An inorganic-organic diblock copolymer photoresist for direct mesoporous SiCN ceramic patterns via photolithography

A high resolution negative-tone-type of inorganic-organic diblock copolymer photoresist was synthesized as a novel precursor for simple and direct fabrication of SiCN ceramic mesoporous patterns with ordered nanoscale pores by using a "top-down" photolithographic technique and the subsequent sacrificial processes of a "bottom-up" self-assembled nanostructure.     

Fabrication of a Flexible and Disposable Microreactor Using a Dry Film Photoresist

In this paper, we demonstrate that a low‐cost flexible microreactor can be manufactured using a dry film photoresist in conjunction with photolithographic and hot roll lamination techniques. A microfluidic flow path and sample reservoir patterns were prefabricated in a dry film photoresist tape using traditional photolithographic methods. This tape was sandwiched between two plastic films ‐ wells were prepouched on the cover film — that were bonded upon passage through a hot roll laminator. A simple Plexiglas reactor holder was designed and constructed to use in evaluating the flexible microchip reactor. We demonstrate a chemical synthesis of polyaniline that was performed with this polymeric microreactor using a hydrodynamic flow control system. The fabrication of this microreactor suggests that there is great potential for designing and prototyping disposable microscale reaction systems using dry film photoresist for a range of chemical and biochemical syntheses.     

Photosensitive materials based on copolymers of vinyl cyclopropyl ether with maleic anhydride

Copolymers prepared from vinyl cyclopropyl ether and maleic anhydride were modified with allyl alcohol, and the products obtained were thermally cross-linked with styrene. Photoresists were prepared from these copolymers, and their photolithographic parameters were determined.     

Sequential polymer lithography for chemical sensor arrays

A simple process for the deposition of up to six different polymers in selected areas to be used as sensitive layers in chemical sensor arrays is presented. The process is based on photolithographic processes and takes advantage of the balance between UV exposure dose, material tone and developers used. The sensing properties of the deposited films in the array were characterized by the in situ monitoring of volume expansion upon exposure to analytes using white light reflectance sspectroscopy. The swelling properties of processed films are compared to the unprocessed ones for the purpose of examining the variation induced by the processing steps (exposure and development circles). Additionally, the repeatability of the processes as well as the effect of analyte sequence is examined. This process offers good control of the lateral dimensions and the thickness of the polymeric films and allows for the parallel fabrication of sensors based on different transduction mechanisms including mass sensitive and stress induced bending chemical sensors.     

Patterning molecularly thin films of polymers—new methods for photolithographic structuring of surfaces

Three novel photolithographic processes for patterning of molecularly thin polymer films are described. The polymer monolayers are prepared by immobilization of initiator molecules to surfaces of solid substrates followed by thermally or photochemically activated radical chain polymerization. Thus polymer chains which are covalently linked to the surfaces of the substrates are obtained. The films can be patterned using appropriate masks and deep or near UV irradiation before, during or after polymer formation. The procedures described in this paper allow the chemical tailoring of surfaces with high spatial resolution. Step-and-repeat procedures, which take advantage of the covalent linking of the polymers to the surfaces, permit the preparation of multifunctional polymer patterns.     

Synthesis of photolabile o-nitroveratryloxycarbonyl (NVOC) protected peptide nucleic acid monomers

The chemical synthesis of peptide nucleic acid (PNA) monomers was accomplished using various combinations of the o-nitroveratryloxycarbonyl (NVOC) group (N-aminoethylglycine backbone) and base labile acyl-type nucleobase protecting groups (anisoyl for adenine and cytosine; isobutyryl for guanine), thus offering a photolithographic solid-phase PNA synthetic strategy compatible with photolithographic oligonucleotide synthesis conditions and allowing the in situ synthesis of PNA microarrays in an essentially neutral medium, by avoiding the use of the commonly used deprotection reagents such as trifluoroacetic acid or piperidine. Convenient methods were also explored to prepare 1-(carboxymethyl)-4-N-(4-methoxybenzoyl)cytosine and 9-(carboxymethyl)-2-N-(isobutyryl)guanine with good yields.     

玻璃上基于自组装和喷墨打印的选位金属沉积

采用氨基硅烷自组装分子对玻璃表面进行修饰; 借助喷墨打印技术, 按照设计好的线路图形把引发化学镀的催化剂“墨水”喷射在上述修饰表面上. 由于自组装分子具有朝向面外的氨基末端能吸附作为催化剂的溶胶或离子, 因而可以起到“有机浆糊”的作用, 使图形化的催化剂层固定在表面上以充当模板, 由于化学镀只在催化剂模板上发生, 从而可获得与设计一致的, 且与基底牢固结合的金属沉积图形. 将该方法拓展应用到玻璃基底上, 着重优化自组装条件, 提高了结合力, 首次实现了玻璃表面上包括金、铜以及镍硼合金在内的多种金属直接成型.     

