Bi2212体系的层间耦合对临界电流密度的影响

通过对具有不同层间耦合强度的Bi2212单晶样品的磁滞回线的测量,得到了样品的临界电流密度Jc随层间耦合强度和磁场的变化关系．实验结果显示,样品的层间耦合减弱,Jc明显减小．同时发现Jc与磁场间存在Jc ∝ exp(-H^a)关系,进一步分析表明,Jc的这种磁场依赖关系是对数钉扎势垒模型的必然结果．     

高温超导电机电枢线圈临界电流密度研究

高温超导线材的临界电流密度受磁场的影响,在设计计算时,通常假设在线圈截面上电流密度是均匀分布的。但是,实际上在线圈截面上,电压是一致的。由于线圈中的磁场不均匀分布,各处的临界电流密度是不同的。采用数值模拟的方法,分析了高温超导线圈截面上的临界电流分布。结果显示,临界电流密度的分布是不均匀的,总的临界电流可比按均匀分布时的计算结果提高25%以上。     

纳米Pr6O11粉末掺杂MgB2超导电性研究

本文采用固相反应法制备了一系列纳米Pr6O11掺杂的MgB2超导块材,掺杂量分别为0,1,3,5,10wt.%.X射线衍射结果表明:随着Pr6O11掺杂量的增加,MgB2的晶格常数也逐渐增大,也就是说Pr原子部分替代了MgB2晶格中的Mg原子.磁测量结果显示,Pr6O11的掺杂对MgB2的超导转变温度(Tc)有很小的抑制.在低含量Pr6O11掺杂(1wt.%)时,MgB2的临界电流密度(Jc)和不可逆场(Hirr)均有明显的提高,但进一步提高Pr6O11的掺杂量时,会损害MgB2在高场下的性能.文中同时也讨论了Pr6O11掺杂影响MgB2的Tc和Jc性能的机理.     

高温超导薄膜晶界的电传输特性

本文较系统地总结和分析了氧化物高温超导薄膜晶界的电流电压、薄膜晶界及其二维网络中的临界电流密度等电传输特性,讨论了薄膜晶界电流密度对磁场的依赖关系和各向异性特征,介绍了薄膜晶界电传输特性的光电辐射效应、化学掺杂效应和电场效应.这些针对超导薄膜晶界电传输特性的研究不仅对高温超导弱连接和电子配对机制的理解,而且对基于双轴织构和薄膜外延技术的第二代高温超导带材的发展具有重要意义.     

NdBa2Cu3O7-δ/YBa2Cu3O7-δ多层膜体系的外延结构和磁通钉扎的研究

采用脉冲激光沉积技术.在单晶SrTiO3基底上外延生长了一系列名义结构为p×(NdBa2Cu3O7-δ(m)/YBazCu3O7-δ(n))的多层膜和准多层膜(单元层NdBa2Cu3O7-δ较厚而YBa2Cu3O7-δ呈非连贯的岛状分布,m,n为激光脉冲数,p为重复周期).样品的超导转变温度在87-91 K范围,具体大小取决于不同的调制结构,多层膜的重复周期越大,层状界面越多,超导转变温度就越低.磁传输测量表明,准多层的样品不仅具有较高的超导转变温度,而且具有较强的磁通钉扎性能,77 K零场下的临界电流密度高达4×106 A/cm2,显示出良好的应用前景.     

高温超导Tl2Ba2CaCu2O8斜切本征结特性研究

在铝酸镧(LaAlO3)斜切衬底上制备了 Tl2Ba2CaCu2O8(Tl-2212)本征约瑟夫森结微桥,对其进行了输运特性研究.测试了样品在不同测量温度下的电流电压(I-V)曲线,结合模型仿真结果对临界电流特性进行了研究分析.利用低温扫描激光显微镜(LTSLM)初步探讨了 Tl-2212本征结微桥的温度空间分布特性,...     

热处理对MgB_2超导体超导电性和显微结构的影响

采用固相反应法常压下制备MgB2超导块材,研究两种不同的热处理工艺(淬火、预热)对MgB:超导电性和显微结构的影响.结果显示淬火有助于细化晶粒,提高样品的临界电流密度;预热在一定程度上提高MgB2样品的致密度和磁通钉扎力,其中随炉升温600℃预热1 h再升至750℃保温0.5 h后淬火的样品自场Jc达到0.586 MA/cm2,不可逆场超过7 T,20 K下在0.8T达到最大钉扎力Fpumax.     

