Graded tensile-strained bulk InGaAs/InP superluminescent diode with very wide emission spectrum

A kind of novel broad-band superluminescent diodes (SLDs) using graded tensile-strained bulk InGaAs is developed. The graded tensile-strained bulk InGaAs is obtained by changing only group-Ⅲ trimethyl-gallium source flow during low-pressure metal organic vapor-phase epitaxy. At the injection current of 200 mA, the fabricated SLDs with such structure demonstrate full-width at half-maximum spectral width of 106 nm and the output light power of 13.6 mW, respectively.     

Quantum-dot superluminescent diode: A proposal for an ultra-wide output spectrum

We propose a novel superluminescent diode (SLD) with a quantum dot (QD) active layer, which should give a wider output spectrum than a conventional quantum well SLD. The device makes use of inhomogeneous broadness of gain spectrum resulting from size inhomogeneity of self-assembled quantum dots grown by Stranski– Krastanow mode. Taking a design made out in the In_xGa_1-xAs/GaAs system for example, the spectrum characteristics of the device are simulated realistically, 100–200 nm full width of half maximum of output spectrum can be obtained. The dependence of the output spectrum on In composition, size distribution and injection current of the dots active region is also elaborated.     

The emission wavelength tuning of InAs/InP quantum dots with thin GaAs, InGaAs, InP capping layers by MOCVD

InAs quantum dots (QDs) were grown on InP substrates by metalorganic chemical vapor deposition. The width and height of the dots were 50 and 5.8 nm, respectively on the average and an areal density of 3.0×10¹⁰ cm⁻² was observed by atomic force microscopy before the capping process. The influences of GaAs, In_0.53Ga_0.47As, and InP capping layers (5–10 ML thickness) on the InAs/InP QDs were studied. Insertion of a thin GaAs capping layer on the QDs led to a blue shift of up to 146 meV of the photoluminescence (PL) peak and an InGaAs capping layer on the QDs led to a red shift of 64 meV relative to the case when a conventional InP capping layer was used. We were able to tune the emission wavelength of the InAs QDs from 1.43 to 1.89 μm by using the GaAs and InGaAs capping layers. In addition, the full-width at half-maximum of the PL peak decreased from 79 to 26 meV by inserting a 7.5 ML GaAs layer. It is believed that this technique is useful in tailoring the optical properties of the InAs QDs at mid-infrared regime.     

High-Current Multi-Finger Mesa InGaAs/InP DHBTs

Characteristics of single- and multi-finger mesa InGaAs/InP double heterojunction bipolar transistors （DHBTs） are compared. The current gain decreases with the increasing number nf of the emitter fingers due to the mutual thermal interaction between the fingers. The Kirk current can be as high as 150mA for four-finger DHBT. No degradation of the peak of the current gain cutoff frequency ft is found for multi-finger DHBTs. The peak of the maximum oscillation frequency fmax decreases with an increase of nf due to the increasing parasitic resistance of the base. The results are very helpful for applications of the common-base DHBTs in power amplifiers operating at very high frequencies.     

InP/InGaAsP多量子阱自发辐射谱的解析函数

利用洛伦兹线型函数、高斯线型函数和Sech线型函数对InP/InGaAsP多量子阱自发辐射谱进行拟合,采用莱文贝格-马夸特算法,得到上述三种函数的解析表达式.研究结果表明:高斯线型光谱拟合函数的中心波长为1548.651nm,谱线半极大全宽度为61.42 nm,功率补偿为0.00212 mW,拟合优度为0.99191,残差平方和为2.26505×10~(-6).高斯线型拟合的拟合优度最大,残差平方和最小,且各数据点的残差值分布在±0.0001之间,分布比较均匀.高斯线型函数具有较高拟合度.     

