负电子亲和势光电阴极量子效率公式的修正

量子效率是表征负电子亲和势（NEA）光电阴极发射性能的最重要的特性参数,准确建立量子效率公式为揭示各个阴极参量对整体性能的影响以及NEA光电阴极的优化设计提供了重要的理论指导.在对NEA光电阴极体内及表面光电发射过程的分析基础上,考虑入射光子能量、表面能带弯曲区以及表面势垒对电子发射的影响,对表面逸出概率和电子衰减长度进行了修正,并利用积分法推导了NEA光电阴极的量子效率公式,其理论预测曲线与实验曲线基本一致,从而验证了修正公式的实用性.为NEA光电阴极的研究提供了有效的理论参考依据. 关键词： 负电子亲和势光电阴极 量子效率 能带弯曲区 衰减长度     

The optimal thickness of a transmission-mode GaN photocathode

A 150-nm-thick GaN photocathode with a Mg doping concentration of 1.6×1017cm-3 is activated by Cs/O in an ultrahigh vacuum chamber,and a quantum efficiency(QE) curve of the negative electron affinity transmission-mode(t-mode) of the GaN photocathode is obtained.The maximum QE reaches 13.0% at 290 nm.According to the t-mode QE equation solved from the diffusion equation,the QE curve is fitted.From the fitting results,the electron escape probability is 0.32,the back-interface recombination velocity is 5×104 cm·s-1,and the electron diffusion length is 116 nm.Based on these parameters,the influence of GaN thickness on t-mode QE is simulated.The simulation shows that the optimal thickness of GaN is 90 nm,which is better than the 150-nm GaN.     

The optimal thickness of transmission-mode GaN photocathode

A 150-nm-thick GaN photocathode with an Mg doping concentration of 1.6× 10¹⁷cm^-3 is activated by Cs/O in ultrahigh vacuum chamber, and quantum efficiency (QE) curve of negative electron affinity transmission-mode (t-mode) GaN photocathode is obtained. The maximum QE reaches 13.0% at 290 nm. According to the t-mode QE equation solved from the diffusion equation, the QE curve is fitted. From the fitting results, the electron escape probability is 0.32, the back-interface recombination velocity is 5× 10⁴ cm·s^-1, and the electron diffusion length is 116 nm. Based on these parameters, the influence of GaN thickness on t-mode QE is simulated. The simulation shows that the optimal thickness of GaN is 90 nm, which is better than the 150-nm GaN.     

Equivalent Method of Solving Quantum Efficiency of Reflection-Mode Exponential Doping GaAs Photocathode

The mathematical expression of the electron diffusion and drift length LDE of exponential doping photocathode is deduced. In the quantum efficiency equation of the reflection-mode uniform doping cathode, substituting LDE for LD, the equivalent quantum efficiency equation of the reflection-mode exponential doping cathode is obtained. By using the equivalent equation, theoretical simulation and experimental analysis shows that the equivalent index formula and formula-doped cathode quantum efficiency results in line. The equivalent equation avoids complicated calculation, thereby simplifies the process of solving the quantum efficiency of exponential doping photocathode.     

GaAs光阴极量子效率分布测量

基于负电子亲和势GaAs光阴极直流高压注入器,设计并搭建了国内首套光阴极量子效率分布测量系统。该系统利用单透镜实现逐点扫描,并采用LabVIEW进行控制和数据读写。实验表明,该系统单点采样时间小于2.3s,分辨率优于0.32mm。初步测量了GaAs阴极的量子效率分布,观察到量子效率分布及其衰减的不均匀性,量子效率较高区域的衰减速率更低。     

Preliminary Systematic Study of the Temperature Effect on the K—Cs—Sb Photocathode Performance Based on the K and Cs Co-Evaporation

It is very important to increase the quantum efficiency(QE)and prolong the lifetime of the photocathode in a variety of applications.We have succeeded in preparing a high QE cesium potassium antimonide(K-Cs-Sb)photocathode by K and Cs co-evaporation in the photocathode preparation facility.In order to better understand the effect of the substrate(photocathode)temperature on the photocathode performance,the photocathode preparation,photocathode performance degradation,photocathode performance recovery and photocathode removal are studied in detail.     

