Atomic fluorescence mapping of optical field intensity profiles issuing from nanostructured slits, milled into subwavelength metallic layers

In this work, we report on the fabrication and characteristics of light-emitting diodes based on p-GaN/i-ZnO/n-ZnO heterojunction. A 30 nm i-ZnO layer was grown on p-GaN by rf reactive magnetron sputtering, then a n-ZnO was deposited by the electron beam evaporation technique. The current-voltage characteristic of the obtained p-i-n heterojunction exhibited a diode-like rectifying behavior. Because the electrons from n-ZnO and the holes from p-GaN could be injected into a i-ZnO layer with a relatively low carrier concentration and mobility, the radiative recombination was mainly confined in i-ZnO region. As a result, an ultraviolet electro-emission at 3.21 eV, related to ZnO exciton recombination, was observed in a room-temperature electroluminescence spectrum of p-i-n heterojunction under forward bias.     

Low-voltage blue light emission from n-ZnO/p-GaN heterojunction formed by RF magnetron sputtering method

High quality n-ZnO/p-GaN heterojunction was fabricated by growing highly crystalline ZnO epitaxial films on commercial p-type GaN substrates via radio frequency (RF) magnetron sputtering. Low-voltage blue light emitting diode with a turn-on voltage of ∼2.5 V from the n-ZnO/p-GaN heterojunction was demonstrated. The diode gives a bright blue light emission located at ∼460 nm and a low threshold voltage of 2.7 V for emission. Based on the results of the photoluminescence (PL) and electroluminescence (EL) spectra, the origins of the EL emissions were studied in the light of energy band diagrams of ZnO–GaN heterojunction, and may attribute to the radiative recombination of the holes in p-GaN and the electrons injected from n-ZnO, which almost happened on the side of p-GaN layer. These results may have important implications for developing short wavelength optoelectronic devices.     

Tunable electroluminescence from n-ZnCdO/p-GaN heterojunction

By cadmium allowing of zinc oxide, a phosphor-free single-chip white light emission diode based on n-ZnCdO/p-GaN heterostructure has been realized. The white light electroluminescence was produced by the superposition of two intense emission bands, a blue band and a yellow band. The origins of the blue band was contributed by both GaN and ZnCdO, while the yellow band was from the recombination of the holes and the electrons in the interface of GaN and ZnCdO.     

p-GaN插入层调控InGaN基黄绿双波长LED发光光谱

采用MOCVD技术在硅衬底上生长了含有7个黄光量子阱和1个绿光量子阱的混合有源区结构的InGaN基黄绿双波长LED外延材料,研究了电子阻挡层前p-GaN插入层厚度对黄绿双波长LED载流子分布及外量子效率(EQE)的影响。通过LED变温电致发光测试系统对LED光电性能进行了表征。结果表明,100 K小电流时随着电流密度的增大,三组样品的绿光峰与黄光峰相对强度的比值越来越大,且5.5 A·cm^-2的电流密度下,随着温度从300 K逐步降低至100 K,三组样品的绿光峰与黄光峰相对强度的比值也越来越大,说明其载流子都在更靠近p型层的位置发生辐射复合。三组样品的p-GaN插入层厚度为0,10,30 nm时,EQE峰值依次为29.9%、29.2%和28.2%,呈现依次减小的趋势,归因于p-GaN插入层厚度越大,p型层越远离有源区,空穴注入也越浅。电子阻挡层前p-GaN插入层可以有效减小器件EL光谱中绿光峰随着电流密度增加时峰值波长的蓝移(33 nm),实现了对低温发光光谱的调控。     

Effect of intrinsic ZnO thickness on the performance of SnS/CdS-based thin-film solar cells

