Chemisorption of carbon monoxide on copper-nickel alloy surfaces

The adsorption of CO on Cu-Ni alloy surfaces has been studied at 300 and 120 K using LEED, AES, TDS, and work function measurement. The alloys have been prepared as thin (111) epitaxial films evaporated on mica, and as poly crystalline foils. At 300 K the alloy surfaces show an adsorption behavior similar to that of pure Ni: the work function increases to a saturation value which is higher for Ni-rich surfaces than for Cu-rich. The isosteric heat of adsorption (106 kJ/mole) is nearly as high as with pure Ni. At 120 K the alloys exhibit a more Cu-like adsorption behavior: the work function passes through a minimum which becomes deeper at higher Cu surface concentration. The isosteric heat of adsorption at low temperatures (50 kJ/mole) is nearly as low as for pure Cu. From TDS it can be shown, that the binding energy of the highest (Ni-like) adsorption states increases with increasing Ni surface concentration. At the (111) alloy surfaces no LEED superstructures due to CO adsorption could be observed.     

The effect of potassium on the molecular orientation of CO chemisorbed on Ni(111): An esdiad study

Using electron stimulated desorption (ESD) and electron stimulated desorption ion angular distribution (ESDIAD) techniques, we have determined that coadsorbed potassium systematically quenches the O⁺ ion yield from CO on the Ni(111) surface for 1000 eV electron excitation energies. The quenching appears to be a short range K-CO interaction; 3 or 4 CO molecules are affected for each K atom adsorbed on the surface. The quenching effect of K on CO indicates that a significant electronic perturbation of CO is caused by its local interaction with K. This effect prevents ESDIAD observation of the K-quenched CO species. In addition, the CO molecules that are not quenched at a potassium coverage of 0.02 K/Ni exhibit a normally oriented C-O bond similar to that found for CO adsorbed on a K-free Ni(111) surface.     

局域功函数图像及其在Cu(111)-Au/Pd表面的应用

用扫描隧道显微镜（STM）对Cu(111)-Au和Cu(111)-Pd表面的局域功函数进行了研究.通过 测量隧道电流对针尖样品间距的响应，得到了与STM形貌图一一对应的表面局域功函数图像. 实验发现，Au/Pd覆盖层和Cu衬底间的功函数有明显的不同.Pd薄膜的功函数甚至超过了其体 本征值，且功函数在台阶处变小.用偶极子的形成解释了台阶处功函数的降低.这一工作表明 ，用测量局域功函数的方法容易区分表面上不同的元素，并具有纳米尺度的空间分辨率. 关键词： 扫描隧道显微镜 局域功函数 台阶     

用扫描隧道显微镜测量局域功函数

用扫描隧道显微镜在Cu（111）-Au和Pt（111）-Ag表面上对局域功函数进行了测量．在扫描的同时通过测量隧道电流对针尖样品间距离变化的响应，可以在得到扫描隧道显微镜（STM）图的同时得到功函数图．用这种方法，成功地观察到Au，Ag覆盖层与Cu，Pt衬底间的功函数的差别．结果表明：Au覆盖层的功函数介于Cu（111）和Au（111）的功函数之间，这与其它方法的结果一致．在Pt（111）-Ag表面观察到了局域功函数随覆盖层厚度的变化．本工作表明：扫描隧道显微镜在研究功函数与表面结构的关系方面是十分有用的；用测量局域功函数的方法还可以区分表面不同种的物质 关键词：     

Secondary ion emission processes of sputtered alkali ions from alkali/Si(100) and Si(111)

The secondary alkali ion yield vs. the work function change (Δφ) of Na, K and Cs/Si(100) and Si(111) was measured to discuss the details of secondary ion emission processes. In the case of alkali/metal systems, the secondary ion emission is explained by the electron tunneling model. In this model, the ionization of the ejected atom occurs as a result of electron resonant tunneling through the potential barrier separating an atom and a metal, and the secondary ion yield depends on exponentially the work function change of metal surface. For alkali/Si(100) systems, the secondary ion emission processes are explained in terms of the electron tunneling model since the secondary alkali ion yield vs. the work function change (Δφ) follows the exponential manner. However, it is not easy to apply the simple electron tunneling model to our experimental results for alkali/Si(111) systems. There is the essential difference in surface structures between Si(100) and Si(111). Therefore, it is suggested that the local electronic environment around the adsorbates might be taken into consideration for alkali/Si(111) systems.     

