Hybrid Integration Between Long Focus Microlens Array and IR Detector Array

A special method, named step simulation method, is proposed for fabricating Si microlens array to improve the performance of infrared focal plane array (IR FPA). The focus length of rectangle-based multistep microlens array with element dimension of 40 µm×30 µm is 885.4 µm by the method, which is much longer than the focus length of microlens array fabricated by conventional Fresnel binary optics technique., The large-scale 256×256 element microlens array is hybridintegrated with the PtSi Schottky-barrier IR FPA by optical adhesive. The test results show that diffractive spot size of the microlens is 17 µm×15 µm and the average optical response of the IR FPA is increased by a factor of 2.4.     

Technique for Monolithic Fabrication of Microlens Arrays Integrated with Infrared CCD

Based on scalar diffraction theory, 8-phase-level 256×256 elements diffractive microlens array with element dimension of 50×33 μm2 have been fabricated on the back-side of PtSi(3～5 μm) infrared CCD. The measurement results indicated that the ratio of the signal-to-noise of the infrared CCD with microlens was increased by a factor of 2.8.     

Technique for Monolithic Fabrication of Microlens Arrays Integrated with Infrared CCD

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Monolithic integration technology between microlens arrays and infrared charge coupled devices

In this paper, we develop an integration technology between Si microlens and 256(H)×256(V) element PtSi Schottky-barrier infrared charge coupled device (IR-CCD) to improve the optical responsivity of CCD sensor. The refractive microlenses with the pixel size of approximately 28×28 μm² is directly fabricated on the backside of CCD substrate to focus the incident irradiation onto the active area. For the integration device the fill factor is improved by a factor of 2.1. As a result, the IR-CCD image sensors operating at 77 K indicate an approximate 0.06–0.4 increase in relative optical responsivity in the spectral range of from 1 to 5 μm. CCD imaging quality with microlens has been improved comparing to that without microlens to a great extent.     

Bach Fabrication of Microlens at the end of Optical Fiber using Self-photolithgraphy and Etching Techniques

This paper describes a simple batch process for fabrication of microlens and microlens array at the end of an optical fiber or an optical fiber bundle using self-photolithography and etching techniques. A photoresist micro-cylinder was exactly formed at the core of the fiber end by exposing an UV light from the other end of the fiber and conventional development, rinse processes. A photoresist microlens was formed by thermal reflowing of the fiber at 170°C for 1 h. A measurement of transmissivity showed that the fabricated photoresist microlens is applicable for a wavelength that is longer than 450 nm. Alternatively, a glass microlens was fabricated at the core of the fiber by dry etching with an SF₆ gas using the photoresist microlens as a mask. The focusing of the lensed fiber was confirmed and simulation work showed that the lensed fiber could focus the light with a beam spot of 2 μm, numerical aperture (NA) of 0.285 and a depth of focus of 16 μm.     

Design and Fabrication of Microlens Array for Near-Field Vertical Cavity Surface Emitting Laser Parallel Optical Head

A GaP microlens for collecting laser light was developed in the tip of a near-field probe. It is important to realize a near-field optical probe head with high throughput and a small spot size. The design and fabrication results of the GaP microlens array are described. The most suitable GaP microlens with a probe was calculated as having a 10 μm radius using the two-dimensional finite difference time domain (2-D FDTD) method. The full width half maximum (FWHM) spot size variation and optical power density tolerance were calculated as 157 nm ± 5 nm and 7%, respectively. A spherical GaP microlens was fabricated with a radius of 10 μm by controlling the Cl₂/Ar gas mixture ratio. The difference between the theoretical spherical shape and the fabricated GaP microlens was evaluated as 40 nm at peak to valley. The FWHM spot size and optical throughput of the fabricated microlens were measured as 520 nm and 63%, respectively. The microlens was the same as a theoretical lens with a 10 μm radius. The micron-lens array fabrication process for a near-field optical head was demonstrated in this experiment.     

Photoetching of spherical microlenses on glasses using a femtosecond laser

We fabricated spherical microlenses on optical glasses by femtosecond laser direct writing (FLDW) in ambient air. To achieve good appearances of the microlenses, a meridian-arcs scanning method was used after a selective multilayer removal process with spiral scanning paths. A positive spherical microlens with diameter of 48 μm and height of 13.2 μm was fabricated on the surface of the glass substrate. The optical performances of the microlens were also tested. Compared to the conventional laser direct writing (LDW) technique, this work could provide an effective method for precise shape-controlled fabrication of three-dimensional (3D) microstructures with curved surfaces on difficult-to-cut materials for practical applications.     

