An Anomalous Gain Mechanism in GaN Schottky Barrier Ultraviolet Photodetectors

The gain mechanism in GaN Schottky barrier ultraviolet photodetectors is investigated by focused light beam. When the incident light illuminates the central region of the Schottky contact electrode, the responsiyity changes very little with the increase of reverse bias voltage. However, when the incident light illuminates the edge region of the electrode, the responsivity increases remarkably with the increase of reverse bias voltage, and the corresponding quantum efficiency could be even higher than 100%. It is proposed that the surface states near the edge of the electrode may lead to a reduction of effective Schottky barrier height and an enhancement of electron injection, resulting in the anomalous gain.     

Theoretical Analysis of Current Crowding Effect in Metal/AIGaN/GaN Schottky Diodes and Its Reduction by Using Polysilicon in Anode

There exists a current crowding effect in the anode of AIGaN/GaN heterojunction Schottky diodes, causing local overheating when working at high power density, and undermining their performance. The seriousness of this effect is illustrated by theoretical analysis. A method of reducing this effect is proposed by depositing a polysilicon layer on the Schottky barrier metal. The effectiveness of this method is provided through computer simulation. Power consumption of the polysilicon layer is also calculated and compared to that of the Schottky junction to ensure the applicability of this method.     

Schottky diode based on porous GaN for hydrogen gas sensing application

This article reports the study of Pd Schottky contact on porous n-GaN for hydrogen gas sensing. Upon exposure to 2% H₂ in N₂, porous GaN sensor exhibited significant change of current. Morphological studies revealed that Pd contact deposited on porous GaN has ridge-trench-like morphology, a dense porous network was found in between the ridges. The dramatic change of current was attributed to the unique microstructure at Pd/porous GaN interface, which allowed higher accumulation of hydrogen; this resulted in a stronger effect of H-induced dipole layer and led to a significant change in the electrical characteristics of the porous sensor.     

Intersecting behaviour of nanoscale Schottky diodes I-V curves

We describe a new feature connected with Schottky barriers with nanosize dimensions. We found out by theoretical analysis that the I-V curves of such small diodes measured at different temperatures should intersect and consecutively at higher voltages larger current flows through the diode at lower temperatures. This effect which is at first glance in contradiction with the thermionic theory is caused by the series resistance influence. We show that the presence of the series resistance is a necessary condition of its observation. However, the intersection voltage—minimum voltage at which the intersection may occur—increases with the value of the series resistance and the diode dimensions for which the effect could be observable in Si diodes and the common series resistance values must be in submicrometer range. Diodes with several hundreds nanometers dimension have the intersection voltage ∼1 V. Analytical expression for the intersection voltage values was also derived.     

Investigation on the barrier height and inhomogeneity of nickel silicide Schottky

The apparent Schottky barrier height (SBH) of the nickel silicide Schottky contacts annealed at different temperatures was investigated based on temperature dependence of I-V characteristic. Thermionic emission-diffusion (TED) theory, single Gaussian and double Gaussian models were employed to fit I-V experimental data. It is found the single Gaussian and double Gaussian SB distribution model can give a very good fit to the I-V characteristic of apparent SBH for different annealing temperatures. Also, the apparent SBH and the leakage current increase with annealing temperatures under reverse voltage. In addition, the homogeneity of interfaces for the samples annealed at temperatures of 500 and 600 °C is much better than that of the samples annealed at temperatures of 400, 700, and 800 °C. This may result from the phase transformation of nickel silicide due to the different annealing temperatures and from the low Schottky barrier (SB) patches.     

Numerical analysis of gate leakage current in AlGaN Schottky diodes

We studied theoretically the influence of the tunneling current on the leakage current in AlGaN Schottky diodes. It is shown that the most important conductance mechanism in these structures is the tunneling. The thermionic emission has lower influence on the total current practically throughout the whole reverse bias range and doping concentrations studied. For high doping concentrations we found very slow temperature dependence of the diode current.     