Role of buried ultra thin interlayer silicide on the growth of Ni film on Si(100) substrate

The presence of a buried, ultra-thin amorphous interlayer in the interface of room temperature deposited Ni film with a crystalline Si(100) substrate has been observed using cross sectional transmission electron microscopy (XTEM). The electron density of the interlayer silicide is found to be 2.02 e/?³ by specular X-ray reflectivity (XRR) measurements. X-ray diffraction (XRD) is used to investigate the growth of deposited Ni film on the buried ultra-thin silicide layer. The Ni film is found to be highly textured in an Ni(111) plane. The enthalpy of formation of the Ni/Si system is calculated using Miedema’s model to explain the role of amorphous interlayer silicide on the growth of textured Ni film. The local temperature of the interlayer silicide is calculated using enthalpy of formation and the average heat capacity of Ni and Si. The local temperature is around 1042 K if the interlayer compound is Ni₃Si and the local temperature is 1389 K if the interlayer compound is Ni₂Si. The surface mobility of the further deposited Ni atoms is enhanced due to the local temperature rise of the amorphous interlayer and produced highly textured Ni film. Received: 2 March 2000 / Accepted: 28 March 2000 / Published online: 11 May 2000     

Negative molecular ion formation and work function changes: Experimental results for CO and CO2 scattering from nickel (+potassium) surfaces

The scattering of CO⁺ and CO⁺₂ at grazing incidence from Ni(111)+K and clean Ni(111), Ni(110) surfaces produces CO, CO₂ and dissociated species. The observation of negative species O⁻ and CO⁻₂ is strongly dependent on the K coverage or work function of the surface. The dissociation of CO⁺ (CO) is weakly changed by the presence of K, whereas in the CO⁺₂ (CO₂) case dissociation via CO⁻₂ → CO + O⁻ is strongly increasing with K coverage.     

Ni(111)表面一氧化碳和氢共吸附的密度泛函理论研究

本文用密度泛函理论(DFT)的总能计算研究了一氧化碳和氢原子在Ni(111)表面上p(2×2)共吸附系统的原子结构和电子态，结果表明CO和H原子分别被吸附于两个对角p(1×1)元胞的hcp和fcc位置.以氢分子和CO分子作为能量参考点，总吸附能为2.81 eV，相应的共吸附表面功函数φ为6.28 eV.计算得到的C—O，C—Ni和H—Ni的键长分别是1.19?, 1.96?和 1.71?，并且CO分子以C原子处于hcp的谷位与金属衬底原子结合.衬底Ni(111)的最外两层的晶面间距在吸附后的相对变化分别是 关键词： Fisher-Tropsch反应 催化作用 Ni(111) p(2×2)/(CO+H) 共吸附     

Nickel carbonyl adsorption on the Ni(111) surface

Overlayers formed by the adsorption of Ni(CO)₄ in CO on the Ni(111) surface at 100 K were characterized using high resolution electron energy loss spectroscopy and thermal desorption spectroscopy. At temperatures below 135 K, molecular nickel carbonyl adsorbs on the CO saturated Ni(111) surface as suggested by several observations. Vibrational transitions characteristic of molecular Ni(CO)₄ are dominant. The energy dependence of both the elastic and inelastic electron scattering cross sections are dramatically altered by Ni(CO)₄ adsorption. All of the mass spectrometer ionization fragments typical of molecular Ni(CO)₄ are observed in the narrow thermal desorption peak at 150 K. The inelastic scattering cross sections for both adsorbed nickel carbonyl and adsorbed CO on the Ni(111) surface suggest that a nonresonant dipole scattering mechanism is dominant.     