石英微透镜阵列的制作研究

叙述了采用氩离子束刻蚀的方法制作线列长方形拱面石英微透镜阵列.所制单元石英微透镜底部的外形尺寸为(300×106)um²,平均冠高7.07μm,平均曲率半径202.19μm,平均焦距404.38μm,平均F₂数为3.82,平均光焦度2.47×10³屈光度,扫描电子显微镜和表面探针测试表明,所制线列石英微透镜阵列的图形整齐均匀,单元长方形拱面石英微透镜的轮廓清晰,表面光滑平整.所制微透镜阵列用于高T_c超导红外探测器阵列的实验证实,微透镜的引入可以显著改善超导探测器的光响应特性.     

Optical Dispersion Characteristics of Planar Microlenses

It is essential to know the wavelength dispersion of a planar microlens in order to suitably design optical systems which use such a component. For this purpose, the measurement of focal length over a wide range of the spectrum has been performed. It was clarified that the focal length varies by about 20% from blue (ƛ=0.442 μm) to near-infra red (ƛ=1.55μm) region. The maximum index difference between the lens center and substrate, an important parameter for the characterization of planar microlenses, has been estimated as a function of wavelength using the ray equation. The effect of angled incidence has been discussed.     

Synthesis and field emission of diamond-like carbon nanorods on TiO2/Ti nanotube arrays

Highly ordered TiO₂/Ti nanotube arrays were fabricated by anodic oxidation method in 0.5 wt% HF. Using prepared TiO₂/Ti nanotube arrays deposited Ni nanoparticles as substrate, high quality diamond-like carbon nanorods (DLCNRs) were synthesized by a conventional method of chemical vapor deposition at 750 °C in nitrogen atmosphere. DLCNRs were analyzed by filed emission scanning electron microscopy and Raman spectrometer. It is very interesting that DLCNRs possess pagoda shape with the length of 3–10 μm. Raman spectra show two strong peaks about 1332 cm⁻¹ and 1598 cm⁻¹, indicating the formation of diamond-like carbon. The field emission measurements suggest that DLCNRs/TiO₂/Ti has excellent field emission properties, a low turn-on field about 3.0 V/μm, no evident decay at 3.4 mA/cm² in 480 min.     

Determination of Aberration Coefficient of Microoptic Arrays from Axial Confocal Response by Neural Method

We propose a high-speed and parallel method to determine lens aberrations from its confocal axial response. This method analyzes the intensity confocal response including the aberration information of the objective lens by means of neural network algorithm. This method is designed to work parallely for many microlenses, and simultaneously determines aberrations of each element of a microlens array. A prototype system can determine spherical aberration coefficients of a microlens in the range from −0.7λ to 0.3λ with less than 1% RMS error.     

Lens Sag Measurement of Microlens Array Using Optical Interferometric Microscope

This study attempted to develop a detection system for lens sag of the microlens array in real time using an optical automatic inspection framework to link with the computer through a camera. An image processing technique was applied to detect the spherical microlens array, and then, the results were compared.The system light source used laser light and applied CCD to collocate with the microscope array to form an automatic optical detection system for an optical interferometric microscope. It applied the principle of the Fizeau interferometer, illuminated the surface of microlens array, and formed the phase difference required by the interference of two lights through the laser light reflected by the reference plane and the surface of the microlens array, thus, forming an interference fringe.When the sag of the microlens was much longer than the wave length of the detection light source, the fringe would be densely distributed, thus, only a few central fringes were clear in the microscopic image. An image processing method was used to search the center of the interference fringe and a creative algorithm was utilized to obtain the lens sag of the microlens. As proved by the experiment, lens sag of 4 microlens arrays were detected in real time, with a minimum detection error of 0.08 μm, and a maximum detection error of 4 μm (error value 1 ~ 9%), according to different sample processes. This system featured a simple structure and is applicable to non-contact detection and detection of different-sized microlens arrays.     

