The chemisorption of sulphur on W(100)

The interaction of sulphur vapour with a W(100) surface is studied in detail with Auger Electron Spectroscopy (AES), LEED, work function difference (Δ?) measurements and thermal desorption spectroscopy (TDS). The dissociative adsorption of S occurs on the W surface without reconstruction. Several LEED structures are observed which indicate repulsive adatom interactions. TDS shows that the desorption energy of atomic S decreases from about 8 eV at θ = 0.1 ML to about 3 eV near saturation in close vicinity of 1 ML. Above $\text{θ =}\text{3}\text{4}$ ML, S₂ desorbs in addition to S in a high temperature peak which saturates at about 1 ML. Sulphur in excess of about 1 ML is desorbed in two low temperature peaks of which the lower one consists not only of S and S₂ but also of S₃ and S₄.     

Chemisorption of CO on differently prepared Cu(111) surfaces

The adsorption of CO on Cu(111) has been studied by Auger electron spectroscopy (AES), low energy electron diffraction (LEED), electron energy loss spectroscopy (EELS), work function measurements and thermal desorption spectroscopy. Two LEED overlayers of CO on Cu(111) have been found: $\text{√3 × √3}\text{R}\text{30°}$ and $\text{√}\text{7}\text{3}\text{× √}\text{7}\text{3}\text{R}\text{49.1°}$. Two different heats of adsorption were derived from thermal desorption spectra: 44.2 and 35.1 kj/mole. The isosteric heat of adsorption evaluated from work function measurements corresponds to the thermal desorption results. Energy losses due to CO adsorption have been found by means of EELS at 4.7, 7.7, and 13.8 eV.     

Site-selective adsorption of xenon on a stepped Ru(0001) surface

The adsorption of xenon has been studied with UV photoemission (UPS), flash desorption (TDS) and work function measurements on differently conditioned Ru(0001) surfaces at 100 K and at pressures up to 3 × 10^?5 Torr. Low energy electron diffraction (LEED) and Auger electron spectroscopy (AES) served to ascertain the surface perfectness. On a perfect Ru(0001) surface only one Xe adsorption state is observed, which is characterized by$\text{Xe}\text{5}\text{p}{}_{\mathrm{<mtext>3</mtext><mtext>2</mtext>}}$,$\text{1}\text{2}$ electron binding energies of 5.40 and 6.65 eV, an adsorption energy of E_ad≈ 5 kcal/mole and dipole moment of μ'_T ≈ 0.25 D. On a stepped-kinked Ru(0001) surface, the terrace-width, the step-height and step-orientation of which are well characterized with LEED, however, two coexisting xenon adsorption states are distinguishable by an unprecedented separation in$\text{Xe}\text{5}\text{p}{}_{\mathrm{<mtext>3</mtext><mtext>2</mtext>}}$,$\text{1}\text{2}$ electron binding energies of 800 meV, by their different UPS intensities and line shapes, by their difference in adsorption energy ofΔE_ad ≈ 3 kcal/mole and finally by their strongly deviating dipole moments of μ_S = 1.0 D and μ_T = 0.34 D. The two xenon states (which are also observed on a slightly sputtered surface) are identified as corresponding to xenon atoms being adsorbed at step and terrace sites, respectively. Their relative concentrations as deduced from the UPS intensities quantitatively correlate with the abundance of step and terrace sites of the ideal TLK surface structure model as derived from LEED. Furthermore, ledge-sites and kink-sites are distinguishable via E_ad. The E_ad heterogeneity on the stepped-kinked Ru(0001) surface is interpreted in terms of different coordination and/or different charge-transfer-bonding at the various surface sites. The enormous increase in Xe 5p electron binding energy of 0.8 eV for Xe atoms at step sites is interpreted as a pure surface dipole potential shift. —The observed effects suggest selective xenon adsorption as a tool for local surface structure determination.     

Structure and electronic properties of cleaved Si(111) upon Ge adsorption

The effect of ultrahigh vacuum deposition of Ge below and at monolayer coverage onto clean cleaved Si(111) surface held at room temperature is studied by low energy electron diffraction, Auger electron specroscopy and photoemission yield spectroscopy. A well ordered $\text{3}\text{×}\text{3}$ R 30° structure developes at $\text{1}\text{3}$ ML, where it replaces the 2 × 1 initial pattern; it persists at $\text{2}\text{3}$ ML before transforming into a 1 × 1 diagram which fades into increasing background at 1 ML and up. Si surface dangling bonds are replaced at $\text{1}\text{3}$ ML by states associated with Ge-Si bonds and Ge dangling bonds to which states due to Ge-Ge bonds added upon increasing coverage.     