Electronic structure of the Au-intercalated graphene/Ni(111) surface

We report the electronic structure of the Au-intercalated graphene/Ni(111) surface using angle-resolved photoemission spectroscopy and low energy electron diffraction. The graphene/Ni(111) shows no Dirac cone near the Fermi level and a relatively broad C 1s core level spectrum probably due to the broken sublattice symmetry in the graphene on the Ni(111) substrate. When Au atoms are intercalated between them, the characteristic Dirac cone is completely recovered near the Fermi level and the C 1s spectrum becomes sharper with the appearance of a 10?×?10 superstructure. The fully Au-intercalated graphene/Ni(111) surface shows a p-type character with a hole pocket of ～0.034?Å^?1 diameter at the Fermi level. When the surface is doped with Na and K, a clear energy gap of ～0.4?eV is visible irrespective of alkali metal.     

单晶CeB_6发射性能及磁电阻各向异性研究

采用X射线劳厄定向法对单晶CeB_6的(110),(111),(210)和(310)晶面进行了定向.系统研究了不同晶面热发射性能及磁场对电阻率的影响规律.结果表明,当阴极温度为1873 K时(110),(111),(210)和(310)晶面最大发射电流密度分别为38.4,11.54,50.4和20.8 A/cm~2,表现出了发射性能的"各向异性".RichardsonDushman公式计算逸出功结果表明,上述晶面中(210)晶面具有最低的逸出功,为2.4 eV.从实际应用来看,该晶面有望替代商业化的钨灯丝成为新一代的场发射阴极材料.磁电阻率测量结果显示,当晶体从[001]方向旋转至[011]方向时电阻率从73μ?·cm变化至69μ?·cm,表明电阻率在磁场中沿不同方向同样具有"各向异性"的特点.     

Adsorption of potassium on iron

Adsorption of K on Fe(110), (100) and (111) surfaces was studied by means of LEED, AES, thermal desorption and work function measurements. The monolayer capacity is about 5.5 × 10¹⁴ K-atoms/cm² in all three cases. With Fe(111) an ordered 3 × 3 overlayer was found at fairly low coverages. The work function decreases to a minimum and the initial dipole moments were determined to μ₀ = 7.0 Debye for Fe(110), μ₀ = 4.4 Debye for K/Fe(100) and μ₀ = 3.9 Debye for K/Fe(111). The heat of adsorption decreases from its initial value (Fe(110): 57; Fe(100): 54; Fe(111): 52 kcal/mole) continuously with increasing coverage which parallels the continuous decrease of the dipole moment of the adsorbate complex.     

NH3在Ni/Pt(111)和Ni/WC(001)表面上分解的第一性原理研究

采用密度泛函理论和slab模型,研究NH₃在Ni单原子层覆盖的Pt（111）和WC（001）表面上的物理与化学行为,计算了Ni单原子覆盖表面的电子结构以及NH₃的吸附与分解.表面覆盖的单原子层中,Ni原子的性质与Ni（111）面上的Ni原子明显不同.与Ni（111）相比,Ni/Pt（111）和Ni/WC（001）表面上Ni原子dz²轨道上的电子更多地转移到了其它位置,该轨道上电荷密度降低有利于NH₃吸附.在Ni/Pt（111）和Ni/WC（001）面上NH₃吸附能均大于Ni（111）,NH₃分子第一个N-H键断裂的活化能则明显比Ni（111）面上低,有利于NH₃的分解,吸附能增大使NH₃在Ni/Pt（111）和Ni/WC（001）面上更倾向于分解,而不是脱附.N₂分子的生成是NH₃分解的速控步骤,该反应能垒较高,说明N₂分子只有在较高温度下才能生成.WC与Pt性质相似,但Ni/Pt（111）和Ni/WC（001）的电子结构还是有差异的,与Ni（111）表面相比,NH₃在Ni/Pt（111）表面上分解速控步骤的能垒降低,而在Ni/WC（001）上却升高.要获得活性好且便宜的催化剂,需要对Ni/WC（001）表面做进一步改进,降低N₂分子生成步骤的活化能.     

