Growth and Characteristics of Epitaxial AlxGa1-xN by MOCVD

Al_xGa_1-xN epilayers with a wide Al composition range (0.2≤x≤ 0.68) were grown on AlN/sapphire templates by low-pressure metalorganic chemical vapour deposition (LP-MOCVD). X-ray diffraction results reveal that both the (0002) and (10^-15) full widths at half-maximum (FWHM) of the Al_xGa_1-xN epilayer decrease with increasing Al composition due to the smaller lattice mismatch to the AlN template. However, the surface morphology becomes rougher with increasing Al composition due to the weak migration ability of Al atoms. Low temperature photoluminescence (PL) spectra show pronounced near band edge (NBE) emission and the NBE FWHM becomes broader with increasing Al composition mainly caused by alloy disorder. Meanwhile, possible causes of the low energy peaks in the PL spectra are discussed.     

Growth of Highly Conductive n-Type Al0.7Ga0.3N Film by Using AlN Buffer with Periodical Variation of Ⅴ/Ⅲ Ratio

High quality and highly conductive n-type Al0.7Ga0.3N films are obtained by using AlN multi-step layers （MSL） with periodical variation of Ⅴ/Ⅲ ratios by low-pressure metalorganic chemical vapour deposition （LP-MOCVD）. The full-width at half-maximum （FWHM） of （0002） and （1015） rocking curves of the Si-doped Al0.7Ga0.3N layer are 519 and 625 arcsec, respectively, Room temperature （RT） Hall measurement shows a free electron concentration of 2.9 × 10^19 cm^-3, and mobility of 17.8cm^2V^-1s^-1, corresponding to a resistivity of 0.0121 Ω cm. High conductivity of the Si-doped AlGaN film with such high Al mole fraction is mainly contributed by a remarkable reduction of threading dislocations （TDs） in AlGaN layer. The TD reducing mechanism in AlN MSL growth with periodical variation of Ⅴ/Ⅲ ratio is discussed in detail.     

Centimetre-Long Single Crystalline ZnO Fibres Prepared by Vapour Transportation

Centimetre-long ZnO fibres are synthesized by vapour transportation via thermal evaporation of ZnO powders. The growth process is carried out in a graphite crucible, in which ZnO powder is loaded as the source material, and a silicon wafer is positioned on the top of the crucible as the growth substrate. During the growth process, the source temperature is kept at 800℃ and the substrate temperature is kept at 600℃. Typical growth time to obtain centimetre-long ZnO fibres is 5-10 hours. Scanning electron microscopy （SEM）, x-ray diffraction （XRD）, transmission electron microscopy （TEM）, and selected area electron diffraction （SAED） measurement results show that ZnO fibres are single crystalline with high crystalline quality and very low defects concentration.     

Investigating stacking faults in nonpolar gallium nitride films using X-ray diffraction

Nonpolar (11-20) GaN films with different basal-plane stacking fault (BSF) densities (determined using transmission electron microscopy) were investigated using X-ray diffraction. Diffuse streaking from I₁ and I₂ BSFs was observed in reciprocal space maps of the 10-10 and 20-20 reflections. X-ray calibration curves for BSF density determination can be plotted using the diffusely scattered intensity of open detector 10-10 or 20-20 ω-scans measured at a fixed, large separation from the peak maximum. However, ab initio determination of stacking fault densities is not possible due to additional broadening from other defects. Similarly, ω-scan peak widths are poor indicators of BSF densities.     

