Surface space-charge layer analysis in semi-insulating GaAs containing deep levels in bulk

A computer simulation study of space-charge layers at the surface of semiinsulating GaAs containing deep EL2 and Cr centers in bulk is presented. Substantial influence of the deep bulk levels on the main characteristics of the surface space charge layers, is demonstrated. The special features of these characteristics and the conditions of their arising are discussed.     

Characterization of MOVPE-grown GaAs layers by C-V analysis

A computer simulation study of the capacitance of a surface space charge layer in undoped n-GaAs grown by metalorganic vapour phase epitaxy is presented. The effect of the deep donor level EL2 on the surface capacitance of epilayers with an ideal free surface is estimated. In order to approach the as-grown layer surface the model used is extended considering MIS and Schottky-barrier structures and their voltage-capacitance curves are analysed. The theoretical C-V dependences are compared with experimental C-V curves of a real structure including N⁺-GaAs substrate, undoped n-GaAs epitaxial layer containing EL2 levels and thin native oxide. Conditions are determined at which the EL2 levels as well as the native oxide film may influence the capacitance characteristics.     

Evidence for two energy levels associated with EL2 trap in GaAs

By photocapacitance technique, applied to n-type LEC-grown GaAs, two energy levels:E _v +0.45 eV andE _c –0.75 eV are identified, for the first time, as being associated with the EL2 trap. As follows from the analysis of photo-EPR results on highly resistive GaAs crystals, the same energy levels can be attributed to the arsenic antisite defect, As_GA. In view of these findings, it is argued that the occupied EL2 level corresponds to the neutral charge state of As_Ga defect.     

Double anion antisite in GaAs - the simplest member of EL2 family?

Properties of an aggregate composed of two nearest-neighbour As_Ga defects are examined. Such an aggregate behaves like a dimer in which the two constituents are weakly coupled giving rise to a double near-degeneracy of electronic states of the system. The system is unstable against the Jahn-Teller (J-T) distortion that couples pairs of nearly degenerate states. Usually the distortion is stabilized by localization of a single electron, or a pair of electrons, at one of the two As_Ga defects. If one of the two electrons is excited into theT ₂ resonant state of individual As_Ga then the vibronic coupling can be strong, and the resulting J-T effect can give rise to a metastable behaviour of the system. It is argued that the (As_Ga)₂ aggregate is the best candidate for EL2 centre in GaAs crystals.     

Analysis of the surface photovoltage under sub-bandgap illumination: Effect of the bulk traps

The simple theory of the surface photovoltage induced by photostimulated electron transitions from the bulk impurity levels is given. The relevant calculations show that the surface barrier height, the concentration of the impurity levels and the trapping process at the surface effectively control this phenomenon. Under the proper conditions, a very low excitation level in the bulk can generate significant surface photovoltage signals.     

Thermal regeneration of the EL2 center unquenched configuration in semi-insulating GaAs

The EL2 center is a key defect in semi-insulating GaAs. Its nature is a matter of discussions. Recently, Levinson proposed a dipolar model that could explain the quenching properties previously related to a possible metastable state. According to this model, the EL2 defect could take two different quenched and unquenched geometrical configurations, respectively, denoted (0) and (0^*); some levels in the band gap were shown to be typical of the (0) configuration; in this paper we propose to observe these levels by means of thermally stimulated conductivity or thermally stimulated optical absorption spectroscopy. Their behaviour after thermal cycles in the dark will express the conversion of the (0^*) configuration into the (0) one. A steep thermal threshold is displayed atT=120 K, whereas other residual relaxation phenomena are also observed aboveT=220 K. The internal electronic mechanisms of the (0) configuration will also be discussed.     

Characterization of GaAs/AlxGa1-xAs heterointerface defects by means of capacitive measurememts

x Ga_1-xAs heterojunctions grown by liquid-phase epitaxy. Interface states with hiqh concentration, N_t=3×10¹¹ cm^-2 and energy level E_c-E_t=0.14 eV distributed in a box 150 Å wide at the heterointerface and acting as electron traps are observed. The possible origin could be the isolated arsenic vacancy V_As in n-GaAs. Received: 25 April 1996/Accepted: 22 January 1997     

Phonons in surface photovoltage of GaAs

Oscillatory surface photovoltage is reported in GaAs at 4.2°K, characterized by two series of minima. Dominating series is attributed to the capture of photoexcited electrons by surface states with emission of phonons. Second, weak series coincides with oscillations in photoconductivity.     

Surface photovoltage measurement in MOS structures

A method for the dc surface photovoltage measurement in MOS capacitors is proposed. Results of surface-photovoltage measurements performed for two kinds of MOS structures on p-type silicon substrates are presented. Comparison of them with results obtained form C-V characteristics exhibits a satisfactory conformity. Two groups of surface states beginning at E _t ¹ = E_v + 0.25 eV and E _t ² = E_c – 0.30 eV in the oxide-silicon interface of the investigated structures had been found.     

A study of deformation-produced deep levels inn-GaAs using deep level transient capacitance spectroscopy

Deformation-produced deep levels, both of electron and hole traps, have been studied using deep level transient capacitance spectroscopy (DLTS) for an undopedn-type GaAs (HB grown) compressed at 440°C. Concentrations of two grown-in electron trap levels (E _c −0.65eV andE _c −0.74eV) and one grown-in hole trap level (E _v +∼0.4eV) increase with plastic deformation, while that of a grown-in electron trap level (E _c −∼0.3eV) decreases in an early stage of deformation. While no new peak appeared in the electron trap DLTS spectrum after plastic deformation, in the hole trap DLTS spectrum a broad spectrum, seemingly composed of many peaks, newly appeared in a middle temperature range, which may be attributed to electronic energy levels of dislocations with various characters.     