NdBa2Cu3O7-δ/YBa2Cu3O7-δ多层膜体系的外延结构和磁通钉扎的研究

采用脉冲激光沉积技术,在单晶SrTiO₃基底上外延生长了一系列名义结构为p×(NdBa₂Cu₃O_7-δ(m)/YBa₂Cu₃O_7-δ(n))的多层膜和准多层膜(单元层NdBa₂Cu₃O_7-δ较厚而YBa₂Cu₃O_7-δ呈非连贯的岛状分布,m,n为激光脉冲数,p为重复周期).样品的超导转变温度在87—91 K范围,具体大小取决于不同的调制结构,多层膜的重复周期越大,层状界面越多,超导转变温度就越低.磁传输测量表明,准多层的样品不仅具有较高的超导转变温度,而且具有较强的磁通钉扎性能,77K零场下的临界电流密度高达4×10⁶ A/cm²,显示出良好的应用前景. 关键词： 2Cu₃O_7-δ')" href="#">NdBa₂Cu₃O_7-δ 多层膜 磁通钉扎 临界电流密度     

高温超导微波限幅器的研制

与常规材料相比,高温超导薄膜(即HTSC)的表面电阻极低,在微波频段下,其微波表面电阻要比常规材料小两个数量级以上,并能实现高达106～107A/cm2的电流密度.本项目选用10×15×0.44mm3双抛LaAlO3衬底上外延生长的钇系高温超导薄膜的YBa2Cu3O7(YBCO),利用临界电流密度的特性,设计并制作了高温超导微波限幅器,其工作温度在90K以下,77K时设计指标为:f:9.4～9.6GHz,插入损耗L≤0.4dB,门槛电平:10dBm,驻波比≤1.5.     

密封容器中后处理制备Tl2Ba2CaCu2Oy高温超导薄膜及其性能研究

以铝酸镧（001）单晶为基片，采用两步法制备Tl2Ba2CaCu2Oy（Tl 2212）高 温超导薄膜.首先，利用脉冲激光沉积（PLD）工艺沉积Ba2CaCu2Ox非晶前驱体薄膜；然后，前驱体薄膜在高温（720—850℃）下密封钢容器里铊化结晶形成Tl 2212薄膜.XRD结果表明Tl2212 薄膜是沿c轴方向生长的，其相组成为Tl 2212，摇摆曲线（0012）的半高宽为0.72° ，SEM图像显示其表面光滑平整，其零电阻温度为106.2K. 关键词： Tl 2212超导薄膜 脉冲激光沉积     

Influence of the reaction conditions on the formation of Tl(Re)-Ba-Ca-Cu-O superconducting thin films by thallination in open system

Rhenium avoids air degradation of the target as well as of precursor thin films during the preparation of high temperature Tl-based superconductors. Addition of Re has been used during synthesis of oriented Tl(Re)-Ba-Ca-Cu-O films. High temperature superconducting Tl-based thin films were prepared by a two step method combining RF magnetron sputtering and ex-situ thallination. Precursors with a composition of Re_0.1Ba₂Ca₂Cu₃O_x were deposited on a CeO₂ buffered R-plane sapphire substrate. The sputtered films were prepared at room temperature in an Ar atmosphere. The thallination of the precursor films was performed in a one zone configuration, where both the pellet and precursor film were kept at the same temperature. The thallination temperature varied in the range of 850–880°C and samples were held for 30, 45 and 60 min at this temperature in a flowing oxygen atmosphere. Besides Tl-2212, X-ray diffraction reveals the possibility of also preparing the Tl-2223 phase, which was until now not reported in a Re doped form. Presented at 5-th International Conference Solid State Surfaces and Interfaces, November 19–24, 2006, Smolenice Castle, Slovakia     

蓝宝石基片上制备双面Tl_2Ba_2CaCu_2O_8超导薄膜

在蓝宝石基片上,以CeO2为缓冲层制备了高质量的双面Tl2Ba2CaCu2O8(Tl-2212)超导薄膜。以金属铈靶作为溅射源生长了c轴取向的CeO2缓冲薄膜,并对CeO2薄膜进行了高温处理,有效改善了其结晶质量和表面形貌。采用两步法制备了双面的Tl-2212超导薄膜。XRD测试显示,薄膜为纯的Tl-2212相,且其晶格c轴垂直于衬底表面。超导薄膜的Tc为106K,Jc(77K,0T)为3.5MA/cm2,微波表面电阻Rs(77K,10GHz)为390μΩ。     

蓝宝石基片上制备大面积Tl2Ba2CaCu2O8超导薄膜

在2英寸双面蓝宝石基片上采用CeO₂作为缓冲层制备了高质量Tl₂Ba₂CaCu₂O₈(Tl-2212)超导薄膜.以金属铈作为溅射靶材,采用射频磁控反应溅射法生长了c轴织构的CeO₂缓冲薄膜,并研究了不同生长条件对于CeO₂缓冲层的晶体结构及表面形貌的影响.超导薄膜采用直流磁控溅射和后热处理的方法制备.扫描电子显微镜(SEM)图像显示,超     

