容性耦合射频氩等离子体放电诊断研究及仿真模拟

针对中等气压、中等功率下射频容性耦合(CCRF)等离子体的放电特性,采用基于流体模型的COMSOL软件仿真,建立一维等离子体放电模型,以Ar为工作气体,研究同一气压时不同射频输入功率下等离子体电子温度和电子密度的分布规律。同时依据仿真模型设计制作相同尺寸的密闭玻璃腔体和平板电极,实验测量了不同射频输入功率时放电等离子体的有效电流电压及发射光谱,进而计算等离子体的电子温度及电子密度;利用玻耳兹曼双线测温法,得到光谱法下等离子体的电子温度及电子密度。结果表明：当气体压强为250 Pa、输入功率为100~450 W时,等离子体电压电流呈线性关系,电子密度随功率的增大而增大,而电子温度并未随功率的变化而有明显变化,其与功率无关。运用仿真模拟验证了实验的准确性,通过比较,三种方法所得的结果相近。通过结合等效回路法、光谱法和数值模拟仿真法初步诊断出中等气压下等离子体的放电参数,提出了结合三种方法作为实验研究的方法,使实验结果更具说服力,证明其方法的可靠性,也为进一步的等离子体特性研究提供依据。     

Simulation of nanoparticle coagulation in radio-frequency capacitively coupled C_2H_2 discharges

A self-consistent fluid model is employed to investigate the coagulation stage of nanoparticle formation, growth,charging, and transport in a radio-frequency capacitively coupled parallel-plate acetylene(C2H2) discharge. In our simulation, the distribution of neutral species across the electrode gap is determined by mass continuity, momentum balance, and energy balance equations. Since a thermal gradient in the gas temperature induced by the flow of the neutral gas, a careful study of the thermophoretic force on the spatial distribution of the nanoparticle density profiles is indispensable. In the present paper, we mainly focus on the influences of the gas flow rate, voltage, and gas pressure on the spatial distribution of the nanoparticle density. It appears that the resulting density profile of the 10-nm particles experiences a significant shift towards the upper showerhead electrode once the neutral equations are applied, and a serious shift is observed when increasing the gas flow rate. Thus, the flow of neutral gas can strongly influence the spatial distribution of the particles in the plasma.     

13.56 MHz/2 MHz柱状感性耦合等离子体参数的对比研究

通过Langmuir双探针和发射光谱诊断方法,对比研究了驱动频率为13.56 MHz和2 MHz柱状感性耦合等离子体中电子密度和电子温度的径向分布规律.结果表明:在高频和低频放电中,输入功率的增加对等离子体参数产生了不同的影响,高频放电中主要提升了电子密度,低频放电中则主要提升了电子温度.固定气压为10 Pa,分别由高频和低频驱动时,电子密度的径向分布均为"凸型".而电子温度的分布差异比较明显,高频驱动时,电子温度在腔室中心较为平坦,在边缘略有上升;低频驱动时,电子温度随径向距离的增加而逐渐下降.为了进一步分析造成这种差异的原因,在相同放电条件下采集了氩等离子体的发射光谱图,利用分支比法计算了亚稳态粒子的数密度,发现电子温度的径向分布始终与亚稳态粒子的径向分布相反.继续升高气压到100 Pa,发现不论高频还是低频放电,电子密度的径向分布均从"凸型"转变为"马鞍形",较低气压时电子密度的均匀性有了一定的提升,但低频的均匀性更好.     

甚高频激发容性耦合氩等离子体的电子能量分布函数的演变

甚高频激发的容性耦合等离子体由于离子通量和能量的相对独立可控而受到人们的关注. 本文采用朗缪尔探针诊断技术测量了40.68 MHz激发的容性耦合Ar等离子体的特性(如电子能量概率分布、电子温度和密度等)随宏观参量的演变情况. 实验结果表明, 电子能量概率分布随着气压的增加从双麦克斯韦分布逐步转变为单麦克斯韦分布并最终演变为Druyvesteyn分布, 而射频激发功率的增加促进了低能电子布居数的增强; 在从等离子体放电中心移向边界的过程中, 低能电子的布居数显著下降, 而高能电子的布居则有所上升; 放电极板间距的变化直接导致了等离子体中电子加热模式的转变. 另外, 我们也对等离子体中的高低能电子密度和温度的分配情况进行了讨论.     

