均值量化与中值量化光栅性能的理论研究

对相移技术的投影栅相位法的传统中值量化方法提出改进,设计和制作出小误差、低高阶谐波的均值量化光栅.理论讨论了相位值、离散等级和量化等级等因素对两种量化光栅性能的影响;在标准偏差和频谱分布两方面比较后,得出均值量化光栅性能优于中值量化光栅且更接近正弦光栅的结论.     

基于分光计的光栅光谱特性研究

在分光计上,观察并测试了不同光栅常数的光栅在汞光源下的光谱,探究光栅的分辨能力与光栅常数之间的关系。实验结果表明,在光栅有效使用宽度一定的情况下,随着光栅常数的减小,光栅的色分辨本领R和角色散率D都大幅提高,光栅的分辨能力提高。因此,在技术许可的条件下,减少光栅常数d是提高光栅色分辨本领的有效措施,这对光栅的制作和选用以及相关领域的发展具有较好的指导作用。     

Quantitative coherence analysis of dual phase grating x-ray interferometry with source grating

Dual phase grating x-ray interferometry is compatible with common imaging detectors,and abandons the use of an absorption analyzer grating to reduce the radiation dose.When using x-ray tubes,an absorbing source grating must be introduced into the dual phase grating interferometer.In order to attain a high fringe visibility,in this work we conduct a quantitative coherence analysis of dual phase grating interferometry to find how the source grating affects the fringe visibility.Theoretical analysis shows that with the generalized Lau condition satisfied,the fringe visibility is influenced by the duty cycle of the source grating and the transmission through the grating bar.And the influence of the source grating profile on the fringe visibility is independent of the phase grating type.Numerical results illustrate that the maximum achievable fringe visibility decreases significantly with increasing transmission in the grating bar.Under a given transmission,one can always find an optimal duty cycle to maximize the fringe visibility.These results can be used as general guidelines for designing and optimizing dual phase grating x-ray interferometers for potential applications.     

Polarization selectivity of two-layer grating sandwiched between two fused-silica substrates

The polarization selectivity is described based on the two-layer grating sandwiched between two fused-silica substrates. The polarization-selective grating can diffract TE polarization with high efficiency and split TM polarization with good uniformity. With the novel structure, the grating can have high efficiency of sandwiched grating and wideband property of two-layer grating. The modal method is applied to analyze the grating, which corresponds well with the results of rigorous coupled-wave analysis. The physical analysis can give the good guideline to optimize the polarization-selective sandwiched two-layer grating effectively. Such a polarization-selective grating can also have merits of high efficiency for TE polarization and wide angular bandwidth for TM polarization based on the two-layer grating sandwiched between two fused-silica substrate. It is easy to clean and protect the grating surface compared with the surface-relief grating.     

柱面光栅色散特性及其应用

 基于椭球面光栅理论,提出柱面光栅概念,并对其衍射特性和集光本领进行研究。结果表明：在掠入射条件下凹柱面光栅具有与凹球面光栅相似的衍射特性,但凹柱面光栅可以方便地沿光栅母线方向划分成若干相同部分独立工作,因此,安装水平隔板的掠入射凹柱面光栅单色仪可以用于托卡马克等离子体的真空紫外（VUV）光谱时空分辨测量。     

光栅扫描光谱仪参数的研究

光栅扫描光谱仪的入射光线和出射光线的方向是固定的,在光栅转动下进行分光,这与光栅不动而入射光方向改变的分光方法不同。由光栅方程出发,计算出电脑自动控制多光栅转动的光谱仪测试系统的角色散率、线色散率和分辨本领,得出光栅扫描光谱仪的角色散率、线色散率和分辨本领等参数公式。所得结果与光栅不动而入射光方向改变的光谱仪的角色散率、线色散率和分辨本领不同。这为光栅扫描光谱仪的使用和研究提供了理论依据。     

The influence of grating shape formation fluctuation on DFB laser diode threshold condition

Not only the grating material refractive index itself but also the Bragg grating physical shape formation affects the coupling strength greatly. The Bragg grating shape includes three factors, namely grating depth, duty ratio and grating angle. During the lithography and wet etching process, there always will be some fluctuation between the target and real grating shape formation after fabrication process. This grating shape fluctuation will affect the DFB coupling coefficient \(\kappa\), and then consequently threshold current and corresponding wavelength. This paper studied the grating shape formation fluctuation influence to improve the DFB fabrication yield. A truncated normal random distribution fluctuation is considered in this paper. The simulation results conclude that it is better to choose relative thicker grating depth with lower refractive index to obtain a better fabrication tolerance, while not quite necessary to spend too much effort on improving lithography and wet etching process to get a precisely grating duty ratio and grating angle.     

