带分划板的变倍双目望远镜

本文叙述了原苏联的ＢＫ７～１２×３５，ＢＫ７～１４×３６和ＢＰ１０～１６×４０变倍双目望远镜。给出了这些变倍双目望远镜与固定放大率双目望远镜相比的实验室试验结果。试验结果表明原苏联研制的变倍双目望远镜在光学和技术性能方面基本上与固定放大率双目望远镜不相上下。而且表明研制带分划板的变倍双目望远镜将会导致放大率变化范围的增加，可观察角视场的增大，结构的改进和重量的减轻。     

特别耐高低温分划板的研制

为了解决分划板在高低温情况下容易开胶的问题,通过对几种光学用胶以及制版工艺的选择和探讨,研制出特别耐高低温的分划板。     

特殊分划板的制作工艺改进

<正> 对于瞄准活动目标的分划板,为了使跟踪的目标更加明显,需要在十字交叉缺口处加刻一红点。如图1所示。这里主要介绍这种特殊分划板的技术要求、常规刻划工艺及其改进措施。一、常规刻划工艺1.技术要求制造该分划板,其测标点大小、测标线粗细及其不同心度应满足如下技术要求:(1)测标点的直径为0.04~(±0.004)mm,为红色;     

用五轴机刻制球面分划板

目前,国内刻制球面分划板一般采用两种方法。一种是利用万向接头原理,使刻刀始终垂直于球面切线进行刻划,这种方法可刻划任何曲率半径的球面分划板,有的厂就利用这种原理制造了具有万向刀架或万向承座的专用球面刻线机。但是,这种刻线机的万向接头要求精度高,制作麻烦,机器用途单一。它虽然使用模板缩放,但一次只能刻划一块零件,效率不高。另一种方法是在没有专用球面刻线机的条件下,用手摇万能刻线机进行刻线。它的刀架结构形式是直     

分划板失调时猫眼系统的反射特性

为降低光电装备猫眼效应,减小光学窗口被激光主动侦察系统探测到的概率,对分划板失调情况下猫眼系统的反射特性进行了研究。基于几何光学与2维平面波角谱衍射理论,推导并仿真了平面波通过分划板失调猫眼系统在出射面上的衍射光场分布特性,实验验证了猫眼目标的反射特性。研究结果表明:分划板失调会导致猫眼系统出射面的回波光斑发生椭圆形变,而斜入射探测激光会使这一现象更加明显。利用这一特性对猫眼系统进行改进,会大大增加激光主动侦察系统区分形变猫眼目标和漫反射背景干扰的难度。     

分划板失调时猫眼系统的反射特性

为降低光电装备猫眼效应,减小光学窗口被激光主动侦察系统探测到的概率,对分划板失调情况下猫眼系统的反射特性进行了研究。基于几何光学与2维平面波角谱衍射理论,推导并仿真了平面波通过分划板失调猫眼系统在出射面上的衍射光场分布特性,实验验证了猫眼目标的反射特性。研究结果表明：分划板失调会导致猫眼系统出射面的回波光斑发生椭圆形变,而斜入射探测激光会使这一现象更加明显。利用这一特性对猫眼系统进行改进,会大大增加激光主动侦察系统区分形变猫眼目标和漫反射背景干扰的难度。     

前置分划板连续变焦CCD瞄准镜光学设计

针对目前国内市场遥控武器站遥控枪塔的CCD瞄准镜不能在整个焦距范围内任意视场进行瞄准射击的问题,设计了一个前置分划板连续变焦CCD瞄准镜光学系统.它不同于一般的变焦系统,该系统采用补偿组线性运动,变倍组凸轮曲线运动的变焦方式来保证像面稳定.系统变焦比为5:1,在一定焦距范围内实现连续变焦,并且通过采用分划板前置的方式,...     

