基于混合型量子阱的GaN基垂直结构发光二极管性能

为解决GaN基垂直结构发光二极管(VS-LEDs)在大电流驱动时效率下降的问题,制作了具有耦合量子阱(CQWs)和传统量子阱(NQWs)的混合型量子阱(HQWs)结构VS-LEDs.与NQWs结构VS-LEDs相比,HQWs结构VS-LEDs在350 mA输入电流下的正向偏压降低0.68 V,光输出功率提升53.0％,并有更好的电流响应效率.同时,NQWs结构和HQWs结构VS-LEDs的外量子效率分别下降到最大值的37.7％和67.5％,表明采用HQWs能使LEDs的效率下降得到大幅缓解.     

垒温对硅衬底GaN基蓝光LED发光效率的影响

用MOCVD技术在硅衬底上生长了GaN基蓝光LED外延材料,研究了有源层多量子阱中垒的生长温度对发光效率的影响,获得了不同电流密度下外量子效率(EQE)随垒温的变化关系。结果表明,在860~915℃范围内,发光效率随着垒温的上升而上升。当垒温超过915℃后,发光效率大幅下降。这一EL特性与X光双晶衍射和二次离子质谱所获得的阱垒界面陡峭程度有明显的对应关系,界面越陡峭则发光效率越高。垒温过高使界面变差的原因归结为阱垒界面的原子扩散。垒温偏低使界面变差的原因归结为垒对前一个量子阱界面的修复作用和为后一个量子阱提供台阶流界面的能力偏弱。外延生长时的最佳垒温范围为895~915℃。     

GaN纳米柱发光特性

用自组装的Ni纳米岛做掩模通过ICP刻蚀得到GaN纳米柱,采用扫描电子显微镜(SEM)观测其形貌,室温下光致发光(PL)谱测量研究样品发光特性。结果表明,室温下GaN 纳米柱的发光强度是体材料的2.6倍。为了修复刻蚀损伤,用KOH对样品进行湿法处理,发现经KOH处理的纳米柱与处理前相比变得更直,且其发光较处理之前进一步增强。为了研究其原因,分别对KOH处理前后的样品进行变温PL谱的测量,发现湿法处理后发光增强是由于内量子效率的提高引起的。     

激光剥离技术实现垂直结构GaN基LED

为改善GaN基发光二极管(Light-emitting diode,LED)的电学特性和提高其输出光功率,采用激光剥离技术,在KrF准分子激光器脉冲激光能量密度为400mJ/cm2的条件下,将GaN基LED从蓝宝石衬底剥离,结合金属熔融键合技术,在300℃中将GaN基LED转移至高电导率和高热导率的硅衬底,制备出了具有垂直结构的GaN基LED,并对其电学和光学特性进行了测试。结果表明:在110mA注入电流下,垂直结构器件的开启电压由普通结构的3.68V降低到了3.27V;在560mA注入电流下,器件输出光功率没有出现饱和现象;采用高电导率和高热导率的硅衬底能有效地改善GaN基LED的电学和光学特性。     

p-GaN层厚度对GaN基p-i-n结构紫外探测器性能的影响

研究了p-GaN层厚度对GaN基pin结构紫外探测器性能的影响.模拟计算表明：较厚的p-GaN层会减小器件的量子效率,然而同时也会减小器件的暗电流,较薄的p-GaN层会增加器件的量子效率,但是同时也增加了器件的暗电流.进一步的分析表明,金属和p-GaN之间的结电场是出现这种现象的根本原因.在实际的器件设计中,应该根据实际需要选择p型层的厚度. 关键词： GaN 紫外探测器 量子效率 暗电流     