Effect of CO on Characteristics of AlGaN/GaN Schottky Diode

Pt Schottky diode gas sensors for CO are fabricated using A1GaN/GaN high electron mobility transistor（HEMTs）structure. The diodes show a remarkable sensor signal （3 mA, in N2, 2mA in air ambient） biased 2 V after 1% CO is introduced at 50℃. The Schottky barrier heights decrease for 36meV and 27meV in the two cases respectively. The devices exhibit a slow recovery characteristic in air ambient but almost none in the background of pure N2, which reveals that oxygen molecules could accelerate the desorption of CO and offer restrictions to CO detection.     

Hydrogen Sensors Based on AlGaN/AlN/GaN Schottky Diodes

Pt/AlGaN/AlN/GaN Schottky diodes are fabricated and characterized for hydrogen sensing. The Pt Schottky contact and the Ti/Al/Ni/Au ohmic contact are formed by evaporation. Both the forward and reverse currents of the device increase greatly when exposed to hydrogen gas. A shift of 0.3 V at 300 K is obtained at a fixed forward current after switching from N2 to 10%H2＋N2. The sensor responses under different concentrations from 50ppm H2 to 10%H2＋N2 at 373K are investigated. Time dependences of the device forward current at 0.5 V forward bias in N2 and air atmosphere at 300 and 373K are compared. Oxygen in air azcelerates the desorption of the hydrogen and the recovery of the sensor. Finally, the decrease of the Schottky barrier height and sensitivity Of the sensor are calculated.     

A Physics-Based Compact Direct-Current and Alternating-Current Model for AlGaN/GaN High Electron Mobility Transistors

A set of analytical models for the dc and small signal characteristics of AIGaN/GaN high electron mobility transis- tors （HEMTs） are presented. A modified transferred-electron mobility model is adapted and a phenomenological low-field mobility model is developed. We calculate the channel charge considering the neutralization of donors and the contribution of free electrons in the AlGaN layer. The gate-to-source and gate-to-drain capacitances are obtained analytically, and the cut-off frequency is predicted. The models are implemented into the HSPICE simulator for the dc, ac and transient simulations and verified by experimental data for the first time. A high efficiency class-E GaN HEMT power amplifier is designed and simulated by the HSPICE to verify the applicability of our models.     

Effect of growth pressure on the morphology evolution and doping characteristics in nonpolar a-plane GaN

Nonpolar a-plane GaN layers grown on r-plane sapphire substrates were examined by using a two-step growth process. The higher initial growth pressure for the nucleation layer resulted in the improved crystalline quality with lower density of both threading dislocations and basal stacking faults. This was attributed to the higher degree of initial roughening and recovery time via a growth mode transition from three-dimensional (3D) to quasi two-dimensional (2D) lateral growth. Using Hall-effect measurements, the overgrown Si doped GaN layers grown with higher initial growth pressure were found to have higher mobility. The scattering mechanism due to the dislocations was dominant especially at low temperature (<200 K) for the lower initial growth pressure, which was insignificant for the higher initial growth pressure. The temperature-dependent Hall-effect measurements for the Mg doped GaN with a higher initial growth pressure yielded the activation energy and the acceptor concentration to be 128 meV and 1.2 × 10¹⁹ cm⁻³, respectively, corresponding to about 3.6% of activation at room temperature. Two-step growth scheme with a higher initial growth pressure is suggested as a potential method to improve the performance of nonpolar a-plane GaN based devices.     