GaN真空面电子源光电发射机理研究

采用Cs源持续、O源断续的交替方法成功激活了GaN光电阴极,原位测试了透射模式下的光谱响应曲线,获得了透射模式下高达13%的量子效率.从一维定态薛定谔方程入手,得到了GaN真空面电子源材料的电子透射系数的表达式.对于一定形状的阴极表面势垒,电子透射系数决定于入射电子能量、表面势垒的高度和宽度.根据具有负电子亲和势(NEA)特性的透射式GaN光电阴极的能带及Cs,O覆盖过程中阴极表面势垒的变化情况,结合双偶极层[CaN(Mg):Cs]:O-Cs表面模型,分析了GaN真空面电子源材料NEA特性的形成原因.研究表明:Cs,O激活过程中形成的双偶极层对电子逸出起促进作用,双偶极层的形成是材料表面真空能级下降的原因. 关键词： GaN 电子源 透射系数 双偶极层     

Comparison of the photoemission behaviour between negative electron affinity GaAs and GaN photocathodes

In view of the important application of GaAs and GaN photocathodes in electron sources, differences in photoemission behaviour, namely the activation process and quantum yield decay, between the two typical types of III-V compound photocathodes have been investigated using a multi-information measurement system. The activation experiment shows that a surface negative electron affinity state for the GaAs photocathode can be achieved by the necessary Cs-O two-step activation and by Cs activation alone for the GaN photocathode. In addition, a quantum yield decay experiment shows that the GaN photocathode exhibits better stability and a longer lifetime in a demountable vacuum system than the GaAs photocathode. The results mean that GaN photocathodes are more promising candidates for electron source emitter use in comparison with GaAs photocathodes.     

光学共振增强的表面铯激活银纳米结构光阴极

金属光阴极因其超短脉冲发射和运行寿命长的特性从而具有重要应用价值,但是较高的功函数和较强的电子散射使其需要采用高能量紫外光子激发且光电发射量子效率极低.本文利用Mie散射共振效应增强银纳米颗粒中的局域光学态密度,提升光吸收率和电子的输运效率,并利用激活层降低银的功函数,从而增强光阴极在可见光区的量子效率.采用时域有限差分方法分析银纳米球阵列的光学共振特性,采用磁控溅射和退火工艺在银/氧化锡铟复合衬底上制备银纳米球,紧接着在其表面沉积制备铯激活层,最后在高真空腔体中测试光电发射量子效率.实验结果表明平均粒径150 nm的银纳米球光阴极在425 nm波长的量子效率超过0.35%,为相同激活条件下银薄膜光阴极的12倍,峰值波长与理论计算的Mie共振波长相符合.     

指数掺杂反射式GaAlAs和GaAs光电阴极比较研究

采用指数掺杂技术, 通过金属有机化学气相沉积法外延生长了反射式GaAlAs和GaAs光电阴极, GaAlAs发射层的Al组分设计为0.63. 在超高真空系统中分别对两种阴极进行激活实验, 得到激活后的光谱响应曲线. 利用指数掺杂反射式光电阴极量子效率公式对实验曲线进行拟合并分析了电子漂移扩散长度、后界面复合速率、表面电子逸出几率等性能参数对光电发射性能的影响. 结果表明, 与GaAs光电阴极相比, GaAlAs光电阴极的Al组分虽然在一定程度上不利于光电发射, 但是解决了GaAs光电阴极由于响应波段宽而不能很好地用于窄波段可见光探测领域的问题, 制备出只对蓝绿光响应的反射式GaAlAs光电阴极.     