GaN基LED量子阱内量子点发光性质的模拟分析

采用模拟计算的方法,运用量子点模型对GaN基LED器件中不同尺寸量子点的电致发光光谱进行模拟分析,并对器件结构中电子空穴浓度,辐射复合强度进行了研究．分析结果显示,随着量子点尺寸的增大,量子点发光波长存在红移,当圆柱状量子点半径从1．8nm增长到13nm时,波长红移309．6meV,在量子阱中生长单一尺寸的量子点可以达到不同波长的单色发光器件,而在不同量子阱中生长不同尺寸的量子点可以实现多波长发光,以及单颗LED的白色显示,并通过调节量子点的分布密度达到调节各发光波长强度的目的．结果表明,量子点分布密度调节之后多波长发光均匀性得到有效改善．     

渐变型量子阱垒层厚度对GaN基双波长发光二极管发光特性调控的研究

采用软件理论分析的方法对渐变型量子阱垒层厚度的InGaN双波长发光二极(LED)的载流子浓度分布、 能带结构、自发发射谱、内量子效率、发光功率及溢出电子流等进行研究.分析结果表明, 增大量子阱垒层厚度会影响空穴在各量子阱的注入情况, 对双波长LED各量子阱中空穴浓度分布的 均衡性及双波长发光光谱的调控起到一定作用,但会导致内量子效率严重下降; 而当以特定的方式从n电极到p电极方向递减渐变量子阱垒层厚度时, 活性层量子阱的溢出电子流 得到有效的控制, 双发光峰强度达到基本一致, 同时芯片的内量子效率下降得到了有效控制, 且具备大驱动电流下较好的发光特性.     

In组分渐变提高InGaN/GaN多量子阱发光二极管发光性能

利用金属有机物化学气相沉积系统在蓝宝石衬底上通过有源层的变温生长,得到In组分渐变的量子阱结构,从而获得具有三角形能带结构的InGaN/GaN多量子阱发光二极管(LED)(简称三角形量子阱结构LED).变温光致发光谱结果表明,相对于传统具有方形能带结构的量子阱LED(简称方形量子阱结构LED),三角形量子阱结构有效提高了量子阱中电子和空穴波函数的空间交叠,从而增加了LED的内量子效率;电致发光谱结果表明,三角形量子阱结构LED器件与传统结构LED器件相比,明显改善了发光峰值波长随着电流的蓝移现象.通过以上     

GaN基LED溢出电流的模拟

通过分析影响电子溢出的因素,建立多量子阱的物理模型,得到溢出电流表达式.研究了外加电压与极化效应对溢出电流的影响,认为极化效应使能带弯曲,电子溢出量子阱,溢出电流大幅度增加.考虑了LED散热和载流子屏蔽效应对溢出电流的影响,并为减小溢出电流提供了思路.     

量子阱渐变层材料及结构对GaN基LED性能的影响

In组分渐变InGaN/GaN量子阱结构可以有效解决晶格失配所带来的LED发光效率降低的问题。采用Silvaco软件建立了In组分渐变量子阱结构数值计算模型,研究了量子阱中渐变层In组分及渐变层厚度对极化电荷密度、载流子浓度及LED功率谱密度的影响。研究结果表明：随着渐变层中In组分的增加,载流子浓度以及极化电荷密度都在增大,但极化电荷密度增幅较小,峰值功率谱密度随着In组分增加的增长幅度逐渐减小;功率谱密度随着渐变层顶层厚度的增加先增大后减小,渐变层非顶层厚度不均匀时的功率谱密度比均匀时的功率谱密度小。     

Affection of different doping structure on quantum efficiency and spectrum response of reflection-mode GaN photocathode

In order to analyze the effect of varied doping structure on the quantum efficiency and spectrum response of the photocathode, six kinds of reflective varied doping GaN photocathode samples are designed and grown. The quantum efficiency curves and the spectrum response curves are obtained after these samples are activated. Through the analysis of experiment result, the factors and the reasons that can affect the quantum efficiency and spectrum response are concluded. The experiment result shows that the photocathode with exponential-doping structure has the best spectrum response and the highest quantum efficiency. The experiment result provides suggestions for the study on optimizing design of photocathode doping structure.     