分划板模板设计问题的一点讨论

<正> 目前国内各光学厂在批量生产分划板的过程中,大都采用浮刻法,即各类分划常用刻线机按模板刻划。因此,模板是刻度工装中非常重要的一种。模板设计的是否合理,直接影响分划板的精度。这里,对模板设计问题进行一点讨论。模板的设计一般分下列几步: 一、求放大率根据国产五轴机的缩放原理其放大率公式为:     

照像分划板底图的刻漆膜制图法

通常照相分划板制造的第一步,就是按产品图绘制精确的放大底图。有了良好的放大底图,才能照出高质量的分划板。一般绘制放大底图,要付出大量的人力与时间,有时一个复杂的图形,一个有经验的绘图人员需要几个月才能完成。我厂自行设计了一种仪器,其中分划板     

6HJ-01光学用环氧树脂胶研制报告

本报告总结了GHJ-01胶主要组分的配制工艺、配方确定的实验依据,介绍了该胶的固化特性、机械、粘接及光学性能;通过热失重曲线讨论了胶合后剥离返修的条件及实施方法。并对胶合件的应力进行了理论性探讨。     

Jamming effect analysis of infrared reticle seeker for directed infrared countermeasures

In directed infrared countermeasures (DIRCM), the purpose of jamming toward missiles is making missiles miss the target (aircraft of our forces) in the field of view. Since the DIRCM system directly emits the pulsing flashes of infrared (IR) energy to missiles, it is more effective than present flare method emitting IR source to omni-direction. In this paper, we implemented a reticle seeker simulation tool using MATLAB-SIMULINK, in order to analyze jamming effect of spin-scan and con-scan reticle missile seeker used widely in the world, though it was developed early. Because the jammer signal has influence on the missile guidance system using its variable frequency, it is very important technique among military defense systems protecting our forces from missiles of enemy. Simulation results show that jamming effect is greatly influenced according to frequency, phase and intensity of jammer signal. Especially, jammer frequency has the largest influence on jamming effect. Through our reticle seeker simulation tool, we can confirm that jamming effect toward missiles is significantly increased when jammer frequency is similar to reticle frequency. Finally, we evaluated jamming effect according to jammer frequencies, by using correlation coefficient as an evaluation criterion of jamming performance in two reticle missile seekers.     

Testing of holographic optical elements for holographic gun-sight

Conventional methods of measuring the various parameters of holographic optical elements are tedious for mass production. A novel approach is described for the holographic elements used in the holographic sight, in which the parameters are defined and measured as per their intended final application. Since the holographic sight is used for accurate target acquisition along with the other features, parallax in the sight becomes a critical parameter. Besides, the maximum brightness of the reticle is another parameter of the device, which is important for the use of sight in the strong sunlight in summers. There are two holographic elements, namely holographic reticle and holographic lens in the sight. Both can be tested in a simple set-up in terms of the parallax of the sight and the brightness of the reticle. The masters for both elements are required to be benchmarked once and rest of the elements in a mass production can be tested with the reference of masters.     

Reticles as Standards in Laser Diffraction Spectroscopy

This paper reports on the applicability and the limitations of reticles as standards in laser diffraction spectroscopy. In comparison with standard materials, reticles carry some advantages with respect to their ease of handling. In contrast, the static features on a reticle cannot faultlessly simulate a real measurement on a moving particle system. The difference becomes visible in the form of speckles superimposed on the diffraction pattern and is dependent on the positions of the features on the reticle. As long as the feature positions are random, the speckles are also randomly distributed over the pattern and the measurement data averaging the intensities over the detector ring areas are only slightly disturbed. However, reticles containing only non-overlapping features contravene the requirement of complete feature position randomness and their diffraction patterns show a dark ring close to the center. The normal evaluation of these diffraction patterns delivers size distributions which are too narrow and shifted to smaller particle sizes. Nevertheless, by defining a reticle specific phase function and by implementing it in the evaluation algorithm, the correct particle size distribution is obtained. Simulations have been performed to investigate reticles with and without overlapping features.     

