Scaling regimes for second layer nucleation

Nucleation on top of two-dimensional islands with step edge barriers is investigated using scaling arguments. The nucleation rate is expressed in terms of three basic time scales: the time interval between deposition events, the residence time of atoms on the island, and the encounter time required for atoms forming a stable nucleus to meet. Application to the problem of second layer nucleation on growing first layer islands yields a sequence of scaling regimes with different scaling exponents relating the critical island size, at which nucleation takes place, to the diffusion and deposition rates. Second layer nucleation is fluctuation-dominated, in the sense that the typical number of atoms on the island is small compared to , when the first layer island density exponent satisfies . The upper critical nucleus size, above which the conventional mean field theory of second layer nucleation is valid, increases with decreasing dimensionality. In the related case of nucleation on top of multilayer mounds fluctuation-dominated and mean field like regimes coexist for arbitrary values of the critical nucleus size . Received 4 September 2000     

Substrate-step-induced effects on the growth of CaF2 on Si (111)

The growth of CaF₂ on vicinal Si (111) surfaces was studied by scanning tunneling microscopy (STM) and atomic force microscopy (AFM) for the temperature range from 300 to 750 °C. In the submonolayer range a transition from terrace to step nucleation is observed for increasing temperature. The first monolayer grows in the step-flow growth mode since second layer islands are not nucleated before completion of the wetting layer. For the subsequent growth of CaF₂ on the CaF interface layer, substrate-induced steps do not act as preferential nucleation sites, but rather as growth barriers. Thus CaF₂ films grow very inhomogeneously at high temperatures. At lower deposition temperatures, the film homogeneity increases due to the increased (homogeneous) nucleation rate on terraces. The lattice mismatch leads to (lateral) relaxation of thicker CaF₂ film close to substrate steps. In addition, CaF₂ self-decoration effects are caused by the relaxed regions close to the film steps at temperatures above 500 °C. Received: 7 August 2001 / Accepted: 23 October 2001 / Published online: 3 April 2002     

Nucleation and growth mechanisms of Fe on Au(111) in the sub-monolayer regime

The growth of Fe on Au(111) at 300 K in the sub-monolayer regime has been investigated using scanning tunneling microscopy, focusing on the mechanisms of nucleation, coalescence and interlayer diffusion. Below a coverage of 0.1 ML, Fe growth proceeds in a well-ordered fashion producing regular arrays of islands, while approaching the island coalescence threshold (above 0.35–0.4 ML), we observed a consistent increasing of random island nucleation. These observations have been interpreted through rate equation models for the island densities in the presence of preferred nucleation sites. The evolution of the second layer fraction has also been interpreted in a rate equation scheme. Our results show that the ordered to random growth transition can be explained by including in the model bond breaking mechanisms due to finite Fe–Fe bond energy. A moderate interlayer diffusion has been inferred from data analysis between the second and the first layer, which has been used to estimate the energy barrier of the adatoms descending process.     

Direct observation of strain relaxation in iron layers on W(110) by time-resolved STM

Time-resolved,in-situ-applied STM has been used to study the epitaxial growth of iron on W(110) at room temperature. By this way, sequences of STM images show directly the atomistics of the growth process on the surface. The first layer of iron on W(110) grows pseudomorphically without a preferred growth direction. Beginning with the second layer, the islands grow anisotropically with preferred growth in the [001]-direction. The generation of an ordered two-dimensional dislocation network starts at a coverage of 1.4 pseudomorphic monolayers to relax the misfit of 9.4%. A direct correlation of the creation of misfit dislocations in the second layer and the nucleation of the third-layer islands was found. Together with the onset of strain relaxation, the growth mode abruptly changes from layer-by-layer to statistical growth. A quantitative statistical analysis of the data allows to exactly determine the onset of relaxation, the vertical location of the dislocation lines, and the lateral extension of an island that is necessary to induce the formation of dislocations.     