成像法在电磁叠加型光阴极注入器中的应用

光阴极注入器为X射线自由电子激光提供高品质电子束团,其中,阴极面上电子发射的均匀性在很大程度上影响着电子束团的束流品质,实验中常通过测量光阴极量子效率分布来评估电子发射的均匀性。成像法测量光阴极量子效率分布时具有实时、高分辨的特点,目前,此方法只在电磁分离型光阴极注入器中有所应用。探索成像法在电磁叠加型光阴极注入器中应用的可行性,采用理论分析结合数值模拟的方法,研究结果显示成像法适用于电磁叠加型光阴极注入器,且由此获得的量子效率分布具有阴极面中心位置处分辨率优于外层的特点。此外,针对成像法在初始束团横向动量分布测量中的应用进行模拟计算分析,并在此基础上提出一种判断阴极面剩余磁场是否为零的方法。     

NEA GaN光电阴极表面模型研究

针对目前NEAGaN光电阴极研究中Cs激活或Cs/O激活后表面状态的形成过程还不清楚的问题,围绕NEAGaN光电阴极的光电发射机理,结合GaN光电阴极激活过程中出现的现象及成功激活的最终效果,给出了GaN光电阴极铯氧激活后的表面模型[GaN(Mg):Cs]:O-Cs。利用该模型可很好地解释单独用Cs激活时约-1.0eV的有效电子亲和势和Cs/O共同激活时-1.2eV的有效电子亲和势的成因,也较好地解释了表面吸附原子的组合形式,即Cs/O激活后激活层的化学结构由Cs2O2和CsO2构成。     

超二代像增强器多碱阴极光电发射特性研究

通过测量超二代像增强器多碱阴极的光谱反射率和透射率,根据能量守恒定律计算得到了多碱阴极的光谱吸收率.结果表明,只有当光子的能量大于1.333 eV以后,多碱阴极的吸收率才开始快速增大.这说明多碱阴极的光谱吸收存在一个1.333 eV的长波吸收限,入射光的光子能量如果小于该吸收限,多碱阴极将不吸收.在多碱阴极的表面电子亲合势进一步降低的情况下,多碱阴极光电发射的长波理论阈值由长波吸收限所决定.多碱阴极在吸收光子之后的电子跃迁过程中,跃迁电子的能量增加小于所吸收入射光子的能量,即存在一个"能量损失".光子的能量越高,所激发的跃迁电子所处的能级越高,能量损失越大.同时光子的能量越高,跃迁电子所处的能级越高,电子跃迁的几率越低.多碱阴极的量子效率由吸收率、跃迁几率和跃迁能级、扩散过程中的能量损失等因素共同决定,因此多碱阴极的量子效率存在长波阈的同时也存在短波阈.多碱阴极的量子效率在2.11 eV达到最大值之后,随着光子能量的增加而单调减小,在3.6 eV时,量子效率减小到零.多碱阴极在3.6 eV时的吸收系数仍然很高,但由于电子跃迁的几率低,同时电子扩散过程中的能量损失大,导致尽管多碱阴极对短波具有较高的吸收系数,但量子效率仍然较低.因此对多碱阴极所吸收的光子能量中,转换成为光电导、晶格热振动等其他非光电发射形式能量的比例而言,短波较长波高,对光电发射的贡献率而言,短波较长波低.     