Increased Power Concentration and its Effects on the Discharge Parameters of the Low Pressure Hg-rare Gas Positive Column. II. Variation of Tube Radius

The reduction of the tube radius is an effective technique for enhancing power concentration. The increased wall losses are compensated by larger field strengths, which counteract the decrease in radiation efficiency with rising current density. The causal relationships are investigated for tube radii of 18-4 mm at constant discharge current i = 200 mA and constant current density j = 1.2 mA/mm² and for parameter variation of the field strength only. The measured efficiencies of the Hg-resonance lines 254 and 185 nm and the electron energy distribution functions agree well with the calculated values. Moreover, the results of the model calculations provide information on the elementary processes involved, such as elastic losses, collisions of second kind, stepwise processes and Coulomb interaction. The results show that Hg-rare gas discharge with tube radii R = 5–10 mm are no less suitable for light production than those with radii between 13 and 18 mm.     

BEHAVIOR OF Ar PLASMA FORMED IN A HIGH DENSITY PLASMA SOURCE-AN ECR REACTOR

In order to develop the ultra-large scale integration(ULSI), low pressure and high density plasma apparatus are required for etching and deposit of thin films. To understand critical parameters such as the pressure, temperature, electrostatic potential and energy distribution of ions impacting on the wafer, it is necessary to understand how these parameters are influenced by the power input and neutral gas pressure. In the present work, a 2-D hybrid electron fluid-particle ion model has been developed to simulate one of the high density plasma sources-an Electron Cyclotron Resonance (ECR) plasma system with various pressures and power inputs in a non-uniform magnetic field. By means of numerical simulation, the energy distributions of argon ion impacting on the wafer are obtained and the plasma density, electron temperature and plasma electrostatic potential are plotted in 3-D. It is concluded that the plasma density depends mainly on both the power input and neutral gas pressure. However, the plasma potential and electron temperature can hardly be affected by the power input, they seem to be primarily dependent on the neutral gas pressure. The comparison shows that the simulation results are qualitatively in good agreement with the experiment measurements.     

Modeling of electron cyclotron resonance discharges

A simple model to predict the spatially-averaged plasma characteristics of electron cyclotron resonance (ECR) reactors is presented. The model consists of global conservation equations for species concentration, electron density and energy. A gas energy balance is used to predict the neutral temperature self-consistently. The model is demonstrated for an ECR argon discharge. The predicted behavior of the discharge as a function of system variables agrees well with experimental observations     

Distribution function of electrons and kinetic coefficients in cesium-argon mixture discharge

The distribution function of electrons in a cesium-argon mixture discharge is found in the present paper by solving Boltzmann's equation. The elastic and inelastic electron-atom collisions and electron-electron collisions are taken into consideration.The influence of the addition of cesium vapours to argon on the quantities characterizing the discharge plasma is explained. From the electron distribution function are calculated: the drift velocity, the mean energy, the ratio of the diffusion and mobility coefficients and the electron energy losses for individual elementary processes as functions of the electric field and the concentration of the neutral gas components.     

A Model for the Bulk Plasma in an RF Chlorne Discharge

A model has been constructed to describe the electrical characteristics of the central bulk plasma region in a 13.56-MHz parallel-plate discharge in chlorine at pressures of about 1 torr. This region is modeled as a volume-controlled plasma with the electron balance dominated by single-step electron-impact ionization and attachment and with the electron energy distribution function in equilibrium with the local instantaneous electric field. Relationships between the ionization frequency, the attachment frequency, the electron drift velocity, and the electric field are provided by solutions of the Boltzmann equation for mixtures of Cl2 and Cl which result from Cl2 dissociation. From a measured current waveform and Cl2/Cl density ratio, the model generates the local electric-field waveform, the time-varying electron density, and the power density in the central portion of the bulk plasma. The calculated time-averaged power input per unit discharge length compares well with experimentally determined values.     

Generation of uniform atmospheric pressure argon glow plasma by dielectric barrier discharge

In this paper, atmospheric pressure glow discharges (APGD) in argon generated in parallel plate dielectric barrier discharge system is investigated by means of electrical and optical measurements. Using a high voltage (0–20 kV) power supply operating at 10–30 kHz, homogeneous and steady APGD has been observed between the electrodes with gap spacing from 0.5 mm to 2 mm and with a dielectric barrier of thickness 2 mm while argon gas is fed at a controlled flow rate of 1 l/min. The electron temperature and electron density of the plasma are determined by means of optical emission spectroscopy. Our results show that the electron density of the discharge obtained is of the order of 10¹⁶ cm^???3 while the electron temperature is estimated to be 0.65 eV. The important result is that electron density determined from the line intensity ratio method and stark broadening method are in very good agreement. The Lissajous figure is used to estimate the energy deposited to the glow discharge. It is found that the energy deposited to the discharge is in the range of 20 to 25 μJ with a discharge voltage of 1.85 kV. The energy deposited to the discharge is observed to be higher at smaller gas spacing. The glow discharge plasma is tested to be effective in reducing the hydrophobicity of polyethylene film significantly.     

