Sensitivity of methyl thiolate desulfurization selectivity to reaction temperature and hydroxyl coverage

The adsorption and reaction of methanethiol (CH3SH) and dimethyl disulfide (CH3SSCH3) on Mo(110)-(1 x 6)-O have been studied using temperature-programmed reaction spectroscopy and reflection-absorption infrared spectroscopy over the temperature range of 110-550 K. The S-H bond is broken upon adsorption to form adsorbed OH, water, and methyl thiolate (CH3S-) at low temperature. Water is evolved at 210 and 310 K via molecular desorption and disproportionation of OH, respectively. Some hydroxyl remains on the surface up to 350 K. Methyl thiolate is also formed from CH3SSCH3 on Mo(110)-(1 x 6)-O. Methyl thiolate undergoes C-S cleavage above 300 K, yielding methane and methyl radicals. There is also a minor amount of nonselective decomposition leading to the formation of carbon and hydrogen. Methane production is promoted by adsorbed hydroxyl. As the hydroxyl coverage increases, the yield of methyl radicals relative to methane diminishes. Accordingly, there is more methane produced from methanethiol reaction than from dimethyl disulfide, since S-H dissociation in CH3SH produces OH. The maximum coverage of the thiolate is approximately 0.5 monolayers, based on the amount of sulfur remaining after reaction measured by Auger electron spectroscopy. In contrast to cyclopropylmethanethiol (c-C3H5CH2SH), for which alkyl transfer from sulfur to oxygen is observed, there is no evidence for transfer of the methyl group of methyl thiolate to oxygen on the surface. Specifically, there is no evidence for methoxy (CH3O-) in infrared spectroscopy or temperature-programmed reaction experiments.     

预吸附氧对NO在Pt(110)表面吸附和分解的影响

 利用程序升温反应谱、X射线光电子能谱和高分辨电子能量损失谱研究了NO在清洁和预吸附氧的Pt(110)表面的吸附和分解. 在清洁的Pt(110)表面,室温下低覆盖度时NO以桥式吸附为主,高覆盖度时NO以线式吸附为主. 加热过程中部分NO(主要是桥式吸附物种)分解,生成N2和N2O. 室温下O2在Pt(110)表面发生解离吸附. Pt(110)表面预吸附氧会抑制桥式吸附NO的生成,并导致其脱附温度降低40 K. 降低脱附温度有利于桥式吸附NO的分子脱附,从而抑制分解反应. 这些结果从表面化学的角度合理地解释了铂催化剂在富氧条件下对NO分解能力的降低.     

Low-temperature reduction of NO(2) on oxidized Mo(110)

The reactions of nitrogen dioxide (NO(2)) were investigated on oxidized Mo(110) containing both chemisorbed oxygen and a thin film oxide. NO(2) reacts on both oxidized Mo(110) surfaces via a combination of reversible adsorption and reduction to NO, N(2), and trace amounts of N(2)O below 200 K. On the surface containing chemisorbed O, there is some complete dissociation of NO(2) to yield N(a) and O(a). N(2) forms at high temperatures through atom combination. On both surfaces, NO is the predominant product of NO(2) reduction. However, the chemisorbed layer which has a low oxidation state, and hence a greater capacity to accept oxygen, more effectively reduces NO(2). The selectivity for N(2) formation over N(2)O is greater for NO(2) as compared with NO on both surfaces studied. The selectivity changes are largely attributed to an increase in the concentration of Mo=O species and a change in the distribution of oxygen on the surface. Notably, more oxygen, in particular Mo=O moieties, is deposited by NO(2) reaction than by O(2) reaction, indicating that NO(2) is a stronger oxidant. The fact that there are several N-containing species on the surface at low temperatures may also affect the product distribution. On both surfaces, N(2)O(4), NO(2), and NO are identified by infrared spectroscopy upon adsorption at 100 K. All N(2)O(4) desorbs by 200 K, leaving only NO(2) and NO on the surface. Infrared spectroscopy of NO(2) on (18)O-labeled surfaces provides evidence for oxygen transfer or exchange between different types of sites even at low temperatures.     

