhance the correlation among emitters. By this way, we obtained uniform spectral distribution among emitters of a 64-elements laser diode array with 35 GHz linewidth and 41 W output laser power.