Calculations of the Cd hyperfine field andEFG on Ni surfaces

The hyperfine field andthe electric field gradient on Cd probe atoms at Ni(100) and Ni(111) surfaces are calculated self-consistently within the local density molecular/cluster approach.     

Adsorption behavior of H2O on clean and oxygen precovered Ni(s)(111)

Photoelectron spectroscopy (UPS), thermal desorption spectroscopy (TDS), isotope exchange experiments, work function change (δφ) and LEED were used to study the adsorption and dissociation behavior of H₂O on a clean and oxygen precovered stepped Ni(s)[12(111) × (111)] surface. On the clean Ni(111) terraces fractional monolayers of H₂O are adsorbed weakly in a single adsorption state with a desorption peak temperature of 180 K, just above that of the ice multilayer desorption peak (T_m = 155 K). In the angular resolved UPS spectra three H₂O induced emission maxima at 6.2, 8.5 and 12.3 eV below E_F were found for θ ≈ 0.5. Angular and polarization dependent UPS measurements show that the C_2v symmetry of the H₂O gas-phase molecule is not conserved for H₂O(ad) on Ni(s)(111). Although the Δφ suggest a bonding of H₂O to Ni via the negative end of the H₂O dipole, the O atom, no hints for a preferred orientation of the H₂O molecular axes were found in the UPS, neither for the existence of water dimers nor for a long range ordered H₂O bilayer. These results give evidence that the molecular H₂O axis is more or less inclined with respect to the surface normal with an azimuthally random distribution. H₂O adsorption at step sites of the Ni(s)(111) surface leads in TDS to a desorption maximum at T_m = 225 K; the binding energy of H₂O to Ni is enhanced by about 30% compared to H₂O adsorbed on the terraces. Oxygen precoverage causes a significant increase of the H₂O desorption energy from the Ni(111) terraces by about 50%, suggesting a strong interaction between H₂O and O(ad). Work function measurements for H₂O+O demonstrate an increase of the effective H₂O dipole moment which suggests a reorientation of the H₂O dipole in the presence of O(ad), from inclined to a more perpendicular position. Although TDS and Δφ suggest a significant lateral interaction between H₂O+O(ad), no changes in the molecular binding energies in UPS and no “isotope exchange” between ¹⁸O(ad) and H₂¹⁶O(ad) could be observed. Also, dissociation of H₂O could neither be detected on the oxygen precovered Ni(s)(111) nor on the clean terraces.     

Interaction of acetic acid with ethylenediamine on a Ni(111) surface studied by XPS

The interaction of ethylenediamine with a Ni(111) surface was investigated in the temperature range 170–420 K by means of X-ray photoelectron spectroscopy. Molecularly absorbed species were predominant below 290 K giving the C1s and the N 1s peaks at 286.4 and 399.9 eV (at 250 K) and at 286.0 and 399.7 eV (at 290 K), respectively. The amount dehydrogenated species increased during heating up to 420 K resulting in a variation of the N 1s binding energy as 399.7 → 397.7 → 397.5 → 397.7 eV. The variation was correlated with successive dehydrogenation reactions such as

The interaction of acetic acid with molecularly absorbed ethylenediamine below 200 K brought about the appearance of the N 1s peak at 401.9 eV assignable to the ammonium form of nitrogen at the expense of the N 1s peak at 400.1 eV. The remaining N 1s peak is located at 399.6 eV. Ethylenediamine absorbed at 290 K, showing the N 1s peak at 399.7 eV, gave no ammonium form even after interaction with acetic acid at 220 K. These results indicate that a part of ethylenediamine was unidentate and the rest was bidentate (chelating) on the Ni(111) surface at 250 K and all of the molecules were bidentate at 290 K. When acetic acid was adsorbed on a clean Ni(111) surface at 165 K, formation of an acetyl group was indicated besides acetate.     

