纳米硅(nc-Si:H )/晶体硅(c-Si)异质结太阳电池的数值模拟分析

运用美国宾州大学发展的AMPS程序模拟分析了n-型纳米硅（n+-nc-Si:H）/p-型晶体硅(p-c-Si)异质结太阳电池的光伏特性.分析表明，界面缺陷态是决定电池性能的关键因素，显著影响电池的开路电压（VOC）和填充因子（FF），而电池的光谱响应或短路电流密度（JSC）对缓冲层的厚度较为敏感.对不同能带补偿（bandgap offset）的情况所进行的模拟分析表明，随着ΔEc的增大，由于界面态所带来的开路电压和填充因子的减小逐渐被消除，当ΔEc达到05eV左右时界面态的影响几乎完全被掩盖.界面层的其他能带结构特征对器件性能的影响还有待进一步研究.最后计算得到了这种电池理想情况下（无界面态、有背面场、正背面反射率分别为0和1）的理论极限效率ηmax=3117% (AM15，100mW/cm2，040—110μm波段).     

钙钛矿/硅叠层太阳电池中平面a-Si:H/c-Si异质结底电池的钝化优化及性能提高

最近,旋涂法制备的钙钛矿/平面硅异质结高效叠层太阳电池引起人们广泛关注,主要原因是相比于绒面硅衬底制备的钙钛矿/硅叠层太阳电池,其制备工艺简单、制备成本低且效率高.对于平面a-Si:H/c-Si异质结电池, a-Si:H/c-Si界面的良好钝化是获得高转换效率的关键,进而决定了钙钛矿/硅异质结叠层太阳电池的性能.本文主要从硅片表面处理、a-Si:H钝化层和P型发射极等方面展开研究,通过对硅片表面的氢氟酸(HF)浸泡时间和氢等离子体预处理气体流量、a-Si:H钝化层沉积参数、钝化层与P型发射极(I/P)界面富氢等离子体处理的综合调控,获得了相应的优化工艺参数.对比研究了p-a-Si:H和p-nc-Si:H两种缓冲层材料对I/P界面的影响,其中高电导、宽带隙的p-nc-Si:H缓冲层既能够降低I/P界面的缺陷态,又可以增强P型发射层的暗电导率,提高了前表面场效应钝化效果.通过上述优化,制备出最佳的P-type emitter layer/aSi:H(i)/c-Si/a-Si:H(i)/N-type layer (inip)结构样品的少子寿命与implied-Voc分别达到2855μs和709 mV,表现出良好的钝化效果.应用于平面a-Si:H/c-Si异质结太阳电池,转换效率达到18.76%,其中开路电压达到681.5 mV,相对于未优化的电池提升了34.3 mV.将上述平面a-Si:H/c-Si异质结太阳电池作为底电池,对应的钙钛矿/硅异质结叠层太阳电池的开路电压达到1780 mV,转换效率达到21.24%,证明了上述工艺优化能够有效地改善叠层太阳电池中的硅异质结底电池的钝化及电池性能.     

a-Si:H/c-Si 异质结太阳电池 J-V 曲线的 S-Shape 现象

通过异质结界面分析与 AMPS 模拟计算研究了 a-Si:H/c-Si 异质结太阳电池在低温工作、a-Si:H 层低掺杂、高价带补偿以及高界面态时光态 J-V 曲线出现 S-Shape 现象的物理过程,总结了 S-Shape 现象的物理原因.分析结果表明,当空穴输运受到界面势垒的限制时,空穴在 c-Si 界面附近聚集,能带重新分配,c-Si 耗尽区的电场减小,更多的电子从 c-Si 准中性区反转至 c-Si 界面及耗尽区与空穴复合,复合速率显著增大,光电流的损失显著增大,光态 J-V< 关键词： 模拟 异质结太阳电池 a-Si:H/c-Si 异质结     

