Effects of poly(methyl methacrylate)-block-poly(vinyl acetate) copolymer on the spinodal decomposition of corresponding homopolymer blends

Effects of adding a small amount of poly(methyl methacrylate)-block-poly(vinyl acetate) (PMMA-b-PVAc) to poly(methyl methacrylate)/poly(vinyl acetate) (PMMA/PVAc) blends with a lower critical solution temperature (LCST) phase diagram on the kinetics of late-stage spinodal decomposition (SD) were investigated by time-resolved light scattering at 160°C. It is found that the coarsening process of the structure was slowed down or accelerated upon addition of PMMA-b-PVAc depending on the composition of the block copolymer and the blend. The effect of the block copolymer on the domain size were interpreted as compatibilizing and incompatibilizing effects of the block copolymer on PMMA/PVAc blends based on the evaluation of changes in the stability limits of PMMA/PVAc with the addition of block copolymer using random phase approximation (RPA).     

Catenated PS–PMMA Block Copolymers via Supramolecularly Templated ATRP Initiator Approach

A novel route to synthesize catenated macrocyclic PS–PMMA block copolymers is demonstrated via combination of supramolecular chemistry and controlled radical polymerization (CRP). Polymerization of styrene with bromopropionate ester initiator coupled with phenanthroline Cu(I) complex affords a four arm PS macroinitiator, which upon further chain extension by polymerization of MMA generates a four arm PS–PMMA block copolymer. Intramolecular coupling of PS–PMMA–Br arms via low temperature styrene‐assisted atom transfer radical coupling (ATRC) leads to the formation of PS–PMMA catenand, which generates the metal‐free catenated macrocyclic PS–PMMA block copolymer after removal of Cu metal. The interlocked structures of catenated block copolymers are confirmed by GPC, NMR, and AFM image analysis.     

PTHF—MMA嵌段共聚物的合成及性质

以含偶氮聚四氢呋喃(AZO-PTHF)为大分子引发剂,通过使甲基丙烯酸甲酯(MMA)进行自由基聚合的方法合成了PTHF-MMA嵌段共聚物。用GPC、IR、H-NMR和TMA对所得共聚物进行了表征。嵌段共聚物的韧性和耐折性大大超过PMMA,但透明性和强度却无明显损失。     

Atomic force microscopy investigation of asymmetric diblock copolymer morphologies in thin films

Microphase separation and the resulting morphology of asymmetric diblock copolymers of poly(ε-caprolactone) (PCL) in thin films have been investigated by atomic force microscopy. Copolymers consisted of a short block of PCL (M_n∼2500-4500 g/mole) and a longer second block of poly(methyl methacrylate) (PMMA), poly(styrene) (PS) or poly(cyclohexene oxide) (PCHO). Tendency for microphase separation above the glass transition temperature of the second block (PMMA, PS or PCHO) resulted in a pitted morphology on the surface of the thin films. This tendency was strongest for PMMA and weakest for PCHO. The presence of up to 54% PMMA homopolymer in PCL-PMMA block copolymer did not prevent the formation of such pitted morphology on the surface. The effect of the chemical structure of the second block and the possible orientations of the block copolymer molecules in thin films are discussed.     

Effect of a block copolymer on the adhesion between incompatible polymers. I. Symmetric tests

We have studied the adhesion (welding) of polystyrene (PS) and poly (methyl methacrylate) (PMMA) and the effect of incorporating a thin layer of PS/PMMA block copolymer in the joint. The minimum thickness of copolymer layer necessary to increase the joint failure energy G to that of the bulk was about half the interlamellar spacing (long period) of the block copolymer. This tends to suggest a simple model of the block copolymer organizing on the interface with the two halves of the copolymer dissolved in the relevant homopolymers, however, we have no direct evidence for this. X-ray photoelectron spectroscopy and optical microscopy were used to study the failure path. Without copolymer the crack propagated partly in the polystyrene and partly on the interface. Crazes grew from the interface into the polystyrene and the crack tended to follow such a craze for a short distance then jump back to the interface. With the copolymer, the failure mode was very similar, but there was evidence now of crazing on the interface. In no case was there evidence of a significant amount of PMMA on the PS side of the failure.     