Fabrication of microfluidic devices using dry film photoresist for microchip capillary electrophoresis

An inexpensive, disposable microfluidic device was fabricated from a dry film photoresist using a combination of photolithographic and hot roll lamination techniques. A microfluidic flow pattern was prefabricated in a dry film photoresist tape using traditional photolithographic methods. This tape became bonded to a poly(methyl methacrylate) (PMMA) sheet with prepouched holes when passed through a hot roll laminator. A copper working electrode and platinum decoupler was readily incorporated within this microchip. The integrated microchip device was then fixed in a laboratory-built Plexiglas holder prior to its use in microchip capillary electrophoresis. The performance of this device with amperometric detection for the separation of dopamine and catechol was examined. The separation was complete within 50 s at an applied potential of 200 V/cm. The relative standard deviations (RSD) of analyte migration times were less than 0.71%, and the theoretical plate numbers for dopamine and catechol were 3.2 x 10(4) and 4.1 x 10(4), respectively, based on a 65 mm separation channel.     

In vivo and in vitro testing of microelectronically fabricated planar sensors designed for applications in cardiology

Summary Ion-sensitive, planar micro-electrode arrays were fabricated by photolithographic microelectronics technology on a flexible polyimide substrate. The steps of the microelectronics processing are summarized. The electrodes were tested in blood serum, whole blood and in the hamstring muscle of anesthetized rabbits. The performance characteristics of planar pH-sensors are compared with commercial glass electrodes. The close correlation of the data are encouraging for further acute and later chronic applications.Dedicated to Professor Dr. Wilhelm Fresenius     

Nanolithography and nanochemistry: probe-related patterning techniques and chemical modification for nanometer-sized devices

The size regime for devices produced by photolithographic techniques is limited. Therefore, other patterning techniques have been intensively studied to create smaller structures. Scanning-probe-based patterning techniques, such as dip-pen lithography, local force-induced patterning, and local-probe oxidation-based techniques are highly promising because of their relative ease and widespread availability. The latter of these is especially interesting because of the possibility of producing nanopatterns for a broad range of chemical and physical modification and functionalization processes; both the production of nanometer-sized electronic devices and the formation of devices involving (bio)molecular recognition and sensor applications is possible. This Review highlights the development of various scanning probe systems and the possibilities of local oxidation methods, as well as giving an overview of state-of-the-art nanometer-sized devices, and a view of future development.     

光刻蚀法制备水凝胶微图案及其应用

采用光刻技术, 通过光引发单体聚合, 在硅烷化破片表面原位制备水凝胶微图案. 该法简便易行, 无需复杂的仪器设备和操作过程, 且所制微图案具有较好的稳定性. 通过细胞微图案化和液滴微结构制备展示了该技术的实用性和潜在的应用方向.     

Polymeric photoacid generators for direct photochemical modification of surface

To achieve easy spin coating and enhanced efficiency in the photolithographic process for the direct photochemical modification of surface, we incorporated photoacid generator (PAG) into polymer backbone. Bis‐(4‐hydroxy‐phenyl)‐(4‐methoxy‐3,5‐dimethyl‐phenyl)‐sulfonium chloride was synthesized as a monomer, and was polymerized with sebacoyl chloride and terephthaloyl chloride. The resulting polymeric PAG in chloride salt form was converted to the p‐toluenesulfonate and 1‐naphthol‐5‐sulfonate forms with ion‐exchange reactions. By the photolithographic process with the polymeric PAG, the protecting groups of the linker molecules self‐assembled onto a glass plate were micropatterned to produce an amine pattern for the microarray of oligonucleotides. The acids generated from the polymeric PAG effectively deprotect the acid‐labile protecting groups of the linker molecules through a chemical amplification process in the exposed region. After the treatment of the patterned amino groups with a fluorescent dye, the pattern profiles were observed with a fluorescence scanner. The fluorescence image reveals a well‐defined pattern at a micro level, which clearly indicates that the polymeric PAGs have a great potential in photochemical surface modification for the microarray of oligonucleotides. Copyright © 2007 John Wiley & Sons, Ltd.     

Polyimide/montmorillonite nanocomposites with photolithographic properties

Polyimide/montmorillonite nanocomposites with photolithographic properties (PSPI/MMT) were prepared by in situ polymerization using an intrinsic photosensitive polyimide (PSPI) based on 4,4^′-diamino-3,3^′-dimethyldiphenylmethane (MMDA) and benzophenone-3,3^′,4,4^′-tetracarboxylic dianhydride (BTDA). XRD, TEM were used to obtain the information on morphological structure of PSPI/MMT nanocomposites. The exfoliated structure was obtained in the MMT content range studied. Satisfactory photolithographic patterns were obtained when the MMT content was below 2 wt.%. Universal tester, TGA, DSC were applied to characterize the mechanical and thermal properties of the nanocomposites. The introduction of MMT led to increase in tensile strength to the PSPI matrix while the elongation at break was not obviously effected. The introduction of MMT also resulted in improved thermal stability, marked decrease in coefficient of thermal expansion, decrease in solvent uptake, slight increase in glass transition temperature and increase in modulus.     