Oxygen adsorption on Ge(111) surface: I. Atomic clean surface

Oxygen adsorption on a clean Ge(111) surface has been studied in the temperature range 300–560 K by means of Auger electron spectroscopy (AES), thermal desorption (TD), work function (WF) measurements, and electron energy loss spectroscopy (ELS). The adsorption and WF kinetics at 300 K exhibit a shape different from those observed at higher adsorption temperatures. At 300 K oxygen only removes the empty dangling bond surface state, whereas at higher temperature new loss transitions involving chemically shifted Ge 3d core levels appear. The findings imply that at 300 K only a chemisorption oxygen state exists on the Ge(111) surface whereas the formation of an oxide phase requires higher temperatures. The shapes of the TD curves show that the desorption of GeO follows $\text{1}\text{2}$ order desorption kinetics.     

The adsorption of benzene and naphthalene on the Rh(111) surface: A LEED,AES and TDS study

The adsorption of benzene and naphthalene on the Rh(111) single-crystal surface has been studied by low-energy electron diffraction (LEED), Auger electron spectroscopy (AES) and thermal desorption spectroscopy (TDS). Both benzene and naphthalene form two different ordered surface structures separated by temperature-induced phase transitions: benzene transforms from a ($\text{3}\text{1}\text{1}\text{3}$) structure, which can also be labelled c($\text{2}\text{3}\text{× 4}$)rect, to a (3 × 3) structure in the range of 363–395 K, while naphthalene transforms from a ($\text{3}\text{3}\text{× 3}\text{3}$)R30° structure to a (3 × 3) structure in the range 398–423 K. Increasing the temperature further, these structures are found to disorder at about 393 K for benzene and about 448 K for naphthalene. Then, a first H₂ desorption peak appears at about 413 K for benzene and 578 K for naphthalene and is interpreted as due to the occurrence of molecular dissociation. All these phase transitions are irreversible. The ordered structures are interpreted as due to flat-lying or nearly flat-lying intact molecules on the rhodium surface, and they are compared with similar structures found on other metal surfaces. Structural models and phase transition mechanisms are proposed.     

Adsorption of HCl and HBr on Si(111): AES,ELS, and EID studies

The combined techniques in situ of Auger electron spectroscopy, electron energy loss spectroscopy, electron impact desorption, and work-function change measurement have been applied to the study of the adsorption of HCl and HBr on thermally cleaned Si(111) surfaces. Major results are summarized as follows: (1) HCl shows a fast adsorption to the saturation coverage of $\text{θ}{}_{\mathrm{s}}\text{? 0.3}$ (estimated using the continuum approximation) by the exposure of about 1 L at room temperature. (2) The average sticking probabilities for HCl and HBr are ～0.7. (3) Two adsorbed states of HCl or HBr at room temperature are discriminated. For HCl, the first state is characterized by the emission of ～1.2 eV ions and the electronic transition at 8.4 eV, which is subsequently converted to the second state characterized by the emission of ～3.2 eV ions and the electronic transitions at 7.0 and 8.4 eV. Heating the sample at ～800 K causes the desorption of hydrogen and the appearance of the Cl-related peaks at 6.0, 7.0, and 9.0 eV in the loss spectra. For HBr, the first and the second states are characterizied by the emission of ～1.2 and ～3.2 eV ions, respectively. The electronic transition is observed at 7.8 eV in both states. (4) It is proposed that HCl and HBr are adsorbed as molecules initially, which are subsequently dissociated into atoms spontaneously at room temperature.     

Adsorption and desorption of oxygen on stepped tungsten surfaces

The adsorption and desorption of oxygen on stepped tungsten surfaces with orientations close to the (110) orientation and steps parallel to the most densely packed crystal direction ([111]) is studied with low energy electron diffraction, Auger electron spectroscopy, work function measurements and thermal desorption spectroscopy. With increasing deviation from the (110) orientation, an increasing preference for the formation of the p(2 × 1) domain with the densely packed direction parallel to the steps is noted. The adsorption kinetics does not differ markedly from that on the flat (110) surface, however the desorption behaviour at low coverages (θ < 0.3) is quite different. The results are interpreted in terms of the dissociation of a mobile precursor at terrace and step sites, the competition between the two domains during their growth and a step-induced premature transition to the complex structure observed on flat (110) surfaces at $\text{θ ? 8}$. The steps are believed to play also a significant role in desorption.     

