CW laser-assisted oxidation of thin Cd,In, Sn,and Zn films in air

Thin films of Cd, In, Sn, and Zn are deposited onto glass and irradiated in air by means of a cw-Ar⁺ laser beam. The films are oxidized. The variations of the diameter of the oxidized zones are measured as a function of time and laser beam power, P. The temperature is measured by an interferometric method. It is shown that oxidation proceeds rapidly at some critical temperature, independent of P over some range of P, in the cases of Cd, In, and Zn. These critical temperatures correspond to the melting temperatures of Cd and In. No relation to any specific temperature of the Zn-O phase diagram is found. Feedback effects are also discussed.     

Kinetic studies of laser-induced synthesis of thin vanadium pentoxide films

The kinetics of Ar⁺ laser-induced oxidation of 100 nm thick vanadium films on glass substrates is followed by measuring time-dependent changes in reflected and transmitted intensity of a He-Ne probe beam. The growth rate of the vanadium pentoxide layer increases with increasing laser powerP as = ₀ exp(-a/P). At power densities above kW/cm² vanadium pentoxide crystallizes from the melt.     

Excimer laser-induced crystallization of CdSe thin films

We have investigated ArF (λ=193 nm) excimer laser-induced crystallization of amorphous CdSe semiconductor thin films. The crystallization has been monitored by a related photoluminescence emission in the free-exciton and defect-band transition regions. For different irradiation conditions, we have observed formation of nanorods, up to 2 μm long, as well as the formation of arrays of CdSe nanobeads with a narrow size distribution and characteristic dimensions corresponding to λ/2 and λ/8. The successful crystallization has also been confirmed by confocal Raman spectroscopy.     

Microstructure and roughness improvement of polycrystalline Bi thin films upon pulsed-laser melting

Bismuth films with different thicknesses have been grown by do sputtering on substrates held at room temperature. The films are always formed by columnar crystals with a grain size comparable to the film thickness which lead to surface roughness. It increases with the thickness of the films and has a strong influence on the film optical properties. The films have been irradiated with nanosecond laser pulses, and real-time reflectivity measurements during the irradiation were used to follow the changes in the film optical properties. It will be shown that pulsed-laser irradiation of films thinner than 100 nm improves substantially their surface roughness and their crystalline quality by increasing the grain size at least one order of magnitude.     

Vanadium oxidation as a result of cw CO2 laser irradiation in atmospheric air

New results are reported concerning the vanadium oxidation by cw CO₂ laser irradiation in air at atmospheric pressure. Particular emphasis is paid both to the initial stage and the development of the oxidation process under the action of the laser radiation. Some aspects are finally discussed concerning the quantitative theoretical interpretation of the experimentally recorded data.     

Optical and structural properties of thin films deposited from laser fused Zirconia,Hafnia, and Yttria

The optical and structural properties of films deposited from laser sintered Zirconia (ZrO₂), Hafnia (HfO₂), and Yttria (Y₂O₃) and from the commercially available (unprocessed material) Zirconia, Hafnia and Yttria, were studied and compared. All the films had low absorption. Films deposited from the laser sintered material had very low optical inhomogeneity. ZrO₂ films showed negative inhomogeneity for films deposited from the unprocessed material. The refractive index increased for ZrO₂ films deposited from the laser sintered material. HfO₂ and Y₂O₃ films showed positive inhomogeneity when deposited from the unprocessed material. The refractive index of the films of these materials decreased when deposited from the laser sintered material. The thin films of ZrO₂ and Y₂O₃ prepared from laser sintered material had stable monoclinic and cubic structures respectively while HfO₂ films were found to be amorphous.     

Kinetics of photo‐darkening and self‐bleaching in amorphous As2S3 and As2Se3 thin films

The kinetics of photo‐darkening of amorphous As₂S₃ and a‐As₂Se₃ thin films follows a single exponential, but the magnitude and the rate of the process is higher in case of As₂S₃. The kinetics of self‐bleaching (dark relaxation) in advance photo‐darkened state follows a stretched exponential (SRE) with different stretching parameter for a‐As₂S₃ and a‐As₂Se₃. Within the J. C. Phillips approach we suppose that photo‐darkening in amorphous As₂S₃ films is, to some extent, accompanied by changes in short‐range order interactions, while photo‐darkening of amorphous As₂Se₃ is accompanied rather by changes in Coulomb interactions. The self‐bleaching process reduced the magnitude of photo‐darkening up to 45% and 60% for amorphous As₂S₃ and As₂Se₃ films, respectively. (© 2007 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

AlCl3-induced crystallization of amorphous silicon thin films

It is reported that the direct contact between Al and amorphous silicon (a-Si) enhances the crystallization of a-Si films. But the polycrystalline silicon (poly-Si) films crystallized by the direct contact of Al metal film suffer the problems of rough surface. In our study, we utilized the AlCl₃ vapor during the a-Si films deposition instead of Al metal film to enhance crystallization. X-ray diffraction (XRD) shows that the AlCl₃ vapor so successfully enhanced the crystallization of a-Si films that the crystallization was completed in 5 h at 540 °C. And the orientation of the poly-Si film deposited with AlCl₃ vapor is much more random than that of annealed with Al metal under layer. But the average grain size is much larger than that. Moreover, the surface of the AlCl₃-induced crystallized poly-Si film was much smoother than that of the Al-induced poly-Si film. The Al and Cl incorporation into the poly-Si film was confirmed using X-ray photoelectron spectroscopy (XPS) and found that the quantity of Al and Cl incorporated into the Si film was below the detection limit of XPS.     