Promotion of formaldehyde production from adsorbed methoxy by oxidation of Mo(110) with NO2

The reaction of methoxy (OCH3) in the presence of NO2 is studied on a thin-film oxide of Mo(110) for its relevance to the alkane-assisted reduction of NO(x). Temperature-programmed reaction indicates that oxygen deposited by NO2 dissociation promotes formaldehyde evolution. This pathway is not observed in any appreciable amount for methoxy on the thin-film oxide of Mo(110), nor for the reaction of methoxy in the presence of NO or O2. No new intermediates, in particular those containing C-N bonds, are detected after NO2 is exposed to the surface containing methoxy. Furthermore, infrared spectra provide evidence that the presence of NO2 does not significantly perturb the methoxy intermediate. These results indicate that surface oxidation rather than intermolecular complexation is the most likely mechanism by which NO2 promotes the evolution of oxygenates. In addition, the presence of methoxy decreases the capacity of the Mo surface to reduce NO2. No N2 is produced, and molecular desorption predominates. There are also no NO(x) species present after heating to 500 K when NO2 reacts in the presence of methoxy, whereas monomeric NO and dinitrosyl are present when NO2 reacts alone. These results are discussed in the context of CH4-assisted NO(x) reduction.     

水在HfO2(111)和(110)表面的吸附与解离

运用广义梯度近似密度泛函理论方法(GGA-PW91)结合周期平板模型, 研究水分子在二氧化铪(111)和(110)表面不同吸附位置在不同覆盖度下的吸附行为. 通过比较不同吸附位的吸附能和几何构型参数发现:(111)和(110)表面铪原子(top 位)是活性吸附位. 水分子与表面的吸附能值随覆盖度的变化影响较小. 在(111)和(110)表面, 水分子都倾向以氧端与表面铪原子相互作用. 同时也计算了羟基、氧和氢在表面的吸附, Mulliken 电荷布居, 态密度及部分频率. 结果表明, 在两种表面羟基以氧端与表面铪相互作用, 氧原子与表面铪和氧原子同时成键, 而氢原子直接与表面氧原子相互作用形成羟基. 通过过渡态搜索, 水分子在(111)和(110)表面发生解离, 反应能垒分别为9.7和17.3 kJ·mol^-1, 且放热为59.9和47.6 kJ·mol^-1.     

Reactivity of V2O3(0001) surfaces: molecular vs dissociative adsorption of water

The adsorption of water on V2O3(0001) surfaces has been investigated by thermal desorption spectroscopy, high-resolution electron energy loss spectroscopy, and X-ray photoelectron spectroscopy with use of synchrotron radiation. The V2O3(0001) surfaces have been generated in epitaxial thin film form on a Rh(111) substrate with three different surface terminations according to the particular preparation conditions. The stable surface in thermodynamic equilibrium with the bulk is formed by a vanadyl (VO) (1x1) surface layer, but an oxygen-rich (radical3xradical3)R30 degrees reconstruction can be prepared under a higher chemical potential of oxygen (microO), whereas a V-terminated surface consisting of a vanadium surface layer requires a low microO, which can be achieved experimentally by the deposition of V atoms onto the (1x1) VO surface. The latter two surfaces have been used to model, in a controlled way, oxygen and vanadium containing defect centres on V2O3. On the (1x1) V=O and (radical3xradical3)R30 degrees surfaces, which expose only oxygen surface sites, the experimental results indicate consistently that the molecular adsorption of water provides the predominant adsorption channel. In contrast, on the V-terminated (1/radical3x1/radical3)R30 degrees surface the dissociation of water and the formation of surface hydroxyl species at 100 K is readily observed. Besides the dissociative adsorption a molecular adsorption channel exists also on the V-terminated V2O3(0001) surface, so that the water monolayer consists of both OH and molecular H2O species. The V surface layer on V2O3 is very reactive and is reoxidised by adsorbed water at 250 K, yielding surface vanadyl species. The results of this study indicate that V surface centres are necessary for the dissociation of water on V2O3 surfaces.     

Theoretical study of adsorption of O((3)P) and H(2)O on the rutile TiO(2)(110) surface

The adsorption of oxygen atoms O(3P) on both ideal and hydrated rutile TiO(2)(110) surfaces is investigated by periodic density functional theory (DFT) calculations within the revised Perdew-Burke-Ernzerhof (RPBE) generalized gradient approximation and a four Ti-layer slab, with (2 x 1) and (3 x 1) surface unit cells. It is shown that upon adsorption on the TiO(2) surface the spin of the O atom is completely lost, leading to stable surface peroxide species on both in-plane and bridging oxygen sites with O-binding energies of about 1.0-1.5 eV, rather than to the kinetically unstable terminal Ti-O and terminal O-O species with smaller binding energies of 0.1-0.7 eV. Changes in O-atom coverage ratios between 1/3 and 1 molecular layer (ML) and coadsorption of H(2)O have only minor effects on the O-binding energies of the stable peroxide configurations. High O-atom diffusion barriers of about 1 eV are found, suggesting a slow recombination rate of adsorbed O atoms on TiO(2)(110). Our results suggest that the TiOOTi peroxide intermediate experimentally observed in photoelectrolysis of water should be interpreted as a single spinless O adatom on TiO(2) surface rather than as two Ti-O* radicals coupled together.     