Low‐temperature growth of high quality AlN films on carbon face 6H‐SiC

AlN films have been grown on atomically flat carbon face 6H‐SiC (000 ) substrates by pulsed laser deposition and their structural properties have been investigated. In‐situ reflection high‐energy electron diffraction observations have revealed that growth of AlN at 710 °C proceeds in a Stranski–Krastanov mode, while typical layer‐by‐layer growth occurs at room temperature (RT) with atomically flat surfaces. It has been revealed that the crystalline quality of the AlN film is dramatically improved by the reduction in growth temperature down to RT and the full width at half maximum values in the X‐ray rocking curves for 0004 and 10 2 diffractions of the RT‐grown AlN film are 0.05° and 0.07°, respectively. X‐ray reciprocal space mapping has revealed that the introduction of misfit dislocations is suppressed in the case of RT growth, which is probably responsible for the improvement in crystalline quality. (© 2008 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Structural, thermal and morphological studies of magnesium substituted-lithium manganese oxide spinels

Coexistence of two phases having space groups of Fd3m and P4₃32 in the Mg-doped LiMn₂O₄ spinel is being reported for the first time in this article. Mg-doped LiMn₂O₄ powders have been synthesized by sol-gel method using citric acid as a chelating agent. X-ray powder diffraction (XRD) studies show that the crystal structure of LiMg_xMn_2−xO₄ for x<0.25 is a single-phase cubic spinel, which has space group of Fd3m. The cubic spinel structures having space group of Fd3m and P4₃32 are found to coexist in the compound for x=0.25. The structure becomes single-phase cubic spinel with space group P4₃32 for x>0.25. Field emission scanning electron microscopy (FESEM) shows that particle size of various synthesized powders ranges from 100 to 350 nm. Particle size decreases with increase in Mg content. Differential thermal analysis (DTA) and thermogravimetry (TG) studies show an exponential decay relationship between Mg-doping content and the decomposition temperature to form nonstoichiometry (LiMg_xMn_2−xO_4−δ) in air atmosphere. Fourier transform infrared spectroscopy (FTIR) analysis shows increase in the number of vibrational bands with increase in Mg content, which indicates ordering of the ions in the case of ordered spinel structure, and consequent reduction of the space group symmetry from O_h⁷ to O⁷.     

Room‐temperature epitaxial growth of high‐quality m ‐plane InGaN films on ZnO substrates

The authors have grown high‐quality m ‐plane In_0.36Ga_0.64N (1 00) films on ZnO (1 00) substrates at room temperature (RT) by pulsed laser deposition (PLD) and have investigated their structural properties. m ‐plane InGaN films grown on ZnO substrates at RT possess atomically flat surfaces with stepped and terraced structures, indicating that the film growth proceeds in a two‐dimensional mode. X‐ray diffraction measurements have revealed that the m ‐plane InGaN films grow without phase separation reactions at RT. The full‐width at half‐maximum values of the 1 00 X‐ray rocking curves of films with X‐ray incident azimuths perpendicular to the c ‐ and a‐axis are 88 arcsec and 78 arcsec, respectively. Reciprocal space‐mapping has revealed that a 50 nm thick m ‐plane In_0.36Ga_0.64N film grows coherently on the ZnO substrate, which can probably explain the low defect density that is observed in the film. (© 2009 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Measurement of GaN/Ge（001） Heterojunction Valence Band Offset by X-Ray Photoelectron Spectroscopy

X-ray photoelectron spectroscopy has been used to measure the valence band offset （VBO） at the GaN/Ge heterostructure interface. The VBO is directly determined to be 1.13 ±0.19 eV, according to the relationship between the conduction band offset AEc and the valence band offset △Ev：△Ec =EgGaN -EgGe - △Ev, and taking the room-temperature band-gaps as 3.4 and 0.67eV for GaN and Ge, respectively. The conduction band offset is deduced to be 1.6±0.19 eV, which indicates a type-I band alignment for GaN/Ge. Accurate determination of the valence and conduction band offsets is important for the use of GaN/Ge based devices.     

A Comparison between AlN Films Grown by MOCVD Using Dimethylethylamine Alane and Trimethylaluminium as the Aluminium Precursors

Aluminium nitride (AlN) films grown with dimethylethylamine alane (DMEAA) are compared with the ones grown with trimethylaluminium (TMA). In the high-resolution x-ray diffraction Ω scans, the full width at half maximum (FWHM) of (0002) AlN films grown with DMEAA is about 0.70 deg, while the FWHM of (0002) AlN films grown with TMA is only 0.11 deg. The surface morphologies of the films are different, and the rms roughnesses of the surface are approximately identical. The rms roughness of AlN films grown with DMEAA is 47.4nm, and grown with TMA is 69.4nm. Although using DMEAA as the aluminium precursor cannot improve the AlN crystal quality, AlN growth can be reached at low temperature of 673K. Thus, DMEAA is an alternative aluminium precursor to deposit AlN film at low growth temperatures.     