高功率微波沿面闪络击穿机制粒子模拟

针对高功率微波介质沿面闪络击穿物理过程,首先建立了理论模型,包括：动力学方程、粒子模拟算法、二次电子发射, 以及电子与气体分子蒙特卡罗碰撞模型、电子碰撞介质表面退吸附气体分子机制;其次,基于理论模型,编制了1D3V PIC-MCC程序,分别针对真空二次电子倍增、高气压体电离击穿和低气压面电离击穿过程,运用该程序仔细研究了电子和离子随时间演化关系、电子运动轨迹、电子及离子密度分布、空间电荷场时空分布、电子平均能量、碰撞电子平均能量、碰撞电子数目随时间演化关系、电子能量分布函数、平均二次电子发射率以及能量转换关系。研究结果表明：真空二次电子倍增引发的介质表面沉积功率只能达到入射微波功率1%左右的水平,不足以击穿;气体碰撞电离主导的高气压体电离击穿,是由低能电子（eV量级）数目指数增长到一定程度导致的,形成位置远离介质表面,形成时间为s量级;低气压下的介质沿面闪络击穿,是在二次电子倍增和气体碰撞电离共同作用下,由于数目持续增长的高能电子（keV量级）碰撞介质沿面导致沉积功率激增而引发的,形成位置贴近介质沿面,形成时间在ns量级。     

高功率微波沿面闪络击穿机制粒子模拟

针对高功率微波介质沿面闪络击穿物理过程,首先建立了理论模型,包括:动力学方程、粒子模拟算法、二次电子发射, 以及电子与气体分子蒙特卡罗碰撞模型、电子碰撞介质表面退吸附气体分子机制;其次,基于理论模型,编制了1D3V PIC-MCC程序,分别针对真空二次电子倍增、高气压体电离击穿和低气压面电离击穿过程,运用该程序仔细研究了电子和离子随时间演化关系、电子运动轨迹、电子及离子密度分布、空间电荷场时空分布、电子平均能量、碰撞电子平均能量、碰撞电子数目随时间演化关系、电子能量分布函数、平均二次电子发射率以及能量转换关系。研究结果表明:真空二次电子倍增引发的介质表面沉积功率只能达到入射微波功率1%左右的水平,不足以击穿;气体碰撞电离主导的高气压体电离击穿,是由低能电子（eV量级）数目指数增长到一定程度导致的,形成位置远离介质表面,形成时间为s量级;低气压下的介质沿面闪络击穿,是在二次电子倍增和气体碰撞电离共同作用下,由于数目持续增长的高能电子（keV量级）碰撞介质沿面导致沉积功率激增而引发的,形成位置贴近介质沿面,形成时间在ns量级。     

Effect of Parallel-Plate Geometry on Mode Transition Behavior in Argon Microplasmas: Two-Dimensional Simulation

A two-dimensional self-consistent fluid model is employed to investigate radio-frequency process parameters on the plasma properties in Ar microdischarges. The neutral gas density and temperature balance equations are taken into account. We mainly investigate the effect of the electrode gap on the spatial distribution of the electron density and electron temperature profiles, due to a mode transition from the regime(secondary electrons emission is responsible for the significant ionization) to the regime(sheath oscillations and bulk electrons are responsible for sustaining discharge) induced by a sudden decrease of electron density and electron temperature.The pressure, radio-frequency sources frequency and voltage effects on the electron density are also elaborately investigated.     

Investigation of the glow and contracted discharge plasmas in nitrogen by coherent anti-Stokes Raman spectroscopy,optical interferometry,and numerical simulation

The translational temperature in the plasma of glow and contracted discharges is measured using the methods of coherent anti-Stokes Raman spectroscopy and optical interferometry. The current density in the discharge is determined by measuring the electron concentration with optical interferometry and emission spectroscopy. The distribution of nitrogen molecules over vibrational and rotational levels in the ground state, the electron energy distribution, and the time dependence of the gas temperature are numerically found based on a model including the homogeneous Boltzmann equation and balance equations for the concentrations of charged and excited particles and for the gas temperature. The dynamics of transition to the quasi-steady-state distribution of nitrogen molecules over vibrational levels is studied.     