III-V compounds for solar cell applications

Research activities in the field of III-V solar cells are reviewed. III-V compound semiconductors are used for space solar cells, concentrator solar cells, and in thermophotovoltaic generators. The epitaxial growth of ternary and quaternary material by MOVPE and LPE allows us to realize various band gaps. Multi-junction solar cells with different band gaps are necessary to obtain efficiencies larger than 30%. Recent results of the III-V solar cell research at the Fraunhofer ISE are presented. A mechanically stacked GaAs/GaSb tandem concentrator solar cell achieved an efficiency of 31.1% under 100×AM1.5d. An efficiency of 23% for a two-terminal concentrator module (486 cm²) with Fresnel lenses has been measured under realistic outdoor conditions. Received: 1 March 1999 / Accepted: 28 March 1999 / Published online: 24 June 1999     

Impact of dopants in GaN on the formation of two-dimensional electron gas in AlGaN/GaN heterostructure field-effect transistors

The two-dimensional electron gas distribution in AlGaN/GaN high electron mobility transistors is determined from the solution of the coupled Schr?dinger’s and Poisson’s equations. Considering the piezoelectric effect, the two-dimensional electron gas concentration is calculated to be as high as 7.7×10¹⁹ cm^-3. In order to obtain an understanding of how the two-dimensional electron gas distribution is influenced by dopants in GaN, we observed the two-dimensional electron gas concentration and occupation of sub-bands versus dopant concentration in the GaN layer of an AlGaN/GaN heterostructure. Our results show that the two-dimensional electron gas concentration is slightly increased at higher doping levels in GaN, while the quantum confinement in the AlGaN/GaN heterostructure is weakened with the increase of donor concentration in the GaN layer. Received: 26 May 2001 / Accepted: 23 July 2001 / Published online: 23 January 2002     

Performance Improvement of GaN Based Schottky Barrier Ultraviolet Photodetector by Adding a Thin A1GaN Window Layer

We propose a new structure of GaN based Schottky barrier ultraviolet photodetector, in which a thin n-type A1GaN window layer is added on the conventional n^--GaN/n^＋-GaN device structure. The performance of the Schottky barrier ultraviolet photodetector is found to be improved by the new structure. The simulation result shows that the new structure can reduce the negative effect of surface states on the performance of Schottky barrier GaN photodetectors, improving the quantum efficiency and decreasing the dark current. The investigations suggest that the new photodetector can exhibit a better responsivity by choosing a suitably high carrier concentration and thin thickness for the A1GaN window layer.     

The effect of non-constant effective tunneling mass and asymmetry for resonant tunneling in double-barrier structures

We discuss the transmission coefficient τ_d in non-repetitive, one-dimensional, rectangular double-barrier structures without simplifications such as strongly attenuating barriers, strong localization, or overall constant effective tunneling mass of the electron. For resonance τ_d=1, we obtain two non-approximative conditions which require different resonance energies of the tunneling electron than previously reported in the literature. In fact, the resonance peaks are shifted to higher energy levels in the order of the width of the peaks due to the effect of non-constant tunneling mass. We investigate the dependence of the resonance condition and the shape of the resonance peaks in regard to perturbation of the electron energy, the gap width as well as the barrier width and height. Resonance is stable for variation of the barrier width but sensitive for variation of the barrier height and the gap width. Received: 9 December 1998 / Accepted: 5 January 1999 / Published online: 31 March 1999     

Tunnelling through randomly inhomogeneous barriers as a special problem of the scattering theory

The tunnelling of electrons through an inhomogeneous delta barrier is considered. The strength of the barrier is defined as a function oscillating around a constant mean value along a plane. Owing to deviations from this value, the tunnelling through such a delta barrier has to be interpreted as a scattering. A simple model is discussed when circular windows of a given radius b representing themselves delta barriers of a given strength γ₀ are embedded in a homogeneous delta barrier defined with another strength . When the centers of the windows are distributed randomly in the barrier plane, the potential energy of the electrons is a random function of two space coordinates. The perpendicular incidence is discussed with emphasis on the angular probability density of the tunnelled electrons. The derivation of the angular probability density proves that three basic quantum-mechanical phenomena can be described by one simple formula: tunnelling, diffraction and scattering.     