Effect of Nitridation on Morphology, Structural Properties and Stress of AlN Films

We investigate effects of nitridation on AlN morphology, structural properties and stress. It is found that 3min nitridation can prominently improve AlN crystal structure, and slightly smooth the surface morphology. However, 10min nitridation degrades out-of-plane crystal structure and surface morphology instead. Additionally, 3-min nitridation introduces more tensile stress （1.5 GPa） in AlN films, which can be attributed to the weaker islands 2D coalescent. Nitridation for lOmin can introduce more defects, or even forms polycrystallinity interlayer, which relaxes the stress. Thus, the stress in AlN with 10 min nitridation decreases to -0.2 GPa compressive stress.     

Evolutions of Crystal Structure, Stoichiometry and Electrochemical Behavior with Co Substitution in LiNi1-yCoyO2 Positive Electrodes

LiNi1-yCoyO2（0.1 ≤ y ≤ 0.4） positive electrode materials are synthesized by a chemical method with stoichiometric acetates of related cations. Their crystal structure, stoichiometry and electrochemical behaviors versus Co concentration are investigated by x-ray diffraction, synchrotron-based x-ray absorption fine structure and galvanostatic cycling ts. The results reveal that the non-stoiehiometric Ni^2＋, Li/Ni cation mixing and polarization are reduced as the amount of Co substitution increases, clearly indicating that the Co element is a medium for easily oxidizing Ni^2＋ to Ni^3＋ during the synthesis process.     

Effects of Substrate Temperature and Nitrogen Pressure on Growth of AIN Films by Pulsed Laser Deposition

Highly oriented aluminium nitride （AIN） films are grown on p-Si （100） substrates by pulsed laser deposition, and their characteristics of structure and composition are studied by x-ray diffraction, Fourier transform infrared spectroscopy and scanning electron microscopy. The results show that the deposited films exhibit good crystalline properties with a sharp x-ray diffraction peak at 2θ= 33.15 ° corresponding to AIN h （100） crystalline orientation. The influences of substrate temperature and ambient nitrogen （N2） pressure on the crystallinity of A1N films are remarkable. At room temperature, when the ambient N2 pressure arises from 5 × 10^-6 Pa to 5 Pa, the crystallinity of the film becomes better. When the substrate temperature is 600℃, the film has the best crystallinity at 0.05 Pa. Furthermore, the effects of substrate temperature and ambient N2 pressure on the combination of A1-N bonds and surface morphology of AIN films are also studied.     

Improvement of Field Emission Characteristics of Copper Nitride Films with Increasing Copper Content

A copper nitride （Cu3N） thin film is deposited on a Si substrate by the reactive magnetron sputtering method. The XPS measurements of the composite film indicate that the Cu content in the film is increased to 80.82 at. % and the value of the Cu/N ratio to 4.2：1 by introducing 4% 112 into the reactive gas. X-ray diffraction measurements show that the film is composed of Cu3N crystallites with an anti-ReO3 structure. The effects of the increase of copper content on the field emission characteristics of the Cu3N thin film are investigated. Significant improvement in emission current density and emission repeatability could be attributed to the geometric field enhancement, caused by numerous surface nanotips, and the decrease of resistivity of the film.     