Multilayer Cooperative Sequential Adsorption

Cooperative sequential adsorption is here extended to multilayer coverages. We discuss two different growth rules with cooperativity either restricted to only the first layer of coverage or applied in all layers. The unrestricted variant is considered in the case where lateral growth dominates over the nucleation of terraces. The limit of completely suppressed nucleation corresponds to a morphological transition to a flat interface from one governed by the Kardar–Parisi–Zhang equation. With the restricted growth rule we find interesting behavior resulting from a competition between lateral growth at the first layer and growth on the top of nucleated islands. There is an intermediate regime between random deposition at the submonolayer coverage and asymptotic random deposition behavior. In this regime the kinetic roughening can be studied by applying sequential adsorption rate equations for cluster lengths in the first layer, with an additional geometric argument.     

Nucleation and submonolayer growth of C60 on KBr

Noncontact atomic force microscopy has been applied to the prototypical molecule-insulator system C60 on KBr to study nucleation and submonolayer growth. Overview images reveal an island growth mode with unusual branching structures. Simultaneous molecular and atomic resolution on the C60 and KBr surfaces, respectively, was obtained revealing a coincident 8x3 superstructure. Also, a 21+/-3 pm apparent height difference was observed in atomic force microscopy topographies between some first layer molecules. One of the initial nucleation sites of the C60 islands was determined by observation of loosely bound molecules at kink sites in monatomic KBr steps, in conjunction with the observation that islands form preferentially at step edges.     

Real-time X-Ray diffraction measurements of the phase transition in KCl shocked along

We have directly imaged subcritical fluctuations during the nucleation phase of three-dimensional islands in strained layer epitaxy. The fluctuations are defect mediated and are found to be large even at low growth temperatures. We attribute the existence of large fluctuations to the time dependence of the supersaturation. This indicates classical nucleation concepts are relevant, even at low growth temperatures.     

Effects of AlN nucleation layer thickness on crystal quality of AlN grown by plasma-assisted molecular beam epitaxy

In this paper,the effects of thickness of AlN nucleation layer grown at high temperature on AlN epi-layer crystalline quality are investigated.Crack-free AlN samples with various nucleation thicknesses are grown on sapphire substrates by plasma-assisted molecular beam epitaxy.The AlN crystalline quality is analysed by transmission electron microscope and x-ray diffraction (XRD) rocking curves in both (002) and (102) planes.The surface profiles of nucleation layer with different thicknesses after in-situ annealing are also analysed by atomic force microscope.A critical nucleation thickness for realising high quality AlN films is found.When the nucleation thickness is above a certain value,the (102) XRD full width at half maximum (FWHM) of AlN bulk increases with nucleation thickness increasing,whereas the (002) XRD FWHM shows an opposite trend.These phenomena can be attributed to the characteristics of nucleation islands and the evolution of crystal grains during AlN main layer growth.     

界面形核时间对GaN薄膜晶体质量的影响

利用金属有机化学气相沉积技术系统研究了界面形核时间对c面蓝宝石衬底上外延生长GaN薄膜晶体质量的影响机理. 用原子力显微镜、扫描电子显微镜、高分辨X射线衍射仪以及光致发光光谱仪表征材料的晶体质量以及光学性质. 随着形核时间的延长, 退火后形成的形核岛密度减小、尺寸增大、均匀性变差, 使得形核岛合并过程中产生的界面数量先减小后增大, 导致GaN外延层的螺位错和刃位错密度先减小后增大, 这与室温光致发光光谱中得到的带边发光峰与黄带发光峰的比值先增大后降低一致. 研究结果表明, 外延生长过程中, 界面形核时间会对GaN薄膜中的位错演变施加巨大影响, 从而导致GaN外延层的晶体质量以及光学性质的差异.     

Memory effects and slow dynamics in ultra thin magnetic films

Monte Carlo studies of a uniaxial spin system on a square lattice with both ferromagnetic exchange interactions and dipolar interactions reveal three distinct dynamical regimes at low temperatures. In the first regime the magnetization decays through nucleation and growth of spin islands, in the second regime, despite the magnetization being effectively zero, there is a persistent memory effect most clearly revealed by the asymmetry between the numbers of up and down islands. The third regime is characterized by slow crystallization of the equilibrium smectic phase from the quenched polycrystalline state.     