硅异质结太阳电池的物理机制和优化设计

硅异质结太阳电池是一种由非晶硅薄膜层沉积于晶硅吸收层构成的高效低成本的光伏器件,是一种具有大面积规模化生产潜力的光伏产品.异质结界面钝化品质、发射极的掺杂浓度和厚度以及透明导电层的功函数是影响硅异质结太阳电池性能的主要因素.针对这些影响因素已经有大量的研究工作在全世界范围内展开,并且有诸多研究小组提出了器件效率限制因素背后的物理机制.洞悉物理机制可为今后优化设计高性能的器件提供准则.因此及时总结硅异质结太阳电池的物理机制和优化设计非常必要.本文主要讨论了晶硅表面钝化、发射极掺杂层和透明导电层之间的功函数失配以及由此形成的肖特基势垒;讨论了屏蔽由功函数失配引起的能带弯曲所需的特征长度,即屏蔽长度;介绍了硅异质结太阳电池优化设计的数值模拟和实践;总结了硅异质结太阳电池的研究现状和发展前景.     

基于平面硅的晶硅异质结太阳电池表面减反膜的优化

目前晶硅异质结太阳电池大多采用刻蚀绒面来减小光学损耗,但该方法工艺繁琐,且重复性和后期镀膜均匀性不佳;同时,绒面增加了载流子的传输路径和复合概率,限制了电池性能的提高.本文利用太阳电池模拟软件OPAL和光学膜系设计软件TFCalc,以平面硅为衬底,设计了一种双层TiO2/SiNx减反膜.考虑到太阳光谱分布和异质结太阳电...     

异质结太阳电池硅衬底绒面陷光结构的优化

硅异质结(SHJ)太阳电池作为备受关注的新型高效太阳电池,是在单晶硅表面沉积非晶硅薄膜制备而成的。将绒面结构的单晶硅衬底应用于异质结太阳电池,可以减少光的反射,增强光吸收的效率,从而提高太阳电池短路电流密度。利用湿法化学腐蚀对单晶硅衬底表面进行制绒,通过优化影响绒面形貌的几个关键参数,包括异丙醇浓度、时间、衬底类型和硅酸钠的含量,最终通过在n型单晶硅衬底上制绒,使波长为1011 nm处最低反射率从制绒前的34.7%降低到了9.14%,将制绒衬底应用到异质结太阳电池上,短路电流由32.06 m A/cm-2提升到36.16 m A/cm-2,有效地改善了SHJ太阳电池的性能。     

硅基薄膜太阳电池一维光子晶体背反射器的模拟设计与制备

从模拟和实验两个方面研究了一种适用于硅基薄膜太阳电池的一维光子晶体新型背反射器.首先采用时域有限差分方法,模拟研究了组成一维光子晶体的两种介质的折射率比、厚度比以及周期厚度对光子禁带的影响.基于模拟结果,制备出一种由低折射率SiOx层与高折射率非晶硅a-Si层周期性交叠构成的禁带可调式一维光子晶体背反射器.通过改变a-Si层的厚度,使得禁带范围由500—750 nm波长范围红移至650—1100 nm,反射率分别达到96.4%和99%.将上述结构的一维光子晶体作为背反射器分别应用于非晶硅单结太阳电池和非晶硅/微晶硅双结叠层太阳电池,与没有背反射结构电池相比,短路电流密度分别提升了18.3%和15.2%.同时模拟研究了在不同入射角度下自然光、TE波和TM波对光子晶体反射特性的影响.研究结果表明,在太阳电池中,光线倾斜入射对一维光子晶体反射率的影响有限.     