Compensation in GaAs crystals due to anti-structure disorder

Complete equilibrium of native point defects in a GaAs crystal being in contact with the liquid phase (melt) is considered. Equilibrium relations for the concentrations of antisite defects, Ga_As and As_Ga, in dependence on the melt composition are derived. It is argued that the As_Ga defect is a double donor, the lower energy level of which corresponds to EL2, while the Ga_As is a double acceptor that can be identified with residual acceptor having the levels at 78 meV and 200 meV above the valence band, which was discovered by Elliot et al. It is shown that the presence of antisite defects together with an excess of background shallow acceptors leads, under reasonable assumptions, to a nearly intrinsic behaviour of LEC-grown GaAs, if the As atom fraction in the melt ranges from 0.471 to 0.535, in accordance with observations of Holmes et al.     

Valence band and chemical interactions of Zn/CdSnAs2 interfaces

X-ray photoelectron spectroscopy (XPS) together with argon ion sputtering was used to investigate the interface of the Zn/CdSnAs₂ system at various temperatures. The formation of an intermediate compound between Zn and As is proposed. The surface enrichment of Cd and Sn at 200 and 400°C is explained in terms of bond breaking and lattice strain theories.NCL Communication No. 4352     

Surface photovoltage spectroscopy and surface piezoelectric effect in GaAs

“Real” (111) surfaces of n-type GaAs were investigated employing surface photovoltage spectroscopy and the surface piezoelectric effect. Surface states at the energy position E_c ? E_t ? 0.72 eV were found on both the Ga and the As surfaces. Both types of surfaces exhibited a barrier of about 0.55 V. No variations in the surface barrier or the energy position of the surface states were observed in various ambients at atmospheric pressure (dry air, wet air, ammonia and ozone). However, the capture cross-section of the surface states for electrons, as determined from the surface piezoelectric effect transients (of the order of 10^?13 cm²), was found to be sensitive to the ambient. It decreased in wet air and increased in ozone. This effect was more pronounced on the As than on the Ga surfaces. Additional surface states were found to be present in the energy region of 0.9 to 1.0 eV, below the bottom of the conduction band. However, their exact energy positions could not be determined due to interference caused by the carrier trapping of the surface states at E_c ? E_t ? 0.72 eV.     

Photoelectrochemical etching of ZnS: Further evidence for non-uniform flow of charge carriers in Schottky barriers

It is shown that short photoelectrochemical etching of two kinds of ZnS crystals leads to a reduction in the surface recombination velocity as evidenced by their increased photocurrent. The unique surface morphology (>10⁹ pits cm^–2) revealed after photoetching supports the hypothesis that the charge flow within the space charge layer is highly nonuniform.Incumbent of Helen & Milton A. Kimmelman Career Development Chair in perpetuity established by Helen and Milton A. Kimmelman, New York, NY     

Residual non-idealities in the almost ideal silicon p-n junction

The reproducible, mass production of almost ideal silicon p-n junctions has allowed two new phenomena to be discovered: a pure generation without recombination, and a slow capacitance-free current transient. Our present knowledge of these phenomena is reviewed and speculations about the centres responsible for them are discussed; these centres seem to be connected to ultimate, unavoidable properties of the silicon p-n junction rather than to unwanted impurities.     

Annealing behavior ot trap-centers in silicon containing A-swirl defects

The annealing behavior of trap-centers was studied in float-zone silicon wafers containing A-swirl defects. Samples from areas of high and low A-swirl density were annealed in nitrogen ambient between 100° and 900 °C, and analysed using the Deep Level Transient Spectroscopy. The results indicate, that two levels atE _c }-0.07 eV, _n=4.6×10^–16 cm², andE _c–0.49eV, _n=6.6×10^–16cm² are caused by one defect, for which the silicon di-selfinterstitial is a likely interpretation. A level atE _c }-0.11 eV was assigned to interstitial carbon. Both defects annealed out at about 170 °C. After 600 °C annealing an additional level atE _c–0.2 eV was detected, which was attributed to an interstitial silicon carbon complex. Heat treatment at 800 °C generated a new level atE _c–0.49 eV, _n=2.9×10^–16cm² only in the area of high A-swirl defect density. This level was also observed after oxidation and subsequent annealing of silicon.     

Optical properties and origin of infrared light scattering centers in undoped semi-insulating GaAs crystals

The wavelength dependence and polarization characteristics of the infrared light scattered from an undoped GaAs crystal were investigated in the 90° angle infrared light scattering configuration. The scattering is Rayleigh scattering from scatterers which are always associated with the dislocations, and they are classified into three types,S, L _A , andL _G scatterers, according to their polarization characteristics. TheS, L _A , andL _G -scatterers are thought to be small As clusters, large As precipitates and large Ga precipitates, respectively.     

Dislocation generation in silicon grown laterally over SiO2 by liquid phase epitaxy

Epitaxial lateral overgrowth (ELO) on thermally oxidized and patterned (111) Si is effected by liquid phase epitaxy (LPE). It produces Si layers spreading out on the amorphous SiO₂ which are either perfectly grown defect-free or, coexisting, defective layers containing dislocations. High voltage electron microscopy of the defective layers reveals regular arrangements of the dislocations which result from glide and multiplication processes governed by the elastic interactions between the dislocations. The nucleation of the first dislocations during the ELO process is attributed to a slight warping of the substrates. A corresponding bending of the epitaxial layer induces mechanical stress, which may exceed the critical value at the oxide edges of the seeding windows where the first dislocations nucleate. The characteristics of the dislocation arrangements and lattice imaging results support this model. Suggestions are made for ways to reduce stress and, thus, avoid dislocation formation.