Growth and properties of magnetron cosputtering grown MnxGe1−x on Si (001)

We have grown Mn_xGe_1−x films (x=0, 0.06, 0.1) on Si (001) substrates by magnetron cosputtering, and have explored the resulting structural, morphological, electrical and magnetic properties. X-ray diffraction results show there is no secondary phase except Ge in the Mn_0.06Ge_0.94 film while new phase appears in the Mn_0.1Ge_0.9 film. Nanocrystals are formed in the Mn_0.06Ge_0.94 film, determined by field-emission scanning electron microscopy. Hall measurement indicates that the Mn_0.06Ge_0.94 film is p-type semiconductor and hole carrier concentration is 6.07×10¹⁹ cm⁻³ while the Mn_xGe_1−x films with x=0 has n-type carriers. The field dependence of magnetization was measured using alternating gradient magnetometer, and it has been indicated that the Mn_0.06Ge_0.94 film is ferromagnetic at room temperature.     

Enhancement in Thermoelectrical Power Factor of N-Type Si80Ge20 Alloys

Influences of the carrier concentration and mobility of heavily doped n-type Si80 Ge20 alloys on the thermoelectrical power factor are investigated. The experimental results indicate that thermoeleetrieal power factors of 32- 36μWem-1K^-2 eouM be consistently achieved with carrier concentrations of 2.1-2.9 × 10^20cm^-3 and carrier mobilities of 36-40 cm^2 V^-1s^-1. However, many samples with suitable carrier concentrations do not always have high mobilities and high power factors. Some possible explanations for this behaviour are discussed.     

Growth-Parameter Spaces and Optical Properties of Cubic Boron Nitride Films on Si（001）

Cubic boron nitride （c-BN） films were deposited on Si（001） substrates in an ion beam assisted deposition （IBAD） system under various conditions, and the growth parameter spaces and optical properties of c-BN films have been investigated systematically. The results indicate that suitable ion bombardment is necessary for the growth of c-BN films, and a well defined parameter space can be established by using the P/a-parameter. The refractive index of BN films keeps a constant of 1.8 for the c-BN content lower than 50%, while for c-BN films with higher cubic phase the refractive index increases with the c-BN content from 1.8 at χc =50% to 2.1 at χc = 90%. Furthermore, the relationship between n and p for BN films can be described by the Anderson-Schreiber equation, and the overlap field parameter γ is determined to be 2.05.     

Elimination of surface scratch/texture on the surface of single crystal Si substrate in chemo-mechanical grinding (CMG) process

Si wafers are widely used as a substrate material for fabricating ICs. The quality of ICs depends on the quality of Si wafers. The chemo-mechanical grinding (CMG) with soft abrasive grinding wheels (SAGW) has been recently found to be a great potential process for machining Si wafers to generate superior surface quality at low cost. However, there have been very few studies on observing variation of topography of scratch/texture and understanding basic eliminating process of scratch/texture on the ground Si wafer. Furthermore, few reports on the variation of surface roughness and material removal rate (MRR) during CMG process and relationship between MRR and surface roughness during CMG process are presented. In this paper, a series of CMG experiments have been conducted to study the elimination process of artificial scratches created on etched Si surfaces and residual textures induced by SD1500 diamond wheel in CMG process, and to understand the topography variations of Si surfaces and some basic grinding characteristics during CMG process.     

Self-assembled formation of uniform InP nanopore arrays by electrochemical anodization in HCl based electrolyte

Attempts were made to optimize the electrochemical anodization process for the formation of high-density, regular and straight nanopore arrays on InP. The structure, shape and size of the pores were very sensitive to substrate orientations, electrolyte concentrations and anodization voltages. Among (1 1 1)A, (1 1 1)B and (0 0 1) substrate orientations, the most uniform and most straight nanopore arrays were obtained on (0 0 1) substrates at anodization voltages of 5-7 V by using 1.0-1.5 M HCl electrolyte containing HNO₃. The pore depth could be controlled up to 80 μm by the anodization time.     

Influence of Phase Transition of Starting Materials on Growth of GaN Nanomaterials by CVD

Ground by mechanical ball milling under certain conditions, β-Ga2O3 powders can transit to ε-Ga2O3 ones. As starting materials, Ga2O3 powders treated by different methods are used to prepare GaN nanomaterials. It is found that the morphologies of GaN nanomaterials are quite different due to the phase transition of Ga2O3 from β-Ga203 to ε-Ga203.