GaN 光电阴极的研究及其发展

GaN 光电阴极的理论研究主要集中在量子产额、电子能量分布和表面模型三个方面.国内对 GaN 光电阴极的研究尚处于起步阶段,存在基础理论不太明确、关键制备工艺欠成熟的问题.重点探讨了 GaN 光电阴极在发射机理、材料生长、表面净化、激活工艺的优化、变掺杂结构设计和稳定性等方面的研究动向、存在的相关问题及应采取的措施.根据实验结果提出了制备GaN光电阴极的可行性工艺流程. 关键词： GaN 光电阴极 发展     

用积分法推导NEA光电阴极的量子产额

以“三步发射模型”为基础, 采用积分的方法推导出反射式和透射式负电子亲和势（ Ｎ Ｅ Ａ）光电阴极的量子产额表达式, 其中反射式阴极的表达式和传统的求解扩散方程得出的表达式完全相同, 而根据透射式阴极的表达式绘出的量子产额理论曲线, 和求解扩散方程绘出的曲线基本重合, 与实验曲线也符合得很好。     

透射式碲铯(Cs2Te)光阴极厚度不均匀现象消除方法的研究

为解决透射式Cs₂Te光阴极厚度不均匀问题,通过理论和实验研究,分析了产生此问题的机理及其影响因素。这些因素包括：蒸发源发生器形状及其与阴极基底之间的相对位置;Cs/Te原子在阴极基底表面上完成化学反应所需的结合能以及制作阴极前基底表面所能达到的温度均匀性水平等。实验证明,上述最后一个因素是影响Cs₂Te光阴极厚度不均匀的主要原因。通过改变加温程序,优化保温时间,均衡阴极基底与阴极托盘温度梯度等途径,使得制作的透射式Cs₂Te光阴极厚度不均匀性由原来的76.4%,改善为＜10%。     

新型注铯镁金属光阴极的实验研究

报道了用于激光驱动高亮度注入器的新型光阴极的实验研究.用铯离子注入的方法得到了在镁基底上的掺铯合金光阴极,研究了注入、溅射及光电发射的机制和参数.用此阴极得到了比纯金属镁阴极高约一个量级的量子效率和绿光下的单光子发射效应,为用于强流短脉冲电子束的光阴极研究提供了新的途径. 关键词：     

Experimental study on the activation process of GaAs spin—polarized electron source

GaAs spin-polarized electron source is a new kind of electron source, where the GaAs semiconductor crystal is used as a photocathode under the irradiation of helicity light. In this paper the activation process of the GaAs spin-polarized electron source is unvestigated experimentally in detail, during which the negative electron affinity of the photo cathode should be achieved more carefully by absorbing the caesium and oxygen on the surface of the GaAs crystal under ultrahigh vacuum conditions. Besides the different activation processes, the important physical parameters are studied to achieve the optimum activation results. At the same time the stability and lifetime of the polarized electron beam are explored for future experiments. Some important experimental data have been acquired.     

极端紫外波段碱卤化物光阴极材料量子效率计算

为了满足极端紫外波段微通道位敏阳极光子计数探测器研究的需要,研究了碱卤化物光阴极材料的量子效率.由于光阴极材料的光电发射电流主要是由次级电子形成的,给出碱卤化物光阴极材料次级电子发射的理论模型,推导出次级电子产出的计算公式,针对光子能量30—250 eV范围内,计算并分析了光阴极材料厚度和光入射角对次级电子产出的影响.分析结果显示,光阴极材料厚度大于100 nm并且掠入射角大于临界角,是获得高次级电子产出的最佳条件.最后,应用推导的公式分析20种碱卤化物在能量30—250 eV范围内次级电子产出的光谱响应 关键词： 极端紫外 碱卤化物 光阴极 次级电子     

Quantum efficiency dependence on built-in electric fields in exponential-doped and graded-doped gallium arsenide photocathodes

We calculated the intensities and widths of the built-in electric fields of exponential-doped and graded-doped gallium arsenide (GaAs) photocathode for the first time. We analyzed the quantum efficiency (QE)for both samples with these two factors, along with the absorption coefficient and found out that although the exponential-doped sample was more complicated in structure than the graded-doped sample, the QE was not enhanced in the full experimental waveband as we expected, especially for those electrons with lower energy. It shows that the escape probability and diffusion length mainly depend on the intensity of the electric fields, which is believed the most decisive factor for the QE enhancement.