InGaAsP/InP边发光管特性的研究

用液相外延技术生长的外延片,制成了SiO2条形限制的InGaAsP/InP边发光管,100mA下光功率1mW,最高值1.3mW,发射波1.31μm,半宽860A。研究了外延材料特性(如p-n结位置,有源层厚度和浓度)对器件光功率,光谱特性,和Ⅰ-Ⅴ特性的影响。有源层厚度(d)对光功率和光谱半宽有重要影响,p-n结不偏位的器件,光谱特性为单一的长波长发射蜂,具有正常的Ⅰ-Ⅴ特性。p-n偏离有源层的器件,光谱特性除长波长发射峰外,尚有9700A的InP发射峰,其Ⅰ-Ⅴ特性具有异常特性,导通电压>0.9V。     

Quantum well intermixing of multiple quantum wells on InP by argon plasma bombardment and the sputtered-SiO2 film

A quantum well intermixing process combining inductively-coupled-plasma reactive ion etching (ICP-RIE) and SiO₂ sputtering film was investigated for the InGaAsP and InGaAlAs multi-quantum wells (MQWs). Optimal distance is 300-nm-thick for InGaAsP and of 200-nm-thick for InGaAlAs. Between MQWs and the upper cladding by ICP-RIE and bombardment, covering the 300-nm-thick sputtered SiO₂ using rapid thermal annealer (RTA) processing resulted in a band-gap blue-shift of 90 nm for InGaAsP and of 60 nm for InGaAlAs.     

InGaAsP/InP evanescent mode waveguide optical isolators and their application to InGaAsP/InP/Si hybrid evanescent optical isolators

We theoretically investigated InGaAsP/InP evanescent mode waveguide optical isolators and proposed their application to InGaAsP/InP/Si hybrid evanescent optical isolators. InGaAsP/InP evanescent optical isolators are composed of semiconductor optical amplifier (SOA) waveguides having InGaAsP multiple quantum well (MQW) active layer and upper InGaAsP waveguide layer with ferromagnetic layer. Optical isolation is obtained for evanescent optical mode in the InGaAsP waveguide layer. InGaAsP/InP/Si hybrid evanescent optical isolators are theoretically proposed based on the idea of InGaAsP/InP evanescent optical isolators. InGaAsP/InP/Si hybrid evanescent optical isolators are composed of ferromagnetic metal loaded silicon evanescent waveguides with wafer-bonded InGaAsP/InP optical gain material. The optical isolation and propagation loss are discussed with the structure of silicon evanescent waveguides, and optical isolation of 8.0 dB/mm was estimated. The concept of semiconductor evanescent mode optical isolators is feasible with InP based photonic integrated circuits and advanced silicon photonics.     

Numerical study on strained InGaAsP/InGaP quantum wells for 850-nm vertical-cavity surface-emitting lasers

The physical and optical properties of compressively strained InGaAsP/InGaP quantum wells for 850-nm vertical-cavity surface-emitting lasers are numerically studied. The simulation results show that the maximum optical gain, transparency carrier densities, transparency radiative current densities, and differential gain of InGaAsP quantum wells can be efficiently improved by employing a compressive strain of approximately 1.24% in the InGaAsP quantum wells. The simulation results suggest that the 850-nm InGaAsP/InGaP vertical-cavity surface-emitting lasers have the best laser performance when the number of quantum wells is one, which is mainly attributed to the non-uniform hole distribution in multiple quantum wells due to high valence band offset. PACS 42.55.Px; 78.20.-e; 78.20.Bh; 78.30.Fs     

InGaAsP/InP双异质结发光管频响特性的研究

本文研究了光纤通信用1.3μmInGaAsP/InP双异质结发光管的频响特性。结果表明:器件有源区掺杂浓度;有源层厚度;注入电流;光谱特性;P-n结特性等因素,对发光管的频响特性有重要影响。老化前有源区DSD的存在与否对频响无明显关系。     

1.3μm InGaAsP/InP双异质结发光管的特性研究

用液相外延技术生长的三层和四层InGaAsP/InP双异质结材料,制成了1.3μm InGaAsP/InP双异质结发光管。光功率输出(100mA)>1.0mW,最高2mW,尾纤输出功率(N.A.0.23,芯径60μ)>50μW。文中描述了器件的特性参数,还讨论了光功率的饱和特性和退化特性。     

Characterization of surface deformation around Vickers indentations in InGaAsP epilayers on InP substrate

The deformation surrounding Vickers indentations on InGaAsP/InP epilayers have been studied in detail. The surface topography was characterized by using atomic force microscopy (AFM). The material pile-up and sink-in regions around the indentation impression was observed for the quaternary InGaAsP/InP epilayers. The sectional analysis mode of the AFM shows the depth profile at the indented region. Microindentation studies were carried out for different atomic fraction of the quaternary InGaAsP/InP compound semiconductor alloys. The microhardness values of InGaAsP/InP epilayers were found to be in the range of 5.08 and 5.73 GPa. These results show that the hardness value of the quaternary alloy drastically increases as the composition of As was increased by 0.01 atomic fraction and when the phosphorous concentration decreases from 0.4 to 0.38. The reason may be that the increase in As concentration hardens the lattice when phosphorous concentration was less and hardness decreases when phosphorous was increased.     