The adsorption of CO,O2, and H2 on Pt(100)-(5×20)

The adsorption/desorption characteristics of CO, O₂, and H₂ on the Pt(100)-(5 × 20) surface were examined using flash desorption spectroscopy. Subsequent to adsorption at 300 K, CO desorbed from the (5×20) surface in three peaks with binding energies of 28, 31.6 and 33 kcal gmol^?1. These states formed differently from those following adsorption on the Pt(100)-(1 × 1) surface, suggesting structural effects on adsorption. Oxygen could be readily adsorbed on the (5×20) surface at temperatures above 500 K and high O₂ fluxes up to coverages of $\text{2}\text{3}$ of a monolayer with a net sticking probability to ssaturation of ? 10^?3. Oxygen adsorption reconstructed the (5 × 20) surface, and several ordered LEED patterns were observed. Upon heating, oxygen desorbed from the surface in two peaks at 676 and 709 K; the lower temperature peak exhibited atrractive lateral interactions evidenced by autocatalytic desorption kinetics. Hydrogen was also found to reconstruct the (5 × 20) surface to the (1 × 1) structure, provided adsorption was performed at 200 K. For all three species, CO, O₂, and H₂, the surface returned to the (5 × 20) structure only after the adsorbates were completely desorbed from the surface.     

Room temperature adsorption and growth of Ga and In on cleaved Si(111)

Low energy electron diffraction (LEED), Auger electron spectroscopy (AES) and photoemission yield spectroscopy (PYS) measurements have been performed on a set of ultrahigh vacuum cleaved Si(111) surfaces with different bulk dopings as a function of Ga or In coverage θ. The metal layers are obtained by evaporation on the unheated substrate and θ varies from zero to several monolayers (ML). First, the 2×1 reconstruction of the clean substrate is replaced by a $\text{3}\text{×}\text{3}$ R30° structure at $\text{1}\text{3}$ ML, meanwhile the dangling bond peak at 0.6 eV below the valence band edge E_vs is replaced by a peak at 0.1 eV for Ga or 0.3 eV for In, below E_vs. At the same time, the ionization energy decreases by 0.4 eV (Ga) or 0.6 eV (In), while the Fermi level pinning position gets closer to the valence band edge by about 0.1eV. Upon increasing θ, new LEED structures develop and the electronic properties keep on changing slightly before metallic islands start to grow beyond θ ～1 ML.     

CO chemisorption on PtCu surfaces I. CO on (1 × 3) Pt0.98Cu0.02(110)

Thermal desorption and photoemission spectroscopy (PES) have been used to investigate the chemisorption of CO on an annealed Pt_0.98Cu_0.02(110) surface. The clean surface shows 9.1 ± 2.6% Cu within the top 4 Å, and is (1 × 3) reconstructed. Thermal desorption of CO has revealed the existence of various adsorption states with these respective heats of adsorption: (α) 35.2 to 37.8 kcal/mol and (β) 24.5 to 26.3 kcal/mol on Pt sites, (γ) 16.0 to 17.2 kcal/mol on PtCu “mixed” sited, and (δ) 12.9 to 13.9 kcal/mol on Cu sites. PES observation of Cu 3d-derived states (using hv = 150 eV) and the $\text{Cu 2p}{}_{\mathrm{<mtext>3</mtext><mtext>2</mtext>}}$ core levels (using Mg Kα radiation) shows that the electronic structure of the Cu constituent is changed only when CO adsorbs on the Pt-Cu “mixed” sites or the Cu sites. Furthermore, the CO states associated with Pt sites reflect the structural difference between the (1 × 3) alloy surface and the (1 × 2) pure Pt(110) surface: α-CO on the alloy surface desorbs at a temperature 17 to 21 K. higher than the maximum desorption temperature of CO from pure Pt(110), and the ratio of β-CO to α-CO desorption from the alloy surface is larger than the ratio of low temperature to high temperature peaks in the desorption of CO from pure Pt(110).     

The surface structure of Fe3O4(1 1 1) films as studied by CO adsorption

We have studied adsorption of CO on Fe₃O₄(1 1 1) films grown on a Pt(1 1 1) substrate by temperature programmed desorption (TPD), infrared reflection absorption spectroscopy (IRAS) and high resolution electron energy loss spectroscopy (HREELS). Three adsorption states are observed, from which CO desorbs at ∼110, 180, and 230 K. CO adsorbed in these states exhibits stretching frequencies at ∼2115-2140, 2080 and 2207 cm⁻¹, respectively. The adsorption results are discussed in terms of different structural models previously reported. We suggest that the Fe₃O₄(1 1 1) surface is terminated by 1/2 ML of iron, with an outermost 1/4 ML consisting of octahedral Fe²⁺ cations situated above an 1/4 ML of tetrahedral Fe³⁺ ions, in agreement with previous theoretical calculations. The most strongly bound CO is assigned to adsorption to Fe³⁺ cations present on the step edges.     

