Optical properties of carbon nanotubes and BaTiO3 composite thin films

Multiwalled carbon nanotubes and BaTiO₃ composite films have been prepared by pulsed-laser deposition technique at room temperature and high temperature of 600℃, separately. The structures of the composite films are investigated by using scanning electron microscopy and x-ray diffraction. The optical behaviours of the samples produced at different temperatures are compared with Raman spectroscopy, and UV-visible absorption. And the observation by Z-scan technique reveals that the composite films have a larger optical nonlinearity, and the samples prepared at high temperatures have better transmittance and opposite sign imaginary part of optical third-order nonlinearity.     

Studies on electrical switching behavior and optical band gap of amorphous Ge–Te–Sn thin films

Amorphous thin film Ge₁₅Te_85−x Sn _x (1≤x≤5) and Ge₁₇Te_83−x Sn _x (1≤x≤4) switching devices have been deposited in sandwich geometry using a flash evaporation technique, with aluminum as the top and bottom electrodes. Electrical switching studies indicate that these films exhibit memory type electrical switching behavior. The switching fields for both the series of samples have been found to decrease with increase in Sn concentration, which confirms that the metallicity effect on switching fields/voltages, commonly seen in bulk glassy chalcogenides, is valid in amorphous chalcogenide thin films also. In addition, there is no manifestation of rigidity percolation in the composition dependence of switching fields of Ge₁₅Te_85−x Sn _x and Ge₁₇Te_83−x Sn _x amorphous thin film samples. The observed composition dependence of switching fields of amorphous Ge₁₅Te_85−x Sn _x and Ge₁₇Te_83−x Sn _x thin films has been understood on the basis of Chemically Ordered Network model. The optical band gap for these samples, calculated from the absorption spectra, has been found to exhibit a decreasing trend with increasing Sn concentration, which is consistent with the composition dependence of switching fields.     

Effect of sputtering pressure on structural and optical properties of silver oxide thin films; Kramers–Kronig method

Silver oxide nano layers were prepared by RF magnetron sputtering on amorphous SiO₂ substrates. O₂ pressure in chamber was varied from 1 to 4 and 7 mTorr during growth process. The effects of different O₂ pressure on structural, morphological and optical properties of the films were investigated by means of X-ray diffraction, scanning electron microscopy, atomic force microscopy and UV–Vis spectroscopy analyses. Optical reflectance measured in the wavelength of 350–950 nm by spectroscopy. Other optical properties and optical band gaps were calculated using Kramers–Kronig relations. The X-ray diffraction measurements showed change in crystalline structure with increasing O₂ pressure. Preferred orientation has been changed to another growth orientation at 4 mTorr O₂ pressure. The Atomic force microscope images showed increasing in roughness consistently by increasing oxygen pressure. The thickness of the thin films decreases (from 217 to 180 nm) with increasing O₂ pressure. Optical results revealed that the highest optical band gap of 3.1 eV and the highest transmittance of?~?80% were achieved at lower O₂ pressure (1 mTorr).     

Structural,electrical and optical properties of Cdx Zn1−xSe thin films

X-ray diffraction and electron diffraction techniques indicate that Cd_x Zn_1–xSe thin films on glass substrates have a polycrystalline nature, with sphalerite structure for x0.5 and wurtzite structure for x0.6. The crystalline size in each composition increases with increasing the film thickness. The room temperature dark resistivity varies from one composition to another showing a transition at x=0.55The temperature dependence of of the deposited films revealed two conduction mechanisms, one below 352 K due to shallow levels, surface states, and defects introduced during the film growth, and over 352 K due to deep-level ionization following the ordinary semiconducting behaviour.The thermal activation energy of the free charge carriers decreases linearly with increasing the molar fraction x of the CdSe content up to x=0.55, above which it increases with increasing x.The optical constants of Cd_x Zn_1–xSe thin films of different compositions were determined in the spectral range 400–2000 nm. The analysis of the absorption coefticient at and near the absorption edge indicates the existence of allowed direct transition energy gaps decreasing with increasing x.     

Structural and electrical properties of SrTiO3 thin films as insulator of metal-ferroelectric-insulator-semiconductor （MFIS） structures

SrTiO₃ (STO) thin films were deposited on p-Si(100) substrates at various substrate temperatures from 300℃ to 700℃ by radio frequency (RF) magnetron sputtering technique. Their structure and electrical properties were investigated. It was found that the transition from amorphous phase to polycrystalline phase occurred at the substrate temperatures 300--400℃. Their crystallinity became better when the substrate temperatures further increased. The dielectric and leakage current measurements were carried out by using the Si/STO/Pt metal--insulator--semiconductor (MIS) structures at room temperature. It was found that the fixed charge density decreased and both the interface trap density and the dielectric constant increased when the substrate temperatures were increased. The leakage current mechanisms for STO MIS structures with STO films prepared at 700℃ followed the space charge limited current (SCLC) under the low applied electric field and the Poole--Frenkel emission under the high one. In addition, the resistivity for films prepared at 700℃ was higher than 10¹¹\Omega \cdot cm under the voltage lower than 10V (corresponding to the electric field of 1.54\times 10³kV\cdotcm^-1). It suggested that the STO films prepared at 700℃ were suitable for acting as the insulator of metal--ferroelectric--insulator--semiconductor (MFIS) structures.     