Chain structures of surface hydroxyl groups formed via line oxygen vacancies on TiO2(110) surfaces studied using noncontact atomic force microscopy

Structures of surface hydroxyl groups arranged on a reduced TiO2(110) surface that had line oxygen vacancies were studied using noncontact atomic force microscopy (NC-AFM). NC-AFM results revealed that by increasing the density of oxygen vacancies on the TiO2(110) surface, line oxygen vacancies were formed by removal of oxygen atoms in a bridge oxygen row on the TiO2(110) surface. After the TiO2(110) surface with the line oxygen vacancies was exposed to water, the surface showed hydroxyl chain structures that were composed of hydroxyl groups linearly arranged in a form of two rows on the line oxygen vacancies and on a neighboring bridge oxygen row. In-situ NC-AFM measurements of these surfaces exposed to water at room temperature revealed that hydroxyl chain structures were formed at the line oxygen vacancy. Annealing above 500 K was sufficient to remove the hydroxyl chain structures on the TiO2(110) surface and allowed line oxygen vacancies to reappear on the surface. The line oxygen vacancies are active sites for water dissociation. In conclusion, the formation of the hydroxyl chain structure suggests that the surface hydroxyl groups on a TiO2(110) surface can be controlled by preparing oxygen vacancy structures on the surface.     

Characterization of mo deposited on a TiO2(110) surface by scanning tunneling microscopy and Auger electron spectroscopy

The properties of Mo ultrathin films deposited on a TiO2(110) surface were investigated by scanning tunneling microscopy (STM) and spectroscopy (STS), as well as by Auger electron spectroscopy (AES). The substrate exhibited mainly large (1 x 1) terraces decorated by additional [001] rows (missing or added 1D structures) of reduced TiO(x) phases. Only a few percent of the surface exhibited a cross-linked (1 x 2) arrangement. The deposition of Mo layers at room temperature with a rate of approximately 0.4 monolayer/ min resulted in nanoclusters of 1-2 nm with a low-profile shape (2D-like). Preferential decoration of the atomic steps was not found; at the same time, the 1D defect sites of missing or added rows on the (110) terraces were characteristically decorated by larger Mo nanocrystallites. This behavior indicates that the mobility of Mo atoms is higher on the more reduced regions of the substrate. The high dispersion of the Mo adlayer changed only slightly on annealing up to 700 K; in the range of 900-1050 K, however, a significant increase of the particle size accompanied by splitting of the TiO2(110) terraces was observed. This behavior may be explained by the partial oxidation of the supported Mo (accompanied by the reduction of the substrate) into tetragonal crystallites oriented and slightly elongated in the [001] or [110] direction of the TiO2(110) support. STS measurements indicated that the crystallites or the support/crystallite interface formed above 900 K possesses a wide band gap. The annealing above 1050 K resulted in the disappearance of Mo from the TiO2(110) surface, which may be explained by the formation and sublimation of MoO3 species at the perimeter of the nanoparticles. The change of AES signal intensities for O(KLL) and Mo(MNN) as a function of the annealing temperature also supports this mechanism.     

Ultrathin Rh films on Ru(0001): oxidation in confinement

Ultrathin rhodium films with a thickness ranging from 1 to a few monolayers were deposited on a single-crystal Ru(0001) surface in order to investigate the oxidation behavior of ultrathin epitaxial films on a dissimilar substrate. It is found that rhodium grows on Ru(0001) initially layer by layer, adapting the in-plane lattice parameters of Ru(0001). When exposing Rh films to oxygen environment (approximately 4.8 x 10(6) L O2 exposure) at 660 K, 2-4 ML Rh films form a surface oxide composed of (9 x 9) O-Rh-O trilayers. Quite in contrast, oxidation of the 1 ML RhRu(0001) film leads to a poorly ordered oxide with a rutile structure reminiscent of RuO2(110) on Ru(0001). The oxidized 1 ML RhRu(0001) film contains much more oxygen than the oxidized thicker Rh films. Lower temperatures (535 K) and high doses of oxygen lead to a (1 x 1)-O overlayer on the 1 ML RhRu(0001) surface, whose atomic geometry resembles closely that of the (1 x 1)-O phase on clean Ru(0001).     