Evolution of surface morphologies in multivariant assemblies of surface-tethered diblock copolymers after selective solvent treatment

We study systematically the topography behavior of PHEMA-b-PMMA block as a function of the PHEMA and PMMA block lengths after selectively collapsing the top (PMMA) block by using surface-anchored assemblies of poly(2-hydroxyethyl methacrylate-b-methyl methacrylate), PHEMA-b-PMMA, block copolymer with orthogonally varying lengths of each block. Our experimental results are in excellent qualitative agreement with topology diagrams predicted by self-consistent field calculations of Zhulina and co-workers.     

Critical micelle concentrations of block and gradient copolymers in homopolymer: Effects of sequence distribution,composition, and molecular weight

The critical micelle concentrations (CMCs) of styrene–methyl methacrylate (S-MMA) block and gradient copolymers present in a homopolymer poly(methyl methacrylate) (PMMA) matrix were determined using an intrinsic fluorescence technique based on the ratio of excimer to monomer fluorescence from styrene repeat units. The homopolymer molecular weight (MW) and copolymer MW, composition, and sequence distribution were varied to determine their effects on the CMC, and comparisons were made to theory. Although the effects of these parameters on micelle formation have been the focus of significant theoretical study, few experimental studies have addressed these issues. The MW of the S block (forming the micelle core) has a strong effect on the CMC. For example, an order of magnitude reduction in the CMC (from ∼ 1 to ∼ 0.1 wt %) is observed when the S block MW is increased from 51 to 147 kg/mol while maintaining the MMA block and PMMA MWs at 48–55 kg/mol. Increasing the PMMA matrix MW also has a strong an effect on the CMC, with the CMC for a nearly symmetric S-MMA block copolymer with each block MW equal to 48–51 kg/mol decreasing by a factor of 5 and by several orders of magnitude when the matrix MW is increased from 55 to 106 kg/mol and 255 kg/mol, respectively. In contrast, similar changes in the MMA block MW have little effect on the CMC. Finally, when present in a 55 kg/mol PMMA matrix, a 55 kg/mol S-MMA gradient copolymer with a styrene mole fraction of 0.51 exhibits a factor of 6 larger CMC than a block copolymer of similar MW and composition. © 2008 Wiley Periodicals, Inc. J Polym Sci Part B: Polym Phys 46: 2672–2682, 2008     

Conformational change in an isolated single synthetic polymer chain on a mica surface observed by atomic force microscopy

The random coil conformation of an isolated conventional synthetic polymer chain was clearly imaged by atomic force microscopy (AFM). The sample used was a poly(styrene)-block-poly(methyl methacrylate) diblock copolymer. A very dilute solution of the copolymer with benzene was spread on a water surface. The structure thus formed on water was subsequently transferred and deposited onto mica at various surface pressures and observed under AFM. The AFM images obtained with films deposited at a low surface pressure (<0.1 mN/m) showed a single polystyrene (PS) block chain aggregated into a single PS particle with a single poly(methyl methacrylate) (PMMA) block chain emanating from the particle. Immediately after the deposition, the single PMMA block chain aggregated to form a condensed monolayer around the polystyrene particles. However, after exposing the deposited film to highly humid air for 1 day, the PMMA chains spread out so that the single PMMA block chain could be identified as a random coil on the substrate. The thin water layer formed on the mica substrate in humid air may enable the PMMA block chain to be mobilized on the substrate, leading to the conformational rearrangement from the condensed monolayer conformation to an expanded and elongated coil. The elongation of the PMMA chain was highly sensitive to the humidity; the maximum elongation was obtained at 79% relative humidity. The elongation was a slow process and took about 20 h.     

Structure induced by irradiation of femtosecond laser pulse in dyed polymeric materials