高功率808nm InGaAsP—GaAs分别限制结构的半导体激光器

介绍了研究分别限制结构ＩｎＧａＡｓＰ－ＧａＡｓ半导体激光器所得到的最新成果。利用引进的俄国技术，基于量子阱结构的ＩｎＧａＡｓＰ－ＧａＡｓ激光器，可用短时间液相外延技术制造。在ＧａＡｓ衬底上制成的ＩｎＧａＡｓＰ－ＧａＡｓ分别限制结构的激光器，主要参数如下：发射波入λ＝８０８ｎｍ，阈值电流密度Ｊ＝３００Ａ／ｃｍ＾２，对于条宽ω＝１００μｍ的激光器，连续功率为１－２Ｗ。     

InGaAsP quantum-wells saturable absorber for diode-pumped passively Q-switched 1.3-μm lasers

We demonstrate the first use of InGaAsP quantum wells as a saturable absorber in the Q-switching of a diode-pumped Nd-doped 1.3 μm laser. The barrier layers of the InGaAsP quantum-well device are designed to be a strong absorber for the suppression of the transition channel at 1.06 μm. With an incident pump power of 1.8 W, an average output power of 160 mW with a Q-switched pulse width of 19 ns at a pulse repetition rate of 38 kHz was obtained. PACS 42.60.Gd; 42.55.Xi; 42.65.Re     

InP-based optoelectronic devices for optical fiber communications

In this contribution we report the research and development of 1.55 μm InGaAsP/InP gain-coupled DFB laser with an improved injection-carrier induced grating and of high performance 1.3 μm and 1.55 μm InGaAsP/InP FP and DFB lasers for communications. Long wavelength strained MQW laser diodes with a very low threshold current (7–10 mA) have been fabricated. Low pressure MOVPE technology has been employed for the preparation of the layered structure. A novel gain-coupled DFB laser structure with an improved injection-carrier modulated grating has been proposed and fabricated. The laser structures have been prepared by hybrid growth of MOVPE and LPE techniques and reasonably good characteristics have been achieved for resultant lasers. High performance 1.3 μm and 1.55 μm InGaAsP/InP DFB lasers have successfully been developed for CATV and trunk line optical fiber communication. Presented at the 1st Czech-Chinese Workshop “Advanced Materials for Optoelectronics”, Prague, Czech Republic, June 13–17, 1998. Kunio Tada and Yoshiaki Nakano for their cooperation in the fabrication of the novel gain-coupled DFB lasers.     

基于分子束外延生长的1.05 eV InGaAsP的超快光学特性研究

利用分子束外延方法制备了应用于四结光伏电池的1.05 eV InGaAsP薄膜, 并对其超快光学特性进行了研究. 温度和激发功率有关的发光特性表明: InGaAsP材料以自由激子发光为主. 室温下InGaAsP材料的载流子发光弛豫时间达到10.4 ns, 且随激发功率增大而增大. 发光弛豫时间随温度升高呈现S形变化, 在低于50 K时随温度升高而增大, 在50–150 K之间时减小, 而温度高于150 K时再次增大. 基于载流子弛豫动力学, 分析并解释了温度及非辐射复合中心浓度对样品材料载流子发光弛豫时间S形变化的影响.     

Au-Zn,TiPdAu电极对InGaAsP/InP双异质结发光管可靠性影响的研究

本文用AES研究了P-InP/TiPdAu热处理前后的界面特性,结果表明:TiPd层对Au的内扩散和In的扩散有阻挡作用。以TiPdAu作InGaAsP/InP双异质结发光管的p面电极、镀Au作热沉,采用In焊料,研究了器件的可靠性问题,在室温大气气氛中;70℃存储,70～80℃带电老化,三种条件下长时间考核结果表明:器件的I-V特性正常,末见正向压降明显变化。还比较了Au-Zn材料作p面电极用TiPdAu作肖脱基势垒限制层制成的器件和用TiPdAu作电极材料制成的深Zn扩散型器件在老化过程中的特性变化,后二种结构的器件,在长期老化过程中,有源区中有大面积DSD生长和增殖。     

High-Power Electroabsorption Modulator Using Intrastep Quantum Well

An electroabsorption modulator using the intrastep quantum well （IQW） active region is fabricated for optical network systems. The strain-compensated InGaAsP/InGaAsP IQW shows good material quality and improved modulation properties, high extinction ratio efficiency IOdB/V and low capacitance （〈 0.42 pF）, with which an ultra high frequency （〉 15 GHz） can be obtained. High-speed measurement under high-power excitation shows no power saturation up to excitation power of 21 dBm. To our knowledge, the input optical power is the highest reported for multi-quantum well EAMs without heat sinks.     