Eye-protection glasses against YAG laser injury based on the band gap reflection of one-dimensional photonic crystal

Eye-protection glasses against YAG laser injury based on band gap reflection of one-dimensional photonic crystal (PC) is designed and manufactured in this paper. The laser beam (wavelength 1.06 μm) is reflected by the one-dimensional PC (with the transmission 10⁻⁷) and absorbed by the phosphatic glass substrate (with the transmission 1% for 1.06 μm), so the transmission of the device for wavelengths of1.06 μm can reach 10⁻⁹. The glasses have enough capabilities to protect the eyes from injury of ns-YAG lasers whose energy density is 1 J/cm² for all incident angles, and also to avoid a second injury to others from the reflected laser beams. The transmission of the glasses is beyond 70% for the visible lights. The testing data of the eye-protection glasses agree well with the theoretical predictions.     

Effects of parylene C layer on high power light emitting diodes

20 μm parylene C layer was deposited on silicone film to enhance the oxygen and water barrier properties, deposited at typical rate of 2.0 and 5.6 μm/h by controlling different deposited pressures. Surface morphology and roughness were observed by atomic force microscopy (AFM), surface morphology images show lower deposited rate that can lead to better quality film. 20 μm parylene C layer was deposited on silicone encapsulation of high power light emitting diodes (LEDs), the samples were tested by power temperature cycling (PTC) test from −40 to 85 °C, 15 min each extreme, and no corrosion, discoloration, cracks was found on the LEDs after the 1000 h PTC reliability test, and PTC test is intended to simulate worst case conditions encountered in typical applications, and parylene C floating membrane structure can stand such high stress and strain. Optical test on white and red LED samples with and without 20 μm parylene C layer, measurement result shows the optical transmittance more than 95%. 1000 h temperature humidity bias life test (T&HB) is performed for the purpose of evaluating the reliability of LEDs in humid environments, energy-dispersive X-ray (EDX) analysis revealed much lower content of C (carbon) and O (oxygen) on the lead frame of LED with parylene C coating after T&HB test on, and no oxidation was found in the LED package.     

Controlled fabrication of Si nanostructures by high vacuum electron beam annealing

Silicon nanostructures, called Si nanowhiskers, have been successfully synthesized on Si(1 0 0) substrate by high vacuum electron beam annealing (EBA). Detailed analysis of the Si nanowhisker morphology depending on annealing temperature, duration and the temperature gradients applied in the annealing cycle is presented. A correlation was found between the variation in annealing temperature and the nanowhisker height and density. Annealing at 935 °C for 0 s, the density of nanowhiskers is about 0.2 μm⁻² with average height of 2.4 nm grow on a surface area of 5×5 μm, whereas more than 500 nanowhiskers (density up to 28 μm⁻²) with an important average height of 4.6 nm for field emission applications grow on the same surface area for a sample annealed at 970 °C for 0 s. At a cooling rate of −50 °C s⁻¹ during the annealing cycle, 10–12 nanowhiskers grew on a surface area of 5×5 μm, whereas close to 500 nanowhiskers grew on the same surface area for samples annealed at the cooling rate of −5 °C s⁻¹. An exponential dependence between the density of Si nanowhiskers and the cooling rate has been found. At 950 °C, the average height of Si nanowhiskers increased from 4.0 to 6.3 nm with an increase of annealing duration from 10 to 180 s. A linear dependence exists between the average height of Si nanowhiskers and annealing duration. Selected results are presented showing the possibility of controlling the density and the height of Si nanowhiskers for improved field emission properties by applying different annealing temperatures, durations and cooling rates.     

A germanium photodetector array for the near infrared monolithically integrated with silicon CMOS readout electronics

Near infrared (NIR) detectors, operating in the 1.3–1.6 μm region, are key elements in a number of applications ranging from optical communications to remote sensing. InGaAs and Ge are currently the materials of choice for the fabrication of NIR detectors due to their good absorption and transport properties. However, as the required performances increase (bit-rate in optical communications, number of pixels in imaging, etc.), it becomes more and more important to reduce the separation from detectors and driving/biasing and amplifying electronics, by integrating the two components on the same chip.We demonstrate an array of NIR detectors monolithically integrated with standard silicon CMOS readout electronics. The employed low temperature process allowed the integration of the detectors as the last step of chip fabrication. The integrated micro-system consists of a linear array of 120×120 μm² pixels, an analog CMOS multiplexer and a transimpedance amplifier. The chip exhibits a good photoresponse in the NIR, with responsivities as high as 43 V/W at 1.3 μm, dark currents of 1 mA/cm² and inter-pixel cross-talk better than −20 dB.     

