碳化硅表面的外延Graphene

Graphene具有优异的电学性质,是非常有前途的纳米电子材料,有希望替代硅成为下一代集成电路材料,尽管目前有很多种制备Graphene的方法,但就Graphene在将来集成电路方面的应用而言,在碳化硅上的外延生长法最具潜力,文章首先从Graphene的能带结构开始,简单介绍为什么Graphene具有诸多优异的电学性质,比如异常霍尔效应、室温下的高迁移率、碳纳米管的弹道输运等,然后介绍这种外延生长方法及其发展现状,通过比较在不同碳化硅晶面和在不同条件下生长的Graphene的表面形貌,得出结论,在加热炉内,生长在碳化硅晶体碳面的Graphene拥有特别高的质量,最后文章着重讨论对碳面Graphene的电学表征实验,这些实验证明这种材料中的电子是狄拉克电子,同时也发现材料具有优异的电学性质.     

碳化硅表面的外延Graphene

Graphene具有优异的电学性质,是非常有前途的纳米电子材料,有希望替代硅成为下一代集成电路材料.尽管目前有很多种制备Graphene的方法,但就Graphene在将来集成电路方面的应用而言,在碳化硅上的外延生长法最具潜力.文章首先从Graphene的能带结构开始,简单介绍为什么Graphene具有诸多优异的电学性质,比如异常霍尔效应、室温下的高迁移率、碳纳米管的弹道输运等.然后介绍这种外延生长方法及其发展现状.通过比较在不同碳化硅晶面和在不同条件下生长的Graphene的表面形貌,得出结论,在加热炉内     

氢对GaAs薄膜的钝化作用

报导了射频磁控溅射与沉积气氛掺氢相结合制备单层(13~20 nm厚)高质量GaAs多晶态纳米薄膜的方法,研究了氢钝化对薄膜微观结构及光学性质的影响.对GaAs薄膜进行了X射线衍射、原子力显微镜、吸收光谱、光致荧光谱的研究分析.结果表明,衬底温度500℃的掺氢薄膜和520℃的薄膜呈面心立方闪锌矿结构,薄膜的晶团尺寸较大,微观表面较为粗糙,其吸收光谱出现了吸收边蓝移和明显的激子峰,带隙光致荧光峰强明显增加,说明氢在衬底温度500℃~520℃下对薄膜有重要的钝化作用.     

Formation of a Wave Structure on the Surface of a Graphene Film

A wavy structure of the surface of graphene nanoparticles on a hydrocarbon substrate has been obtained. It has been shown that the wavy surface is the manifestation of the Kelvin-Helmholtz instability at the interface between liquid paraffin and graphene suspension with the inhomogeneity length λ = 250 nm. The manifestation of such wavy structures is due primarily to van der Waals forces.

     

Effect of Al Doping on Properties of SiC Films

Undoped and Al-doped 3C-SiC films are deposited on Si（100） substrates by low-pressure chemical vapour deposition. Effects of aluminium incorporation on crystallinity, strain stress, surface morphology and growth rate of SiC films have been investigated. The x-ray diffraction patterns and rocking curves indicate that the crystallinity is improved with aluminium doping. Raman scatting patterns also demonstrate that the strain stress in SiC films is released due to the incorporation of Al ions and the increase of film thickness. Furthermore, due to the catalysis of surface reaction which is induced by trimethylaluminium, the growth rate is increased greatly and the growth process varies from three-dimensional island-growth mode to step-flow growth mode.     

Formation of Iron Silicides Under Graphene Grown on the Silicon Carbide Surface

Physics of the Solid State - The formation of iron silicide thin films under graphene grown on the silicon carbide surface is investigated. The thin films are synthesized by consecutive...     

掺杂N的浓度对SiC薄膜的光敏特性影响(英文)

在热丝化学汽相沉积(HFCVD)法制备SiC薄膜过程中,研究不同的N掺杂下制备样品的光敏特性.对薄膜在室温和较高温度(410℃)下进行光敏特性测试,结果表明,薄膜的制备工艺参量对其光敏特性有较大影响;较高温度下其敏感特性和室温下测试的结果大体一致;在合适条件下制备的薄膜对不同波长的光有较好的敏感特性.可以看出,SiC薄膜在研究高温光敏器件领域具有很好的应用前景.     

掺杂N的浓度对SiC薄膜的光敏特性影响

在热丝化学汽相沉积（HFCVD）法制备SiC薄膜过程中，研究不同的N掺杂下制备样品的光敏特性．对薄膜在室温和较高温度（410℃）下进行光敏特性测试，结果表明，薄膜的制备工艺参量对其光敏特性有较大影响；较高温度下其敏感特性和室温下测试的结果大体一致；在合适条件下制备的薄膜对不同波长的光有较好的敏感特性．可以看出，SiC薄膜在研究高温光敏器件领域具有很好的应用前景．     

Effect of Hydrogen Plasma on the Bismuth Single Crystal Surface

Russian Physics Journal - The data of atomic force microscopy studies of the cleavage surface morphology of a bismuth single crystal after exposure to atomic hydrogen are presented. It has been...     