Protonation of phosphovanadomolybdates H(3+x)PV(x)Mo(12-x)O40: computational insight into reactivity

Protonated phosphovanadomolybdates of the Keggin structure, H(3+x)PV(x)Mo(12-x)O(40) where x = 0, 1, 2, and derivatives with surface defects formed by loss of constitutional water were studied using high-level DFT calculations toward determination of the most stable species and possible active forms in oxidation catalysis in both the gas phase and in polar solutions. The calculations demonstrate that protonation at bridging positions is energetically much more favorable than protonation of terminal oxygen atoms. The preferential protonation site is determined by the stability of the metal-oxygen bond rather than the negative charge on the oxygen atom. In H(3)PMo(12)O(40), maximum distances between protons at bridging oxygen atoms are energetically favored. In contrast, for H(4)PVMo(11)O(40) and H(5)PV(2)Mo(10)O(40) protons prefer nucleophilic sites adjacent to vanadium atoms. Up to three protons are bound to the nucleophilic sites around the same vanadium atom in the stable isomeric forms of H(5)PV(2)Mo(10)O(40) that result in strong destabilization of oxo-vanadium(V) bonding to the Keggin unit. Such behavior arises from the different nature of the Mo-O and V-O bonds that can be traced to the different sizes of the valence d orbitals of the metals. Coordination of two protons at the same site yields water and an oxygen defect as a result of its dissociation. The energetic cost for the formation of surface defects decreases in the order: O(t) ? O(c) ? O(e) and is lower for the sites adjacent to vanadium atoms. Vanadium atoms near defects also have a significant contribution to the LUMO. Thus, vanadium-substituted polyoxometalates with defects near and, especially, between vanadium atoms present a plausible active form of polyoxometalates in oxidation reactions.     

Influence of aggregation, defects, and contaminant oxygen on water dissociation at Cu(110) surface: a theoretical study

The DFT-PW91 slab model approach is employed to investigate the influence of aggregation, surface defects, and contaminant oxygen on water dissociation on Cu(110) at low temperatures. The dissociation barriers of water in various aggregate states are calculated in the range of 60-75 kJ/mol on the clean surfaces, in nice agreement with the experimentally determined values. It is revealed that the aggregation of water shows no propensity to reduce the activation barrier for the O-H bond breaking on Cu(110), at variance with the water chemistry on Ru(0001). The calculated activation energy on Cu(211) which is the most active stepped surface investigated is equal to the value on the (110) surface, indicating that the hydroxyl groups observed on Cu(110) at low temperatures may not stem from surface defects. The coadsorbed oxygen, whether as a "spectator" or a "participant," facilitates the water dissociation both kinetically and thermodynamically.     

Redox chemistry of the acetato-bridged clusters [M3(mu3-O)n(mu-O2CCH3)6(H2O)3]2+ (M = Mo, W, n = 1, 2): reversible redox between mono-micro3-oxo d8 M(III)2M(IV) and d9 M(III)3 forms

A cyclic voltammogram of aqueous 0.1 mol dm(-3) triflic acid solutions of the d6 bioxo-capped M-M bonded cluster [Mo3(mu3-O)2(O2CCH3)6(H2O)3]2+ at a glassy carbon electrode at 25 degrees C gives rise to an irreversible 3e- cathodic wave to a d9 Mo(III)3 species at -0.8 V vs. SCE which on the return scan gives rise to two anodic waves at +0.05 V vs. SCE (E(1/2), 1e- reversible to d8 Mo(III)2Mo(IV)) and +0.48 V vs. SCE (2e- irreversible back to d6 Mo(IV)3). The number of electrons passed at each redox wave has been confirmed by redox titration and controlled potential electrolysis which resulted in 90% recovery of [Mo3(mu3-O)2(O2CCH3)6(H2O)3]2+ following electrochemical re-oxidation at +0.8 V. A corresponding CV study of the d8 monoxo-capped W(III)2W(IV) cluster [W3(mu3-O)(O2CCH3)6(H2O)3]2+ gives rise to a reversible 1e- cathodic process at -0.92 V vs. SCE to give the d9 W(III)3 species [W3(mu3-O)(O2CCH3)6(H2O)3]+; the first authentic example of a W(III) complex with coordinated water ligands. However the cluster is too unstable (O2/water sensitive) to allow isolation. Comparisons with the cv study on [Mo3(mu3-O)2(O2CCH3)6(H2O)3]2+ suggest irreversible reduction of this complex to monoxo-capped [Mo(III)3(mu3-O)(O2CCH3)6(H2O)3]+ followed by reversible oxidation to its d8 counterpart [Mo3(mu3-O)(O2CCH3)6(H2O)3]2+ (Mo(III)2Mo(IV)) and finally irreversible oxidation back to the starting bioxo-capped cluster. Exposing the d9 Mo(III)3 cluster to air (O2) however gives a different final product with evidence of break up of the acetate bridged framework. Corresponding redox processes on d6 [W3(mu3-O)2(O2CCH3)6(H2O)3]2+ are too cathodic to allow similar generation of the monoxo-capped W(III)3 and W(III)2W(IV) clusters at the electrode surface.     

