不同化学镀液中p—Si上激光诱导局部沉积铜

在化学镀铜溶液中，ｐ－Ｓｉ片在波长为５１４．５ｎｍ的激光束的照射下，得到了选择性的铜镀层。采用ＡＥＳ、ＳＥＭ、ＲＢＳ和电学技术对比了在３种含不同还原剂的镀液中得到的镀层的形貌、组成、界面扩散及电学性质，探讨了液相激光诱导化学沉积铜的机理。     

银溶胶上表面增强拉曼光谱的激光照射效应

本文以胞嘧啶的表面增强喇曼光谱（ＳＥＲＳ）作为探针，讨论了激光照射对银溶胶ＳＥＲＳ谱及银溶胶凝聚的影响，分析了影响的原因，指出激光诱导吸附和激光诱导银胶凝聚在这一过程中起主要作用，待测的浓度越低，获得饱和ＳＥＲＳ光谱所需要的时间越长，饱和ＳＥＲＳ光谱的强度越高。     

化学复合镀Ni-P-PTFE镀层的组成分析

近年来化学复合镀技术在工业中应用日益广泛 ,本文运用ＳＥＭ、ＡＥＳ和ＸＰＳ等手段对用化学复合镀制得的Ｎｉ Ｐ ＰＴＦＥ镀层的结构和组分进行了分析 ,并就其耐腐蚀性能与前期得到的Ｎｉ Ｓｎ Ｐ[1 ] 、Ｃｕ Ｓｎ Ｐ[2 ] 、Ｎｉ Ｐ ＣｅＯ2 [3] 、Ｎｉ Ｐ ＳｉＯ2 [4] 镀层进行了比较 ,结果表明 :含量一定的ＰＴＦＥ(聚四氟乙烯 )的共存增强镀层的耐腐蚀性及镀层表面的润滑性。1　实验部分1 1　仪器日产Ｄ/ＭＡＸⅢＡ型Ｘ 射线衍射仪 ,铜靶 ,管压 2 5ｋＶ ,电流 1 0ｍＡ。国产ＪＪＣ 1型润滑湿角测量仪。美国ＰＥＲＫＩＮ ＥＬＭＥＲＰ…     

电沉积非晶态镍磷合金的研究

本文用电化学方法, X射线衍射及电子能谱方法研究了阴极恒电位沉积非晶态镍磷合金镀层,实验结果表明,影响镍磷合金非晶结构的主要因素是镀层中的磷含量,当磷含量大于9%时,镀层具有良好的非晶结构,镀层中镍和磷主要以元素态形式存在,磷的析出具有诱导共析特点。     

电沉积Ni—Mo—P合金镀层在NaCl溶液中的腐蚀特性

用失重法，阳极率曲线，Ｘ－光电子能谱（ＸＰＳ）以及俄歇电子能谱（ＡＥＳ）研究了电沉积Ｎｉ－Ｍｏ－Ｐ合金镀层在５％ＮａＣｌ溶液中的腐蚀特性，非晶态Ｎｉ－Ｍｏ－Ｐ合金镀层比晶态Ｎｉ－Ｍｏ－Ｐ合金镀层有较低的腐蚀速度阳极极化曲线表明，Ｎｉ－Ｍｏ－Ｐ合金镀层中，镍的摩尔分数国０．７１９～０．８６８时，随镀层中磷含量的增加，腐蚀电位正移，而活化区的峰电流随镀层中钼含量的增加而增加，磷含量的活化区的峰电流以及     

[IrBr6]2-的反对称极化率与圆偏振激光诱导的ESR谱频移

在理论上研究了顺磁性粒子体系的圆偏振激光诱导的ＥＳＲ谱频移效应。给出磁场中分子反对称极化率的公式，并以［ＩｒＢｒ６］＾２－离子为例讨论了吸收带半高宽的影响。计算了［ＩｒＢｒ６］＾２－的ＥＳＲ谱在圆偏振激光作用下的频移。结果发现：在光学共振区附近，ＥＳＲ频移可达１ＭＨｚ的量级，与钠原子体系结果类似。     

非晶态镍磷—镍钨磷双层组合镀层的耐蚀性能研究

本文对比研究了镍磷镀层、镍钨磷镀层及非晶态镍磷和镍钨磷双层组合镀层的耐蚀性能，分别进行了各种镀层的浸渍腐蚀实验，镀层的Ｘ射线衍射图象、镀层的扫描电镜图象、以及在工厂实际的腐蚀环境里进行的腐蚀实验。实验结果表明镍磷及镍钨磷双层组合镀层的耐 性优于镍磷镀层、镍钨磷镀层的耐蚀性。     