Tin monosulfide (SnS) has promising properties as an absorber material for thin-film solar cells (TFSCs). SnS/CdS-based TFSCs have the following device structure: SLG/Mo/SnS/CdS/i-ZnO/AZO/Al. The optimization of thickness of intrinsic zinc oxide (i-ZnO) for SnS-absorber layers and its impact on SnS/CdS heterojunction TFSCs has been investigated at different thicknesses ranging from 39 nm to 73 nm. With the increase in thickness of i-ZnO from 39 nm to 45 nm, the overall performance improved. The highest PCE of 3.50% (with V_OC of 0.334 V, J_SC of 18.9 mA cm⁻², and FF of 55.5%) was observed for 45 nm-thick i-ZnO layers. Upon a further increase in the i-ZnO thickness to 73 nm, the device performance deteriorated, indicating that the optimum thickness of the i-ZnO is 45 nm. The device performances were analyzed comprehensively for different i-ZnO thicknesses.     

Experimental observation of a practical limit on enhancement of the spontaneous emission rate in blue GaN-LEDs by mediating surface plasmons

High modulation speed of light-emitting diodes (LEDs) is of primary importance for applications in optical communication. To this end, we experimentally investigated enhancement behaviors of the spontaneous emission rate (SER) of electron–hole pairs in blue InGaN/GaN LEDs by mediating surface plasmons (SPs). The coupling strength of the electron–hole recombination into SPs is controlled by etching the p-GaN layer between the active and metal layers to form thicknesses between 40 nm and 10 nm. While a tendency of increasing SER is theoretically expected for a smaller separation, the maximum value SER enhancement has a practical limit of about 2.5 at λ = 441 nm, and separation of 20 nm due to damage on the p-GaN layer caused by the etching process.     

The influence of ZnO seed layers on n-ZnO nanostructure/p-GaN LEDs

Light-emitting diodes (LEDs) were formed by hydrothermally growing n-ZnO nanostructures on p-GaN with or without seed layers. The performance of the fabricated LEDs was studied. The seed layers not only have a great influence on the morphology and density of the ZnO nanostructures but also determine the lighting bias and emitting mechanism. The LEDs without seed layers and with sputtered seed layers exhibit light emission only under reverse bias, which is believed due to the GaN buffer layer/p-GaN p–n junction. The LEDs with sol–gel seed layers exhibit light emission under both forward and reverse biases. With the increase of the forward bias, the LEDs first demonstrate a red electroluminescence emission coming from the sol–gel seed layers and then demonstrate an orange emission coming from the ZnO nanorods. The sol–gel seed layer and the interface play a very important role in the electroluminescence.     

Solution-based growth of ZnO nanorods for light-emitting devices: hydrothermal vs. electrodeposition

ZnO nanorods have been grown by two inexpensive, solution-based, low-temperature methods: hydrothermal growth and electrodeposition. Heterojunction n-ZnO nanorods/p-GaN light-emitting diodes have been studied for different nanorod growth methods and different preparation of the seed layer. We demonstrate that both the nanorod properties and the device performance are strongly dependent on the growth method and seed layer. All the devices exhibit light emission under both forward and reverse bias, and the emission spectra can be tuned by ZnO nanorod deposition conditions. Electrodeposition of rods or a seed layer results in yellow emission, while conventional hydrothermal growth results in violet emission.     

ZnMgO/n-ZnO/ZnMgO/p-GaN异质结LED的紫外电致发光

利用等离子体辅助分子束外延( P-MBE)技术制备了ZnMgO/n-ZnO/ZnMgO/p-GaN异质结LED.Ni/Au电极与p-GaN、In电极与ZnMgO之间都形成了良好的欧姆接触.在ZnMgO/n-ZnO/ZnMgO/p-GaN异质结器件中观察到了明显的整流特性.异质结的电致发光强度随着注入电流的增大而逐渐增强...     