GaInAsP/InP surface-emitting laser diode

In this review paper, we will introduce the advantages and laser characteristics of GaInAsP/InP surface-emitting (SE) lasers. In order to obtain the room temperature oscillation of the SE laser diodes, it is very important to reduce not only its threshold current density but also threshold current itself. To decrease its threshold current density and/or its threshold current, we investigated some possible SE laser structures. First, we tried to reduce the threshold current density by introducing (i) a Au/SiO₂ mirror, (ii) a dielectric multilayer mirror to increase the n-side (output-side) reflectivity, and (iii) multi-active-layer structure. Next, to reduce the threshold current, certain types of current confining structure, namely (i) a round-high-mesa/polyimide-buried structure, (ii) a planar buried heterostructure (PBH), (iii) a circular buried heterostructure (CBH) with SiO₂ mask and (iv) a flat surface circular buried heterostructure (FCBH), were investigated. The threshold current of the SE laser was reduced to 18 mA and its highest operation temperature was raised to 263 K (–10°C).     

High-depth-resolution SIMS analysis for InGaAs/InP interfaces

The influence of the primary ion impact conditions and of the surface chemical composition on beam-induced effects is investigated in order to achieve a high-depth-resolution analysis for the InGaAs/InP interfaces. The main result is that the oxygen adsorption with an appropriate pressure on the Cs⁺ bombarded surface can suppress the element-dependence of depth resolution which is an artefact in SIMS analysis.     

Non-equilibrium generation-recombination noise in InGaAs/InP photodiodes

We report on temperature (77 to 300 K) and voltage dependent low frequency (100 Hz to 100 kHz) noise behavior of InGaAs/InP photodiodes in non-equilibrium steady state. In addition to common white, 1/f, and Lorentz noise we are able to observe for the first time minima and maxima in the photocurrent noise spectra. The recombination of a pair of free carriers through a recombination center at the heterointerface provides the correlation between the electron and hole ensembles necessary to explain the observed noise reduction.     

Quantum point contacts on InGaAs/InP heterostructures

For the first time we have observed quantized conductance in a split gate quantum point contact prepared in a strained In_0.77Ga_0.23As/InP two-dimensional electron gas (2DEG). Although quantization effects in gated two-dimensional semiconductor structures are theoretically well known and proven in various experiments on AlGaAs/GaAs and also on In_0.04Ga_0.96As/GaAs, no quantum point contact has been presented in the InGaAs/InP material with an indium fraction as high as 77% so far. The major problem is the comparatively low Schottky barrier of the InGaAs (φ_B≈ 0.2 eV) making leakage-free gate structures difficult to obtain. Nevertheless this heterostructure—especially with the highest possible indium content—has remarkable properties concerning quantum interference devices and semiconductor/superconductor hybrid devices because of its large phase coherence length and the small depletion zone, respectively. In order to produce leakage-free split gate point contacts the samples were covered with an insulating SiO₂layer prior to metal deposition. The gate geometry was defined by electron-beam lithography. In this paper we present first measurements of a point contact on an In_0.77Ga_0.23As/InP 2DEG clearly showing quantized conductance.     

High bandwidth surface-illuminated InGaAs/InP uni-travelling-carrier photodetector

Uni-traveling-carrier photodiodes(UTC-PDs)with ultrafast response and high saturation output are reported.A gradient doping layer and a narrow InP cliff layer were introduced to enhance the saturation and bandwidth characteristics.We measured the dark current,photo response,bandwidth,and saturation current of the fabricated UTC devices.For a15-μm-diameter device,the dark current was 3.5 nA at a reverse bias of 1 V,and the 3-dB bandwidth was 17.2 GHz at a reverse bias of 5 V,which are comparable to the theoretically values.The maximum responsivity at 1.55μm was 0.32 A/W.The saturation output current was over 19.0 mA without bias.     

LP-MOCVD生长InGaAs/InP应变量子阱的研究

本文研究了LP-MOCVD对不同x值的In_1-xGa_xAs/InP生长条件,并且生长了压缩应变为0.5%三个不同阱宽的InGaAs/InP量子阱结构,利用77KPL光谱分析了能级同阱宽的关系,实现最窄阱宽为4.4nm,最小全半高峰宽为17.0mev.     