We investigated the structures induced by an irradiation of a near‐infrared (NIR) femtosecond laser pulse in dye‐doped polymeric materials {poly(methyl methacrylate) (PMMA), thermoplastic epoxy resin (Epoxy), and a block copolymer of methyl methacrylate and ethyl acrylate‐butyl acrylate [p(MMA/EA‐BA) block copolymer]}. Dyes used were classified into two types—type 1 with absorption at 400 nm and type 2 with no absorption at 400 nm. The 400‐nm wavelength corresponds to the two‐photon absorption region by the irradiated NIR laser pulse at 800 nm. Type 1 dye‐doped PMMA and p(MMA/EA‐BA) block copolymer showed a peculiar dye additive effect for the structures induced by the line irradiation of a NIR femtosecond laser pulse. On the contrary, dye‐doped Epoxy did not exhibit a dye additive effect. The different results among PMMA, p(MMA/EA‐BA) block copolymer, and Epoxy matrix polymers are supposed to be related to the difference of electron‐acceptor properties. The mechanism of this type 1 dye‐additive‐effect phenomenon for PMMA and p(MMA/EA‐BA) block copolymer is discussed on the basis of two‐photon absorption of type 1 dye at 400 nm by the irradiation of a femtosecond laser pulse with 800 nm wavelength and the dissipation of the absorbed energy to the polymer matrix among various transition processes. Dyes with a low‐fluorescence quantum yield favored the formation of thicker grating structures. © 2002 Wiley Periodicals, Inc. J Polym Sci Part B: Polym Phys 40: 2800–2806, 2002     

Reactively and physically compatibilized immiscible polymer blends: stability of the copolymer at the interface

This paper reports on the interfacial behaviour of block and graft copolymers used as compatibilizers in immiscible polymer blends. A limited residence time of the copolymer at the interface has been shown in both reactive blending and blend compatibilization by preformed copolymers. Polystyrene (PS)/polyamide6 (PA6), polyphenylene oxide (PPO)/PA6 and polymethylmethacrylate (PMMA)/PA6 blends have been reactively compatibilized by a styrene-maleic anhydride copolymer SMA. The extent of miscibility of SMA with PS, PPO and PMMA is a key criterion for the stability of the graft copolymer at the interface. For the first 10 to 15 minutes of mixing, the in situ formed copolymer is able to decrease the particle size of the dispersed phase and to prevent it from coalescencing. However, upon increasing mixing time, the copolymer leaves the interface which results in phase coalescence. In PS/LDPE blends compatibilized by preformed PS/hydrogenated polybutadiene (hPB) block copolymers, a tapered diblock stabilizes efficiently a co-continuous two-phase morphology, in contrast to a triblock copolymer that was unable to prevent phase coarsening during annealing at 180°C for 150 minutes.     

水分散体系中甲基丙烯酸甲酯和丙烯酸八氟戊酯嵌段共聚物的合成与表征

在聚合物链上引入氟元素可以赋予聚合物很多优异的性能 ,如良好的热稳定性、化学稳定性、生物相容性和憎水憎油性等 .含氟单体与一般单体共聚是合成含氟共聚物的重要途径 .通过原子转移自由基聚合 (ATRP)不仅可以实现多种单体的控制 (共 )聚合 ,而且可以合成出具有预定分子量、窄分子量分布以及结构明晰聚合物[1] ,我们曾报道了溶液体系中用ATRP方法合成含氟嵌段共聚物[2～ 4] .众所周知 ,大多数含氟聚合物都是通过乳液或悬浮聚合反应合成的 .然而 ,普通的乳液或悬浮聚合难以合成结构和组成可控的聚合物 ,如嵌段共聚物 ,所以近年来 ,水…     

PI-b-PMMA diblock copolymers: nanostructure development in thin films and nanostructuring of thermosetting epoxy systems

Poly(isoprene-block-methyl methacrylate) (PI-b-PMMA) block copolymers with different block ratios have been used to generate nanostructures both in thin films and by nanostructuring a thermosetting epoxy system. Obtained morphologies have been analyzed in terms of atomic force microscopy. The nanostructuring of thin films was carried out by thermal and solvent vapor annealing, in which the copolymer films were exposed to acetone vapors, selective solvent for methyl methacrylate (PMMA) block. By solvent vapor annealing thin films of both copolymers self-assembled into a hexagonally packed cylindrical morphology. Thermal annealing was carried out above the glass transition temperature of both blocks, obtaining worm-like and lamellar morphologies, depending on the block ratio. One of the copolymers has also been used for nanostructuring an epoxy thermosetting system. Morphologies consisting of spherical-shaped PI domains dispersed in a continuous epoxy matrix in which PMMA remained miscible were obtained, independently of the copolymer amount.     