Inreased Power Concentration and its Effect on the Discharge Parameters on the Low Pressure Hg-Rare Gas Positive Column III. Effects of an Axial Rod

After the investigation of the influence of current and tube radius on the power concentration of the Hg-rare gas discharge in the two previous parts, part III deals with the corresponding effects of additional recombination surfaces. The plasma parameters (radiant flux of the resonance lines, field strength, electron density, electron energy distribution function) are measured in a discharge tube with an axial glass rod. With increasing rod diameter and increasing distance from the tube axis radial radiation intensity distribution becomes asymmetric. The field strength increases with the radius of the rod. The dependence of the field strength and that of the radiant flux on the parameters of the discharge do not basically change. The measured UV-radiation efficiency of the positive column is higher than that of discharges without axial rod for equal tube radius. This is attributed primarily to the changed radial electron density distribution and its effect on the collision processes.     

X-Ray Measurements during Whistler-Mode Electron Cyclotron Resonance Plasma Startup and Heating in an Axisymmetric Magnetic Mirror

New measurements and analyses of whistler-mode electron cyclotron resonant heating (ECRH) startup and heating in an axisymmetric magnetic mirror are presented. Experimental studies of startup are presented which include the effects of initial neutral gas pressure on density and energy buildup rates, the effects of electron-beam-generated seed plasma on startup times, and a possible density threshold for the absolute whistler instability. Results of two types of analyses are presented. The first is a Fokker-Planck finite-element simulation the principal result of which is the prediction of the creation of a sloshing electron velocity distribution in the first 10 ?s after microwave power is applied. The second simulation uses rate equations to predict buildup, with rate coefficients based on a model sloshing-electron distribution function. Both results are consistent with experimental observations. Measurements of X-ray emission provided information about plasma transport, the sloshing electron spatial distribution, and the hot-electron average energy. The foil ratio technique gave average energies of 1-3 keV during whistler-mode ECRH, in agreement with afterglow measurements of hot electron decay. Possible applications of whistler-mode ECRH plasma production and heating are for plasma soft X-ray sources and plasma potential modification in tandem mirror machines.     

Detailed comparison between probe density measurements of glow discharge in argon and in helium

In this article we shall look a bit more closely at some of the fundamental plasma parameters obtained by a cylindrical Langmuir probe within low-pressure electrical gas discharge plasma. The presented measurements were made in argon and in helium glow discharge plasmas. We are mainly concerned with the densities of the charged particles (electrons and ions) within the plasma and the effect of the discharge conditions upon them. The electron density is calculated from the electron current at the space potential and from the integration over the EEDF. The ion density is calculated by using the OML collisionless theory. The parameterization of Laframboise's numerical results is also used for the ion density calculation. In the range of our experimental conditions the results of plasma density, for both gases, tend to show that the ion densities measured with the OML and Laframboise theories exceeds the measured electron densities. The results also show that the plasma electron and ion densities increased with both discharge power and gas pressure.     

Ladungsträgerdichte,Neutralgasdichte, elektrisches Potential und Elektronentemperatur in der zylindrischen Diffusionssäule unter Berücksichtigung des Elektronendruckes

The profiles of charged particle density, neutral gas density, charged particle generation and the electron temperature itself are calculated in the cylindrical positive column under diffusion conditions. The electron pressure is taken into account. The nonlinear differential equations for the charged particle density and the neutral gas density are solved by means of relatively well konverging power series. Inside the column the neutral gas partial pressure decreases with increasing electron partial pressure. Thereby, the profiles for charged particle density and electrical potential are flattened near the axis and fall more rapidly near the wall, and the electron temperature increases. The electron pressure increases with rising electric power input into the column. The necessary condition for the existence of a steady-state low pressure discharge with high current densities is investigated shortly.     

Characterization of a RF/dc-magnetron discharge for the sputter deposition of transparent and highly conductive ITO films

A RF-superimposed dc-magnetron sputter process for coating color filter materials with transparent and conducting ITO films was investigated. In this process, the sputtering cathode is excited simultaneously by dc- and RF-power (at 13.56 MHz). This work summarises the measured properties of the gas discharge. Some basic data of the deposited ITO films are given, also. The dependence of the RF portion of the total sputtering power on the discharge voltage has been monitored for different values of total power and process pressure. The ion energy distribution function of the positively charged ions approaching the substrate surface has been measured using a retarding field plasma analyser probe. It was shown that the mean energy of the ions increases with increasing RF portion of the total power. The electron temperature in the body region of the gas discharge has been derived from measurements of the optical emission of the excited species. Received: 3 November 1998 / Accepted: 8 March 1999 / Published online: 14 July 1999