Modification of ISFETs by covalent anchoring of poly(hyroxyethyl methacrylate) hydrogel. Introduction of a thermodynamically defined semiconductor-sensing membrane interface

Silicon dioxide ion-sensitive field effect transistors were modified by silylation with methacryloxypropyltrimethoxysilane (MPTS) and with in situ photopolymerized poly(hydroxyethyl methacrylate). Subsequently, the covalently linked methacrylate was swollen with a buffered potassium chloride solution, prior to the introduction of a hydrophobic sensing membrane. The introduced hydrogel layer effects a significant reduction in the peak-to-peak noise levels and eliminates completely interference from carbon dioxide. The method is compatible with integrated circuit photolithographic techniques and improves the development of potentiometric biosensors and chemical sensors.     

溶胶-凝胶法制备聚酰亚胺/二氧化钛感光杂化材料

高聚物 -无机物纳米杂化材料的研究已成为当今高分子化学和物理、无机化学和材料化学等许多学科交叉的前沿领域 [1] .聚酰亚胺因其特有的优越性能而成为聚合物中的热选材料 ;感光聚酰亚胺除具备常规聚酰亚胺的优良性能 ,还由于可在材料上直接刻蚀图形 ,简化工艺步骤 [2 ] ,作为通信产业中光波导、光联接等装置的材料而受到市场的关注 .目前有很多关于无机材料 Ti O2 和 Si O2 用于电光领域材料[3～ 5] 及其与聚合物形成的杂化材料用于制作光波导、光联结等电光领域的文献 [6,7] 报道 ,但很少见到可直接刻蚀图形的无机 /聚酰亚胺杂化材料 […     

Polymers grafted from solid surfaces

Monolayers of polymer molecules were generated at the surface of a solid substrate in situ by using self-assembled monolayers of initiator molecules. The layers were characterized by IR-spectroscopy, surface plasmon resonance measurements, ellipsometry, X-ray reflectometry, AFM and neutron reflectometry. Several novel techniques for the photolithographic patterning of the attached films are described. As a potential application for the attached layers the control of adhesion of biological cells to solid substrates is studied.     

Formation of deprotected fuzzy blobs in chemically amplified resists

The requirement of nanometer dimensional control in photolithographic patterning underlies the future of emerging technologies, including next-generation semiconductors, nanofluids, photonics, and microelectromechanical systems. For chemically amplified resists, dimensional control is mediated by the diffusion and reaction of photogenerated acids within a polymer-based photoresist matrix. The complex nature of the combined processes of reaction and diffusion prohibit the routine measurement of this phenomenon. Using small-angle neutron scattering, we have measured the form of the diffusion–reaction path of a photogenerated acid within a model photoresist matrix with a labeled protection group on the polymer side group. During the deprotection reaction, changes in the scattering form factor result from the shape and form of the deprotected regions. The individual volumes or blobs of reacted material are diffuse, with a fuzzy boundary between the reacted and unreacted regions. The impact of these results on the pattern quality is also discussed. © 2004 Wiley Periodicals, Inc. J Polym Sci Part B: Polym Phys 42: 3063–3069, 2004     

Synthesis of photolabile 2-(2-nitrophenyl)propyloxycarbonyl protected amino acids

The 2-(2-nitrophenyl)propyloxycarbonyl (NPPOC) group has been introduced as a photolabile amino protecting group for amino acids to be used as building blocks in photolithographic solid-phase peptide synthesis. NPPOC-protected amino acids were found to be cleaved in the presence of UV light about twice as fast as the corresponding o-nitroveratryloxycarbonyl (NVOC)-protected amino acids.     

Study on side‐chain second‐order nonlinear optical polyimides based on novel chromophore‐containing diamines. II. Copolyimides possessing direct photolithographic features

Second‐order nonlinear optical copolyimides were prepared from a novel chromophore‐containing diamine, 4‐nitro‐4′‐[N‐(4,6‐di‐4‐aminophenylamino)‐1,3,5‐triazin‐2‐yl]aminoazobenzene, a codiamine, 4,4′‐diamino‐3,3′‐dimethyldiphenylmethane, and benzophenone‐3,3′,4,4′‐tetracarboxylic dianhydride by a traditional two‐step process, which includes a solution polycondensation followed by a chemical imidization. Some of the polyimides (PIs) obtained possessed direct photolithographic features, and good photolithographic patterns were easily obtained. All PIs exhibited high‐glass transition temperatures (235–246 °C) and high thermal‐decomposition temperatures. They were also soluble in strong polar aprotic solvents such as N‐methyl‐2‐pyrrolidone, dimethylacetamide, dimethylformamide, dimethyl sulfoxide, and γ‐butyrolactone. © 2001 John Wiley & Sons, Inc. J Polym Sci A: Polym Chem 39: 1419–1425, 2001     

Photo-patternable electroluminescent blends of polyfluorene derivatives and charge-transporting molecules

New photo-curable blends of electroluminescent polymeric hosts and charge-transporting dopants were designed for photo-patterning and avoiding phase separation during the process. Oxetane-functionalized polyfluorene derivatives, aryl amines, and aromatic oxadiazoles were synthesized. Through a standard photolithographic process, 5-μm line and space patterns of the electroluminescent material on silicon substrate were produced. Devices constructed from the photo-curable blends showed better color purity of blue emission and more excellent device performances compared with those of the pure polyfluorene derivative.