A new self-activated yellow-emitting phosphor Zn2V2O7 for white LED

A new self-activated yellow-emitting Zn₂V₂O₇ phosphor was synthesized by high temperature solid-state reaction. X-ray powder diffraction (XRD) analysis confirmed the sample with monoclinic formation of Zn₂V₂O₇. The excitation and emission spectra indicated the phosphor can be efficiently excited by near ultraviolet (NUV) light in 220–400 nm range and exhibit a bright broad yellow emission with the highest emission intensity at 531 nm. The broad emission band from 400 to 650 nm can be attributed to the charge transfer transition in the VO₄ tetrahedra, which suggests that the phosphor is a promising yellow phosphor applied for white light-emitting diodes (WLED).     

The effect of a surface layer capping p-InGaN/p-GaN superlattices on the contact to p-GaN

In this study, the influence of the surface layer (p-InGaN or p-GaN) capping p-InGaN/p-GaN superlattices (SLs) on the contact to p-type GaN was investigated. It was found that the specific contact resistance (_ρc)$\left({\rho }_c\right)$ to p-type GaN is lower when using p-InGaN as the surface layer. The lowest value of _ρc${\rho }_c$ was 1.99×10⁻⁴ Ω cm² at room temperature. It was also found that low temperature growth of the p-GaN layers in the SLs is beneficial for lowering the ohmic contact resistance. Unlike Ni/Au deposited directly on p-GaN (without the strained p-InGaN/p-GaN SLs), Ni/Au deposited on p-InGaN/p-GaN SLs produces ohmic behavior even before annealing.     

Electroluminescence of an n-ZnO/p-GaN Heterojunction under Forward and Reverse Biases

Electroluminescent characteristics of n-ZnO/p-GaN heterojunctions under forward and reverse biases are studied. Emissions at 389nm and 57Ohm are observed under forward bias. An unusual emission at 390ram appears under reverse bias, and is attributed to the recombination in the p-GaN side of the heterojunction. The yellow emission peaked at 57Ohm is suppressed under reverse bias. The light intensity exponentially depends on the reverse current. The emission under reverse bias is correlated to tunnelling carrier transport in the heterostructure. Our results also support that the well-known yellow band of GaN comes from the transitions between some near-conduction-band-edge states and deep localized acceptor states.     

Solution epitaxy of gallium-doped ZnO on p-GaN for heterojunction light-emitting diodes

We report white light emission from a Ga-doped ZnO/p-GaN heterojunction light-emitting diode which was fabricated by growing gallium-doped ZnO film on the p-GaN in water at 90°C. As determined from Ga-doped ZnO films grown on (111) oriented MgAl₂O₄ spinel single crystal substrates, thermal treatment at 600°C in nitrogen ambient leads to a carrier concentration of 3.1×10²⁰ cm⁻³ (and carrier mobility of 28 cm²/Vs) which is two orders of magnitude higher than that of the undoped films. Electroluminescence emissions at wavelengths of 393 nm (3.155 eV) and 529.5 nm (2.4 eV) were observed under forward bias in the heterojunction diode and white light could be visibly observed. The high concentration of electrons supplied from the Ga-doped ZnO films helped to enhance the carrier recombination and increase the light-emitting efficiency of the heterojunction diode.     

Improvement in electroluminescence performance of n-ZnO/Ga_2O_3 /p-GaN heterojunction light-emitting diodes

n-ZnO/p-GaN heterojunction light-emitting diodes with and without a Ga2O3 interlayer are fabricated. The electroluminescence （EL） spectrum of the n-ZnO/p-GaN displays a single blue emission at 430 nm originating from GaN, while the n-ZnO/Ga2O3/p-GaN exhibits a broad emission peak from ultraviolet to visible. The broadened EL spectra of n-ZnO/Ga2O3/p-GaN are probably ascribed to the radiative recombination in both the p-GaN and n-ZnO, due to the larger electron barrier （ΔEC=1.85 eV） at n-ZnO/Ga2O3 interface and the much smaller hole barrier （ΔEV=0.20 eV） at Ga2O3/p-GaN interface.     