Two-Dimensional Alignment-Free Optical Interconnect Using Micro Optical Bench Scheme

In this paper, we have proposed and demonstrated a novel packaging method involving a vertical cavity-surface emitting laser (VCSEL) array. The concept is based on micro optical bench (MOB) placing a laser sub-mount and two-dimensional optical fiber array to match the reference plane of MOB to provide an alignment free optical interconnect. No degradation of I-V and I-L characteristics of the packaged VCSELs was found after use of the proposed packaging process. The coupling loss was about 0.9 dB for λ = 1.55 μm and the loss deviation among channels was less than 0.5 dB in a 2 x 4 ch coupling module between planar microlens and multi-mode fibers.     

Strain and tilt measurement using multi-point diffraction strain sensor

A multi-point diffraction strain sensor (MDSS) was developed earlier by us for strain measurement with variable sensitivity and measurement range using a microlens array. The technique is now extended to measure both tilt and non-uniform strain with a sensitivity of 0.41 mε/pixel and 4.7 mrad/pixel. The validation was made through comparison of the strain measured using MDSS with that by a micro-Moiré interferometer incorporated with Gabor filtering method, while the tilt is compared with derivatives of the surface profile measured by a confocal microscope.     

Near-infrared intersubband absorption in (CdS/ZnSe)/BeTe type-II super-lattices grown on GaAs substrate by MBE

We study the dependence of absorption wavelength on the well width in the (CdS/ZnSe)/BeTe super-lattices(SL). With well-width reduction, the wavelength decreases from 1.795 to 1.57 μm. Structural properties, strain state and interface composition are determined via XRD measurement. A (CdS/ZnSe)/Be_xMg_1−xTe structure is prepared and XRD reveals the average lattice constant match to GaAs substrate. TEM reveals that numerous stacking faults exist in the (CdS/ZnSe)/BeTe structure, and stacking faults are completely suppressed in (CdS/ZnSe)/Be_xMg_1−xTe SLs. Intersubband transition down to 1.535–1.55 μm have been observed in SLs.     

Analysis of pupil and corneal wave aberration data supplied by the SN CT 1000 topography system

Ocular aberrations depend on pupil size and centring and the retinal image quality under natural conditions differs from that corresponding to laboratory ones. In the present article, pupil and wave aberration data supplied by the Shin Nippon CT 1000 (SN CT 1000) topography system are analysed. Two groups of eyes under natural viewing conditions are considered ((260±20) lux at the eye under study). The first group consists of 10 normal eyes (−1.25 to 3 D sphere; 0 to −1.75 D cylinder) of five young subjects (age between 18 and 33 years). For this group, five determinations per eye are performed and the repeatability of results is analysed. Pupil centre is displaced from corneal vertex towards the temporal region, the largest displacement being (0.5±0.1) mm. The variation of pupil diameter in each eye is less than 21% while the inter-subject variability is large since diameters are between (3±0.3) and (5.3±0.6) mm. Aberrations are evaluated for two different pupil sizes, the natural one and a fictitious one of 6 mm. The corneal higher-order root-mean square wavefront error (RMS_HO) for a 6 mm pupil centred in the corneal vertex, averaged across all eyes, is (0.37±0.06) μm while, considering the natural pupil diameter, the average in each eye is significantly lower, up to eight times smaller. The fourth-order spherical aberration is an important aberration in the considered eyes, its maximum value for a 6 mm pupil being (0.38±0.02) μm. The second group consists of 24 eyes of 12 subjects (age between 25 and 68 years) such that four eyes are of normal adults (1.25 to +6 D sphere; 0 to −0.5 D cylinder), eight have astigmatisms (−5.5 to +3.25 D sphere; −1.5 to −4.5 D cylinder), six have post-refractive surgery (+0.5 to +3.5 D sphere; −0.5 to −4 D cylinder) and six have keratoconus (−9.5 to +1 D sphere; −1 to −4.5 D cylinder). For this group only one determination per eye is performed. Pupil centre is displaced from corneal vertex towards the temporal region except in cases of keratoconus, where there can be a dominant upwards displacement. Pupil diameters are between 2.7 and 5.6 mm. The corneal higher order root mean square wavefront error for a 6 mm pupil ranges between 0.3 (normal eye) and 5.3 μm (keratoconus).