Excimer-laser-assisted RF glow-discharge deposition of amorphous and microcrystalline silicon thin films

We combine the deposition of Hydrogenated amorphous Silicon (a-Si:H) by rf glow discharge with XeCl-excimer laser irradiation of the growing surface in order to obtain different kinds of silicon films in the same deposition system. In-situ UV-visible ellipsometry allows us to measure the optical properties of the films as the laser fluence is increased from 0 up to 180 mJ/cm² in separate depositions. For fixed glow-discharge conditions and a substrate temperature of 250° C we observe dramatic changes in the film structure as the laser fluence is increased. With respect to a reference a-Si:H film (no laser irradiation) we observe at low laser fluences (15–60 mJ/cm²) that the film remains amorphous but demonstrates enchanced surface roughness and bulk porosity. At intermediate fluences (80–165 m/Jcm²), we obtain an amorphous film with an enhanced density with respect to the reference film. Finally, at high fluences (165–180 mJ/cm²), we obtain microcrystalline films. The in-situ ellipsometry measurements are complemented by ex-situ measurements of the dark conductivity, X-ray diffraction, and Elastic Recoil Detection Analysis (ERDA). Simulation of the temperature profiles for different film thicknesses and for three laser fluences indicates that crystallization occurs if the surface temperature reaches the melting point of a-Si:H ( 1420 K). The effects of laser treatment on the film properties are discussed by taking into account the photonic and thermal effects of laser irradiation.Presented at LASERION 93, Munich, June 21–23, 1993     

Laser crystallization of amorphous silicon films investigated by Raman spectroscopy and atomic force microscopy

The intrinsic and phosphorous (P)-doped hydrogenated amorphous silicon thin films were crystallized by laser annealing. The structural properties during crystallization process can be investigated. Observed redshifts of the Si Raman transverse optical phonon peak indicate tensile stress present in the films and become intense with the effect of doping, which can be relieved in P-doped films by introducing buffer layer structures. Based on experimental results, the established correlation between the stress and crystalline fraction (X_C) suggests that the relatively high stress can limit the increase in X_C and the highest crystalline fraction is obtained by a considerable stress release. At high laser energy density of 1250 mJ/cm², the poorer crystalline quality and disordered structure of the film originating from the irradiation damage and defects lead to the low electron mobility.     

X-ray pole-figure study of the epitaxial growth of C60 thin films on mica (001)

The growth of epitaxial C₆₀ thin films on mica(001) by thermal evaporation has been studied in detail by X-ray pole-figure measurements. The influence of the deposition rate, the substrate temperature and the film thickness on the in-plane epitaxial arrangements and the formation of twins has been investigated. It has been demonstrated that the C₆₀ growth is determined by two independent and equivalent C₆₀-crystal grain alignments (type-A and type-B). The nearly six-fold symmetry of the mica(001)-substrate surface offers the three-fold fcc-(111)-oriented C₆₀-crystal grains two equivalent crystal alignments. A high deposition rate of 0.5 Å/s is responsible for the formation of twins at a substrate temperature of 150°C, which diminishes by a higher substrate temperature of 200°C. By a decrease of the deposition rate down to 0.08 Å/s the twins vanish at a film thickness of 200 nm and at the substrate temperature of 150°C. Under the same sublimation conditions, in addition to the type-A and type-B crystal orientations, the growth of the thin C₆₀ films starts with a slight fibre texture which does not appear at a larger film thickness.     

Fluorescence-excitation and hole-burning spectroscopy of heavy-dose neutron-irradiated α-Al2O3

We report on persistent spectral hole-burning and fluorescence-excitation spectroscopy in heavy-dose (3 × 10²⁰ n/cm²) neutron-irradiated and annealed sapphire using a Ti:Sapphire ring laser in single-frequency and broad-band operation. The optimum conditions for hole burning were obtained after annealing the crystals to 400 °C. Holes have been detected in the near-infrared spectral range between 745 and 795 nm. At 1.5 K, the narrowest hole widths were approximately 2 GHz, so that about 10⁴ holes can be burnt in this spectral region. Besides the storage density in the wavelength dimension, the coefficient describing the electric-field-induced filling of a spectral hole also rises by more than one order of magnitude as compared to crystals with low neutron-irradiation dose.     