以有机镍配合物为前体制备担载镍催化剂的研究

描述了以镍单核配合物ＮｉＣｐ２和簇合物Ｎｉ３Ｃｐ３Ｎ－ｔ－Ｃ４Ｈ９为前体的ＳｉＯ２载镍催化剂的制备，通过元素分析、ＴＲＲ、ＴＰＤＥ、ＸＰＳ，ＣＯ吸附和苯加氢反应对以镍配合物和簇合物为前体制备的催化剂的性能及其制备过程了研究和表征。结果表明，镍与合物和簇合物在担载过程中同载体ＳｉＯ２表面发生了相互作用，其化学组成发生了变化，在苯加氢反应中，此催化剂的活性比以Ｎｉ（ＮＯ３）２为前体制备的催化剂高得多，     

结晶紫与卤素或卤酸根离子共吸附的近红外表面增强喇曼散射

采用近红外激光（１０６４ｎｍ）激发和扫描式双光栅单色仪研究了卤素、卤酸根离子及吡啶对结晶紫近红外表面增强喇曼散射光谱（ＮＩＲ－ＳＥＲＳ）的影响．揭示了这些离子（或分子）与结晶紫及银表面的相互作用．Ｃｌ－、Ｂｒ－、Ｉ－、ＢｒＯ－３离子及吡啶均能引起结晶紫ＮＩＲ－ＳＥＲＳ的明显增强，而ＣｌＯ－３和ＩＯ－３离子则不能．观察到ＮＩＲ－ＳＥＲＳ中化学增强的直接证据，并估算了化学增强因子．Ｃｌ－、Ｂｒ－、Ｉ－和ＢｒＯ－３离子引起结晶紫ＮＩＲ－ＳＥＲＳ的化学增强因子分别约为４９、７７、１５和３６．     

烯丙基硫脲与支持电解质阴离子在银电极上共吸附的拉曼光谱

用表面增强拉曼散射光谱（ＳＥＲＳ）和时间分辨ＳＥＲＳ光谱（ＴＲＳＥＲＳ）等技术首次研究了烯丙基硫脲（ＡＴＵ）在ＨＣｌＯ４、Ｈ２ＳＯ４和ＨＮＯ３介质中与无机阴离子在银电极上的电化学共吸附行为．提出ＡＴＵ很可能以Ｓ端与银电极表面形成化学吸附键，仲氨基相对伯氨基距离表面较近，整个分子偏向烯丙基一侧倾斜吸附在表面上．ＣｌＯ－４、ＳＯ２－４和ＮＯ－３等弱吸附无机阴离子均能被ＡＴＵ诱导共吸附在其质子化了的仲氨基上，这３种无机阴离子被ＡＴＵ诱导共吸附的强弱顺序是ＣｌＯ－４＞ＳＯ２－４＞ＮＯ－３．被诱导共吸附的无机阴离子对ＡＴＵ在电极表面的化学吸附起到稳定剂的作用，有利于ＡＴＵ在电极表面形成致密的吸附层     

沉积温度对等离子增强化学气相沉积法制备的SiNx:H薄膜特性的影响

利用Centrotherm公司生产的管式等离子增强化学气相沉积(PECVD)设备在p型抛光硅片表面沉积SiN_x:H薄膜, 研究沉积温度对SiN_x:H薄膜的组成及光学特性、结构及表面钝化特性的影响. 然后采用工业化的单晶硅太阳电池制作设备和工艺制作太阳电池, 研究不同温度制备的薄膜对电池电性能的影响. 测试结果表明: SiN_x:H薄膜的折射率随着沉积温度的升高而变大, 分布在1.926-2.231之间, 这表明Si/N摩尔比随着沉积温度的增加而增加; 当沉积温度增加时, 薄膜中Si－H键和N－H键浓度呈现减小趋势, 而Si－N键浓度逐渐升高, 薄膜致密度增加; 随着沉积温度的升高, SiN_x:H薄膜中的氢析出导致了钝化硅片的有效少子寿命先升高后降低, 并且有效少子寿命出现明显的时间衰减特性. 当沉积温度为450 °C时, 薄膜具有最优的减反射和表面钝化效果. 采用不同温度PECVD制备的5组电池的电性能测试结果也验证了这一结果.     

Preparation of hierarchically porous nickel from macroporous silicon

A novel approach for preparing hierarchical porous nickel structures has been developed. It is an aqueous processing of the template, macroporous silicon, which was etched in HF solution to have straight channels. By immersion in a prepared nickel solution, the silicon sidewalls were replaced by nickel deposits to form a total metallic structure. Since silicon framework was gradually consumed during the displacement reactions, the deposited nickel displayed additional feature of being highly porous on the sidewalls. With the initial straight microchannels, the metal structure was hierarchically porous.     