高温退火对蓝宝石基片的表面形貌和对CeO2缓冲层以及Tl-2212超导薄膜生长的影响

研究了蓝宝石(1102)基片在不同温度和时间下退火时表面形貌和表面相结构的变化,以及它对CeO₂缓冲层和Tl-2212超导薄膜生长的影响.原子力显微镜(AFM)研究表明,在流动氧环境中1000℃温度下退火,蓝宝石(1102)的表面首先局部区域形成台阶结构,然后表面形成叠层台阶结构,随着退火时间的延长,表面发生了台阶合并现象,表面形貌最终演化为稳定的具有光滑平台的宽台阶结构.XRD测试表明,通过高温热处理可以大幅度提高蓝宝石基片表面结构的完整性.在1000℃温度下热处理20 h的蓝宝石 关键词： Tl-2212超导薄膜 蓝宝石 缓冲层     

Tl-based superconducting films prepared by aerosol spray deposition and thallinated in an open system

Superconducting Tl-based films were prepared on a LaAlO₃ single crystal substrate. Spray pyrolysis of Ba, Ca and Cu nitrate solutions was used for deposition of the precursor films. They were subsequently ex-situ thallinated in flowing oxygen (open system). While the superconducting Tl-2212 phase formed at an annealing temperature of 880°C, thallination at 900°C led to the formation of a Tl-2223 /Tl-2212 mixture. The amount of Tl-2223 increased with prolonged thallination, whereas the Tl-2212 phase progressively disappeared. Films prepared in such a manner were c-oriented and contained only low amounts of non-superconducting impurities. The resulting samples were characterized by XRD and SEM and their T _C values were determined by resistive four-point measurements. They showed critical temperatures in the range of T _ON = 125–135 K, T _C0 = 91–93 K. Differences between the composition and properties of the obtained films and those thallinated in closed systems under 50 kPa of oxygen are discussed in this paper. Results show that the Tl-2212 → Tl-2223 transformation proceeds at a slower rate under flowing oxygen than in a closed system. Presented at 5-th International Conference Solid State Surfaces and Interfaces, November 19–24, 2006, Smolenice Castle, Slovakia.     

采用快速升温烧结方法生长Tl-1223超导薄膜的研究

报道了在铝酸镧(00l)衬底上生长Tl-1223超导薄膜的快速升温烧结方法以及铊(Tl)源陪烧靶的配比对Tl-1223薄膜晶体结构的影响.扫描电子显微镜观测表明,采用快速升温烧结方法生长的Tl-1223超导薄膜具有致密的晶体结构.X-射线衍射等测试表明,采用合适配比的陪烧靶在氩气环境下可以制备出纯c轴取向的Tl-1223超导薄膜,充氧退火后的薄膜具有较好的电学性能,其临界转变温度T_(c onset)达到116K,临界电流密度达到1.5MA/cm~2(77 K,0 T).实验结果表明,采用这一新的烧结方法制备Tl系超导薄膜具有升降温时间和恒温时间短、生产成本低等特点.     

Formation of epitaxial Tl_2Ba_2Ca_2Cu_3O_(10) superconducting films by dc-magnetron sputtering and triple post-annealing method

For obtaining pure phase T12Ba2Ca2Cu3O10 （T1-2223） films with good superconducting properties, the growth technique is improved by dc magnetron sputtering and a triple post-annealing process. The triple post-annealing process comprises annealing twice in argon and once in oxygen at different temperatures. In the first low-temperature annealing phase in argon, T12Ba2CaCu2O8 （T1-2212） is obtained to effectively minimize evaporation in the next step. With the increase of temperature in the second annealing stage in argon, the previously prepared T1-2212 inter-phase is converted into T1-2223 phase. An additional annealing in oxygen is also adopted to improve the properties of T1-2223 films, each containing an optimal oxygen content value. The results of X-ray diffraction （XRD） θ-2θ scans, 09 scans and rotational φ scans show that each of the T1-2223 films has a high phase purity and an epitaxial structure. Smooth films are observed by scanning electron microscopy （SEM）. The critical temperatures Tc of the films are measured to be about 120 K and the critical current densities Jc can reach 4.0 MA/cm2 at 77 K at self field.     

Matching effect in superconducting NbN thin film with a square lattice of holes

A square hole array is fabricated over a micro-bridge of NbN thin film by electron beam lithography and reactive ion milling. Magneto-resistance is measured across the micro-bridge filled with a hole array near the superconducting transition temperature. It is found that magneto-resistance minima occur when the number of vortices is an integer multiple or a fractional multiple of the number of holes. The temperature and the current dependences of the matching effect are studied.