PMMA—b—PTHF／PTHF共混体系中共聚物结晶能力的增强

结晶嵌段共聚物具有一般均聚物所没有的许多特殊结晶行为。虽然,人们很早就已开始对聚氧化乙烯/聚苯乙烯诸类嵌段共聚物的结晶行为进行研究,但对这类体系相分离规律及结晶行为的认识仍很不够。这主要是因为已研究的体系非常有限,此外,大都为对体系非平衡态结构的研究。所以,尽管Whitmore和Noolandi最近提出了结晶嵌段共聚物及其共混物的平衡形态理论,但缺乏实验数据与之比较。     

Selective control over the lamellar thickness of one domain in thin binary blends of block copolymer films

Thin binary blends of poly(styrene‐b‐methyl methacrylate) (PS‐PMMA) block copolymers in films where the lamellar thickness of one domain is controlled while preserving the thickness of the other domain were demonstrated without microphase separation. One of the block copolymers used here was short and symmetric, and the other was long and asymmetric; the molecular weights of the PMMA block chains in the constituents were similar. A random copolymer brush was introduced and film thickness and composition of brush were adjusted to induce perpendicular orientation in thin film. As the blend composition of the long asymmetric block copolymer increased, the PS lamellar thickness increased from 15.8 to 25.1 nm, whereas the PMMA lamellar thickness remained constant at approximately 14 nm (the thickness decreased slightly from 14.0 to 13.3 nm). The domain spacing behavior in thin film was consistent in the bulk. These results were compared with the Birshtein, Zhulina, and Lyatskaya model and the theories for pure block copolymers in the strong segregation limit and in the intermediate segregation regime. © 2013 Wiley Periodicals, Inc. J. Polym. Sci., Part B: Polym. Phys. 2013, 51, 1393–1399     

Thermal‐initiating potentialities of poly(methyl methacrylate) peroxide: Metamorphosis of block‐into‐block copolymer and comparative studies on surface texture and morphology

This is the first report concerning the use of vinyl polyperoxide, namely, poly(methyl methacrylate) peroxide (PMMAP), as a thermal initiator for the synthesis of active polymer PMMAP‐PS‐PMMAP by free‐radical polymerization with styrene. The polymerizations have been carried out at different concentrations of macroinitiator PMMAP. The active polymers have been characterized by ¹H NMR, DSC, thermogravimetric analysis, and gel permeation chromatography. PMMAP‐PS‐PMMAP is further used as the thermal macroinitiator for the preparation of another block copolymer, PMMA‐b‐PS‐b‐PMMA, by reacting the active polymers with methyl methacrylate. The block copolymers have been synthesized by varying the concentrations of the active polymers. The mechanism of block copolymers has been discussed, which is also supported by thermochemical calculations. Studies on the surface texture and morphology of the block copolymer of polystyrene (PS) and PMMA material have been carried out using scanning electron microscopy. Furthermore, in this article, a blend of the same constituent materials (PS and PMMA) in proportions (v/v) similar to that contained in block copolymers has been formulated, and the morphology and surface textures of these materials were also investigated. A comparative microscopical evaluation between two processing methods was done for a better understanding of the processing route dependence of the microstructures. © 2001 John Wiley & Sons, Inc. J Polym Sci A: Polym Chem 39: 546–554, 2001     

Synthesis and Characterization of a Diblock Copolymer of Methyl Methacrylate and Vinyl Acetate by Successive Photo‐Induced Charge Transfer Polymerization Using Ethanolamine as the Parent Compound

Communication: A diblock copolymer consisting of poly(methyl methacrylate) (PMMA) and poly(vinyl acetate) (PVAc) with hydroxyl group at one end is prepared by successive charge transfer polymerization (CTP) under UV irradiation at room temperature using ethanolamine and benzophenone as a binary initiation system. The diblock copolymer PMMA‐b‐PVAc could be selectively hydrolyzed to the block copolymer of poly(methyl methacrylate) and poly(vinyl alcohol) (PVA) using sodium ethoxide as the catalyst. Both copolymers, PMMA‐b‐PVAc and PMMA‐b‐PVA, are characterized in detail by means of FTIR and ¹H NMR spectroscopy, and GPC. The effect of the solvent on CTP and the kinetics of CTP are discussed.     