非简谐振动对SiC类石墨烯热输运性质的影响

考虑到原子的非简谐振动,应用固体物理理论和方法,计算了SiC类石墨烯的简谐系数和非简谐系数,得到它的德拜温度、热容量和热导率等随温度的变化规律,探讨了原子非简谐振动对它的热输运性质的影响.结果表明:SiC类石墨烯的德拜温度随温度的升高而在117-126 K之间线性增大,定容比热随温度升高而非线性增大,热导率随温度升高而非线性减小,温度较低时变化较快,而温度较高时变化较慢,并随着温度升高而趋于常量;考虑到非简谐振动后,SiC类石墨烯的德拜温度、定容比热和热导率的值分别大于、小于和大于简谐近似的相应值,温度愈高,其差值愈大,即温度愈高,非简谐效应的影响愈显著;二维平面状的SiC类石墨烯的定容比热和热导率随温度的变化规律,与三维块状SiC晶体总体趋势相同,只是具体数值不同.     

Formation of SiC Mesastructures with Gently Sloping Sidewalls by Dry Selective Etching through a Photoresist Mask

Technical Physics - We have demonstrated that SiC mesastructures with gently sloping sidewalls form with the help of selective reactive ion etching (RIE) of silicon carbide through a photoresist...     

氢等离子体气氛中退火多孔硅的表面和光荧光特性

用电化学腐蚀法制备了多孔硅(PS),在氢等离子体气氛中不同温度下对多孔硅样品进行了退火处理,并进行了光致发光(PL)谱和原子力显微镜(AFM)表面形貌的测量。不同退火温度给PS表面形态带来较大变化,也影响了其PL谱特性。在退火的样品中观察到的PL谱高效蓝光和紫光谱带,我们认为主要源于量子限制发光峰和非平衡载流子被带隙中浅杂质能级所俘获而引起的辐射复合所产生的。在420—450℃退火处理的多孔硅的PL谱上观察到了一个未见诸于报道的紫光新谱带(3．24eV,382nm),其发光机理有待于进一步研究。     

Formation of Graphene on Polycrystalline Nickel

Technical Physics - The results of studying the formation of graphene layers during thermal pyrolysis of methane on the surface of polycrystalline nickel are presented. The studies have been...     

Effect of Polymer-Substrate Interactions on the Surface Morphology of Polymer Blend Thin Films

Surface structures and compositions of poly(Styrene-block-Ethylene/Butylene-block-Styrene) (SEBS)/Poly(Methyl Methacrylate) (PMMA) blend films have been studied by Atomic Force Microscopy (AFM) and X-ray Photoelectron Spectroscopy (XPS). Substrates with different hydrophobicity and SEBS with and without Maleic Anhydride (MA) grafting were used to study the effect of polymer-substrate interactions. It is indicated that the surface energy of the substrate (substrate/air) plays a crucial role on the surface composition of the polymer component. For a fixed surface, the adsorption of polymer on the substrate is also important. The hydrophilic sites of SEBS-g-MA can prevent the dewetting of the SEBS-g-MA from the substrate. The dewetting of PMMA from the SEBS-g-MA will make the PMMA protrusions more pronounced, and the SEBS-g-MA phase domains are enlarged after annealing treatment. An adsorption scheme is suggested to explain the phase inversion and height difference observed in the various polymers used. In addition, SEBS triblock copolymers form wormlike and meshlike microphase separation morphologies on the hydrophilic and hydrophobic substrates, respectively.     

Photoluminescence of Nanoporous GaN Films Prepared by Electrochemical Etching

Nanoporous （NP） CaN is prepared by electrochemical etching on a CaN epilayer grown on a sapphire substrate by metal-organic chemical vapor deposition. Scanning electron microscopy reveals that the average pore diameter and inter-pore spacing are approximately 25 and 45 nm, respectively. The photoluminescence （PL） spectra show that in contrast to the initial as-grown CaN epilayer, the NP CaN exhibits a high near-band-edge UV intensity, significant relaxation of compressive strain, and a lower yellow luminescence intensity. Both the line shape and line width of the PL spectra are almost the same for these two samples. The high quality of the NP CaN can be explained by the enhancement of the PL extraction efficiency and the decrease of impurity and defect density after etching.     

氢稀释对纳米晶硅薄膜晶化特性的影响及薄膜生长机理

以SiH₄与H₂作为前驱气体,采用射频等离子增强化学气相沉积技术制备了纳米晶硅薄膜.利用Raman散射和红外吸收光谱等技术,对不同氢稀释比条件下薄膜的微观结构和键合特性进行了研究.结果表明,随着氢稀释比增加,薄膜的晶化率明显提高,而氢稀释比过高时,薄膜晶化率呈现减少趋势.红外吸收光谱分析表明,纳米晶硅薄膜中氢的键合模式与薄膜的晶化特性密切相关.随着氢稀释比增加,薄膜中整体氢含量和SiH₂键合密度明显减少,而在高氢稀释比条件下,氢稀释比增加导致薄膜中SiH₂键合密度和整体氢含量增加.     

氢稀释对纳米晶硅薄膜晶化特性的影响及薄膜生长机理

以SiH4与H2作为前驱气体,采用射频等离子增强化学气相沉积技术制备了纳米晶硅薄膜.利用Raman散射和红外吸收光谱等技术,对不同氢稀释比条件下薄膜的微观结构和键合特性进行了研究.结果表明,随着氢稀释比增加,薄膜的晶化率明显提高,而氢稀释比过高时,薄膜晶化率呈现减少趋势.红外吸收光谱分析表明,纳米晶硅薄膜中氢的键合模式与薄膜的晶化特性密切相关.随着氢稀释比增加,薄膜中整体氢含量和SiH2键合密度明显减少,而在高氢稀释比条件下,氢稀释比增加导致薄膜中SiH2键合密度和整体氢含量增加.