一种锗晶体光码盘的分划制作工艺研究

为了在锗晶体光坯上制作出满足要求的码盘图案,分别采用正性光刻胶和负性光刻胶,先镀膜后照相和先照相后镀膜的工艺路线进行工艺实验,并对实验结果进行分析,得出结论:用负性光刻胶按先照相后镀膜的工艺路线为锗晶体光码盘分划制作工艺的最佳方案。实验结果表明:加工出的图案明暗对比度大、边缘不均匀性小于0.008 mm,可实际应用于锗晶体上分划图案的制作。     

基于数字图像处理方法的焦距测量技术研究

介绍了基于数字图像处理方法测量透镜焦距的玻罗板分划线快速自动甄别法。该图像处理方法鲁棒性好,采用Canny法进行分划线边缘检测。用重心法计算所有线条的重心,从重心往两边搜索线条,判断选取间隔大的刻划线对,可以提高测量精度。实验数据表明该方法的相对测量不确定度能达到8.5×10-4。为实现以数字图象处理为基础的焦距客观测量提供了一种可行的技术途径。     

介绍一种新型的金属箔分划板

目前在国外流行的新型金属箔分划板采用腐蚀法或光电成型法制成,用于替代枪用瞄准镜、望远镜和显微镜中的十字线光学分划板,具有制作容易、成本低、重量轻等多种优点。     

金属照相复制工艺

重点介绍用于玻璃基体光学元件(如高精度分划板、度盘等)和金属基体分划件(如外用的度盘、游标、刻尺等)的金属照相复制工艺。     

Matrix Projection Exposure Using an Analogue Liquid Crystal Display Panel in Place of a Reticle

The most serious problems for the matrix projection exposure using a liquid crystal display (LCD) panel in place of a reticle are largely solved by a new breakthrough method. LCD matrix exposure is effective for small volume productions of print circuits, screen masks, micromachine parts, and other items. Since no reticles are needed, all reticle costs are saved, and turnaround times required for changing the patterns are greatly shortened. However, in the conventional method, pattern widths and positions were strictly restricted depending on the geometric size and pitch of the liquid crystal cells. In this paper, a new concept appointing the cell brightness grades continuously using an analogue interface LCD panel is proposed. Calculating the image intensity distributions for various appointments of cell brightness balances to print same wide patterns, it is clarified that the pattern widths and positions are not much different if the pattern widths are wider than 2 cell pitches of the LCD panel. Maximum width and position variations are less than ± 10% even when the patterns are printed at arbitrary positions, of course including halfway ones. The calculated results are proved by experiments using an analogue LCD panel with a cell pitch of 15 μm. Though the cell size are 13 × 10 μm², and different in x and y directions, almost same wide line-and-space patterns are successfully printed at all positions by only one exposure. It is not necessary to shift the reticle for overlapping exposures to print smooth patterns. Oblique patterns and complicated Chinese character patterns are also printed at arbitrary positions. The new breakthrough technology will make the LCD matrix exposure promising for wide uses of printing various rough patterns easily at small costs.     

Localisation laterale d'une frange d'interferences a deux ondes a l'aide d'un reticule a profil sinusoidal

The localization of a two-waves interference fringe is studied when a reticle with a sinusoidal profile is sweeping alternately in the plane of the object or of its image. The best accuracy conditions are discussed in terms of the various process variables. It is shown that the accuracy is better than the accuracy obtained when the fringe is sweeping by a slit.     

基于高速CCD成像的动态变形检测方法

针对测量设备和载体平台需要进行动态基准传递的问题,介绍了利用高速CCD进行成像的变形检测方法,将载体的变形转换为分划板图像上的平移和旋转大小,进行三维的姿态解算。仿真结果和实际成像检测试验表明,在载体角度变形≤±10′的条件下,其横摇、纵倾方向检测精度可达2.8″,偏航方向检测精度可在1′以内。