Effect of Fe3+ doping on structural,optical and electrical properties δ-Bi2O3 thin films

Fe³⁺ doped δ-Bi₂O₃ thin films were prepared by sol–gel method on quartz glass substrate at room temperature and annealed at 800 °C. The thin films were then characterized for structural, surface morphological, optical and electrical properties by means of X-ray diffraction (XRD), scanning electron microscopy (SEM), optical absorption measurements and d.c. two-probe, respectively. The XRD analyses revealed the formation δ-Bi₂O₃ followed by a mixture of Bi₂₅FeO₄₀ and Bi₂Fe₄O₉. SEM images showed reduction in grain sizes after doping and the optical studies showed a direct band gap which reduced from 2.39 eV for pure δ-Bi₂O₃ to 1.9 eV for 10% Fe³⁺ doped δ-Bi₂O₃ thin film. The electrical conductivity measurement showed the films are semiconductors.     

Structure,optical, and magnetic properties of rutile Sn1−xMnxO2 thin films

Sn_1?xMn_xO₂ (x ≤ 0.11) thin films were fabricated by sol–gel and spin-coated method on Si (1 1 1) substrate. X-ray diffraction revealed that single-phase rutile polycrystalline structure was obtained for x up to about 0.078. Evolution of the lattice parameters and X-ray photoelectron spectroscopy studies confirmed the incorporation of Mn³⁺ cations into rutile SnO₂ lattice. Optical transmission studies show that the band gap energy (E_g) broadens with the increasing of Mn content. Magnetic measurements revealed that all samples exhibit room temperature ferromagnetism (RTFM), which is identified as an intrinsic characteristic. Interestingly, the magnetic moment per Mn atom decreases with the increasing Mn content. The origin of RTFM can be interpreted in terms of the bound magnetic polaron model.     

Micro—structural analysis of YBa2Cu3O7—x thin films grown on different substrates by X—ray techniques

YBa2Cu3Ox(YBCO) thin films grown on different substrates with and/or without Eu2CuO4(ECO) buffer layer were investigated by X-ray wide angle diffraction,reflection,diffuse scattering and topography.Theresults show that for the yttria stabilized ZrO2(YSZ) substrate,the presence of an ECO buffer layer improves the crystalline quality of the YBCO film,while a negative effect is observed for the SrTiO3(STO) substrate.The lateral correlation length for a sample grown on a YSZ substrate with ECO buffer Layer is much greater than grown on an STO subetrate.The STO substrate used has mosaic structure.2001 Elsevier Science B.V.All rights reserved.     

Growth and photoluminescence properties of inclined ZnO and ZnCoO thin films on SrTiO_3（110） substrates

ZnO thin film growth prefers different orientations on the etched and unetched SrTiO 3（STO）（110） substrates.Inclined ZnO and cobalt-doped ZnO（ZnCoO） thin films are grown on unetched STO（110） substrates using oxygen plasma assisted molecular beam epitaxy,with the c-axis 42 inclined from the normal STO（110） surface.The growth geometries are ZnCoO[100]//STO[110] and ZnCoO[111]//STO[001].The low temperature photoluminescence spectra of the inclined ZnO and ZnCoO films are dominated by D 0 X emissions associated with A 0 X emissions,and the characteristic emissions for the 2 E（2G）→ 4A2（4F） transition of Co 2＋ dopants and the relevant phonon-participated emissions are observed in the ZnCoO film,indicating the incorporation of Co 2＋ ions at the lattice positions of the Zn 2＋ ions.The c-axis inclined ZnCoO film shows ferromagnetic properties at room temperature.     

The effect of copper concentration on structural,optical and dielectric properties of CuxZn1 − xS thin films

Cu_xZn_1 ? xS (x = 0, 0.25, 0.50, 0.75, 1) thin films were deposited on glass substrates using Successive Ionic Layer Adsorption and Reaction (SILAR) method at room temperature and ambient pressure. The copper concentration (x) effect on the structural, morphological and optical properties of Cu_xZn_1 ? xS thin films was investigated. The X-ray diffraction (XRD) and scanning electron microscopy (SEM) studies showed that all the films exhibit polycrystalline nature and are covered well with glass substrates. The crystalline and surface properties of the films improved with increasing copper concentration. The energy bandgap values were changed from 2.07 to 3.67 eV depending on the copper concentration. The refractive index (n), optical static and high frequency dielectric constants (ε_o, ε_∞) values were calculated by using the energy bandgap values as a function of the copper concentration.     

Reversible alternation between bipolar and unipolar resistive switching in La-SrTiO_3 thin films

The alternation from bipolar to unipolar resistive switching is observed in perovskite La0.01Sr0.99TiO3thin films.These two switching modes can be activated separately depending on the compliance current(Icomp)during the electroforming process:with a higher Icomp(5 mA)the unipolar resistance switching behavior is measured,while the bipolar resistance switching behavior is observed with a lower Icomp(1 mA).On the basis of I–V characteristics,the switching mechanisms for the URS and BRS modes are considered as being a change in the Schottky-like barrier height and/or width at the Pt/La-SrTiO3interface and the formation and disruption of conduction filaments,respectively.     