刻划光栅刻线弯曲误差在线修正技术研究

刻划光栅存在刻线弯曲误差，将直接影响光栅的衍射波前质量。通过构建光栅刻线弯曲误差与衍射波前的映射关系，搭建了光栅刻线弯曲误差的实时测量光路，论述了光栅刻划机主动控制技术原理，将光栅刻划机主动控制技术用于光栅刻线弯曲误差的在线补偿。通过对比光栅刻划实验验证该方法的可行性。上述方法能够准确提取并有效补偿光栅刻线弯曲误差，将光栅衍射波前由0.074 λ提高到0.038 λ，提高了48.6%，同时有效地解决了光栅表面弯曲问题。其研究结果可用于提高机械刻划光栅质量，具有重要的理论及应用价值。     

拼接光栅机械形变对远场光强的影响

分析了将多块较小的光栅使用机械拼接的方式制成超大面积光栅,能解决大面积光栅目前无法整块生产的情况,在实际拼接中光栅会出现很微量的应力变形。根据拼接光栅通常的形变特点,采用标量衍射理论建立了光栅形变的理论模型,并就两块光栅拼接的情况进行了计算和分析,发现形变同拼接误差一样,会对光栅的远场光强产生负面影响,微小的变形量都对远场光强造成破坏,因此对衍射光场的影响不可忽略;获得了光栅机械形变的容限;最后给出了预防形变的措施:可着重减小y方向上约束,并使用多层介质膜光栅降低光栅对能量的吸收。     

刻线误差与面型误差对平面光栅光谱性能影响的二维快速傅里叶变换分析方法

光栅刻线误差与基底面型误差影响平面光栅衍射波前、分辨本领、鬼线、卫线及杂散光等光谱性能,研究光栅性能指标与光栅刻线误差及基底加工误差之间的因果关系,对提高光栅质量极为重要。根据光栅衍射中产生的源于刻线误差与面型误差的光程差,推导出了在光栅锥面衍射情况下的光栅刻线误差、基底面型误差、入射角θ、衍射级次m与衍射波前关系的数学表达式,得到构建非理想光栅衍射波前的理论模型。以理论模型为依据,采用干涉仪测量光栅对称级次衍射波前,实现在测量结果中对光栅刻线误差与基底面型误差的分离,并基于二维快速傅里叶变换分析光栅衍射波前,考察了刻线误差与面型误差对光栅性能指标的影响。借助此方法通过重构的光栅衍射波前,分析光栅分辨本领、鬼线等光谱性能,还可以反演光栅全表面刻线误差与面型误差的大小,为光栅基底加工、光栅制造和使用技术提供理论依据。     

基准光栅重构傅里叶变换轮廓术

应用傅里叶轮廓变换术进行三维形貌测量中,为了获得待测物体的高度相位信息,通常需要采集两幅图像.因此当光学系统发牛变动时,必须重新采集基准光栅图像,不利于快速测量.提出一种从变形光栅图像中获取基准光栅图像信息的测量方法.首先在变形光栅图像中记录基准光栅信息,然后通过傅里叶分析提取基准光栅频率信息,通过图像分析获得基准光栅相位信息,最后重构出一幅完整的基准光栅图像,实现三维物体形貌测量.实验结果验证了该方法的可行的.     

二元矩形金属光栅衍射增强电磁理论

采用耦合波原理计算了TM波经过二元纳米量级金属光栅衍射的电磁场，研究了金属光栅的占空比、光栅深度及TM波入射角对衍射后的光栅表面电磁场的增强的影响，针对金属金、银做了探讨和分析，得出重要的结论. 关键词： 耦合波原理 金属光栅 衍射     

AFM制作纳米光栅技术研究

在扫描探针纳米加工技术的基础上,提出了利用原子力显微镜(AFM)来制作高频光栅的新工艺。利用AFM硅制探针,在接触模式下对光盘(聚碳酸酯材料)进行刻划试验。对刻划光栅的工艺参数进行优化,得到了纳米量级光栅。并将刻划所得光栅应用于数字云纹法,与数字参考栅干涉形成微/纳米数字云纹。实验结果表明,该法所制得的光栅可以应用于实际变形的测量。     