硅异质结太阳电池中钝化层和发射层的优化设计

本征钝化层及p型发射层对硅异质结太阳电池的性能具有重要的影响.本文在常规钝化层与晶硅衬底(c-Si)之间插入一层低功率、高氢稀释比沉积的超薄缓冲层,以此来提高钝化效果,并拓宽钝化层工艺窗口.此外,设计并制备了具有宽带隙、高电导特性的重掺杂纳米晶硅/轻掺杂p型双层复合发射极.实验结果表明,双层钝化层具有更加稳定与优异的钝...     

p型纳米硅与a-Si：H不锈钢底衬nip太阳电池

报道了选用厚度为0．05mm的不锈钢箔作衬底，B掺杂P型氢化纳米硅作窗口层，制备成功开路电压和填充因子分别达到0．90V和0．70的nip非晶硅基薄膜单结太阳电池．UV-VIS透射谱和微区Raman谱证实所用p层具有典型氢化纳米硅的宽能隙和含有硅结晶颗粒的微结构特征．明确指出导致这种氢化纳米硅能隙展宽的物理机制是量子尺寸效应．     

不同环境下硫化镉/铜基薄膜异质结退火对太阳电池性能调控

高效铜基薄膜太阳电池通常采用无机n型半导体材料CdS作为缓冲层,因此,缓冲层与吸收层之间的界面质量和能带匹配对载流子的收集利用至关重要.在优化CdS基础工艺的基础上,在含硫气氛下对硫化镉/铜基薄膜异质结进行退火的策略进一步提高CdS薄膜质量,并将其应用到铜基太阳电池,调控铜基薄膜电池p-n异质结能带匹配.研究表明, CdS薄膜在含硫的惰性气氛中退火可以有效提高CdS薄膜的结晶质量并抑制CZTS/CdS异质结界面的非辐射复合,器件的开路电压得到大幅提升,最高可达718 mV.在器件效率方面,基于溅射法的CZTS太阳电池效率从3.47%提升到5.68%,约为不退火处理的2倍.该研究为铜基薄膜太阳电池器件实现高开路电压提供了可靠的工艺窗口.同时,有力地说明了退火气氛选择对于CdS质量以及CZTS/CdS异质结能带匹配的重要性,除了界面互扩散以外,对薄膜材料组分及其结晶性等均实现了调控.     

非晶/微晶两相硅薄膜电池的计算机模拟

在对不同晶相比硅薄膜的实验研究的基础上，利用有效介质理论估算了这种两相材料的光吸 收系数、迁移率寿命乘积及带隙宽度等参量，计算机模拟了不同结晶比硅薄膜电池的伏安特 性及光谱响应；结果为随着本征层微晶成分的增多，电池的开路电压逐渐减小，短路电流逐 渐增大，本征层的最佳厚度逐渐增大，填充因子有降低的趋势，电池的效率随晶相比的增大 而减小. 电池的光谱响应曲线表明，随晶相比的增大电池的长波响应明显提高. 根据这些模 拟结果，分析讨论了在考虑Lambertian背反射的情况下，非晶/微晶叠层电池的底电池采用 晶相比为40％—50％的两相硅薄膜材料做本征层是最佳选择. 关键词： 两相硅薄膜 太阳能电池 计算机模拟     

Influence of interface states,conduction band offset,and front contact on the performance of a-SiC:H(n)/c-Si(p)heterojunction solar cells

P-type silicon heterojunction(SHJ) solar cells with a-SiC:H(n) emitters were studied by numerical computer simulation in this paper. The influence of interface states, conduction band offset, and front contact on the performance of a-SiC:H(n)/c-Si(p) SHJ solar cells was investigated systematically. It is shown that the open circuit voltage(V_(oc)) and fill factor(F F) are very sensitive to these parameters. In addition, by analyzing equilibrium energy band diagram and electric field distribution, the influence mechanisms that interface states, conduction band offset, and front contact impact on the carrier transport, interface recombination and cell performance were studied in detail. Finally, the optimum parameters for the a-SiC:H(n)/c-Si(p) SHJ solar cells were provided. By employing these optimum parameters, the efficiency of SHJ solar cell based on p-type c-Si was significantly improved.     