GaN/In_xGa_(1-x)N型最后一个量子势垒对发光二极管内量子效率的影响

GaN/In_xGa_(1-x)N型最后一个量子势垒结构能有效提高发光二极管(LED)器件内量子效率,缓解LED效率随输入电流增大而衰减的问题.本文综述了该结构及其结构变化——In组分梯度递增以及渐变、GaN/In_xGa_(1-x)N界面极化率改变等对改善LED器件性能的影响及优势,归纳总结了不同结构的GaN/In_xGa_(1-x)N型最后一个量子垒的工作机理,阐明极化反转是该结构提高LED性能的根本原因.在综述该结构发展的基础之上,通过APSYS仿真计算,进一步探索和深入分析了该结构中In_xGa_(1-x)N层的In组分及其厚度变化对LED内量子效率的影响.结果表明:In组分的增加有助于在GaN/In_xGa_(1-x)N界面产生更多的极化负电荷,增加GaN以及电子阻挡层处导带势垒高度,减少电子泄漏,从而提高LED的内量子效率;但GaN/In_xGa_(1-x)N型最后一个量子势垒中In_xGa_(1-x)N及GaN层厚度的变化由于会同时引起势垒高度和隧穿效应的改变,因而In_xGa_(1-x)N和GaN层的厚度存在一个最佳比值以实现最大化的减小漏电子,提高内量子效率.     

Electronic structure and optical properties of zinc-blende GaN quantum dots

The energy levels of zinc-blende GaN quantum dots (QDs) are studied within the framework of the effective-mass envelope-function approximation. The dependence of the energy of electron and hole states on the quantum dot (QD) size is presented. The selection rules for optical transitions are given and the oscillator strengths of the dipole-allowed transitions for various QD radii are calculated with the wavefunctions of quantized energy levels. The theoretical absorption spectrum of GaN QDs is in good agreement with the existing experimental result.     

Influence of surface scattering on the thermal properties of spatially confined GaN nanofilm

Gallium nitride(GaN), the notable representative of third generation semiconductors, has been widely applied to optoelectronic and microelectronic devices due to its excellent physical and chemical properties. In this paper, we investigate the surface scattering effect on the thermal properties of GaN nanofilms. The contribution of surface scattering to phonon transport is involved in solving a Boltzmann transport equation(BTE). The confined phonon properties of GaN nanofilms are calculated based on the elastic model. The theoretical results show that the surface scattering effect can modify the cross-plane phonon thermal conductivity of GaN nanostructures completely, resulting in the significant change of size effect on the conductivity in GaN nanofilm. Compared with the quantum confinement effect, the surface scattering leads to the order-of-magnitude reduction of the cross-plane thermal conductivity in GaN nanofilm. This work could be helpful for controlling the thermal properties of Ga N nanostructures in nanoelectronic devices through surface engineering.     

硅衬底氮化镓基LED薄膜转移至柔性黏结层基板后其应力及发光性能变化的研究

本文将硅(Si)衬底上外延生长的氮化镓(GaN)基发光二极管(LED)薄膜转移至含有柔性黏结层的基板上, 获得了不受衬底和支撑基板束缚的LED薄膜. 利用高分辨率X射线衍射仪(HRXRD)研究了薄膜转移前后的应力变化, 同时对其光致发光(PL)光谱的特性进行了研究. 结果表明: 硅衬底GaN基LED薄膜转移至柔性基板后, GaN受到的应力会由转移前巨大的张应力变为转移后微小的压应力, InGaN/GaN量子阱受到的压应力则增大; 尽管LED薄膜室温无损转移至柔性基板其InGaN阱层的In组分不会改变, 然而按照HRXRD倒易空间图谱通用计算方法会得出平均铟组发生了变化; GaN基LED薄膜从外延片转移至柔性基板时其PL谱会发生明显红移.     