Evaluation of Schottky junction parameters from current-voltage characteristics exhibiting large excess currents

A new method is presented to extract the junction parameters from current-voltage characteristics of Schottky junctions exhibiting high leakage or other excess currents at low bias and current levels, for reduction of errors and uncertainity of the evaluation. In contrary to the Richardson plot, using the new method presented here, the Schottky junction parameters are evaluated from the measured experimental points directly instead of the extrapolated values of saturation current. The temperature dependence of forward bias, which is necessary for a given thermionic emission current level, is used. After transformation of the data, a linear plot is obtained, which yields both the barrier height and effective Richardson constant.     

HfO2/AlGaN/GaN structures with HfO2 deposited at ultra low pressure using an e‐beam

We show that HfO₂/AlGaN/GaN structures with HfO₂ layer deposited using an e‐beam in ultra high vacuum are suitable for field effect transistors. The dielectric constant of the HfO₂ was found ε_HfO > 23–24, which is close to the highest re‐ ported values for this material. The leakage current did not exceed 10^–4 A/cm² at the threshold voltage. The comparison of the losses in the samples with and without HfO₂ indicates low concentration of the interface traps. (© 2007 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Auger electron spectroscopy of Au/NiOx contacts on p-GaN annealed in N2 and O2 + N2 ambients

We have designed a promising contact scheme to p-GaN. Au/NiO_x layers with a low concentration of O in NiO_x are deposited on p-GaN by reactive dc magnetron sputtering and annealed in N₂ and in a mixture of O₂ + N₂ to produce low resistivity ohmic contacts. Annealing has been studied of NiO_x layers with various contents of oxygen upon the electrical properties of Au/NiO_x/p-GaN. It has been found that the Au/NiO_x/p-GaN structure with a low content of oxygen in NiO_x layer provides a low resistivity ohmic contact even after subsequent annealing in N₂ or O₂ + N₂ ambient at 500 °C for 2 min.Auger depth profiles and transmission electron microscopy (TEM) micrographs reveal that while annealing in O₂ + N₂ ambient results in reconstruction of the initial deposited Au/NiO_x/p-GaN contact structure into a Au/p-NiO/p-GaN structure, annealing in N₂ brings about reconstruction into Au/p-NiO/p-GaN and Ni/p-NiO/p-GaN structures. Hence, in both cases, after annealing in N₂ as well as in O₂ + N₂ ambient, the ohmic properties of the contacts are determined by creation of a thin oxide layer (p-NiO) on the metal/p-GaN interface. Higher contact resistivities in the samples annealed in O₂ + N₂ ambient are most likely caused by a smaller effective area of the contact due to creation of voids.     

Electrostatic correction to the square-potential model of nanostructures significantly affects current resonances

Depletion of carriers in nanostructures generates an electrostatic correction to the square potential model. This correction changes the tunneling probability and consequently affects current resonances. We analyze this effect numerically for the double-barrier quantum well (DBQW) at various temperatures and carrier densities, and conclude that the electrostatic correction significantly affects the resonant voltage, the current at resonance, the peak-to-valley ratio, and may even cause disappearance of the lowest resonance.     

Measurement of GaN/Ge（001） Heterojunction Valence Band Offset by X-Ray Photoelectron Spectroscopy

X-ray photoelectron spectroscopy has been used to measure the valence band offset （VBO） at the GaN/Ge heterostructure interface. The VBO is directly determined to be 1.13 ±0.19 eV, according to the relationship between the conduction band offset AEc and the valence band offset △Ev：△Ec =EgGaN -EgGe - △Ev, and taking the room-temperature band-gaps as 3.4 and 0.67eV for GaN and Ge, respectively. The conduction band offset is deduced to be 1.6±0.19 eV, which indicates a type-I band alignment for GaN/Ge. Accurate determination of the valence and conduction band offsets is important for the use of GaN/Ge based devices.