LP－MOCVD生长InGaAs／InP应变量子阱的研究

本文研究了ＬＰ－ＭＯＣＶＤ对不同ｘ值的Ｉｎ１－ｘＧａｘＡｓ／ＩｎＰ生长条件，并且生长了压缩应变为０．５％三个不同阱宽的ＩｎＧａＡｓ／ＩｎＰ量子阱结构，利用７７ＫＰＬ光谱分析了能级同阱宽的关系，实现最窄阱宽为４．４ｎｍ，最小全半高峰宽为１７．０ｍｅｖ。     

LP—MOCVD研制InGaAs/InP应变量子阱LD

本文指出在LP-MOCVD生长过程中,采用量子阱有源区和上限制层不同的生长温度以及生长非掺杂过渡层等技术能有效地控制InGaAs/InP量子阱激光器的p-n结结位,给出了采用DEZn和H₂S做掺杂源在InP材料中p型和n型杂质溶度和p-n结控制的条件,并研制出有源区阱层InGaAs与InP存在0.5%压缩应变量子阱激光器,这一结构LD实现室温脉冲激射,得到峰值功率为106mW以上,阈值电流密度为2.6kA/cm².     

Dielectrics for passivation of planar InP/InGaAs diodes

We have investigated dielectrics for passivating planar InP or InGaAs photodiodes: thermally evaporated Al₂O₃ and SiO, sputtered Si₃N₄ and SiO₂ and also SiO₂ using chemical vapour deposition. The measured bulk and field-effect properties of all dielectrics excluding sputtered SiO₂ were suitable for this application. In planar InGaAs diodes with Cd diffused or Mg implanted p⁺-region a disordered dielectric/semiconductor surface led to high reverse current densities above 1 mA/cm². In InP diodes with p⁺-diffusion and dielectrics exhibiting positive flatband voltages, e.g. Si₃N₄ and Al₂O₃, reverse current densities of 10 μA/cm² were measured probably caused by a slight inversion of the semiconductor surface. With a SiO or CVD-SiO₂ passivating layer on n-InP lowest leakage current densities (10 nA/cm²) were achieved. Very low dark-current planar photodiodes InP/InGaAsP/InGaAs have been fabricated using SiO passivation (30 nA/cm²).     

Interdiffused InGaAs/InP quantum wells for polarization-independent electroabsorption

The interdiffusion of In0.53Ga0.47As/InP quantum well structures is presented as an approach for achieving polarization-independent electroabsorption. By considering different interdiffusion rates on group III and group V sublattices, the TE and TM absorption coefficient spectra calculated for the interdiffused InGaAs/InP quantum well show that with a suitable interdiffusion process the tensile strain induced in the interdiffused quantum well can provide polarization-independent absorption properties. For the quantum well structure and interdiffusion process considered here polarization-independent electroabsorption can be achieved around 1.3 μm, which is of considerable interest for optical switching and modulating devices. This revised version was published online in November 2006 with corrections to the Cover Date.     

Characterization and optimization of high-power InGaAs/InP photodiodes

The performance of 34-μm-diameter InGaAs/InP charge compensated modified uni-traveling carrier photodiodes (CC MUTCs) is studied using a commercial device simulator based on a drift-diffusion model. Excellent agreement has been achieved between simulations and experiments. The origin of the degradation of responsivity at high optical injection level is investigated. Parameters of the photodiode are further optimized to maximize the saturation current without sacrificing bandwidth and responsivity.     

高迁移率InGaAs/InP量子阱中的有效g因子

利用化学束外延法制备了高迁移率的In_0.53Ga_0.47As/InP量子阱样品. 在样品的低温磁输运测试中, 观察到纵向磁阻的Shubnikov-de Hass (SdH) 振荡和零场自旋分裂引起的拍频. 本文提出一种解析的方法, 即通过同时拟合不同倾斜磁场下SdH振荡的傅里叶变换谱, 得到有效g因子的大小.     

InAs/GaAs submonolayer quantum dot superluminescent diode emitting around 970 nm

According to the InAs/GaAs submonolayer quantum dot active region, we demonstrate a bent-waveguide superluminescent diode emitting at a wavelength of around 970 nm. At a pulsed injection current of 0.5 A, the device exhibits an output power of 24 mW and an emission spectrum centred at 971 nm with a full width at half maximum of 16 nm.