Understanding of a-Si:H(p)/c-Si(n) heterojunction solar cell through analysis of cells with point-contacted p/n junction

We fabricated point-contacted a-Si:H(p)/c-Si(n) heterojunction solar cells using patterned SiO₂ and investigated their electrical properties using the light current–voltage (I–V) curve and Suns-V_oc measurements. The light I–V curves showed bias-dependent changes according to the applied voltage in the point-contacted cells, especially in the samples with a long distance between the point-contacted junctions. The Suns-V_oc measurements showed that the bias-dependence of the light I–V curves did not originate from the recombination in the SiO₂/Si or a-Si:H(p)/c-Si(n) interface, but from the series resistances. It is possible to explain the bias-dependent light I–V curve in terms of the conductivity of a-Si:H(p) and difference in the electrical contact properties between a-Si:H(p), ZnO and c-Si(n). These results mean that the electrical properties of the a-Si:H(p) layer and the contact properties with this layer are also critical to obtain a high J_sc and fill factor in n-type based Si heterojunction solar cells.     

Influence of the semiconductor/metal rear contact on the performance of n(a-Si:H)/i(a-Si:H)/p(c-Si) heterojunction solar cells

The aim of this work is to analyze on the results of using of Al/Ag layer as a rear contact to improve the performance of heterojunction silicon solar cells. An analytical method is presented to extract the physical parameters of the equivalent circuit. These parameters are extracted to simulate the I(V) characteristic of heterojunction silicon solar cells, with Al and Al/Ag rear-metal contact. A good agreement between our analytical method and experimental measurement of electrical characteristics is obtained which show clearly how the Al/Ag rear contact can improve the characteristics of silicon solar cells. The influence of the rear-metal contact on the performance of the c-Si(p)-based bifacial HIT solar cell, i.e., the ZnO/Al/a-Si:H(n)/a-Si:H(i)/c-Si(p)/metal solar cell, is investigated in detail by computer simulation using the AFORS-HET software. Accordingly, the design optimization of the bifacial HIT solar cells on c-Si(p) substrates is provided. These simulation show an optimal conversion efficiency of 23% when the rear-metal contact is perfectly ohmic.     

Sub-stochiometric MoOx by radio-frequency magnetron sputtering as hole-selective passivating contacts for silicon heterojunction solar cells

The silicon heterojunction (SHJ) solar cell has long been considered as one of the most promising candidates for the next-generation PV market. Transition metal oxides (TMOs) show good carrier selectivity when combined with c-Si solar cells. This has led to the rapid demonstration of the remarkable potential of TMOs (especially MoO_x) with high work function to replace the p-type a-Si:H emitting layer. MoO_x can induce a strong inversion layer on the interface of n-type c-Si, which is beneficial to the extraction and conduction of holes. In this paper, the radio-frequency (RF) magnetron sputtering is used to deposit MoO_x films. The optical, electrical and structural properties of MoO_x films are measured and analyzed, with focus on the inherent compositions and work function. Then the MoO_x films are applied into SHJ solar cells. When the MoO_x works as a buffer layer between ITO/p-a-Si:H interface in the reference SHJ solar cell, a conversion efficiency of 19.1% can be obtained. When the MoO_x is used as a hole transport layer (HTL), the device indicates a desirable conversion efficiency of 17.5%. To the best of our knowledge, this current efficiency is the highest one for the MoO_x film as HTL by RF sputtering.     

Performance improvement for epitaxially grown SiGe on Si solar cell by optimizing the back surface field

This letter reports on the performance improvement of an epitaxially grown SiGe on Si solar cell by optimizing the back surface field (BSF). First, a Si_0.18Ge_0.82 on silicon (Si) solar cell was fabricated with a 0.25 μm BSF layer. A 25 mV open‐circuit voltage (V_OC) improvement was observed on this BSF solar cell compared with the reference solar cell without BSF layer. Then, a Si_0.18Ge_0.82 on Si solar cell with double BSF layers was designed and fabricated. The measured efficiency of this solar cell is 3.4% when filtered by a GaAs_0.79P_0.21 top cell. To the best of the authors' knowledge, the 3.4% efficiency reported here is the highest efficiency for SiGe on Si solar cells when filtered by a GaAs_0.79P_0.21 top cell. The previous best reported efficiency for high Ge composition SiGe on Si solar cell was only 1.7% when filtered by a GaAs_0.79P_0.21 top cell.