近距离升华沉积CdTe掺Cd薄膜的微结构和电学、光学特性

采用近距离升华技术制备了掺杂Cd元素的CdTe多晶薄膜.利用X射线衍射仪和扫描电子显微镜表征其微结构,用霍尔效应测试仪和紫外可见分光光度计分析其电学、光学特性.结果显示,适量的掺杂Cd元素可改善CdTe薄膜晶形,显著提高薄膜的电导特性,由弱的p型电导转变为导电性能良好的n型电导,但对光能隙影响不大. 关键词： 近距离升华 CdTe薄膜 掺杂Cd 电学和光学特性     

Threshold resistance switching in silicon-rich SiO_x thin films

Si-rich SiO_x and amorphous Si clusters embedded in SiO_x films were prepared by the radio-frequency magnetron cosputtering method and high-temperature annealing treatment.The threshold resistance switching behavior was achieved from the memory mode by continuous bias sweeping in all films,which was caused by the formation of clusters due to the local overheating under a large electric field.Besides,the Ⅰ-Ⅴ characteristics of the threshold switching showed a dependence on the annealing temperature and the SiO_x thickness.In particular,formation and rupture of conduction paths is considered to be the switching mechanism for the 39 nm-SiO_x film,while for the 78 nm-SiO_x film,adjusting of the Schottky barrier height between insulator and semiconductor is more reasonable.This study demonstrates the importance of investigation of both switching modes in resistance random access memory.     

Effects of annealing on structural,optical and electrical properties of Al-doped ZnO thin films

Transparent conducting oxide (TCO) thin films such as SnO2, In2O3, and Cd2SnO4, have been used extensively as sensor devices, surface acoustic wave devices, coating to heat glass windows and transparent electrodes for solid state display devices, solar cells[1,2] because of their high optical transparency in the visible range, infrared reflec-tance and low d.c. resistivity. Although SnO2 film was developed early, nowadays Sn-doped In2O3 (ITO) films are the predominant TCO thin film in …     

High contrast optical switching in vanadium dioxide thin films

Thermochromic vanadium dioxide thin films prepared by radio-frequency sputtering exhibit controllable transmittance at 1550 nm with a dynamic range exceeding 10³. Efficient optical control with a laser beam at 532 nm is demonstrated with intensities as low as 3 W/cm². Optical switch-on times as short as 100 μs are reported.     

可用于光存储的氧化物、次氧化物薄膜材料的研究及发展

介绍了可用于可录、可擦除、全息光存储及超分辨掩膜层的氧化物、次氧化物薄膜材料的种类、制备方法、光存储特性和存储机制。这类薄膜材料由于具有种类多、应用范围广、制备方法多样、写入灵敏度高和记录稳定性好等优点 ,正受到各国研究者越来越多的关注。分析总结了这类材料的研究现状、存在的主要问题和未来发展方向     

Structural, electrical, and optical properties of ZnInO alloy thin films

Indium zinc oxide (IZO) thin films with different percentages of In content (In/[In+Zn]) are synthesized on glass substrates by magnetron sputtering, and the structural, electrical and optical properties of IZO thin films deposited at different In₂O₃ target powers are investigated. IZO thin films grown at different In₂O₃ target sputtering powers show evident morphological variation and different grain sizes. As the In₂O₃ sputtering power rises, the grain size becomes larger and electrical mobility increases. The film grown with an In₂O₃ target power of 100 W displays the highest electrical mobility of 13.5 cm·V^-1·s^-1 and the lowest resistivity of 2.4 × 10^-3 Ω·cm. The average optical transmittance of the IZO thin film in the visible region reaches 80% and the band gap broadens with the increase of In₂O₃ target power, which is attributed to the increase in carrier concentration and is in accordance with Burstein-Moss shift theory.     

PECVD制备光学薄膜材料折射率控制技术

渐变折射率光学薄膜用途广泛,PECVD技术在制备渐变折射率光学薄膜方面具有独特的优点。通过控制不同反应气体配比变化,分析了反应气体配比变化与所制备的薄膜折射率、消光系数和沉积速率之间的关系,讨论了薄膜折射率、消光系数和沉积速率变化的原因,研制了折射率可控的氟氧化硅(SiOxFy)、氮氧化硅(SiOxNy)、氮化硅(SixNy)等薄膜材料,获取了折射率在1.33~2.06之间的光学薄膜材料。     

Studies on the electrical conductivity, optical absorption and x-ray diffraction in bismuth thin film

Spectroscopically pure bismuth is evaporated onto glass substrates at different substrate temperature using a Hind Hivac coating plant. The electrical conductivity of bismuth thin films, prepared at different substrate temperatures is measured and thermal activation energy is evaluated. From the recorded optical absorption spectrum in the ultraviolet and visible regions optical band gapE _g is determined. X-ray diffractograms are recorded and lattice parameters are determined.