1.3μm场助TE光阴极In1-xGaxAsyP1-y/InP的能带计算及外延层的设计

本文首先简述了1.3μm场助TE光阴极InP(衬底)/In_1-xGa_xAs_yP_1-y(光吸收层)/InP(发射层)/Ag/CsO的工作原理,并对其能带结构进行了计算,得到了In_1-xGa_xAs_yP_1-y(光吸收层)/InP(发射层)的势垒高度、掺杂、InP发射层厚度、组份、渐变区宽度,偏压及耗尽层宽度间的定量关系。并由此出发,对光阴极各参数的设计进行了分析讨论。     

有源层受主浓度对InGaAsP/InP双异质结发光管特性的影响

本文研究了有源层受主浓度(Pa)对InGaAsP/InP双异质发光管特性的影响。有源层受主浓度Pa≈2×1017～1×1018cm-3的器件,具有较大的光输出功率P≥1mW;截止频率fĉ为30～80MHz,并且有正常的Ⅰ-Ⅴ特性。有源层浓度高于上述浓度的器件,光输出功率降低,并且具有异常的Ⅰ-Ⅴ特性。在器件光谱半宽△λ=(λ2/1.24)nkT关系式中,n值是有源层受主浓度(Pa)的函数。上述结果表明:有源层受主浓度(Pa)是影响器件特性的重要因素之一。     

Photovoltaic spectroscopy of InGaAsP/InP multiple quantum wells

Photovoltaic Spectroscopy is used to study lattice matched Au/InGaAsP/InP multiple quantum wells at 4.2 < T < 300 K. Four quantum transitions are clearly identified in the spectra and their temperature shift mapped. The Au/InGaAsP Schottky barrier is found to be nearly temperature independent at φ_B ≃ 0.68 eV, and the binding energy of the 11H associated exciton estimated at E_b ≃ 11 meV. The 11H exciton displays a small electric field shift, to the red at low T, changing over to a blue shift at higher temperatures.     

晶格小失配InGaAsP材料特性及太阳电池应用

Ⅲ-Ⅴ族太阳电池效率的持续提升要求对能量转换材料的带隙宽度进行更细致划分,以实现对全光谱的高效利用。在短波红外波段,四元InGaAsP混晶材料因在带隙宽度和晶格常数的调节上具有很好的可操作性,是一种极具潜力的短波红外光电转换材料。本文对InGaAsP材料生长及子电池器件制备进行了研究,通过时间分辨荧光光谱、高分辨X射线衍射等表征手段对室温下晶格失配的InGaAsP材料进行了测试分析。实验结果表明,在一定程度负失配生长条件下,InGaAsP材料质量随着负失配程度逐渐提高。在后续电池制备过程中,一定程度负失配同样有助于电池器件性能提升,制备的单结电池开路电压由晶格匹配时的633 mV提高到负失配条件下的684 mV,从而为高效多结太阳电池的应用提供了新的技术路线。     

Asymmetric Colliding-Pulse Mode-Locking in InGaAsP Semiconductor Lasers

Asymmetric colliding-pulse mode-locking was successfully demonstrated in an InGaAsP laser. This laser had a single saturable absorber section located partway along the cavity length, and showed mode-locking operation at harmonics of the cavity roundtrip frequency. The method verified that optical pulse repetition up to subterahertz rates can be generated with nearly 1-mm-long mode-locked InGaAsP lasers.     

Investigation of temperature characteristics of modern InAsP/InGaAsP multi-quantum-well TJ-VCSELs for optical fibre communication

Continuous-wave (CW) performance of modern 1.3-μm InAsP/InGaAsP multi-quantum-well (MQW) tunnel-junction vertical-cavity surface-emitting diode lasers (TJ-VCSELs) is investigated using our comprehensive self-consistent simulation model to suggest their optimal design for room and elevated temperatures. For increasing ambient temperatures, an increase in the VCSEL threshold current has happened to be mostly associated with the Auger recombination. Nevertheless, the InAsP/InGaAsP VCSELs have been found to exhibit encouraging thermal behaviour with the quite high value of maximal operating temperature of 350 K. It has been found that 5-μm devices seem to be the most optimal ones because they demonstrate both the room temperature (RT) threshold current equal to only 0.55 mA and maximum operating temperature equal to as much as 345 K. For these devices, the characteristic temperature T0 is equal to 92 K for 290–305 K, 51 K for 310–325 K and 29 K for 330–345 K. Therefore, the InAsP/InGaAsP VCSELs have been found to offer very promising performance both at room and elevated temperatures as sources of the carrier 1.3-μm wave in the fibre optical communication using silica fibres.     

Single-step growth of InGaAsP/InP laser array on patterned InP substrate

Arrays of five InGaAsP/InP single mode junction-defined buried stripe heterostructure lasers are described. The laser arrays were grown on multi-channeled InP substrate by single-step liquid phase epitaxy. The buried double heterostructure and the lateral current confining structure were formed in the same growth process. InGaAsP layer growth is dominated by the preferred orientation, with (1 0 0) growth favored over other directions. As a result of low-temperature single-step growth, the device yield is high. These laser arrays are characterized by output power close to 0.6 W, high quantum efficiency, symmetrical far-field patterns and excellent linearity of the light–current curve. Stable single transverse mode operation obtained up to 600 mW emitted power.