Antisite-defect-induced surface segregation in ordered NiPt alloy

By means of first principles simulations we demonstrate that tiny deviations from stoichiometry in the bulk composition of the NiPt-L1(0) ordered alloy have a great impact on the atomic configuration of the (111) surface. We predict that at T=600 K the (111) surface of the Ni51Pt49 and Ni50Pt50 alloys corresponds to the (111) truncation of the bulk L1(0) ordered structure. However, the (111) surface of the nickel deficient Ni49Pt51 alloy is strongly enriched by Pt and should exhibit the pattern of the 2x2 structure. Such a drastic change in the segregation behavior is due to the presence of different antisite defects in the Ni- and Pt-rich alloys and is a manifestation of the so-called off-stoichiometric effect.     

Synergetic effects of impurities and alloying element Cr on oxidation and dissolution corrosion of Ni (111) surfaces: A DFT study

Using density-functional calculations, we studied the interactions between interstitial impurities (H, O, N, S, and P) and Ni (111) surfaces doped, or not, with Cr, and studied the effect of Cr doping on the dissolution corrosion resistance of Ni(111) surfaces. The aim of this work was to study, at the atomic scale, the effects of Cr on the segregation behaviors of impurities and the synergetic effects between co-doped atoms on the resistance to dissolution corrosion of Ni (111) surfaces. The results indicate that impurities S, P, O, and H prefer to be trapped at near-surface sites, that Cr was uniformly distributed in the Ni crystal and can affect the segregation behavior of impurities S and P to move toward the surface, and it affects impurities N and O such that they shift from the surface to the subsurface. The formation of near-surface Cr nitrides (speculated to be Cr₂N based on the results obtained for particular co-doped surfaces) was also noted. Introducing Cr enhances the structural stability of the Ni (111) surface and protects it from being corroded when impurities are present. The elementary processes studied afforded microscopic insights into the formation of a Cr-depleted zone, a phenomenon that leads to local corrosion of the Ni alloy surface. The results of our theoretical calculations explain some of the experimental results previously observed at the atomic scale.     

The adsorption of no on Ni(111); an esdiad/leed study

The ESDIAD method (electron stimulated desorption ion angular distributions) has been combined with LEED (low energy electron diffraction) in a study of the adsorption of NO on Ni(111). For adsorption at 80 K, NO appears to be bonded with its molecular axis perpendicular to the Ni(111) surface at all coverages. Heating the 80 K layer leads to a striking structural change which we interpret as the formation of inclined or bent NO in the range 120 ? T ? 250 K. Upon adsorption at 150 K, only the bent form of NO is present at low coverages; at higher coverages at 150 K, the perpendicular form appears, in agreement with recent electron energy loss spectroscopy (EELS) data of Lehwald, Yates, and Ibach. When NO is coadsorbed with p(2 × 2) oxygen, the perpendicular form of NO dominates at all coverages and temperatures studied. Dissociated NO adsorbed at steps and defect sites on Ni(111) produces a welldefined hexagonal ESDIAD pattern.     

The adsorption of CO,O2, and H2 on Pt: II. Ultraviolet photoelectron spectroscopy studies

Ultraviolet photoelectron spectroscopy (UPS) has been used to study the chemisorption of CO, O₂, and H₂ on platinum. Three single crystal surfaces ((111), 6(111) × (100), and 6(111) × (111)) and two polycrystalline surfaces were studied. These studies yielded three important results. First, the most dominant change in the Pt valence band upon gas adsorption was a decrease in the height of the peak immediately below the Fermi level. This decrease was nearly identical for all three gases studied. Second, CO adsorption resulted in the formation of a resonance state ～8 eV below the Fermi level which was attributed to CO molecular orbitals. In contrast, no dominant resonance states were observed for adsorbed O or H. The lack of an O resonance state on platinum is in contrast to the results observed for O adsorbed on Fe and Ni and suggests important differences between the OPt chemisorption bond and the OFe and ONi chemisorption bonds. Finally, adsorption of CO at steps or defects led to a decrease in work function while its adsorption on terraces led to an increase in work function. For H, adsorption at steps led to an increase in work function while adsorption on terraces led to a decrease in work function. The adsorption of O led to an increase in work function on all of the surfaces studied.