双锥型光纤布喇格光栅光谱特性

利用传输矩阵法和有限元法分析了光栅周期、调制深度、锥腰直径和不同设计区段长度比等光栅制作参量和结构设计参量对双锥型光纤布喇格光栅光谱特性的影响.软件仿真结果表明:限定相关参量后,光栅周期增大,双锥型光纤布喇格光栅整体反射谱右移,与均匀分布光纤布喇格光栅光谱变化规律一致;调制深度增强,两主反射峰基本不变,而两主反射峰中间的次级峰个数增多,光强增大;锥腰直径减小,激发更多包层模,干涉峰个数增多,强度提升;整根光栅长度保持1cm不变,锥腰区,标准光栅区和渐变光栅区长度比直接影响次级峰的数量和幅值,随着渐变光栅区长度占比的增大,次级峰的幅值增大,同时个数减少.双锥型光纤布喇格光栅可在多参量传感器、多通道滤波器、多通道半导体激光器、色散补偿和光上下载分插复用等方面广泛应用.     

Modal analysis of deep-etched low-contrast two-port beam splitter grating

Modal analysis of a deep-etched low-contrast two-port beam splitter grating under Littrow mounting is presented. The guideline for the design of a subwavelength transmission fused-silica phase grating as high-efficiency grating, polarizing beam splitter (PBS), and two-port beam splitter, is summarized. As an example, a polarization-independent two-port beam splitter grating is designed at wavelength of 1064 nm. We firstly analyzed the physical essence of the grating by the simplified modal method. The guideline for the grating design and the approximate grating parameters are obtained. Then using the rigorous coupled-wave analysis (RCWA) with parameters varying around the approximate ones, optimum grating parameters can be determined. With the design guideline, the time for the rigorous calculation of the grating profile parameters can be reduced significantly.     

空气中等离子光栅诱导探测光丝三次谐波辐射放大的实验研究

对探测光丝的不同位置与等离子光栅相互作用和探测光丝作用到等离子光栅不同位置引起三次谐波的增强进行了实验研究.研究发现,探测光丝的三次谐波信号强度对于探测光丝不同位置与等离子光栅相互作用和等离子光栅内部钳制的激光强度具有极强的依赖关系.与等离子光栅相互作用,三次谐波信号与等离子光栅基波信号的相位匹配与否是解释探测光丝三次谐波信号强度变化的关键.控制探测光丝以小角度与等离子光栅相互作用是实现探测光丝三次谐波信号有效放大的最佳途径.     

聚合物封装的高灵敏度光纤光栅温度传感器及其低温特性

介绍了一种新型的光纤光栅温度传感器。这种光纤光栅温度传感器使用了特殊的工艺将光纤布拉格光栅封装于一种热膨胀系数较大的有机聚合物基底中 ,使得传感器的温度灵敏性比裸光纤光栅提高了 12 .3倍 ,其温度灵敏度系数KT 达到 82 .6 9× 10 -6/℃。在 - 80～ 0℃的低温度范围内 ,对这种新型光纤光栅温度传感器的反射谱进行了测量。研究了这种新型光纤光栅温度传感器的低温特性 ,并与裸光纤光栅和铝基封装的光纤光栅进行了比较 ,结果表明这种新型的光纤光栅温度传感器具有很好的低温响应特性。     

线偏振高斯光束通过复合型衍射光栅的传输特性

提出一种集合浮雕和折射率周期分布调制的复合型衍射光栅,并利用角谱表示和严格的模式理论研究了线偏振高斯光束通过这种复合型衍射光栅的传输特性.数值计算结果表明,在光栅的同一透射深度处复合型衍射光栅光强的起伏频率要比浮雕型光栅光强的起伏频率小.最后使用复合型衍射光栅模型,研究了亚波长体积相位全息光栅的表面起伏和入射光束的束腰宽度对衍射效率的影响. 关键词： 复合型衍射光栅 亚波长体积相位全息光栅 高斯光束 严格模式理论     

Formation and Confirmation of the “Pure” Laser Induced Population Grating in Dye Solution

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极紫外波段变栅距光栅刻槽密度变化及光谱分辨能力分析

针对应用于50~150nm波段的变栅距光栅, 采用球面波曝光系统进行优化设计, 分析了不同宽度光栅的刻槽密度变化和光谱分辨能力。理论分析结果表明, 光栅宽度为4mm时, 理论分辨能力高于14000;光栅宽度为10mm时, 理论分辨能力约为9000;光栅宽度为30mm时, 理论分辨能力急剧下降, 约为3000。光栅的宽度越大, 其刻槽弯曲程度就越大, 光栅的光谱分辨能力就越低, 因此球面波曝光系统只适合制作宽度较小的变栅距光栅。