Initial surface roughening in Ge/Si(001) heteroepitaxy driven by step-vacancy line interaction

The initial surface roughening during Ge epitaxy on Si(001) is shown to arise from an effective repulsion between S(A) surface steps and dimer vacancy lines (VLs). This step-VL interaction gradually inactivates a substantial fraction of adatom attachment sites at the growth front, causing a rapid increase in the rate of two-dimensional island nucleation. The mutual repulsion hinders the crossing of S(A) surface steps over VLs in the second layer, thus organizing the developing surface roughness into a periodic array of anisotropic 2D terraces. Isolated (105) facets forming at specific sites on this ordered template mediate the assembly of first 3D Ge islands.     

In-situ observation of graphene growth on Ni(111)

Graphene growth of mono-, bi- and tri-layers on Ni(111) through surface segregation was observed in situ by low energy electron microscopy. The carbon segregation was controlled by adjusting substrate temperature from 1200 K to 1050 K. After the completion of the first layer at 1125 K, the second layer grew at the interface between the first-layer and the substrate at 1050 K. The third layer also started to grow at the same temperature, 1050 K. All the layers exhibited a 1 × 1 atomic structure. The edges of the first-layer islands were straight lines, reflecting the hexagonal atomic structure. On the other hand, the shapes of the second-layer islands were dendritic. The edges of the third-layer islands were again straight lines similar to those of the first-layer islands. The phenomena presumably originate from the changes of interfacial-bond strength of the graphene to Ni substrate depending on the graphene thickness. No nucleation site of graphene layers was directly observed. All the layers expanded out of the field of view and covered the surface. The number of nucleation sites is extremely small on Ni(111) surface. This finding might open the way to grow the high quality, single-domain graphene crystals.     

The nucleation of pentacene thin films

Photoemission Electron Microscopy was used to determine basic factors for nucleation and growth of thin pentacene films. Dependence of both substrate chemistry and deposition rate on the nucleation density was observed. On SiO₂ pentacene shows a high nucleation density and forms small islands consisting of almost vertically oriented molecules. On Si(001) the nucleation density of this thin-film phase is much smaller, but the pentacene film first forms a flat-lying wetting layer. The thin-film phase only forms on top of this wetting layer. Adsorption of a cyclohexene self-assembled monolayer on Si(001) prior to the pentacene growth suppresses the initial pentacene wetting layer but maintains diffusion parameters similar to pentacene on Si(001). The nucleation of pentacene layers on cyclohexene/Si(001) can be described by classical nucleation theory with a critical nucleus size i6. Simple surface modification techniques such as e-beam irradiation of the substrates prior to pentacene adsorption can also have a significant effect on the pentacene nucleation density. PACS 68.37.Nq; 68.43.Fg; 68.47.Fg; 68.55.Ac     

The effects of sapphire nitridation on GaN growth by metalorganic chemical vapour deposition

In situ optical reflectivity measurements are employed to monitor the GaN epilayer growth process above a low-temperature GaN buffer layer on a c-plane sapphire substrate by metalorganic chemical vapour deposition. It is found that the lateral growth of the GaN islands and their coalescence are promoted in the initial growth stage if optimized nitridation time and temperature are selected when the substrate is pre-exposed to ammonia. As confirmed by atomic force microscopy observations, the quality of the GaN epilayers is closely dependent on the surface morphology of the nitridated buffer layer, especially grain size and nucleation density.     

Dynamics of wetting layer formation

We study the formation and growth of wetting layers in the binary liquid mixture cyclohexane-methanol. By progressively deuterating the methanol we can tune the equilibrium wetting layer thickness. Hysteresis of the transition is observed for large thicknesses and is absent for thinner ones. This can be understood by calculating the activation energy for wetting layer nucleation as a function of the film thickness. We also show that the late-stage growth of the wetting layer after the nucleation process follows a power law in time, in agreement with a diffusion-limited growth mechanism proposed theoretically.     

Influences of misfit strains on liquid phase heteroepitaxial growth

Influences of misfit strains with different signs on liquid phase heteroepitaxial growth are studied by binary phase field crystal model. It is amazing to find that double islands are formed because of lateral and vertical separation. The morphological evolution of epitaxial layer depends on signs of misfit strains. The maximum atomic layer thickness of double islands under negative misfit strain is larger than that of under positive misfit strain at the same evolutional time, and size differences between light and dark islands is much smaller under negative misfit strain than that of under positive misfit strain. In addition, concentration field and density field approximately have similar variational law along x direction under the same misfit strain but show opposite variational trend under misfit strains with different signs. Generally, free energy of epitaxial growth systems keeps similar variational trend under misfit strains with different signs.     