A proposed experiment to measure surface roughness in Si/SiO2 system

The adsorption of oxygen on clean cleaved (111) silicon surfaces has been investigated by high resolution electron spectroscopy (HRES), Auger electron spectroscopy (AES) and ellipsometry. Localized vibrations ($\text{h}\text{?}\text{ω = 94}$, 130 and 175 meV) which are related to the binding state band of oxygen are identified with HRES. AES measures the concentration of adsorbed atoms basically independent of their binding state while ellipsometry refers additionally to the optical properties of the adsorbed layer. The same adsorption kinetics was found with the three methods. Oxygen therefore adsorbs in a single likely molecular state. The sticking coefficient S increases exponentially with the surface step concentration. S is also enhanced by the presence of nude ion gauges. Depending on these parameters sticking coefficients between 2 × 10^?4 and 10^?1 have been obtained. This result might contribute to an explanation of the large differences in earlier works.     

Thermal desorption of cyanogen from Pt(100)

Thermal desorption of cyanogen adsorbed on Pt(100) was studied by flash desorption mass spectrometry. By investigating the parent ion and all possible fragmentation products in the mass spectrometer during desorption it was concluded, that desorption takes place exclusively as molecular C₂N₂. Three desorption peaks were observed at 140, 410 and 480°C denoted as α, β₁ and β₂. The respective surface coverages at saturation were determined by quantitative evaluation of the flash desorption curves to be 2.0 ± 0.2 × 10¹⁴ and 5.5 ± 1.0 × 10¹⁴$\text{molecules}\text{cm}{}^2$ for the α and the β states, respectively. First order desorption kinetics was suggested by the coverage dependencé of the desorption spectra for both α and β states with desorption energies of 12 and 38–42 $\text{kcal}\text{mole}$, respectively. A large difference in the sticking probabilities of α and β states was observed with initial values of 0.06 (α) and 0.9 (β). Adsorption experiments at elevated temperatures led to the assumption, that α and β states coexist on the surface with no or very little interactions between them. The results are discussed in terms of different models for the adsorption states.     

Interaction of inert gases with a nickel (100) surface: I. Adsorption of xenon

The adsorption of Xe on a Ni(100) surface has been studied in UHV between 30 and 100 K using LEED, thermal desorption spectroscopy (TDS), work function (Δφ) measurements, and UV photoemission (UPS). At and below 80 K, Xe adsorbs readily with high initial sticking probability and via precursor state adsorption kinetics to form a partially ordered phase. This phase has a binding energy of ~5.2 kcal/mole as determined by isosteric heat measurements. The heat of adsorption is fairly constant up to medium coverages and then drops continuously as the coverage increases, indicating repulsive mutual interactions. The thermal desorption is first order with a preexponential factor of about 10¹² s^?1, indicative of completely mobile adsorption. Adsorbed Xe lowers the work function of the Ni surface by 376 mV at monolayer coverage. (This coverage is determined from LEED to be 5.65 × 10¹⁴ Xe molecules/cm^-2.) For not too high coverages, θ, Δφ(θ) can be described by the Topping model, with the initial dipole moment μ₀ = 0.29 D and the polarizability α being 3.5 × 10^?24 cm³. In photoemission, the $\text{Xe 5p}{}_{\mathrm{<mtext>3</mtext><mtext>2</mtext>}}$ and $\text{5p}{}_{\mathrm{<mtext>1</mtext><mtext>2</mtext>}}$ orbitals show up as intense peaks at 5.56 and 6.83 eV below E_f which do not shift their position as the coverage varies. Multilayer adsorption (i.e. the filling of the second and third layers) can be seen by TDS. The binding energies of these α states can be estimated to range between 4.5 and 3.5 kcal/mole. The results are compared and contrasted with previous findings of Xe adsorption on other transition metal surfaces and are discussed with respect to the nature of the inert-gas-metal adsorptive bond.     