甲基丙烯酸甲酯的反向原子转移自由基聚合反应 研究

在较低的温度(60℃)和较低的AIBN/CuCl~2/配位剂摩尔比(1:2:4)条件下,用乙腈为溶剂,实现了甲基丙烯酸甲酯(MMA)的反向原子转移自由基聚合(RATRP)。联二吡啶(bpy)为配位剂时,所合成的聚甲基丙烯酸甲酯(PMMA)的分子量分布可低至1.08。用1,10-菲咯啉(phen)代替bpy,MMA的聚合反应速率加快,但其分子量分布稍宽(1.40左右),并进一步研究了bpy和phen作为混合配位剂时对MMA反向ATRP聚合的影响。用RATRP反应所得的带有卤素端基的PMMA作为苯乙烯ATRP的大分子引发剂,成功地合成了具有预期结构的苯乙烯与甲基丙烯酸甲酯嵌段共聚物,大分子引发剂的引发效率接近于1,说明在RATRP过程中由自由基引发剂引发MMA进行一般自由基聚合反应的可能性甚微。     

Surface and solution properties of polysiloxane–poly(methyl methacrylate) graft copolymer

A polysiloxane–poly(methyl methacrylate) (PMMA) graft copolymer was prepared by hydrosilylation reaction between a Si? H containing polysiloxane and an allyl-terminated PMMA. The obtained graft copolymer was blended with PMMA homopolymer. The addition of only 0.01 wt % of graft copolymer was sufficient to make PMMA surfaces hydrophobic. In acetone–cyclohexane mixed solvent, the graft copolymer formed a polymeric micelle by the aggregation of PMMA branches.     

Solvent-induced novel morphologies in diblock copolymer blend thin films

We report the morphology and phase behaviors of blend thin films containing two polystyrene-b-poly(methyl methacrylate) (PS-b-PMMA) diblock copolymers with different blending compositions induced by a selective solvent for the PMMA block, which were studied by transmission electron microscopy (TEM). The neat asymmetric PS-b-PMMA diblock copolymers employed in this study, respectively coded as a1 and a2, have similar molecular weights but different volume fractions of PS block (fPS=0.273 and 0.722). Another symmetric PS-b-PMMA diblock copolymer, coded as s, which has a PS block length similar to that of a1, was also used. For the asymmetric a1/a2 blend thin films, circular multilayered structures were formed. For the asymmetric a1/symmetric s blend thin films, inverted phases with PMMA as the dispersed domains were observed, when the weight fraction of s was less than 50%. The origins of the morphology formation in the blend thin films via solvent treatment are discussed. Combined with the theoretical prediction by Birshtein et al. (Polymer 1992, 33, 2750), we interpret the formation of these special microstructures as due to the packing frustration induced by the difference in block lengths and the preferential interactions between the solvent and PMMA block. Results obtained here suggest that diblock copolymer blend thin films treated with a selective solvent offer an alternative and attractive approach to control the self-organization of polymers.     

Synthesis and micelle formation of triblock copolymers of poly(methyl methacrylate)-b-poly(ethylene oxide)-b-poly(methyl methacrylate) in aqueous solution

Amphiphilic triblock copolymers of poly(methyl methacrylate)-b-poly(ethylene oxide)-b-poly(methyl methacrylate) (PMMA-b-PEO-b-PMMA) with well-defined structure were synthesized via atom transfer radical polymerization (ATRP) of methyl methacrylate (MMA) initiated by the PEO macroinitiator. The macroinitiator and triblock copolymer with different PMMA and/or PEO block lengths were characterized with ¹H and ¹³C NMR and gel permeation chromatography (GPC). The micelle formed by these triblock copolymers in aqueous solutions was detected by fluorescence excitation and emission spectra of pyrene probe. The critical micelle concentration (CMC) ranged from 0.0019 to 0.016 mg/mL and increased with increasing PMMA block length, while the PEO block length had less effect on the CMC. The partition constant K_v for pyrene in the micelle and in aqueous solution was about 10⁵. The triblock copolymer appeared to form the micelles with hydrophobic PMMA core and hydrophilic PEO loop chain corona. The hydrodynamic radius R_h,app of the micelle measured with dynamic light scattering (DLS) ranged from 17.3 to 24.0 nm and increased with increasing PEO block length to form thicker corona. The spherical shape of the micelle of the triblock copolymers was observed with an atomic force microscope (AFM). Increasing hydrophobic PMMA block length effectively promoted the micelle formation in aqueous solutions, but the micelles were stable even only with short PMMA blocks.