Non-doped red to yellow organic light-emitting diodes with an ultrathin 4-(dicyanomethylene)-2-t-butyl-6(1,1,7,7-tetramethyljulolidyl-9-enyl)-4H-pyran (DCJTB) layer

In this letter, bright non-doped red to yellow organic light-emitting diodes (OLEDs) with ultrathin 4-(dicyanomethylene)-2-t-butyl-6(1,1,7,7-tetramethyljulolidyl-9-enyl)-4H-pyran (DCJTB) layer as the emitting layer were fabricated. It was investigated that the effect of the ultrathin DCJTB layer on the electroluminescent (EL) performance of OLEDs. The DCJTB layer was incorporated at different positions in the conventional tris(8-quinolinolato)-aluminum (AlQ)-based devices (ITO/NPB/AlQ/LiF/Al). The emission of DCJTB was dominative in the EL spectra of the devices, in which the position of 0.3 nm DCJTB layer was less than 10 nm from the NPB/AlQ interface. The EL peak emission of DCJTB shifted to blue side as DCJTB position moved gradually from AlQ to NPB layer. The highest brightness of the device with 0.3 nm DCJTB layer inserted into NPB reached 16,200 cd/m² at 15 V, with the CIE coordinates of (0.522, 0.439).     

Auger electron spectroscopy of Au/NiOx contacts on p-GaN annealed in N2 and O2 + N2 ambients

We have designed a promising contact scheme to p-GaN. Au/NiO_x layers with a low concentration of O in NiO_x are deposited on p-GaN by reactive dc magnetron sputtering and annealed in N₂ and in a mixture of O₂ + N₂ to produce low resistivity ohmic contacts. Annealing has been studied of NiO_x layers with various contents of oxygen upon the electrical properties of Au/NiO_x/p-GaN. It has been found that the Au/NiO_x/p-GaN structure with a low content of oxygen in NiO_x layer provides a low resistivity ohmic contact even after subsequent annealing in N₂ or O₂ + N₂ ambient at 500 °C for 2 min.Auger depth profiles and transmission electron microscopy (TEM) micrographs reveal that while annealing in O₂ + N₂ ambient results in reconstruction of the initial deposited Au/NiO_x/p-GaN contact structure into a Au/p-NiO/p-GaN structure, annealing in N₂ brings about reconstruction into Au/p-NiO/p-GaN and Ni/p-NiO/p-GaN structures. Hence, in both cases, after annealing in N₂ as well as in O₂ + N₂ ambient, the ohmic properties of the contacts are determined by creation of a thin oxide layer (p-NiO) on the metal/p-GaN interface. Higher contact resistivities in the samples annealed in O₂ + N₂ ambient are most likely caused by a smaller effective area of the contact due to creation of voids.     

n-ZnO/i-MgO/p-GaN异质结发光二极管

用等离子体辅助分子束外延的方法生长了n-ZnO/i-MgO/p-GaN异质结发光二极管。I-V测量表明其具有典型的二极管整流特性。电致发光峰位于382nm,通过与n型ZnO和p型GaN的光致发光谱比较,其发光峰位与线形都与ZnO的自由激子发射一致,表明该电致发光来自于ZnO的自由激子发射。通过Anderson模型比较了n-ZnO/i-MgO/p-GaN和n-ZnO/p-GaN异质结的能带示意图,证明了由于MgO层的插入抑制了ZnO向GaN层中的电子注入,且有利于空穴向ZnO层注入,从而实现了ZnO层中的电注入发光。     

van der Waals gap-inserted light-emitting p–n heterojunction of ZnO nanorods/graphene/p-GaN film