具有金属薄层的p-Si阴极在碱溶液中的光电化学性能

本文用循环伏安曲线和恒电位极化方法考察了具有金属薄层的p型单晶外延硅(p⁺/p-Si)阴极在碱溶液中的光电化学性能。结果表明,镀有钨-镍合金层的p⁺/p-Si阴极和镀有钯的p⁺/p-Si阴极,使氢析出的光电流明显增加。前者的电位比光电流达到相同值的空白p⁺/p-Si电极向正方移动了0.3V以上,后者移动0.25V。同时对p型外延硅(p⁺/p-Si)阴极比p型单晶硅(p-Si)阴极光响应较大的实验结果作了初步解释。扫描电镜结果显示,钨-镍合金沉积层是由许多不连续的“团块”构成的,而不是连续层。     

Catalytic amplification of the soft lithographic patterning of Si. Nonelectrochemical orthogonal fabrication of photoluminescent porous Si pixel arrays

Photoluminescent, porous silicon pixel arrays were fabricated via a Pt-promoted wet etching of p-type Si(100) using a 1:1:1 EtOH/HF/H2O2 solution. The pixels were fabricated with micrometer-scale design rules on a silicon substrate that had been modified with an octadecyltrichlorosilane (OTS) monolayer patterned using microcontact printing. The printed OTS layer serves as an orthogonal resist template for the deposition of a Pt(0) complex, which preferentially deposits metal species in areas not covered with OTS. The Pt centers generate a localized oxidative dissolution process that pits the Si in the Pt-coated regions, resulting in the formation of a porous silicon microstructure that luminesces around 580 nm upon illumination with a UV source. Scanning electron microscopy and fluorescence microscopy images of the fabricated porous silicon structures showed that features in the size range of approximately 10-150 microm, and possibly smaller, can be generated by this catalytically amplified soft lithographic patterning method. Importantly, the OTS acts as an etch mask, so that, even with significant hole transport, etching is confined to areas coated with the Pt(0) complex.     

Effect of current density on the microstructure and morphology of the electrodeposited nickel coatings

The aim of this research work was to study the effect of deposition current density on microstructure and surface morphology of electrodeposited nickel coatings. For this purpose, nickel deposits have been synthesized by direct current from Watts bath without additive, to limit the incorporation of pollutants resulting from surface adsorption or electro-activity of these compounds. Nickel deposits have been investigated by scanning electron microscopy and X-ray diffraction. Cyclic voltammetry was also used to gain information on the general behavior of the deposition. The optimum conditions of deposition were established and the influence of current density on the grain size, surface morphology, and crystal orientation was determined.     

p—Si上激光诱导局部沉积铂

现代电子工业中，电子器件基体材料多为半导体或绝缘体，因此，不用外加电源的激光诱导微区沉积技术引起了人们的重视［‘－‘j．这种高度选择性、高速沉积性、工艺简单的技术在电接插件局部镀，多芯层模块制作中的基板联线，加成法制造微带电路及其修复，半导体集成电路中布线的修复等方面有着广泛的应用前景．激光诱导液相金属沉积可在多种基体上，多种电解质溶液中进行”－“’，本课题组自90年代初从事激光镀的研究以来，已利用Ar”激光在硅片上分别实现了Ni－P合金「“］和Cll［“j的镀覆．本文采用3种不同的镀铂溶液作为电解质，在…     

Formation and Properties of Nickel–Phosphorus–Graphite Composite Coatings in Autocatalytic Deposition

It is shown that nickel–phosphorus–graphite composite coatings can be deposited by the autocatalytic deposition method. The optimal concentration of graphite and the duration of ultrasonic treatment of a graphite suspension in solution for deposition of composite coatings based on the nickel–phosphorus alloy were determined. The influence exerted by thermal treatment parameters on the properties of the deposits was examined. The optimal process conditions are suggested.     

Deactivation,coating and performance of nickel capillary columns for GLC

Electroformed nickel tubing was deactivated by chemical vapor deposition of silicon from silane gas and subsequent treatment with cyclooctamethyltetrasiloxane (D4). Standard activity tests performed on the uncoated tube and also on columns coated with crosslinked and uncrosslinked, nonpolar stationary phase, show that good quality flexible columns can be prepared from nickel tubing. The inner surface of the silicon coated tube was characterized by Auger depth profile analysis.     

Anodic Deposition of Vanadium(V) Oxide from Solutions in the Presence of Nickel Ions

The preparation conditions, properties of the deposits obtained, and the nature of anodic processes occurring in the course of electrolytic deposition of vanadium oxide in the presence of nickel ions from solutions of oxovanadium and nickel sulfates were studied.     

p-type macroporous silicon having three-dimensional structure

Macroporous silicon with three-dimensional structure was fabricated using organic-based electrolyte, dimethylformamide (DMF), in the p-type silicon. The obtained three-dimensional macroporous structures grew wholly along the <100> orientation of the p-type silicon wafer.