XPS studies of adatom-adatom interactions: I/Ag(111) and I/Cu(111)

We have studied submonolayer adsorption, at room temperature, of iodine on the (111) faces of silver and copper, using LEED and XPS. In both systems the √3 × √3 LEED pattern appears at ～0.2 monolayer (ML) coverage; no other superlattice pattern was observed. The $\text{I}\text{4}\text{d}{}_{\mathrm{<mtext>5</mtext><mtext>2</mtext>}}$ core electron binding energy in both cases decreases by ～0.15 eV between very dilute coverage and 0.33 ML. The leveling-off of the binding energy for I/Ag(111) for coverages >0.2 ML is shown to be a unique experimental manifestation of an indirect, substrate-mediated adatom-adatom interaction, an attraction of several meV between next-nearest neighbor iodine atoms. The more nearly linear decrease in the I binding energy on Cu(111) is shown to imply a significantly weaker next-nearest neighbor interaction on this surface. The appearance of the √3 × √3 LEED pattern at low coverages on Cu is shown to be consistent with short-range order produced merely by a size effect, that is, by nearest neighbor exclusion. These conclusions are reached with the help of Monte Carlo calculations of a triangular lattice gas.     

Electron stimulated desorption study of oxygen adsorption on tungsten: Evidence for order—disorder transition

The adsorption of oxygen on a polycrystalline tungsten surface at ~300 K has been studied by means of electron stimulated desorption (ESD) Although precision gas dosing was not employed, the initial sticking probability for dissociative adsorption appears to be essentially unity, while the variation with coverage suggests that a high degree of order exists and that precursor state kinetics are significant. A most noticeable and reproducible discontinuity in ESD parameters occurs at a fractional coverage θ ~ 0.8 (exposure ~ 1.4 × 10¹⁵$\text{molecules}\text{cm}{}^2$ incident) which is interpreted as an order-disorder transition within a single (β₁) chemisorption state, and results in an increase in the ionic desorption cross-section by a factor of ~ 1.26. A discussion of the adsorption kinetics and the disorder transition is given in terms of current models of dissociative adsorption which include the effects of nearest neighbour lateral interactions.     

The properties of K and coadsorbed CO + K on Ru(001): I. Adsorption,desorption, and structure

An extensive photoemission and LEED study of K and CO+K on Ru(001) has been carried out. In this paper the LEED and some XPS results together with TPD and HREELS data are presented in terms of adsorption, desorption. and structural properties, and their compatibility is discussed. Potassium forms (2 × 2) and $\text{(}\text{3}\text{×}\text{3}\text{)R30°}$ overlayers below and near monolayer coverage, and multilayer bonding and desorption is similar to that of bulk K. The initial sticking coefficients for CO adsorption on K predosed surfaces are correlated with the initial K structure, and s₀ and CO saturation coverages decrease with increasing K coverage. Two well-characterized mixed CO+K layers have been found which are correlated with predosed (2 × 2) K and $\text{(}\text{3}\text{×}\text{3}\text{)R30°}\text{K}$. They have CO to K ratios of 3:2 and 1:1, and lead to LEED patterns with (2 × 2) and (3 × 3) symmetry, respectively. The molecule is believed to be sp² rehybridized under the influence of coadsorbed K, leading to stronger CO-Ru and weaker C-O bonds as indicated by the TPD and HREELS results, and to stand upright in essentially twofold bridges.     

Chemical shifts in auger electron spectra from silicon in silicon nitride

The chemisorption of nitric oxide on (110) nickel has been investigated by Auger electron spectroscopy, LEED and thermal desorption. The NO adsorbed irreversibly at 300 K and a faint (2 × 3) structure was observed. At 500 K this pattern intensified, the nitrogen Auger signal increased and the oxygen signal decreased. This is interpreted as the dissociation of NO which had been bound via nitrogen to the surface. By measuring the rate of the decomposition as a function of temperature the dissociation energy is calculated at 125 kJ mol^?1. At ～860 K nitrogen desorbs. The rate of this desorption has been measured by AES and by quantitative thermal desorption. It is shown that the desorption of N₂ is first order and that the binding energy is 213 kJ mol^?1. The small increase in desorption temperature with increasing coverage is interpreted as due to an attractive interaction between adsorbed molecules of ～14 kJ mol^?1 for a monolayer. The (2 × 3) LEED pattern which persists from 500–800 K is shown to be associated with nitrogen only. The same pattern is obtained on a carbon contaminated crystal from which oxygen has desorbed as CO and CO₂. The (2 × 3) pattern has spots split along the (0.1) direction as $\text{(m,}\text{n}\text{3}\text{)}$ and $\text{(}\text{m}\text{2, n}\text{)}$. This is interpreted as domains of (2 × 3) structures separated by boundaries which give phase differences of $\text{2π}\text{3}$ and π. The split spots coalesce as the nitrogen starts to desorb. A (2 × 1) pattern due to adsorbed oxygen was then observed to 1100 K when the oxygen dissolved in the crystal leaving the nickel (110) pattern.