量子阱结构对含V形坑InGaN/GaN蓝光LED效率衰减的影响

使用MOCVD在图形化Si衬底上生长了含V形坑的InGaN/GaN蓝光LED。通过改变生长温度,生长了禁带宽度稍大的载流子限制阱和禁带宽度稍小的发光阱,研究了两类量子阱组合对含V形坑InG aN/GaN基蓝光LED效率衰减的影响。使用高分辨率X射线衍射仪和LED电致发光测试系统对LED外延结构和LED光电性能进行了表征。结果表明:限制阱靠近n层、发光阱靠近p层的新型量子阱结构,在室温75 A/cm~2时的外量子效率相对于其最高点仅衰减12.7%,明显优于其他量子阱结构的16.3%、16.0%、28.4%效率衰减,且只有这种结构在低温时(T≤150 K)未出现内量子效率随电流增大而剧烈衰减的现象。结果表明,合理的量子阱结构设计能够显著提高电子空穴在含V形坑量子阱中的有效交叠,促进载流子在阱间交互,提高载流子匹配度,抑制电子泄漏,从而减缓效率衰减、提升器件光电性能。     

Influence of barrier thickness on the structural and optical properties of InGaN/GaN multiple quantum wells

The structural and optical properties of InGaN/GaN multiple quantum wells(MQWs) with different barrier thicknesses are studied by means of high resolution X-ray diffraction(HRXRD), a cross-sectional transmission electron microscope(TEM), and temperature-dependent photoluminescence(PL) measurements. HRXRD and cross-sectional TEM measurements show that the interfaces between wells and barriers are abrupt and the entire MQW region has good periodicity for all three samples. As the barrier thickness is increased, the temperature of the turning point from blueshift to redshift of the S-shaped temperature-dependent PL peak energy increases monotonously, which indicates that the localization potentials due to In-rich clusters is deeper. From the Arrhenius plot of the normalized integrated PL intensity, it is found that there are two kinds of nonradiative recombination processes accounting for the thermal quenching of photoluminescence,and the corresponding activation energy(or the localization potential) increases with the increase of the barrier thickness.The dependence on barrier thickness is attributed to the redistribution of In-rich clusters during the growth of barrier layers,i.e., clusters with lower In contents aggregate into clusters with higher In contents.     

Effects of polarization and p-type GaN resistivity on the spectral response of InGaN/GaN multiple quantum well solar cells

Effects of polarization and p-type GaN resistivity on the spectral response of InGaN/GaN multiple quantum well(MQW) solar cells are investigated. It is found that due to the reduction of piezoelectric polarization and the enhancement of tunneling transport of photo-generated carriers in MQWs, the external quantum efficiency(EQE) of the solar cells increases in a low energy spectral range(λ 370 nm) when the barrier thickness value decreases from 15 nm to 7.5 nm. But the EQE decreases abruptly when the barrier thickness value decreases down to 3.75 nm. The reasons for these experimental results are analyzed. We are aware that the reduction of depletion width in MQW region, caused by the high resistivity of the p-type GaN layer may be the main reason for the abnormally low EQE value at long wavelengths(λ 370 nm).     

Effect of high temperature annealing on strain and band gap of GaN nanoparticles

Black-coloured GaN nanoparticles with an average grain size of 50 nm have been obtained by annealing GaN nanoparticles under flowing nitrogen at 1200 oC for 30 min. XRD measurement result indicates an increase in the lattice parameter of the GaN nanoparticles annealed at 1200 oC, and HRTEM image shows that the increase cannot be ascribed to other ions in the interstitial positions. If the as-synthesised GaN nanoparticles at 950 oC are regarded as standard, the thermal expansion changes nonlinearly with temperature and is anisotropic; the expansion below 1000oC is smaller than that above 1000 oC. This study provides an experimental demonstration for selecting the proper annealing temperature of GaN. In addition, a large blueshift in optical bandgap of the annealed GaN nanoparticles at 1200 oC is observed, which can be ascribed to the dominant transitions from the C(Γ₇) with the peak energy at 3.532 eV.