We report on the electroluminescent (EL) and electrical characteristics of graphene-inserted ZnO nanorods (NRs)/p-GaN heterojunction diode. In a comparative study, ZnO NRs/p-GaN and ZnO NRs/graphene/p-GaN heterojunctions exhibit white and yellow EL emissions, respectively, at reverse bias (rb) voltages. The different EL colors are results of different dichromatic EL peak intensity ratios between 2.25 and 2.8 eV light emissions which are originated from ZnO and p-GaN sides, respectively. The 2.25 eV EL is predominant in both the heterojunctions, because of recombination by numerous electrons tunneled from p-GaN to ZnO across the thin barriers of the staggered broken gap with a large band offset in ZnO/p-GaN and the van der Waals (vdW) gap formed by graphene insertion at ZnO NRs/p-GaN. However, as for the 2.8 eV EL intensity, ZnO NRs/graphene/p-GaN hardly shows the EL emission, whereas ZnO NRs/p-GaN exhibits the substantially strong EL peak. We discuss that the significantly reduced 2.8 eV EL emission of ZnO NRs/graphene/p-GaN is a result of decreased depletion layer thickness at p-GaN side where the recombination events occur for 2.8 eV EL before the reverse bias-driven tunneling because the insertion of graphene (or vdW gap barrier) inhibits the carrier diffusion whose amount determines the depletion thickness when forming the heterojunctions. This study opens a way of suppressing (or enhancing) the specific EL wavelength for the dichromatic EL-emitting heterojunctions simply by inserting atom-thick vdW layer.     

Non-doped phosphorescent white organic light-emitting devices with a quadruple-quantum-well structure

Non-doped white organic light-emitting devices (WOLEDs) with a quadruple-quantum-well structure were fabricated. An alternate layer of ultrathin blue and yellow iridium complexes was employed as the potential well layer, while potential barrier layers (PBLs) were chosen to be 2,2',2''-(1,3,5-benzenetriyl)-tris(1-phenyl-1-H-benzimidazole) (TPBi) or N,N'-dicarbazolyl-3,5-benzene (mCP) combined TPBi. On adjusting the PBLs for device performance comparison, the results showed that the device with all-TPBi PBLs exhibited a yellow emission with the color coordinates of (0.50,0.47) at a luminance of 1000 cd/m², while stable white emission with the color coordinates of (0.36,0.44) was observed in the device using mCP combined TPBi as the PBLs. Meanwhile, for the WOLED, with a reduced efficiency roll-off, a maximum luminance, luminous efficiency, and external quantum efficiency of 12,610 cd/m², 10.2 cd/A, and 4.4%, respectively, were achieved. The performance improvement by the introduction of mCP PBL was ascribed to the well confined exciton and the reduced exciton quenching effect in the multiple emission regions.     

Effect of different spacers for performance enhancement on white organic light-emitting devices based on double emissive layers with homogeneous p-/n-type host

White organic light-emitting devices (WOLEDs) based on phosphorescent blue and yellow emitters were fabricated, while p-type di-(4-(N,N-ditolyl-amino)-phenyl)cyclohexane (TAPC) and n-type 2,2′,2″-(1,3,5-benzenetriyl)-tris(1-phenyl-1-H-benzimidazole) (TPBi) were separately utilized as a homogeneous host for both blue and yellow emissive layers (EMLs). Then, various spacers were inserted between the two EMLs for performance characterization. The results showed that for the TAPC-host devices, a device using 4,7-diphenyl-1,10-phenanthroline (Bphen) as the spacer had a maximum current efficiency (CE) of 11.3 cd/A, while stable white light emission with Commission Internationale del’Eclairage (CIE) coordinates of (0.394, 0.435) at a bias of 5 V was observed. Similarly, among the TPBi-host devices, a device using 4,4′-bis(carbazol-9-yl)biphenyl (CBP) as the spacer exhibited a maximum CE of 18.1 cd/A, accompanied by negligible color variation with the CIE coordinates of (0.284,0.333) at 5 V. For the double-EML devices, the improved device efficiency and color stability by introducing proper spacer was attributed to broadened recombination region and efficient energy transfer between the EMLs.