AFM studies of surface morphologies of sputtered SrTiO3 films and annealed MgO substrates

3 films on single-crystal MgO(100) substrates. Meanwhile, surface morphologies of as-polished and post-annealed MgO(100) substrates are investigated as well. Effects of the miscut (or misorientation) of the substrate surface on morphologies and growth mechanisms are discussed. For comparison, a typical surface morphology and growth mechanism of the spiral island structure in sputtered PrBa₂Cu₃O_7-δ films on MgO(100) substrates are presented. Received: 27 March 1998     

Direct observation of laser-induced crystallization of a-C:H films

The post-growth modification of diamond-like amorphous hydrogenated carbon a-C:H films by laser treatment has been studied by transmission electron microscopy and Raman spectroscopy. a-C:H films grown on Si substrates by benzene decomposition in a rf glow discharge were irradiated with 15 ns pulses of a KrF-excimer laser with fluences in the range of E=50–700 mJ/cm². At fluences below 100 mJ/cm² an increase in the number of graphitic clusters and in their ordering was evidenced from Raman spectra, while the film structure remained amorphous according to electron microscopy and electron diffraction observations. At higher fluences the appearance of diamond particles of 2–7 nm size, embedded into the lower crystallized graphitic matrix, was observed and simultaneously a progressive growth of graphite nanocrystals with dimensions from 2 nm to 4 nm was deduced from Raman measurements. The maximum thickness of the crystallized surface layer (400 nm) and the degree of laser annealing are limited by the film ablation which starts at E>250 mJ/cm². The laser-treated areas lose their chemical inertness. In particular, chemical etching in chromium acid becomes possible, which may be used for patterning the highly inert carbon films.     

Synthesis and properties of In2(Se1-xTex)3 thin films: a new semiconductor compound

In₂(Se_1-xTe_x)₃ polycrystalline films were prepared by a dual-source thermal evaporation technique. The depositions onto glass and SnO₂-coated glass substrates were carried out in a vacuum chamber and followed by an annealing in neutral ambient (Ar or N₂). The structural, morphological and compositional studies of the films were made by X-ray diffraction, energy-dispersive X-ray analysis, X-ray photoelectron spectroscopy, scanning electron microscopy, Raman scattering and optical transmission. Optimum conditions are investigated for the formation of the ternary compound In₂(Se_1-xTe_x)₃ in order to tune the band gap by changing the Te concentration. The film properties as a function of Te amount are discussed. It is shown that single-phase, textured and homogeneous layers of In₂(Se_1-xTe_x)₃ can be grown with x≤0.2 at optimal deposition and heat treatment conditions. For x≅0.17 these films showed an energy band gap of about 1.45 eV and an electrical conductivity at room temperature six orders of magnitude higher than that of the binary γ-In₂Se₃ thin films. Received: 9 July 1999 / Accepted: 25 November 1999 / Published online: 13 July 2000     

A simple estimate of deposited energy and concentration profiles in films produced by Ion-Assisted Physical Vapour Deposition

Analytical expressions for estimating the energy dissipation and the film constituent concentration profiles in films grown by Ion-Assisted Physical Vapour Deposition (IA PVD) are given. Two cases of IA PVD are considered: ion-assistance performed by inert-gas ions as well as by ions of a film constituent. As an example of application, concentration and damage depth profiles in h-BN films grown by IA PVD are calculated and a comparison is made with results obtained by computer simulation.     

Early stages of laser mixing process in Sb/Ge multilayer thin films

The onset of mixing at the interfaces between Sb and Ge in thin multilayered films containing two or four layers has been studied. The films were irradiated with nanosecond laser pulses in order to trigger mixing, and in situ reflectivity measurements were used to follow the transformation in real-time. Cross sectional transmission electron microscopy analysis was used to study both the structure and the composition profile before and after irradiation.A threshold irradiation energy exists for the onset of mixing, below which roughening of the interface between the layers is observed, together with recrystallization of the surface Sb layer following melting. The results are consistent with a melting/diffusion process which is inhomogeneously nucleated at the interface between the top Sb and Ge layers. Once mixing is initiated an amorphous Sb-Ge layer of constant thickness is formed, corresponding to mixing along a well defined planar melt front. Voids are observed at the former Sb/Ge interface, which may be related to interfacial stress in the as-grown configuration.     

XRD and XPS analysis of laser treated vanadium oxide thin films

In this work, we present X-ray photoelectron spectroscopy (XPS) and X-ray diffraction (XRD) analysis of laser treated vanadium oxide sols. The films were also observed by transmission electron microscopy (TEM) and scanning electron microscopy (SEM) to reveal how the original xerogel structure changes into irregular shaped, layer structured V₂O₅ due to the laser radiation. XRD revealed that above 102 W/cm² the original xerogel structure disappears and above 129 W/cm² the films become totally polycrystalline with an orthorhombic structure. XPS spectra showed O/V ratio increment by using higher laser intensities.