Quantum size effect on the diffusion barriers and growth morphology of Pb/Si(111)

An intriguing growth morphology of Pb islands on a Si(111) surface is observed in our STM experiments: the growth of a Pb layer on Pb islands with unstable heights starts from the periphery and moves towards the center, while the nucleation of the next layer on stable Pb islands starts away from the periphery. Using first-principles total energy calculations, we have studied the diffusion barriers of Pb adatoms on a freestanding Pb(111) film as a function of film thickness. The diffusion barriers are found to be very low (<60 meV), and a bi-layer oscillation due to the quantum size effect (QSE) is observed, with a lower barrier on the odd-layered, relatively unstable Pb films. The diffusion barrier difference between the odd- and even-layered film is as large as 40 meV. The observed unusual growth can be attributed to this big difference in the diffusion barriers due to QSE.     

Oxidation and faceting of polycrystalline tungsten ribbons

We have measured the oxidation rate of tungsten and the evaporation rate of tungsten oxide in the temperature range from 900 to 1200 K at an oxygen pressure from 5 × 10^?4 to 5 × 10^?3 Torr. The oxidation rate increases steadily with coverage in the whole range studied. The evaporation rate decreases at high pressure and is strongly dependent on the initial conditions of the experiments. These kinetic measurements support a qualitative model of oxidation. The surface is composed of oxide islands surrounded by oxide-free regions covered only by chemisorbed oxygen atoms. On the bare regions beside the chemisorbed oxygen atoms we suppose the existence of a dilute chemisorbed oxide layer which can either enter the condensed oxide phase or evaporate. The number of the growing islands is set up at the beginning of the reaction and does not increase further. This model, consistent with kinetic results during oxidation, has been proposed first to explain results obtained by Auger electron spectroscopy and thermal desorption spectroscopy under vacuum. Faceting is particularly important in the early stages of the experiment because it can hinder the nucleation of the oxide which is a necessary step for growth. In a narrow range of temperature and oxygen pressure this inhibited nucleation leads to an enhanced evaporation rate so that the growth rate is lower. Recording this growth rate allows us to follow faceting. The parameters studied are the oxygen coverage and the temperature, experimental results are in agreement with LEED and RHEED results. Reconstruction and faceting are discussed and are believed to be caused by a smoothing of the surface during the chemisorption step.     

Stranski-Krastanov growth of CuCl on MgO(001)

Initial growth of CuCl, a zinc-blende-structure I–VII ionic compound, on MgO(001) with NaCl-type structure has been studied using reflection high-energy electron diffraction (RHEED) and atomic force microscopy (AFM). An intermediate layer of adsorbed CuCl, which has a surface structure strongly influenced by the host lattice, was formed before islanding. This layer is easily distinguished from (111) top surfaces of the CuCl islands with trigonal symmetry which have been grown subsequently. This implies that CuCl grows in the Stranski-Krastanov growth mode, which also explains why the nucleation of the islands is insensitive to the step edges of MgO(001).     

The influence of substrate temperature on growth of para-sexiphenyl thin films on Ir{111} supported graphene studied by LEEM

The growth of para-sexiphenyl (6P) thin films as a function of substrate temperature on Ir{111} supported graphene flakes has been studied in real-time with Low Energy Electron Microscopy (LEEM). Micro Low Energy Electron Diffraction (μLEED) has been used to determine the structure of the different 6P features formed on the surface. We observe the nucleation and growth of a wetting layer consisting of lying molecules in the initial stages of growth. Graphene defects – wrinkles – are found to be preferential sites for the nucleation of the wetting layer and of the 6P needles that grow on top of the wetting layer in the later stages of deposition. The molecular structure of the wetting layer and needles is found to be similar. As a result, only a limited number of growth directions are observed for the needles. In contrast, on the bare Ir{111} surface 6P molecules assume an upright orientation. The formation of ramified islands is observed on the bare Ir{111} surface at 320 K and 352 K, whereas at 405 K the formation of a continuous layer of upright standing molecules growing in a step flow like manner is observed.