Density functional theory study of the oxidation of ammonia on the IrO2(110) surface

In this study, we employed density functional theory (DFT) to investigate the oxidation of ammonia (NH(3)) on the IrO(2)(110) surface. We characterized the possible reaction pathways for the dehydrogenation of NH(x) species (x = 1-3) and for the formation of the oxidation products N(2), N(2)O, NO, NO(2), and H(2)O. The presence of oxygen atoms on coordinatively unsaturated sites (O(cus)) of the oxygen-rich IrO(2)(110) surface promotes the oxidation of NH(3) on the surface. In contrast, NH(3) molecules prefer undergoing desorption over oxidation on the stoichiometric IrO(2)(110) surface. Moreover, the O(cus) atoms are also the major oxidants leading to the formation of oxidation products; none of the oxidations mediated by the bridge oxygen atoms were favorable reactions. The energy barrier for formation of H(2)O as a gaseous oxidation product on the IrO(2)(110) surface is high (from 1.83 to 2.29 eV), potentially leading to the formation of nitrogen-atom-containing products at high temperature. In addition, the selectivity toward the nitrogen-atom-containing products is dominated by the coverage of O(cus) atoms on the surface; for example, a higher coverage of O(cus) atoms results in greater production of nitrogen oxides (NO, NO(2)).     

Dissociative adsorption of NO on TiO2 (110)-(1 x 2) surface: Ti2O3 rows as actives sites for the adsorption

The interaction of NO with TiO2 (110)-(1 x 2) surface has been studied by X-ray photoelectron spectroscopy, ultraviolet photoelectron spectroscopy, Auger electron spectroscopy, and low-energy electron diffraction, with the aim to clarify the role of ordered defects in NO reactivity toward TiO2. The interaction was studied for exposures up to 2000 L. However, the main effects occur already in the first 2 L. The exposure of the surfaces to NO resulted in the healing of defect sites without adsorption of N and low-energy electron diffraction shows that the surface (1 x 2) symmetry is not lost after the NO dose.     

Cyclopropylmethyl/cyclobutyl rearrangements on surfaces: evidence for transient cation formation near O-covered Mo(110)

Rearrangement reactions of C4-alkoxides on O-covered Mo(110) have been studied using temperature-programmed reaction spectroscopy and reflection-absorption infrared spectroscopy. Cyclobutoxide on Mo(110), prepared from the corresponding alcohol or bromide, is described for the first time in detail. Several reaction mechanisms are considered for the ring-opening rearrangement of cyclopropylmethoxide during high-temperature annealing. In light of compelling new data, previous results are reinterpreted to support the formation of transient cations near O-covered Mo(110). For the first time, we present strong evidence for clean, heterolytic bond cleavage reactions over a metal surface. Our revised reactivity model is based on spectroscopic and reactivity data that show the rearrangement of cyclopropylmethyl groups to cyclobutyl groups and vice versa. Selectively deuterated 1,1-D2-cyclopropylmethanol was studied as a test of mechanism and as a probe for the lifetime of reactive intermediates. Isotopic scrambling observed for this substrate is consistent with the formation of a relatively long-lived carbocation during rearrangement. The intermediacy of transient cations is further invoked to explain the rearrangements that are now recognized to occur as alkyl bromides are transformed into alkoxides on Mo(110)-(1 x 6)-O. The observed ring expansion/contraction reactions are characteristic of a cationic process; carbon-centered radicals are not known to rearrange in this manner. However, in none of the cases discussed could contributions from radical pathways be completely ruled out. Our results are compared to analogous reactions in the vapor and solution phases. General trends governing rearrangement mechanisms on Mo(110) are presented with respect to metal-surface coverage, heteroatom incorporation, and temperature. Trends are discussed in the context of heterogeneous hydrocarbon oxidation.     

Rates of oxygen exchange between the [H(x)Nb(6)O(19)](8)(-)(x)(a)(q)) Lindqvist ion and aqueous solutions

Oxygen-isotope-exchange rates were measured between sites in the Lindqvist-type [H(x)()Nb(6)O(19)](8)(-)(x)()((aq)) polyoxoanion and aqueous solution as a function of pH and temperature. The ion has a central mu(6)-O that is inert to exchange, 12 mu(2)-O(H), and 6 eta-O. The potassium salt of this ion is recrystallized in (17)O-enriched water to (17)O-label the anion, which is then redissolved into isotopically normal water so that the (17)O NMR signals from structural oxygens can be followed as a function of time. Because the central mu(6)-O retains its (17)O signal throughout the experiments, it is clear that the polyoxoanion remains intact during isotopic equilibration of the other structural oxygens. At pH conditions where the [HNb(6)O(19)](7)(-) ion predominates, the mu(2)-O(H) sites isotopically exchange with solution about an order of magnitude more rapidly than the eta-O sites. Yet, we observe that the terminal and bridging oxo sites react at nearly the same rates when the ion is coordinated to 2-3 protons and possibly when it is unprotonated. On the basis of molecular models and experimental kinetic data, we propose metastable polymorphs of the hexaniobate structure where four of the mu(2)-O(H) and eta-O sites are temporarily equivalent and bonded to a coordinatively unsaturated Nb(V). This hypothesized intermediate allows facile access to bulk water molecules for exchange but cannot fully explain the kinetic results and additional experiments on other Lindvist ions are required.     

Quantum molecular dynamics study of water on TiO2(110) surface

The adsorption of water on perfect TiO(2)(110) surface is studied by quantum molecular dynamics simulation adopting a periodic model formed by five water molecules on a (5 x 1) surface unit cell of a five layer slab of TiO(2). The total simulation time is 3.2 ps. At about 1.3 ps, one water molecule dissociates with the help of other adsorbed waters and surface bridging oxygens. During the remaining 1.9 ps, the waters and OH groups vibrate, but no more dissociation or recombination is observed. By comparing recent experimental O1s photoemission (x-ray photoelectron spectroscopy) spectra of H(2)O/TiO(2)(110) to the computed spectrum of the adsorbate in the configurations supplied by the molecular dynamics simulation, the observed peaks can be attributed to different oxygen species. The proposed assignment of the main spectral features supports the occurrence of partial water dissociation (approximately 20%) also on a perfect TiO(2) surface.     

NO adsorption and dissociation on Rh(111): PM-IRAS study

We have used in situ polarization-modulation infrared reflection absorption spectroscopy to study the adsorption/dissociation of NO on Rh(111). While these studies have not been conclusive regarding the detailed surface structures formed during adsorption, they have provided important new information on the dissociation of NO on Rh(111). At moderate pressures (< or =10(-6) Torr) and temperatures (<275 K), a transition from 3-fold hollow to atop bonding is apparent. Data indicate that this transition is not due to the migration of the 3-fold hollow NO but rather to the adsorption of gas-phase NO that is directed toward the atop position due to the presence of NO decomposition products, particularly chemisorbed atomic O species at the hollow sites. These results indicate that NO dissociation occurs at temperatures well below the temperature previously reported. Additionally, high pressure (1 Torr) NO exposure at 300 K results in only atop NO, calling into question the surface structures previously proposed at these adsorption conditions consisting of atop and 3-fold hollow sites.     

Studies of NO adsorption on Pt(110)-(1 x 2) and (1 x 1) surfaces using density functional theory

Adsorption of NO on Pt(110)-(1 x 2) and (1 x 1) surfaces has been investigated by density functional theory (DFT) method (periodic DMol(3)) with full geometry optimization and without symmetry restriction. Adsorption energies, structures, and N-O stretching vibrational frequencies of NO are studied by considering multiple possible adsorption sites and comparing with the experimental data. Adsorption is strongly dependent on both coverage and surface phase. The assignment of adsorption sites has been carried out with precise calculation of vibrational frequencies for NO on various sites. We clearly show the NO site switching on both of the surfaces as found in the experiments: at low coverages, bridge species is formed on the surface, and at high coverages, NO switches to atop sites.